• 한국생물공학회:학술대회논문집
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• 2005.10a
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• pp.169-170
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• 2005

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1539-1542
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• 2005

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, $HS(CH_2)_nX$, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the wellknown diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser coupled to a near-field scanning optical microscope (NSOM).

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.475-476
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• 2006

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, HS(CH2)nX, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the well-known diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2001.07a
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• pp.151-156
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• 2001

Using the photoimageable thick film conductors, $25\mu\textrm{m}$ line widths and $25\mu\textrm{m}$ spaces can be obtained. Test patterns are made by green tape lamination, paste printing, exposing to UV light, developing in an aqueous process and cofiring. Postfiring method using alumina substrate can be also applied to fine line formation. Series gap resonator formed by photopatterning process showed the improved signal transmission characteristics compared to that obtained by conventional screen printing.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.288-289
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• 2003

금속 박막 위의 알칸티올분자의 흡착에 의한 자기조립단분자막(SAMs)은 접착 방지, 마찰 저하 등의 기능을 가진 코팅층으로서의 응용과 분자 또는 생분자의 미세 구조물 형성을 위한 방법으로 널리 연구되어지고 있다. 이러한 연구 중에서 자기조림단분자막(SAMs)의 매우 얇은 두께(수 nm)의 특성을 활용하여 AFM tip Scratching Lithography 또는 알칸티올 포토패터닝(alkanethiol Photopatterning) 방법을 사용함으로써 microscale의 패턴을 형성하는 연구 결과가 많은 이들의 관심을 받아왔다. (중략)

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.26-29
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• 2003

UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex microscale 3D product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining. is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D microscale products of UV sensitive polymer from 3D CAD data to functional micro parts.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.11 s.176
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• pp.196-201
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• 2005

UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex 3D micro product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining, is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D micro products of UV sensitive polymer from 3D CAD data to functional micro parts.

• Macromolecular Research
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• v.15 no.2
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• pp.142-146
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• 2007

Poly[(1-(9-carbazoly1)ethylene)-co-(3-cinnamoyloxyoctyl-9-carbazolyl)] ethylene (PVK-Cin) was prepared by tethering cinnamate pendants to a carbazole group via an octylene spacer. The photopatternability of the new PVK based-polymer was investigated using a photocrosslinking reaction under UV light illumination $(\lambda=254nm)$. Blends of the PVK-Cin and a soluble poly(phenylene vinylene) (CzEh-PPV) were employed to study the photocrosslinking behavior. Well resolved lithographic patterns were observed in these polymer systems. PVK-Cin produced a blue light emitting pattern both before and after the photocrosslinking reaction. The blends of PVK-Cin and CzEh-PPV also showed corresponding emissions at 398 and 525 (560) nm in the film state.

• Prospectives of Industrial Chemistry
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• v.23 no.6
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• pp.25-36
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• 2020

용액공정을 통해 유기 전자소자를 대면적으로 제조하는 것은 다양한 장치 구성 요소(반도체, 절연체, 도체)의 패터닝 및 적층이 필요하기 때문에 매우 어려운 과제이다. 본 연구에서는 4개의 광 가교 기능기를 가지는 3차원 사면체 가교제인 (2,2-bis(((4-azido-2,3,5,6-tetrafluorobenzoyl)oxy)methyl)propane-1,3-diyl bis(4-azido-2,3,5,6-tetrafluorobenzoate) (4Bx)를 활용하여 용액공정을 기반으로 형성된 전자재료 박막을 고해상도로 패터닝 및 적층하는 기술을 개발하고, 이를 사용하여 고분자 박막 트랜지스터(PTFTs) 및 논리회로 어레이 제작을 진행하였다. 4Bx는 다양한 용액공정이 가능한 전자재료와 용매에 쉽게 혼합될 수 있으며, 자외선(UV)에 의해 가교제가 광 활성화되어 전자재료와 가교 결합을 형성할 수 있다. 4Bx는 기존의 2개의 광 가교 기능기를 갖는 가교제에 비해 높은 가교 효율로 인해 적은 양을 첨가하여도 완전하게 가교된 전자재료 박막을 형성할 수 있어 전자재료의 고유한 특성을 보존할 수 있다. 더욱이, 가교된 전자재료 박막은 화학적 내구성이 향상되어 고해상도 미세 패터닝을 할 수 있을 뿐만 아니라 용액공정을 통해 전자소자를 구성하는 전자재료의 적층이 가능하다. 4Bx의 광 가교 방법은 전용액공정을 통한 전자소자의 제작에 대한 혁신적인 방안을 제시한다.

• Polymer(Korea)
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• v.29 no.4
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• pp.331-337
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• 2005

In general, alkanethiolates having carboxylic acid in the tail group have been used as biorecepton. In this study, we have immobilized a cytochrome c protein using conjugated aromaticthiolates in order to improve the electrical property and physical stability of alkanethilolates. The pattern formation of self-assembled aromaticthiolate monolayers was as follow. Aromatic thiolates bound on the gold surface by the adsorption of 4'-mercapto-biphenyl-4-carboxylic acid and 4-mercapto-[1,1';4',1']terphenyl-4'-carboxylic acid were oxidized by the irradiation of deep UV light through a negative mask. The negative type pattern of the self-assembled monolayer (SAM) was obtained by developing with a deionized water. The pattern formation and electrical conductivity of aromaticthiolate SAMs was investigated by the measurements of STM and AFM. In addition, cytochrome c or ferrocene amide was immobilized onto the patterned substrate. We also studied on the effect of conjugated aromatic thiolates on the electrical activity of cytochrome c or ferrocene amide by cyclic voltammetry.