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Fabrication of Polymer Thin Films on Solid Substrates  

Kim, Min Sung (Department of Image Science & Engineering, Pukyong National University)
Jeong, Yeon Tae (Department of Image Science & Engineering, Pukyong National University)
Publication Information
Applied Chemistry for Engineering / v.21, no.2, 2010 , pp. 200-204 More about this Journal
Abstract
Surface properties are important for determining the functions and uses of materials. So modification of materials with polymer thin films has emerged as an important method to control the physical and chemical properties of the surface layer. We report a simple and effective method to photochemically attach thin polymeric layers to solid surface without chemical derivatization of the substrate and/or the polymer. The system is based on a photoreactive poly(4-vinylpyridine) (P4VP) thin film which is formed on the $SiO_{2}$ surface via spin coating. This substrate is then covered with another polymer film that is reacted with the benzyl radical moieties by UV irradiation. As a result of photochemical reaction, a thin layer of the later polymer is covalently bound to the surface of P4VP. Unbounded polymer is removed by sonication. The thickness of the attached film is a function of the irradiation time and the molecular weight of the polymer. Spatially defined polymer thin films can be fabricated by way of photolithography.
Keywords
P4VP; PMMA; UV cross-linked; photolithography;
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