• 제목/요약/키워드: photonic device fabrication

검색결과 20건 처리시간 0.034초

다중양자우물의 상호섞임 현상을 이용한 광도파로 필터의 제작 (Fabrication of waveguide filter using quantum well intermixing)

  • 김항로;여덕호;윤경훈;김성준
    • 한국광학회:학술대회논문집
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    • 한국광학회 2000년도 제11회 정기총회 및 00년 동계학술발표회 논문집
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    • pp.268-269
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    • 2000
  • We demonstrate a polarization insensitive waveguide filter using quantum well intermixing(QWI). The bandgap of epitaxial layer is modified from 1.55${\mu}{\textrm}{m}$ to 1.40${\mu}{\textrm}{m}$ using QWI and a Bragg grating filter is demonstrated using electron beam lithography technology. The fabricated waveguide filter has a 70% reflection efficiency and a 1.46nm filter bandwidth. Furthermore polarization insensitive transmission characteristics are observed. The device can be applied to photonic integrated circuits(PIC).

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나노 임프린트 기술을 이용한 폴리머 도파로 기반의 브래그 격자형 파장 필터 (Polymeric Wavelength Filter Based on a Bragg Grating Using Nanoimprint Technique)

  • 안세원;이기동;김도환;진원준;이상신
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권5호
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    • pp.267-271
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    • 2006
  • A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

원자층 증착 방법을 이용한 폴리머 광도파로 제작 (Atomic Layer Deposition Method for Polymeric Optical Waveguide Fabrication)

  • 이은수;천권욱;진진웅;정예준;오민철
    • 한국광학회지
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    • 제35권4호
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    • pp.175-183
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    • 2024
  • 근래 광통신, 광센서, 양자광학 등의 다양한 연구 분야에서 광IC 소자를 이용한 광신호 처리 연구가 활발히 진행되고 있으며, 광IC 제작에 이용되는 재료들 중 특히 폴리머 재료는 고유의 특징을 바탕으로 폭넓게 연구개발되고 있다. 폴리머 기반 광IC 소자를 제작하기 위해서는 광도파로 단면 구조를 정확히 제작하기 위한 제작 공정을 확립하는 것이 중요하며, 특히 안정적인 소자 특성을 유지하고 대량생산 시의 수율을 높이기 위해서는 재현성이 높고 오차 수용 범위가 넓은 공정과 제작 조건을 설정하는 것이 필요하다. 본 연구에서는 원자층 증착(atomic layer deposition, ALD) 공정을 도입하여 폴리머 광도파로 소자를 효율적으로 제작할 수 있는 방법을 제안하였으며, 기존의 포토 레지스트나 금속 박막 증착을 이용하는 방법에 비해 광도파로 코어 형상을 더욱 정밀하게 제작할 수 있음을 확인하였다. 본 연구에서는 ALD 공정을 도입하여 코어의 크기가 1.8 × 1.6 ㎛2인 폴리이미드 광도파로를 제작하여 광도파로의 손실을 측정하고, 이와 함께 광파워 분배기인 다중모드 간섭(multi-mode interference) 광도파로 소자를 제작하여 특성을 측정하였다. 이때 기존의 제작과정에서 문제시되었던 에칭 마스크 층의 크랙 현상은 나타나지 않았으며, 광도파로 패턴 단면의 수직성도 우수하였고, 도파로의 전파손실 또한 1.5 dB/cm 이하로 양호하였다. 이로써 ALD 공정이 대량생산을 위한 폴리머 광소자 제작 공정에 적합한 방법임을 확인하였다.

양극산화된 알루미늄과 마이크로 인덴데이션을 이용한 3차원 마이크로-나노 하이브리드 패턴 제작 (Development of 3D Micro-Nano Hybrid Patterns Using Anodized Aluminum and Micro-Indentation)

  • 권종태;신홍규;김병희;서영호
    • 대한기계학회논문집A
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    • 제31권12호
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    • pp.1139-1143
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    • 2007
  • A simple method for the fabrication of 3D micro-nano hybrid patterns was presented. In conventional fabrication methods of the micro-nano hybrid patterns, micro-patterns were firstly fabricated and then nano-patterns were formatted on the micro-patterns. Moreover, these micro-nano hybrid patterns could be fabricated on the flat substrate. In this paper, we suggested the fabrication method of 3D micro-nano hybrid patterns using micro-indentation on the anodized aluminum substrate. Since diameter of the hemispherical nano-pattern can be controlled by electrolyte and applied voltage in the anodizing process, we can easily fabricated nano-patterns of diameter of loom to 300nm. Nano-patterns were firstly formatted on the aluminum substrate, and then micro-patterns were fabricated by deforming the nano-patterned aluminum substrate. Hemispherical nano-patterns of diameter of 150nm were fabricated by anodizing process, and then micro-pyramid patterns of the side-length of $50{\mu}m$ were formatted on the nano-patterns using micro-indentation. Finally we successfully replicated 3D micro-nano hybrid patterns by hot-embossing process. 3D micro-nano hybrid patterns can be applied to nano-photonic device and nano-biochip application.

