• Title/Summary/Keyword: photolithography

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Fabrication of Polymer Thin Films on Solid Substrates (고체 기판에 고분자 박막의 고정화)

  • Kim, Min Sung;Jeong, Yeon Tae
    • Applied Chemistry for Engineering
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    • v.21 no.2
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    • pp.200-204
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    • 2010

  • Surface properties are important for determining the functions and uses of materials. So modification of materials with polymer thin films has emerged as an important method to control the physical and chemical properties of the surface layer. We report a simple and effective method to photochemically attach thin polymeric layers to solid surface without chemical derivatization of the substrate and/or the polymer. The system is based on a photoreactive poly(4-vinylpyridine) (P4VP) thin film which is formed on the $SiO_{2}$ surface via spin coating. This substrate is then covered with another polymer film that is reacted with the benzyl radical moieties by UV irradiation. As a result of photochemical reaction, a thin layer of the later polymer is covalently bound to the surface of P4VP. Unbounded polymer is removed by sonication. The thickness of the attached film is a function of the irradiation time and the molecular weight of the polymer. Spatially defined polymer thin films can be fabricated by way of photolithography.

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Photosensitive Barrier Rib Paste for PDP and Photolithographic Process (Plasma Display Panel용 감광성 격벽 재료 및 Photolithography 공정 성질)

  • Park, Lee Soon;Jeong, Seung Won;Oh, Hyun Shik;Kim, Soon Hak;Song, Sang Moo
    • Applied Chemistry for Engineering
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    • v.10 no.8
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    • pp.1114-1118
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    • 1999

  • Barrier rib for the plasma display panel(PDP) was made by photolithographic process utilizing photosensitive barrier rib paste. The barrier rib paste was prepared by first dissolving ethylcellulose(binder polymer) in butyl carbitol(BC)/butyl carbitol acetate(BCA) =30/70 wt % mixture solvent at 15 wt % concentration. To this solution a mixture of functional monomers consisted of tripropyleneglycol diacrylate/ pentaerythritol triacrylate = 50/50 wt %, Irgacur 651 photoinitiator, and barrier rib powder were added and then the whole mixture was mixed in the three roll mill for 2 hr. The effect of component and concentration of photosensitive barrier paste on the photolithographic process was studied. After optimization of the paste formulation and photolithographic process, barrier rib could be obtained with good resolution up to $100{\mu}m$ height.

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Research on Fabrication of Silicon Lens for Optical Communication by Photolithography Process (포토리소그래피를 통한 광통신용 실리콘 렌즈 제작 및 특성 연구)

  • Park, Junseong;Lee, Daejang;Rho, Hokyun;Kim, Sunggeun;Heo, Jaeyeong;Ryu, Sangwan;Kang, Sung-Ju;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.2
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    • pp.35-39
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    • 2018

  • In order to improve the coupling efficiency, a collimator lens that collects the light emitted from the laser diode at a wide angle to the core of the optical fiber is essential. Glass mold method using a mold is widely used as a collimator lens currently used. Although this method is inexpensive to produce, it is difficult to form precisely and quality problems such as spherical aberration. In this study, the precision of surface processing was improved by replacing the existing glass mold method with the semiconductor process, and the material of the lens was changed to silicon suitable for the semiconductor process. The semiconductor process consists of a photolithography process using PR and a dry etching process using plasma. The optical coupling efficiency was measured using an ultra-precision alignment system for the evaluation of the optical characteristics of the silicon lens. As a result, the optical coupling efficiency was 50% when the lens diameter was $220{\mu}m$, and the optical coupling property was 5% or less with respect to the maximum optical coupling efficiency in the lens diameter range of $210-240{\mu}m$.

  • https://doi.org/10.6117/kmeps.2018.25.2.035 인용 PDF KSCI