• Journal of Integrative Natural Science
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• v.4 no.1
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• pp.11-14
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• 2011

Free-standing multilayer distributed Bragg reflectors (DBR) porous silicon dielectric mirrors, prepared by electrochemical etching of crystalline silicon using square wave currents are treated with polymethylmethacrylate (PMMA) to produce flexible, stable composite materials in which the porous silicon matrix is covered with caffeine-impregnated PMMA. Optically encoded free-standing DBR PSi dielectric mirrors retain the optical reflectivity. Optical characteristics of free-standing DBR PSi dielectric mirrors are stable and robust for 24 hrs in a pH 12 aqueous buffer solution. The appearance of caffeine and change of DBR peak were simultaneously measured by UV-vis spectrometer and Ocean optics 2000 spectrometer, respectively.

• Journal of the Korean Ceramic Society
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• v.37 no.2
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• pp.111-116
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• 2000

700nm red emission(3F3longrightarrow3H6) in Tm3+ ion with 800 nm(3H6longrightarrow3H4) excitation via upconversion process has been reported only in host materials which have low phonon energies such as halide crystals. However, we observed 700nm and 480nm(1G4longrightarrow3H6) upconverted emission with 800nm excitation in several oxide glasses which has never reported. With spectroscopic analyses and lifetime measurements of each nergy level of Tm3+ ion doped in various oxide glasses, following mechanisms are suggested. For red upconversion, upconversion mechanism changed with Tm3+ concentration. While direct excitation up to 3F3 level via anti-Stokes excitation was dominated at low concentration, two-step excitation via 3H6longrightarrow3H4 and 3F4longrightarrow3F3 transitions was dominated at high concentration. For blue upconversion, two step excitation mechanism up to 1G4 level was suggested as follows : electrons are exciated up to 3H5 with direct excitation with pumping light up to 3H4 followed by multiphonon relaxation, and then additional reabsorption of pumping light excites electrons up to 1G4.

• Korean Journal of Materials Research
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• v.25 no.12
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• pp.647-654
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• 2015

Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a high-throughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.8
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• pp.119-125
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• 2009

Fabrication of a three-dimensional (3D) metallic mold for multi-production of a microstructure was studied to settle the problem of long processing time in 3D microfabrication. To date, complicated 3D microstructures including 3D photonic crystals, 3D microlens array, 3D filter for microfludics, and something else were created successfully using the two-photon polymerization (TPP) which was considered as paving the way to fabricate a real 3D shape in nano/microscale. However, for those fabrications, much processing time and efforts were inevitably required. To solve this issue, a simple and effective way was proposed in this paper; 3D master patterns were prepared using TPP, and then counter-shaped Ni molds were fabricated by electroforming process. By using these molds, 3D microstructures can be reproduced with short-processing time and low-effort comparing to the conventional approach, TPP We report some parameters to fabricate a metallic mold precisely.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.15-16
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• 2006

Since two-photon polymerization (TPP) emerged as a new technology over a decade ago, a large variety of micro-objects including 3-D micro-optical components, micromechanical devices, and 3-D photonic crystals have been fabricated using TPP with a high spatial resolution of approximately submicron scale to 100 nm. Recent efforts have been made to improve the fabrication efficiency and precision of micro-objects obtained with TPP; in particular, many studies have been carried out with the aim of developing efficient two-photon absorbing chromophores. In this presentation, we will discuss our efforts to develop highly efficient two-photon absorbing materials and also describe recent attempts to enhance the resolution and to improve the fabrication efficiency of nanofabrications based on TPP.

• Journal of Sensor Science and Technology
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• v.15 no.6
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• pp.391-396
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• 2006

Free-standing multilayer distributed Bragg reflectors (DBR) porous silicon dielectric mirrors, prepared by electrochemical etching of crystalline silicon using square wave currents are treated with polystyrene to produce flexible, stable composite materials in which the porous silicon matrix is covered with caffeine-impregnated polystyrene. Optically encoded DBR PSi/polystyrene composite films retain the optical reflectivity. Optical characteristics of DBR PSi/polystyrene composite films are stable and robust for 2 hrs in a pH=7 aqueous buffer solution. The appearance of caffeine and change of DBR peak were simultaneously measured by UV-vis spectrometer and Ocean optics 2000 spectrometer, respectively.

