• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권6호
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• pp.236-239
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• 2002

Si nanocrystallites thin films on P-type (100) Si substrate have been fabricated by pulsed laser deposition using a Nd:YAG laser. After deposition, samples were annealed in several environmental gases ;It the temperature range of 400 to $800^{\circ}C$ Hydrogen passivation was then performed in the forming gas (95 % $N_2$ + 5 % $H_2$) for 1 hr. Strong violet-indigo photoluminescence has been observed at room temperature on nitrogen ambient-annealed Si nanocrystallites. We report the variation of photoluminescence (PL) properties of Si thin films by changing annealing temperatures and by using hydrogen passivation. The results could suggest that the origin of violet-indigo PL should be related to the Quantum size effect of Si nanocrystallite.

• Current Optics and Photonics
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• 제3권6호
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• pp.516-521
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• 2019

The electrical leakage levels of GaN-based light-emitting diodes (LEDs) containing leakage paths are estimated using photoluminescence (PL) and photovoltaic properties under photoexcitation conditions. The PL intensity and open-circuit voltage (V_OC) decrease because of carrier leakages depending on photoexcitation conditions when compared with reference values for typical LED chips without leakage paths. Changes of photovoltage-photocurrent characteristics and PL intensity due to carrier leakage are employed to assess the leakage current levels of LEDs with leakage paths. The current corresponding to the reduced V_OC of an LED with leakage from the photovoltaic curve of a reference LED without leakage is matched with the leakage current calculated using the PL intensity reduction ratio and short-circuit current of the LED with leakage. The current needed to increase the voltage for an LED with a leakage under photoexcitation from V_OC of the LED up to V_OC of a reference LED without a leakage is identical to the additional current needed for optical turn-on of the LED with a leakage. The leakage current level estimated using the PL and photovoltaic properties under photoexcitation is consistent with the leakage level measured from the voltage-current characteristic obtained under current injection conditions.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.297-297
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• 2012

양자점은 공간적으로 세 방향 모두 전하의 운동을 제한하는 0차원 구조로 불연속적인 상태 밀도를 가진다. 이런 양자점의 특성은 광통신용 소자, 레이저 다이오드 등과 같은 광학 및 전자 장치에 응용될 수 있기 때문에 많은 주목을 받아 활발히 연구되어 왔다. 본 연구에서는 MBE 장비를 이용하여 GaAs 기판위에 InAs 양자점을 성장시키는 동안 As의 공급을 임의로 차단시켜 양자점 형성 조건을 변화시킨 시료들의 광학적 특성을 Photoluminescence (PL) 와 Time-resolved PL (TRPL) 실험을 이용하여 분석하였다. GaAs (001) 기판 위에 GaAs buffer layer를 $610^{\circ}C$에서 성장한 후, $470^{\circ}C$에서 As 공급 조건 변화에 따른 InAs 양자점을 성장하였다. 양자점을 성장한 후 GaAs cap layer를 $610^{\circ}C$에서 성장하였다. InAs 양자점 시료들은 In을 20초 공급하는 동안 As의 공급과 차단을 각각 1초, 2초, 3초의 일정한 간격으로 반복하였다. 10 K에서 각각의 시료들의 PL을 측정한 결과 As 공급과 차단을 2초씩 반복한 T2시료에서 PL 세기가 가장 좋게 나타났으며, 3초씩 반복한 T3시료에서 가장 나쁘게 나타났다. PL 피크는 공급과 차단을 1초씩 반복한 T1 시료가 1.23 eV, T2 시료가 1.24 eV, T3 시료가 1.26 eV에 나타났으며, As의 차단시간이 증가함에 따라 PL 피크가 높은 에너지로 이동함을 보였다. 발광파장에 따른 PL 소멸은 파장이 증가함에 따라 점차 느려지다가 PL 피크 근처에서 가장 느린 소멸곡선을 보이고, 파장이 더 증가하였을 때 점차 빠르게 소멸하였다. As 공급 조건의 변화에 따라 InAs 양자점의 크기와 밀도, 모양 등이 변하는 것을 Atomic Force Microscope (AFM) image를 통하여 확인하였으며, PL과 TRPL을 이용하여 InAs 양자점의 광학적 특성을 분석하였다.

• 한국자기학회지
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• 제15권4호
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• pp.246-249
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• 2005

플라즈마 디스플레이(Plasma Display Panel: PDP)용 청색 형광체인 $CaMgSi_{2}O_6:Eu^{2+}(CMS:Eu^{2+})$를 고상반응(sold-state reaction)법으로 합성하였다. 합성한 재료를 실온에서부터 $1,100^{\circ}C$까지 열처리하여 photoluminescence(PL)와 EPR 측정으로 열적 안정성을 연구하였다. $CMS:Eu^{2+}$ 형광체를 대기 분위기 하에서 상온에서부터 $700^{\circ}C$까지 열처리하였을 때 PL의 변화는 없었으나, $700^{\circ}C$ 이상의 온도에서 열처리 하였을 때는 PL의 감소를 나타내었다. $700^{\circ}C$까지 PL의 안정된 거동을 보이는 것은 구조적으로 안정된 12 면체를 하고 있는 $Ca^{2+}$ 이온의 일부를 $Eu^{2+}$ 이온이 점유하고 있어 $Eu^{2+}$의 원자가 변화에 영향을 미치지 못했으나, $700^{\circ}C$이상의 PL의 감소는 $Eu^{2+}$에서 $Eu^{3+}$의 산화에 의한 것이라는 것을 EPR 흡수세기의 변화로부터 알 수 있었다.

