• Applied Science and Convergence Technology
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• v.26 no.6
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• pp.195-200
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• 2017

A mobile lab kart for plasma training is developed with a high vacuum pumping system, vacuum gauges and a glass discharge tube powered by a high voltage transformer connected to a household 60 Hz line. A numerical model is developed by using a commercial multiphysics software package, CFD-ACE+ to analyze the experimental data. Simulations for argon and nitrogen were carried out to provide fundamental discharge characteristics. Variations of the kart configuration were demonstrated: a glass tube with three electric probes, optical emission spectrometer attachment and infra red thermal imaging system to give more detailed analysis of the discharge characteristics.

• Nuclear Engineering and Technology
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• v.44 no.1
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• pp.21-32
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• 2012

Fluorinated compounds mainly used in the semiconductor industry are potent greenhouse gases. Recently, thermal plasma gas scrubbers have been gradually replacing conventional burn-wet type gas scrubbers which are based on the combustion of fossil fuels because high conversion efficiency and control of byproduct generation are achievable in chemically reactive high temperature thermal plasma. Chemical equilibrium composition at high temperature and numerical analysis on a complex thermal flow in the thermal plasma decomposition system are used to predict the process of thermal decomposition of fluorinated gas. In order to increase economic feasibility of the thermal plasma decomposition process, increase of thermal efficiency of the plasma torch and enhancement of gas mixing between the thermal plasma jet and waste gas are discussed. In addition, noble thermal plasma systems to be applied in the thermal plasma gas treatment are introduced in the present paper.

• Journal of the Korean Society for Aeronautical & Space Sciences
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• v.48 no.6
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• pp.479-487
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• 2020

A new double-pulse laser system that combines Raman and laser induced plasma spectroscopy (LIPS) in a single unit is proposed. The study attempts to enhance the laser induced plasma signals while simultaneously extracting the desired molecular signals from Raman spectroscopy. In low pressure conditions such as the lunar atmosphere, the measuring of plasma emission is hard because of the low electron density and short persistence time causing a rapid plasma expansion. Furthermore, in the integration of the detecting system aimed at space exploration, the minimization of laser system is important in terms of the payload mass. Simultaneous molecular and atomic detection that gave highly resolved spectral data at pressure below 0.07 torr is demonstrated amongst eight rock samples test. The plasma stacking produced from the double-pulse laser enhanced the signal intensity of calcium and oxygen lines in calcite matrix by twofold, compared to a conventional LIPS.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.1-1
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• 2007

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.247.1-247.1
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• 2014

The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

• Journal of Welding and Joining
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• v.9 no.3
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• pp.52-61
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• 1991

In the recent years the computer-numerical controlled cutting process such as a plasma arc cutting and a laser cutting is widely applied to reduce the time and cost expense for generating NC part program of the parts to be cut. In the present study, a CAD system(C-CAD) was developed to generate automatically the NC part programs with CLDAT(Cutter Location Data)for the CNC plasma arc cutting system. The NC part programs are composed of the 2-dimensional drawing of the parts to be cut and the technological data. The shape data of the parts drawn in the Auto-CAD can be also used in the C-CAD, since the data file generated by the C-CAD is compatible with that by the Auto-CAD. In order to check its applicability, the C-CAD and CAM system were applied to cut the parts, and which showed the satisfactory results.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.8
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• pp.607-612
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• 1998

RF HPCVD(Helicon Plasma Chemical Vapor Deposition) has been successfully constructed for diamond thin films. The system consists of plasma generation tube, deposition chamber, pumping lines for gas system. A mixture of $CH_4 and H_2$is used for reaction. Two thermocouples, a quartz tube surrounded by a RF antenna and a magnet, and a high temperature heater were set up in the deposition chamber. The process for the thin film diamond deposition has been carried put in a high vacuum system at a substrate temperature of $800^{\circ}C$, and pressure of 5 mtorr. It is also demonstrated. that the RF HPCVD system has advantages for controlling deposition parameters easily.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.140.1-140.1
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• 2015

Currently, As Plasma application is expanded to the industrial and medical industrial, Low temperature plasma characteristics became important. Especially in Medical industrial, Low temperature plasma directly adapted to human skin, so their plasma parameter is important. One of the plasma parameters is electron density, some kinds of method to measuring electron density are Thomson scattering spectroscopy and Millimeter-wave transmission measurement. But most methods is expensive to composed of experiment system. Heterodyne interferometer system is cheap and simple to setting up, So we tried to measuring electron density by Laser heterodyne interferometer. To measuring electron density at atmospheric pressure, we need to obtain the phase shift signal. And we use a heterodyne interferometer. Our guiding laser is Helium-Neon laser which generated 632 nm laser. We set up to chopper which can make a laser signal like a pulse. Chopper can make a 4 kHz chopping. We used Needle jet as Ne plasma sources. Interference pattern is changed by refractive index of electron density. As this refractive index change, phase shift was occurred. Electron density is changed from Townsend discharge's electron bombardment, so we observed phenomena and calculated phase shift. Finally, we measured electron density by refractive index and electron density relationship. The calculated electron density value is approximately 1015~1016 cm-3. And we studied electron density value with voltage.

• Proceedings of the KSME Conference
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• 2001.06d
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• pp.939-944
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• 2001

For the application of simultaneous $DeSO_{2}\;&\;DeNO_{x}$ equipment using non-thermal plasma process to the industrial and power plants, the many types of plasma device and process were studied. The e-beam and pulsed plasma corona discharge process are outstanding for the study to apply commercial large-scale plant from among these. In this paper, non-thermal plasma of technical trends and the characteristics of system developed by Doosan heavy industries & construction Co., Ltd. are explained. We have researched pulsed plasma corona discharge process since 1994. At the basis of reasonable results for the pilot plant, we constructed the demonstration plant at a domestic coal-fired power plant in 1999, as the previous step for commercial use. In near future, enough information about designs and costs of commercial-size system will be obtained.

• Journal of the Korean institute of surface engineering
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• v.41 no.4
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• pp.134-141
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• 2008

We have developed a numerical model for a remote ICP(inductively coupled plasma) system in 2D and 3D with gas distribution configurations and confirmed it by plasma diagnostics. The ICP source has a Cu tube antenna wound along a quartz tube driven by a variable frequency rf power source($1.9{\sim}3.2$ MHz) for fast tuning without resort to motor driven variable capacitors. We investigated what conditions should be met to make the plasma remotely localized within the quartz tube region without charged particles' diffusing down to a substrate which is 300 mm below the source, using the numerical model. OES(optical emission spectroscopy), Langmuir probe measurements, and thermocouple measurement were used to verify it. To maintain ion current density at the substrate less than 0.1 $mA/cm^2$, two requirements were found to be necessary; higher gas pressure than 100 mTorr and smaller rf power than 1 kW for Ar.