• Korean Journal of Materials Research
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• v.13 no.8
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• pp.485-490
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• 2003

We have developed a new way of the constant growth technique to maintain a grating height of originally-etched V-groove of submicron gratings up to 1.5 $\mu\textrm{m}$ thickness by a low pressure metalorganic chemical vapor deposition. The constant growth technique is well performed on two kinds of submicron gratings that made by holography and electron (e)-beam lithography GaAs buffer layer grown on thermally deformed submicron gratings has an important role in recovering the deformed grating profile from sinusoidal to V-shaped by reducing mass transport effects. The thermal deformation effect on submicron gratings made by e-beam lithography is less than that on submicron gratings made by holography. The constant growth technique is an important step to realize complex optoelectronic devices such as one-step grown distributed feedback lasers and two-dimensional photonic crystals.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.1
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• pp.45-49
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• 2006

A nano-stereolithography (NSL) process has been developed for the fabrication of three-dimensional (3D) micro-devices with high spatital resolution of approximately 100 nm. In the NSL process, a complicated 3D structure can be created by stacking layer-by-layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D stacked structure was finished, unsolidified liquid resins were rinsed by ethanol to develop the fabricated structures; then, the polymerized structure was only left on the glass substrate. Through this work, several 3D microstructures such as a micro-channel, shell structures, and photonic crystals were fabricated to evaluate the possibility of the developed system.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.226-226
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• 2013

Si is a dominant solar material, which is the second most abundant element in the earth giving a benefit in the aspect in cost with low toxicity. However, the inherent limit of Si has an indirect band gap of 1.1 eV resulting in the limited optical absorption. Therefore, a critical issue has been raised to increase the utilization of the incident light into the Si absorber. The enhancement of light absorption is a crucial to improve the performances and thus relieves the cost burden of Si photovoltaics. For the optical aspect, an efficient design of a front surface, where the incident light comes in, has been intensively investigated to improve the performance of photon absorption. Lambertian light trapping can be attained when the light active surface is ideally rough to increase the optical length by about 50 compared to a planar substrate. This suggests that an efficient design may reduce thickness of the Si absorber from the conventional 100~300 ${\mu}m$ to less than 3 ${\mu}m$. Theoretically, a hole-array structure satisfies an equivalent efficiency of c-Si with only one-twelfth mass and one-sixth thickness. Various approaches have been applied to improve the incident light utilization in a Si absorber using textured structures, periodic gratings, photonic crystals, and nanorod arrays. We have designed hole and pillar structured Si absorbers. Four-different Si absorbers have been simultaneously fabricated on an identical Si wafer with hole arrays or pillar arrays at a fixed depth of 2 ${\mu}m$. We have found that the significant enhanced solar cell performances both for the hole arrayed and pillar arrayed Si absorbers compared to that of a planar Si wafer resulting from the effective improvement in the quantum efficiencies.

• Korean Journal of Optics and Photonics
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• v.12 no.1
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• pp.17-24
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• 2001

Two-dimensional binary-phase diffraction gratings which can be employed to fabricate two- and three-dimensional periodic structures are designed and analyzed using rigorous coupled-wave analysis. These gratings serve as phase-masks which generate several diffracted waves from a normally incident beam and thus can produce a periodic interference pattern in space via nearfield holography. The properties of the diffracted beams can be controlled by varying the polarization and wavelength of the incident beam, surface-profile, groove depth and duty cycle of the mask. For the two-dimensional structure, optimum results can be obtained when the diffraction efficiency of the zero-order beam is minimized while that of the first-order maximized. On the other hand, when the diffraction efficiency of the zero-order is appreciable or even greater than other orders, we can obtain a variety of three-dimensional interference patterns which may be used to fabricate photonic crystals of tetragonal-body-centered and hexagonal structures in a submicron scale. scale.