• 제목/요약/키워드: photo lithography

검색결과 153건 처리시간 0.025초

Rapid Manufacturing of 3D Micro-products using UV Laser Ablation and Phase-change Filling

  • Shin Bo-Sung;Kim Jae-Gu;Chang Won-Suk;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권3호
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    • pp.56-59
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    • 2006
  • UV laser micromachining is generally used to create microstructures for micro-products through a sequence of lithography-based photo-patterning steps. However, the micromachining process is not suitable for rapid realization of complex 3D micro-products because it depends on worker experience. In addition, the cost and time required to make many masks are excessive. In this paper, a more effective and rapid micro-manufacturing process, which was developed based on laser micromachining, is proposed for fabricating micro-products directly using UV laser ablation and phase-change filling. The filling process is useful for holding the micro-products during the ablation step. The proposed rapid micro-manufacturing process was demonstrated experimentally by fabricating 3D micro-products from functional UV-sensitive polymers using 3D CAD data.

Polymeric Waveguides with Bragg Gratings in the Middle of the Core Layer

  • Jeong, In-Soek;Park, Hae-Ryeong;Lee, Sang-Won;Lee, Myung-Hyun
    • Journal of the Optical Society of Korea
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    • 제13권2호
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    • pp.294-298
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    • 2009
  • In this paper we proposed a new Bragg grating waveguide in order to improve reflectivity and to achieve compactness. Bragg gratings with various thicknesses were engraved in the middle of the core layer with a length of 3 mm. For the sake of cost-effectiveness, the $3^{rd}$ order Bragg grating waveguides were fabricated via conventional photolithography. The maximum reflectivities for the fixed width waveguide of $6{\mu}m$ with the 0.1 and $0.3{\mu}m$-thick Bragg gratings were, -13.14 and -6.25 dB, respectively, and the Bragg wavelengths were 1562.28, 1564.10 nm, respectively. A slight increase in the Bragg grating thickness can result in a remarkable reduction in the length of the Bragg grating waveguide with a fixed reflectivity.

Design of a Taper-Underlaid Spot-Size Converter with an Offset

  • Choi, Jun-Seok;Oh, Jin-Kyong;Lee, Dong-Hwan;Lee, Hyung-Jong;Kim, Sang-Duk
    • Journal of the Optical Society of Korea
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    • 제11권1호
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    • pp.40-43
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    • 2007
  • We propose a taper-underlaid spot-size converter (TU-SSC) with an offset which consists of two vertically stacked taper layers. The designed TU-SSC reduces coupling loss of a high index-contrast waveguide with $1.5%{\Delta}$ to a single mode fiber from 1.5 dB to 0.27 dB. We also considered the effects of mask misalignment in the fabrication process of TU-SSC, and optimized the design of TU-SSC so that the additional loss of TU-SSC for the mask misalignment of $3{\mu}m$ in the photo-lithography process was as low as 0.13 dB.

복합구조의 압전 에너지 하베스터를 위한 공정연구 (Processing Study for the Piezoelectric Energy Harvest of Composit Structure)

  • 이경수;신동진;고중혁
    • 한국전기전자재료학회논문지
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    • 제25권4호
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    • pp.286-289
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    • 2012
  • In this paper, we have proposed piezoelectric energy harvester employing the pillar structure with the diameter size of 500 um. So we have selected the Su-8 photo-resist and modified lithography process to manufacture the pillar structure with height above the $500{\mu}m$. Simultaneously, we tried to make a comparative study to use ceramic bulk - polymer structure In this paper, we will report the process and properties of micro pillar structure based on the PMN-PZT ($Pb(Mg_{1/3}Nb_{2/3})O_3-PbZrTiO_3$) materials. Finally, We will propose a method for generating electrical energy with a piezoelectric element using vibration, an energy source can be obtained from the "clean" energy.

레진의 경화 반응을 고려한 UV-NIL공정의 열특성에 관한 실험 및 수치해석 연구 (Experiment and Numerical Study on Thermal Characteristics of UV-NIL Process Considering the Cure Kinetics of Photo-polymer)

  • 김우송;박경서;남진현;임흥재;장시열;이기성;정재일;임시형;신동훈
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1847-1850
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    • 2008
  • The process conditions during ultraviolet nanoimprint lithography (UV-NIL) process such as temperature, stamping pressure, UV irradiation, etc. are effective factors for successful imprinting of complex and fine patterns. In this study, the effects of aluminum mold on the thermal characteristics of UV-NIL process were investigated through imprinting experiments and numerical simulations. The temperature of polymer resin on mold was measured to study thermal characteristics during UV curing. From the experimental and numerical results, the importance of curing reaction control for UV-NIL process was discussed for deformation characteristics.

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타원궤적 진동절삭 가공기를 이용한 미세 형상 가공 (Machining of Micro Structure using Elliptical Vibration Grooving Machine)

  • 김기대;노병국
    • 한국정밀공학회지
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    • 제25권11호
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    • pp.45-51
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    • 2008
  • Successive micro-scale V-grooves and a grid of pyramids were machined by elliptical vibration tufting (EVC) to investigate feasibility of using EVC as an alternative method of creating micro-molds to photo-lithography and electroforming, which have been commonly employed. An elliptical vibration grooving machine was developed which consists of two orthogonally-arranged piezoelectric actuators, a diamond cutting tool, and a motorized xyz stage. The micro-scale features were machined on materials of copper, duralumin, nickel, and hastelloy and it was found that EVC significantly reduces cutting resistance and prohibits generation of side burrs and rollover burrs, thus resulting in improving machining qualify of micro-molds in ail experimented workpiece materials.

