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http://dx.doi.org/10.5762/KAIS.2014.15.4.1838

Viscoelastic Finite Element Analysis of Filling Process on the Moth-Eye Pattern  

Kim, Kug Weon (Department of Mechanical Engineering, SoonChunHyang University)
Lee, Ki Yeon (Department of Mechanical Engineering, SoonChunHyang University)
Kim, Nam Woong (School of Mechanical Engineering, Dongyang Mirae University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.15, no.4, 2014 , pp. 1838-1843 More about this Journal
Abstract
Nanoimprint lithography (NIL) fabrication process is regarded as the main alternative to existing expensive photo-lithography in areas such as micro- and nano-electronics including optical components and sensors, as well as the solar cell and display device industries. Functional patterns, including anti-reflective moth-eye pattern, photonic crystal pattern, fabricated by NIL can improve the overall efficiency of such devices. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. In this paper, a cavity-filling process of the moth-eye pattern during the thermal-NIL within the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer, were investigated with three-dimensional finite element analysis. The effects of initial thickness of polymer resist and imprinting pressure on cavity-filling process has been discussed. From the analysis results it was found that the cavity filling can be completed within 100 s, under the pressure of more than 4 MPa.
Keywords
Filling process; Moth-eye pattern; Nanoimprint lithgraphy; Viscoelastic finite element analysis;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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