• 제목/요약/키워드: plasma arc discharge

검색결과 121건 처리시간 0.036초

플라즈마 디스플레이 패널에서 압력에 3차원 시간 분해 측정 (The Measurement of Three-Dimensional Temporal Behavior According to the Pressure in the Plasma Display Panel)

  • 최훈영;이석현;이승걸
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권10호
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    • pp.476-480
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    • 2003
  • In this paper, we have performed 3-dimensional time-resolving measurement of the Ne light emitted from the cell of plasma display panel(PDP) as a function of the pressure using the scanned point detecting system. From the temporal behavior results, we could analyze the discharge behavior of panel with Ne-Xe(4%) mixing gas and 300 torr, 400 torr and 500 torr pressure. At the top view of panel, the discharge of 300 torr panel starts at the 634 ns and ends at the 722 ns. The emission duration time is about 90 ns. The discharge of 400 torr panel starts at the 682 ns and ends at the 786 ns. the emission duration time is about 100 ns. Also, the discharge of 500 torr panel starts at the 770 ns and ends at the 826 ns. the emission duration time is about 56 ns. The discharge moves from inner edge of cathode electrode to outer cathode electrode forming arc type. In the side view of 300 torr, 400 torr and 500 torr an emission shows that the light is detected up to 180${\mu}{\textrm}{m}$, 150${\mu}{\textrm}{m}$ and 70${\mu}{\textrm}{m}$ height of barrier rib and the emission distribution of the 300 torr is wider than 400 torr, 500 torr.

Optical In-Situ Plasma Process Monitoring Technique for Detection of Abnormal Plasma Discharge

  • Hong, Sang Jeen;Ahn, Jong Hwan;Park, Won Taek;May, Gary S.
    • Transactions on Electrical and Electronic Materials
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    • 제14권2호
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    • pp.71-77
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    • 2013
  • Advanced semiconductor manufacturing technology requires methods to maximize tool efficiency and improve product quality by reducing process variability. Real-time plasma process monitoring and diagnosis have become crucial for fault detection and classification (FDC) and advanced process control (APC). Additional sensors may increase the accuracy of detection of process anomalies, and optical monitoring methods are non-invasive. In this paper, we propose the use of a chromatic data acquisition system for real-time in-situ plasma process monitoring called the Plasma Eyes Chromatic System (PECS). The proposed system was initially tested in a six-inch research tool, and it was then further evaluated for its potential to detect process anomalies in an eight-inch production tool for etching blanket oxide films. Chromatic representation of the PECS output shows a clear correlation with small changes in process parameters, such as RF power, pressure, and gas flow. We also present how the PECS may be adapted as an in-situ plasma arc detector. The proposed system can provide useful indications of a faulty process in a timely and non-invasive manner for successful run-to-run (R2R) control and FDC.

워터젯 플라즈마 스크러버 사불화탄소 분해 특성 (Decomposition Characteristics of Tetrafluoromethane Using a Waterjet Plasma Scrubber)

  • 임문섭;전영남
    • 한국기후변화학회지
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    • 제8권1호
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    • pp.63-71
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    • 2017
  • It is recognized that tetrafluoromethane ($CF_4$) has a great influence on global warming. The $CF_4$ is known to have a large impact on climate change due to its large global warming index. In this study, a waterjet plasma scrubber (WPS) was designed and manufactured for the $CF_4$ decomposition. The WPS is a novel technology which is combined a gliding arc plasma and water injection at the center of the plasma discharge. This can give an innovative way for $CF_4$ decomposition by achieving larger plasma columnand generating OH radicals. A performance analysis was achieved for the design factors such as waterjet flow rate, total gas flow rate, consumption electric power, and electrode gap. The highest $CF_4$ decomposition and energy efficiencies were 64.8% and 6.43 g/kWh, respectively; Optimal operating conditions were 20 mL/min of waterjet flow rate, 200 L/min total gas flow rate, 5.3 kW consumption electric power, and 4.4 mm electrode gap. As for the 2 stage reactor of the WPS, the $CF_4$ decomposition efficiency improved as the 85.3% while the energy efficiency decreased as the 5.57 g/kWh.