• 한국분말재료학회지
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• 제23권2호
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• pp.108-111
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• 2016

$Y_2O_3-H_3BO_3:Eu^{3+}$ powders are synthesized using a mechanical alloying method, and their photoluminescence (PL) properties are investigated through luminescence spectrophotometry. For samples milled for 300 min, some $Y_2O_3$ peaks ([222], [440], and [622]) and amorphous formations are observed. The 300-min-milled mixture annealed at $800^{\circ}C$ for 1 h with Eu = 8 mol% has the strongest PL intensity at every temperature increase of $100^{\circ}C$ (increasing from 700 to $1200^{\circ}C$ in $100^{\circ}C$ increments). PL peaks of the powder mixture, as excited by a xenon discharge lamp (20 kW) at 240 nm, are detected at approximately 592 nm (orange light, $^5D_o{\rightarrow}^7F_1$), 613 nm, 628 nm (red light, $^5D_o{\rightarrow}^7F_2$), and 650 nm. The PL intensity of powder mixtures milled for 120 min is generally lower than that of powder mixtures milled for 300 min under the same conditions. PL peaks due to $YBO_3$ and $Y_2O_3$ are observed for 300-min-milled $Y_2O_3-H_3BO_3$ with Eu = 8 mol% after annealing at $800^{\circ}C$ for 1 h.

• Journal of the Optical Society of Korea
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• 제19권6호
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• pp.687-694
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• 2015

A photoluminescence (PL) imaging method using a vision camera was employed to inspect InGaN/GaN quantum-well light-emitting diode (LED) epi-wafers. The PL image revealed dark spot defective regions (DSDRs) as well as a spatial map of integrated PL intensity of the epi-wafer. The Shockley-Read-Hall (SRH) nonradiative recombination coefficient increased with the size of the DSDRs. The high nonradiative recombination rates of the DSDRs resulted in degradation of the optical properties of the LED chips fabricated at the defective regions. Abnormal current-voltage characteristics with large forward leakages were also observed for LED chips with DSDRs, which could be due to parallel resistances bypassing the junction and/or tunneling through defects in the active region. It was found that the SRH nonradiative recombination process was dominant in the voltage range where the forward leakage by tunneling was observed. The results indicated that the DSDRs observed by PL imaging of LED epi-wafers were high density SRH nonradiative recombination centers which could affect the optical and electrical properties of the LED chips, and PL imaging can be an inspection method for evaluation of the epi-wafers and estimation of properties of the LED chips before fabrication.

• Advances in nano research
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• 제1권4호
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• pp.193-202
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• 2013

In this article, we present the effects of Ag doping and after-growth thermal annealing on the photoluminescence (PL) and thermoluminescence (TL) behaviors of $SnO_2$ nanoparticles. $SnO_2$ nanoparticles of 4-7 nm size range containing different Ag contents were synthesized by hydrothermal process. It has been observed that the after-growth thermal annealing process enhances the crystallite size and stabilizes the TL emissions of $SnO_2$ nanostructures. Incorporated Ag probably occupies the interstitial sites of the $SnO_2$ lattice, affecting drastically their emission behaviors on thermal annealing. Both the TL response and dose-linearity of the $SnO_2$ nanoparticles improve on 1.0% Ag doping, and subsequent thermal annealing. However, a higher Ag content causes the formation of Ag clusters, reducing both the TL and PL responses of the nanoparticles.

• Applied Science and Convergence Technology
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• 제24권5호
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• pp.156-161
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• 2015

Application of magnetic fields is important to characterize the carrier dynamics in semiconductor quantum structures. We performed photoluminescence (PL) measurements from an InGaP-AlInGaP single quantum well under pulsed magnetic fields to 50 T. The zero field interband PL transition energy matches well with the self-consistent Poisson-$Schr{\ddot{o}}dinger$ equation. We attempted to analyze the dimensionality of the quantum well by using the diamagnetic shift of the magnetoexciton. The real quantum well has finite thickness that causes the quasi-two-dimensional behavior of the exciton diamagnetic shift. The PL intensity diminishes with increasing magnetic field because of the exciton motion in the presence of magnetic field.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.332.1-332.1
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• 2016

Application of magnetic fields is important to characterize the carrier dynamics in semiconductor quantum structures. We performed photoluminescence (PL) measurements from an InGaP-AlInGaP single quantum well under pulsed magnetic fields to 50 T. The zero field interband PL transition energy matches well with the self-consistent Poisson-Schr?dinger equation. We attempted to analyze the dimensionality of the quantum well by using the diamagnetic shift of the magnetoexciton. The real quantum well has finite thickness that causes the quasi-two-dimensional behavior of the exciton diamagnetic shift. The PL intensity diminishes with increasing magnetic field because of the exciton motion in the presence of magnetic field.

• 한국재료학회지
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• 제16권3호
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• pp.183-187
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• 2006

We present the effects of rapid thermal annealing (RTA) temperature on the structural and optical properties of self-assembled InAs quantum dot (QD) structures grown on GaAs substrates by molecular beam epitaxy (MBE). The photoluminescence (PL) measurements are performed in a closed-cycle refrigerator as a function of temperature for the unannealed and annealed samples. RTA at higher temperature results in the increase in island size, the corresponding decrease in the density of islands, and the redshift in the PL emission from the islands. The temperature dependence of the PL peak energy for the InAs QDs is well expressed by the Varshni equation. The thermal quenching activation energies for the samples unannealed and annealed at $600^{\circ}C$ are found to be $25{\pm}5meV$ and $47{\pm}5$ meV, respectively.