표면광 마이크로레이저 및 능동형 광학 연산소자의 특성 (Characteristics of Top-Surface-Emitting Microlasers and Active Surface Emitting Laser Logic Devices)

  • 이용희
    • 한국광학회지
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    • 제2권4호
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    • pp.233-241
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    • 1991
  • Structures, fabrication, and characteristics of top-surface-emitting GaAs four quantum well microlaser are described. The microlasers have good room-temperautre CW characteristivs. The maximum CW laser output is >3mW from a 30 $\mu\textrm{m}$ diameter microlaser and the maximum differential quantum efficiency is >70% from a 10 $\mu\textrm{m}$ diameter microlaser. Active surface emitting laser logic devices are designed and fabricated as a discrete version of a top-surface-emitting laser and heterojunction phototransistor. The active surface emitting laser logic device have high optical gain (>20 overall, >200 differential) and very high on/off ratio. Two-dimensional arrays of top-surface-emitting microlasers and active surface emitting laser logic devices will be critical elements for optical computing, photonic switching and neural network applications.

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Construction of Membrane Sieves Using Stoichiometric and Stress-Reduced $Si_3N_4/SiO_2/Si_3N_4$ Multilayer Films and Their Applications in Blood Plasma Separation

  • Lee, Dae-Sik;Choi, Yo-Han;Han, Yong-Duk;Yoon, Hyun-C.;Shoji, Shuichi;Jung, Mun-Youn
    • ETRI Journal
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    • 제34권2호
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    • pp.226-234
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    • 2012
  • The novelty of this study resides in the fabrication of stoichiometric and stress-reduced $Si_3N_4/SiO_2/Si_3N_4$ triple-layer membrane sieves. The membrane sieves were designed to be very flat and thin, mechanically stress-reduced, and stable in their electrical and chemical properties. All insulating materials are deposited stoichiometrically by a low-pressure chemical vapor deposition system. The membranes with a thickness of 0.4 ${\mu}m$ have pores with a diameter of about 1 ${\mu}m$. The device is fabricated on a 6" silicon wafer with the semiconductor processes. We utilized the membrane sieves for plasma separations from human whole blood. To enhance the separation ability of blood plasma, an agarose gel matrix was attached to the membrane sieves. We could separate about 1 ${\mu}L$ of blood plasma from 5 ${\mu}L$ of human whole blood. Our device can be used in the cell-based biosensors or analysis systems in analytical chemistry.

면취 공정의 능동 제어를 위한 공압식 자동 강재 면취기와 센서 시스템의 제작 및 실험 (Fabrication and Experiment of Pneumatic Steel Plate Chamfering Machine and Sensor System for Active Control of Chamfering)

  • 나영민;이현석;김민효;박종규
    • 한국기계가공학회지
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    • 제19권12호
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    • pp.80-86
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    • 2020
  • With the exception of welding activities, it is forbidden to use electricity in shipyards, owing to safety concerns such as the possibility of fire, explosions, and short circuits. In this paper, an automatic chamfering machine using pneumatics is proposed for use in such environments. Customers specify their requirements and the machine derives the corresponding theoretical design conditions. The proposed machine was used to perform 3D modeling, and its suitability and performance were confirmed via cutting experiments of the manufactured device. Two types of sensors may be used in this system: contact and non-contact. In the case of the contact type, an end-stop switch that can recognize the end of the material is installed, and when the machine reaches the end of the material, the end-stop switch is operated to cut off the air pressure. In the non-contact type, four sensors were used: photonic, ultrasonic, metal detection, and encoder. The use of the four sensors was repeated 30 times, and the average error determined. Thus, the optimum sensor was identified.