아크방전을 이용한 표면개질 플라이애시의 특성에 관한 실험적 연구 (Experimental Study on the Properties of Surface Treatment Fly Ash Using Arc Discharge)

  • 김선아;박선규
    • 한국건설순환자원학회논문집
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    • 제6권4호
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    • pp.357-364
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    • 2018
  • 플라이애시는 콘크리트의 혼화재로서 사용되는 재료로, 이를 콘크리트 제조에 사용할 경우 시멘트 사용량 감소 및 내화학성 증가와 같은 성능 향상을 기대할 수 있다. 하지만 플라이애시는 미연탄소 함유량 및 표면에 존재하는 유리질의 박막과 같은 문제점이 지적되고 있다. 다량의 미연탄소를 함유하는 플라이애시를 사용하여 콘크리트를 제조할 경우, AE제의 흡착 현상에 의해 슬럼프가 저하되는 문제점이 동반된다. 또한, 입자 표면에 존재하는 유리질 박막은 플라이애시로부터 반응성 물질이 용출되는 것을 방해하여 화학 반응이 일어나지 못하게 만드는 역할을 한다. 지금까지 이러한 플라이애시의 문제점을 해결하기 위하여 플라즈마를 이용한 표면개질 방안이 연구되었으나, 플라즈마는 $O_2$가 활성기체로서 사용될 경우 $O_3$를 발생시키는 문제점을 지니고 있다. 따라서 본 연구에서는 아크방전을 이용해 플라이애시의 표면을 개질하는 방안에 관한 연구를 진행하였으며, 그에 따른 플라이애시의 물리 화학적 특성 변화를 확인하였다. 실험 결과, 아크방전을 이용해 플라이애시의 표면을 개질할 경우 미연탄소가 제거되며 유리질 박막이 파괴되는 것을 확인하였다.

과불화탄소 제거를 위한 플라즈마 워터젯 스크러버 개발 (Development of a Plasma Waterjet Scrubber for the Reduction of PFCs)

  • 이채홍;전영남
    • 한국대기환경학회지
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    • 제26권6호
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    • pp.624-632
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    • 2010
  • Perfluorocarbons (PFCs) are widely used in semiconductor industry. These gases need to be removed efficiently because of their strong absorption of infrared radiation and long atmospheric lifetimes which cause the global warming effect. To destruct $CF_4$, a waterjet gliding arc plasma was designed and manufactured. The highest $CF_4$ destruction showed at waterjet plasma case, compared to plasma discharge only or water scrubber only, respectively. In addition, it could be known that the $CF_4$ destruction should be associated with the electron and OH radicals. The operating conditions such as waterjet flow rate, initial $CF_4$ concentration, total gas flow rate, specific energy input were investigated experimentally using a plasma waterjet scrubber. Through the parametric studies, the highest $CF_4$ destruction of 94.5% was achieved at 0.2% $CF_4$, 2.1 kJ/L SEI, 20 L/min total gas flow rate and 18.5 mL/min waterjet flow rate.

선대 평판형 플라즈마 반응기에서 NOX 제거에 미치는 자계의 영향 (Effect of Magnetic Field on NOX Removal for Wire-Plate Plasma Reactor)

  • 박재윤;고희석;손성도;이동훈;김종달
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권2호
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    • pp.120-124
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    • 2000
  • In this paper, the effect of magnetic field was measured on NOx(NO+NO2) removal and consumption power for wire-plate plasma reactor with magnetic field applied to electric field vertically. NOx of the simulated diesel engine flue gas were removed by the corona discharge generated by DC, AC and Pulsed voltages in wire-plate reactor. Consumption power increased with discharge voltage. However, when magnetic field was applied to electric field vertically, consumption power slightly decreased. NOx removal rate and arc transition voltage for plasma reactor with magnetic field were higher than those for plasma reactor without magnetic field. Consumption power decreased, however NOx removal significantly increased, when water vapour bubbled by dry air was put into simulated flue gas.

