• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.1
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• pp.81-85
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• 2009

We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

• Textile Coloration and Finishing
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• v.10 no.6
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• pp.1-9
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• 1998

The effects of oxygen plasma treatments at different discharge power, reaction pressure, treatment time on yellowing of polyester fabrics were studied. Surface characteristics of the treated fabrics were also investigated by means of SEM and ESCA. The results were as follows : The yellowing of fabrics increases as the power and the treatment time are increased, and decreases as the pressure is increased. The plasma treatment of 100 Watt, 200 mTorr, 5 min. is the optimal condition which is most effective in holding whiteness as well as high weight loss of fabrics.

• Proceedings of the IEEK Conference
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• 2004.08c
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• pp.460-462
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• 2004

The control of the data retention time is a main issue for realizing future high density dynamic random access memory. There are several leakage current mechanisms in which the stored data disappears. The mechanisms of data disappear is as follow, 1 )Junction leakage current between the junction, 2) Junction leakage current from the capacitor node contact, 3)Sub-threshold leakage current if the transfer transistor is affected by gate etch damage etc. In this paper we showed the plasma edge damage effect to find out data retention time effectiveness. First we measured the transistor characteristics of forward and reverse bias. And junction leakage characteristics are measured with/without plasma damage by HP4145. Finally, we showed the comparison TRET with etch damage, damage_cure_RTP and hydrogen_treatment. As a result, hydrogen_treatment is superior than any other method in a curing plasma etch damage side.

• Journal of Environmental Science International
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• v.12 no.7
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• pp.801-807
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• 2003

This work aims the search of environmentally friendly pre-treatment technologies to develop chromate replacements for metal finishing industries due to its toxicological properties. Since the corrosion resistance of steel was strongly related to water permeation, galvanized steel sheets were treated with various hydrophobic silane compounds and water-suspended polymer solution. Also, plasma gas discharge was applied to modify the surface of a polymer coated-steel sheet to be hydrophobic. The surface hydrophobicity of materials was introduced by CF$_3$H plasma exposure. The corrosion property before and after the plasma treatment was investigated in a slat spray tester with 3.5 wt.% NaCl at 35$^{\circ}C$. The results showed that both silane/polymer double coatings and plasma treatment of the galvanized steel exhibited significant retardation of corrosion.

• Transactions on Electrical and Electronic Materials
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• v.17 no.2
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• pp.113-117
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• 2016

Temperature dependent reverse-bias current-voltage (I-V) characteristics in Cu Schottky contacts to oxygen plasma treated n-InP were investigated. For untreated sample, current transport mechanisms at low and high temperatures were explained by thermionic emission (TE) and TE combined with barrier lowering, respectively. For plasma treated sample, experimental I-V data were explained by TE or TE combined with barrier lowering models at low and high temperatures. However, the current transport was explained by a thermionic field emission (TFE) model at intermediate temperatures. From X-ray photoemission spectroscopy (XPS) measurements, phosphorus vacancies (VP) were suggested to be generated after oxygen plasma treatment. V_P possibly involves defects contributing to the current transport at intermediate temperatures. Therefore, minimizing the generation of these defects after oxygen plasma treatment is required to reduce the reverse-bias leakage current.

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.880-883
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• 1996

Plasma Source Ion Implantation (PSII) technique was used for the hydrophilization or hydrophobization of polymer surfaces. Polymers were modified with different plasma gases such as oxygen, nitrogen, argon, and tetrafluoromethane, and for varying lengths of treatment time. Plasma ion treatment of oxygen, nitrogen, argon and their mixtures increased significantly the hydrophilic properties of polymer surfaces. More hydrophobic surfaces of polymers were formed after the treatment with tetrafluoromethane. A study of plasma source ion implanted polymers was performed using contact angle measurements and Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS). The TOF-SIMS spectra and depth profile were used to obtain the information about the treated surfaces of polymers. The permanence of this technique could be evaluated with respect to ageing time. The surfaces treated with PSII gave better stability than other surface modification methods.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.101-103
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• 2009

Minimizing the residual impurity level on the MgO layer is the key factor for reducing temporal dark image sticking on bright screen. In this paper, to reduce the residual impurity level on the MgO layer of 50-in. full-HD ac-PDP with He (35%) - Xe (11%) contents, RF-plasma treatments on the MgO layer are adopted under various gases for plasma treatment. As a result of monitoring the difference in the display luminance between the before and after 5-min. sustain discharge with a square-type image at peak luminance, the Ar and Ar>$O_2$ plasma treatments can reduce the temporal dark image sticking on the bright screen in an ac-PDP.

• Textile Coloration and Finishing
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• v.16 no.5
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• pp.35-41
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• 2004

Poly(ethylene terephthalate), polyimide(Kapton), and polypropylene surfaces were modified with argon low temperature plasma by RF glow discharge at 240m Torr, 40W to investigate the surface morphological changes due to the plasma treatment using atomic force microscopy(AFM). Analysis of the AFM images and Ra(average roughness) revealed that the plasma treatment resulted in significant ablation on the surfaces. The morphological changes and surface roughness, however, were different depending on material characteristics such as heat stability, presence of amorphous region, swelling phenomenon, and molecular structure of repeating unit. It was assumed that polypropylene due to its tertiary hydrogen was ablated easily compared to poly(ethylene terephthalate), and that polyimide was more resistant to the ablation than PET due to rigid skeleton of imide and stable phenyl ring structure.

• Journal of the Korean Society for Heat Treatment
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• v.23 no.3
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• pp.150-155
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• 2010

Generally, plasma nitriding process has composed with a nitriding layer within glow discharge region occurred by energy exchange. The dissociations of nitrogen molecules are very difficult to make neutral atoms or ionic nitrogen species via glow discharge area. However, the captured electrons in which a double-folded screen with same potential cathode can stimulate and come out some single atoms or activated ionic species. It was showed an important thing that is called "hat is a dominant component in this nitriding process?" in plasma nitriding process and it can take an effective species for without compound layer. During a plasma nitriding process, it was able to estimate with analyzing and identification by optical emission spectroscopy (OES) study. And then we can make comparative studies on the nitrogen transfer with plasma nitriding and ATONA process using plasma diagnosis and metallurgical observation. From these observations, we can understand role of active species of nitrogen, like N, $N^+$, ${N_2}^+$, ${N_2}^*$ and $NH_x$-radical, in bulk plasma of each process. And the same time, during DC plasma nitriding and other processes, the species of FeN atom or any ionic nitride species were not detected by OES analyzing.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.23 no.12
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• pp.184-190
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• 2009

Tri-acetyl-cellulose(TAC) film surface was modified by atmospheric-pressure plasma technique to obtain the hydrophilic functional groups and improve the contact angle. TAC film was modified with N2 plasma ionized in dielectric barrier discharge(DBD) reactor under atmospheric pressure. We measured the change of the contact angle and the surface energy with respect to the plasma treatment conditions such as plasma treatment power, discharge gap and Ｎ2 gas flow rate. As the plasma treatment speed of 100[mm/sec], the plasma treatment power of 1.5[kW], discharge gap 2[mm] and the $N_2$ gas flow rate 140[LPM], the best contact angle and the highest surface energy were obtained. The degree of hydrophilization depended strongly on the plasma-treating time and discharge power.