Optical Properties of Long Wave Infrared Spoof Plasmon using Hexagonal Periodic Silver Hole Arrays

  • Lee, Byungwoo;Kwak, Hoe Min;Kim, Ha Sul
    • Applied Science and Convergence Technology
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    • 제25권2호
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    • pp.42-45
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    • 2016
  • A two-dimensional metal hole array (2DMHA) structure is fabricated by conventional photo-lithography and electron beam evaporation. The transmittance of the 2DMHA is measured at long wave infrared (LWIR) wavelengths (${\lambda}{\sim}10$ to $24{\mu}m$). The 2DMHA sample shows transmittance of 70 and 67% at $15.4{\mu}m$ due to plasmonic resonance with perforated silver and gold thin films, respectively, under surface normal illumination at LWIR wavelengths. The measured infrared spectrum is separated into two peaks when the size of the hole becomes larger than a half-pitch of the hole array. Six degenerated plasmon modes (1,0) at the metal/Si surface split to three modes at an incident beam angle of $45^{\circ}$ with respect to the surface normal direction, and wavelength shifts of the transmitted spectrum are observed in a red shift and blue shift at the same time.

SPEM & PEEM (Scanning Photoelectron Microscopy & PhotoEmission Electron Microscopy)

  • 신현준
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.83-83
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    • 2012
  • 본 강연에서는 방사광 연X-선 분광현미경학(spectro-microscopy) 중에서, 표면에서 방출되는 광전자를 이용하는 SPEM (Scanning Photoelectron Microscopy)과 PEEM (Photoemission Electron Microscopy)을 소개하고자 한다. SPEM은 입사하는 X-선을 작은 크기로 집속하여 특정의 작은 공간에서 광전자분광학(XPS) 데이터를 얻거나 특정 광전자에너지의 공간분포를 얻게 해주며, PEEM은 입사한 X-선에 의해 발생한 광전자를 전자렌즈 원리로 영상을 맺히게 하여 광전자의 발생 분포를 구하게 한다. 이들은 균일하지 아니한 이종의 표면 연구에 매우 유용한 측정기법들이지만, 그 원리 및 구성은 많은 차이점들을 가지고 있다. 예를 들어, SPEM은 시료를 scanning하면서 XPS에 보다 충실한 타입이고 PEEM은 full field imaging 타입으로 표면변화의 동역학 연구에 강점이 있다. 본 강의에서는 이들 각각의 원리, 장점들에 대해서 설명하고, 활용 예를 제시하고자 한다. 활용 분야에 있어서, SPEM의 경우는 포항가속기연구소의 SPEM으로 수행되었던 DMS, graphene, nano-lithography, OLED, 등 반도체 및 나노 소재, 소자에의 활용에 대한 예를 제시할 것이다. PEEM의 경우는 포항가속기연구소의 응용 예와 박막 형태의 magnetic material에 대한 예들을 제시할 것이다.

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광 리소그라피를 이용한 다중 위상 홀로그램의 제작 (Fabrication of multi-pahse holograms using photo-lithography)

  • 강봉균;서호형;이덕희;김남
    • 한국통신학회논문지
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    • 제23권4호
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    • pp.1059-1065
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    • 1998
  • 광정보처리와 광연결에 널리 사용되는 위상홀로그램을 제작하기 위해서는 정확한 위상을 갖게 하는 것이 매우 중요하다. 본 논문에서는 광 리소그래피 방식에 의한 위상 홀로그램의 제작 시 요구되는 위상을 얻기 위한 방법으로 회절빔의 0차 세기와 홀로그램의 위상과의 관계를 도입하였고, 이를 이용하여 위상이 각각 $\pi$$\pi$/2인 이진 위상 홀로그램을 제작하였다. 이 두 홀로그램을 결합하여 다중 위상 홀로그램을 구현함으로서 이진 위상 홀로그램에서 재생되는 불필요한 영상을 제거할 수 있었다.

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휴대용 근적외선 분광분석기를 이용한 비침투 혈당 측정 (Non-invasive Blood Glucose Measurement by a Portable Near Infrared (NIR) System)

  • 강나루;우영아;차봉수;이현철;김효진
    • 약학회지
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    • 제46권5호
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    • pp.331-336
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    • 2002
  • The purpose of this study is to develop a non-invasive blood glucose measurement method by a portable near infrared (NIR) system which was newly integrated by our lab. The portable NIR system includes a tungsten halogen lamp, a specialized reflectance fiber optic probe and a photo diode array type InGaAs detector; which was developed by a microchip technology based on the lithography. Reflectance NIR spectra of different parts of human body (finger tip, earlobe, and inner lip) were recorded by using a fiber optic probe. The spectra were collected over the spectral range 1100 ∼ 1740 nm. Partial least squares regression (PLSR) was applied for the calibration and validation for the determination of blood glucose. The calibration model from earlobe spectra presented better results, showing good correlation with a glucose oxidase method which is a mostly used standard method. This model predicted the glucose concentration for validation set with a SEP of 33 mg/dL. This study indicated the feasibility for non-invasive monitoring of blood glucose by a portable near infrared system.