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Plasma-immersion ion Deposition of Hydrogenated Diamond-like Carbon Films on Dielectric Substrates

  • Kon;Chun, Hui-Gon;Cho, Tong-Yul;Nikolay S. Sochugov;You, Yong-Zoo
    • Journal of Korean Vacuum Science & Technology
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    • 제6권4호
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    • pp.143-148
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    • 2002
  • Method of plasma-immersion ion deposition of hydrogenated DLC films on relatively thick flat dielectric substrates from plasma of not-self-sustained low-pressure gas arc discharge is suggested. Coating properties have been investigated experimentally, average energy Per a deposited carbon atom depending on discharge current has been calculated. Optimum deposition parameters lot obtaining sufficiently hard and transparent high-adhesive a-C:H films on a 4-mm thick glass substrates have been determined. Possibility to use these coatings for photo-tools protection from abrasion wear at low operating loads is shown in general.

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평판형 유도결합 플라즈마 장치의 $CF_4$ 방전에 대한 Global Simulation (Global Simulation for $CF_4$ Discharge in Transformer Coupled Plasma Source)

  • 권득철;유동훈;김성식;윤남식;김정형;신용현
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 하계학술대회 논문집 C
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    • pp.1757-1759
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    • 2002
  • Global simulator for $CF_4$ discharge in transformer coupled plasma (TCP) source is developed and simulations arc performed under various conditions. The developed simulator is based on a set of space averaged fluid equations for electrons, positive ions, neutrals and radicals of $CF_4$ plasma. And the used absorbed power by electrons is calculated by a 2-dimensional heating model[1].

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유도결합 플라즈마 마그네트론 스퍼터링에 의한 MgO 박막의 특성 연구 (A Study of MgO Thin Film′s Properties Fabricated by ICP Magnetron Sputtering Method)

  • 김선호;주정훈
    • 한국표면공학회지
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    • 제37권3호
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    • pp.169-174
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    • 2004
  • MgO thin films were reactively deposited using an internal inductively coupled plasma assisted sputtering method varying reactive gas ratio to get stoichiometric film composition, and bipolar dc substrate bias to suppress micro arcs. The minimum frequency required for arc suppression was about 10KHz depending on ICP power. Their crystallinity was analyzed using X-ray diffraction and surface morphology using AFM. The surface was very smooth with rms roughness less than 0.42nm. The preferred orientation of the films were changing from (200) to bulk-like characteristics as Ar: $O_2$ratio was controlled to 10 : 2. Optical emission spectroscopy revealed that there were two distinct discharge modes: a blue one and a green one, where enhanced emission from Ar and Mg were observed. This cannot simply be understood by metallic or oxide mode of reactive sputtering due to ICP coupled to magnetron discharge.

수소재액화를 위한 자기냉매용 HoN 나노분말 합성 및 자기열량효과 연구 (Study on the Synthesis of HoN Nanoparticles and Magnetocaloric Effect as Magnetic Refrigerant for Hydrogen Re-Liquefaction)

  • 김동수;안종빈;장세훈;정국채;김종우;최철진
    • 한국수소및신에너지학회논문집
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    • 제25권6호
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    • pp.594-601
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    • 2014
  • Rare-earth (RE) nitrides can be used as magnetocaloric materials in low temperature. They exhibit ferromagnetism and have Curie temperature in the region from 6 to 70 K. In this study, Holmium nitride (HoN) nano particles were prepared through plasma arc discharge technique and their magnetocaloric properties were studied. Nitrogen gas ($N_2$) was employed as an active element for arc discharge between two electrodes maintained at a constant current. Also, it played an important role not only as a reducing agent but also as an inevitable source of excited nitrogen molecules and nitrogen ions for the formation of HoN phase. Partial pressure of $N_2$ was systematically varied from 0 to 28,000 Pa in order to obtain single phase of HoN with minimal impurities. Magnetic entropy change (${\Delta}S_m$) was calculated with data set measured by PPMS (Physical Property Measurement System). The as-synthesized HoN particles have shown a magnetic entropy change ${\Delta}S_m$) of 27.5 J/kgK in applied field of 50,000 Oe at 14.2 K thereby demonstrating its ability to be applied as an effective magnetic refrigerant towards the re-liquefaction of hydrogen.