모스아이 패턴의 충전공정에 대한 점탄성 유한요소해석 (Viscoelastic Finite Element Analysis of Filling Process on the Moth-Eye Pattern)

  • 김국원;이기연;김남웅
    • 한국산학기술학회논문지
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    • 제15권4호
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    • pp.1838-1843
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    • 2014
  • 나노 임프린트 리소그래피는 수십 나노미터에서 수십 마이크론에 이르는 패턴을 간단하고 저비용으로 대면적 기판에 제작할 수 있어 차세대 패터닝 기술로 주목 받고 있다. 특히, 발광소자, 태양전지, 디스플레이 등의 분야에서는 저반사 나노패턴, 광결정 패턴 등 기능성 패턴을 제작하고 이를 적용하는 연구가 활발히 진행 중에 있다. NIL공정을 통해 성공적으로 패턴을 전사시키기 위해서는 적절한 공정조건의 선택이 필요하다. 이에 본 연구에서는 열 나노임프린트를 이용하여 모스아이 패턴을 전사할 때, 충전과정 및 잔류층 형성을 수치 해석하여 폴리머 레지스트의 점탄성 거동을 살펴 보았고, 레지스트 초기 코팅 두께의 변화 및 가압력의 변화가 충전과정 및 잔류층에 미치는 영향을 조사하였다. 해석결과 본 논문에서 고려된 PMMA의 경우, 4MPa 이상의 압력에서 100초 내로 충전공정이 완료되는 것으로 나타났다.

3-D Hetero-Integration Technologies for Multifunctional Convergence Systems

  • 이강욱
    • 마이크로전자및패키징학회지
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    • 제22권2호
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    • pp.11-19
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    • 2015
  • Since CMOS device scaling has stalled, three-dimensional (3-D) integration allows extending Moore's law to ever high density, higher functionality, higher performance, and more diversed materials and devices to be integrated with lower cost. 3-D integration has many benefits such as increased multi-functionality, increased performance, increased data bandwidth, reduced power, small form factor, reduced packaging volume, because it vertically stacks multiple materials, technologies, and functional components such as processor, memory, sensors, logic, analog, and power ICs into one stacked chip. Anticipated applications start with memory, handheld devices, and high-performance computers and especially extend to multifunctional convengence systems such as cloud networking for internet of things, exascale computing for big data server, electrical vehicle system for future automotive, radioactivity safety system, energy harvesting system and, wireless implantable medical system by flexible heterogeneous integrations involving CMOS, MEMS, sensors and photonic circuits. However, heterogeneous integration of different functional devices has many technical challenges owing to various types of size, thickness, and substrate of different functional devices, because they were fabricated by different technologies. This paper describes new 3-D heterogeneous integration technologies of chip self-assembling stacking and 3-D heterogeneous opto-electronics integration, backside TSV fabrication developed by Tohoku University for multifunctional convergence systems. The paper introduce a high speed sensing, highly parallel processing image sensor system comprising a 3-D stacked image sensor with extremely fast signal sensing and processing speed and a 3-D stacked microprocessor with a self-test and self-repair function for autonomous driving assist fabricated by 3-D heterogeneous integration technologies.

Improved QS-MMI' 1.31/1.55μm 파장분리기의 최적화 설계 및 제작 (Compact Design and Fabrication of 'Improved QS-MMI' Demultiplexer)

  • 김남국;김장겸;최철현;오범환;이승걸;박세근;이일항
    • 한국광학회지
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    • 제16권3호
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    • pp.248-253
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    • 2005
  • 다중모드간섭 기반의 $1.31/1.55{\mu}m$ 파장분리기의 크기 및 성능개선을 위해 'Improved Quasi-State' 불완전 단일상 개념을 설계에 도입하였다. 코어와 클래딩의 굴절률 차이가 작은 경우의 모드간 위상오차를 역이용 하도록 설계하여 'Quasi-State'의 출력 파워와 소멸비를 월등히 개선하였다. 다중모드간섭기의 폭이 $14.4{\mu}m$, 입력도파로의 수평 이동이 $5.3{\mu}m$가 되도록 설계한 구조를 유효굴절률법과 MPA를 사용하여 분석한 결과 최대 소멸비는 양 파장대역 모두 -25dB 이하로 나타났다. 설계된 파장분리기는 일반적인 다중 모드간섭기의 길이의 1/5정도에 불과한 $2620{\mu}m$의 간섭길이를 가진다. 소프트 리소그래피 공정을 통해 설계된 파장분리기를 제작하였으며, $1.31{\mu}m$$1.5{\mu}m$의 성공적인 파장분리를 확인하였다.