• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.236-237
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• 2007

A single-wall carbon nanotube (SWNT) transparent conductive film (TCF) was fabricated using a simple inkjet printing method. The TCF could be selectively patterned by controlling the dot size to diameters as small as 34${\mu}m$. In thisrepeatable and scalable process, we achieved 71% film transmittance and a resistance of 900 ohm/sq sheet with an excellent uniformity, about $\pm$5% deviation overall. Inkjet printing of SWNT is substrate friendly and the TCF is printed on a flexible substrate. This method of fabrication using direct printing permits mass production of TCF in a large area process, reducing processing steps and yielding low-cost TCF fabrications on a designated area using simple printing.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.532-532
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• 2007

UV 경화형 ink를 inkjet printing을 통해 PCB에 patterning 하는 방법에 관한 연구이다. UV 경화형 ink는 일반적으로 ink의 투명도, 색깔, 두께에 따라 완전경화가 밀어나지 않을 수도 있는데 본 연구에서 사용한 UV ink는 particle이 첨가되어 있고 후막 인쇄를 목적으로 하기 때문에 완전경화가 어려웠다. 일반적으로 이러한 UV 경화형 ink의 문제점들을 해결하기 위하여 열경화성 첨가제를 일부 첨가하여 UV에 의한 표면경화와 얼에 의한 속 경화를 진행하는 hybrid system이 사용되고 있지만 본 연구는 PCB를 target으로 하기 때문에 열에 약한 PCB 내의 많은 소자들 때문에 열처리가 쉽지 않은 문제가 있다. 이러한 여러 제약적인 환경에서 UV ink의 완전경화를 위해 경화 process를 최적화 하였으며 10~20um의 후막 인쇄에도 ink가 완전 경화하여 연필경도 9H를 확보하는데 성공하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.266.1-266.1
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• 2013

Large-scale single-crystal organic nanowire arrays were generated using a direct printing method (liquidbridge- mediated nanotransfer molding) that enables the simultaneous synthesis, alignment and patterning of nanowires from molecular ink solutions. Using this method, single-crystal organic nanowires can easily be synthesized by self-assembly and crystallization of organic molecules within the nanoscale channels of molds, and these nanowires can then be directly transferred to specific positions on substrates to generate nanowire arrays by a direct printing process. Repeated application of the direct printing process can be used to produce organic nanowire-integrated electronics with two- or three-dimensional complex structures on large-area flexible substrates. This efficient manufacturing method is used to fabricate all-organic nanowire field-effect transistors that are integrated into device arrays and inverters on flexible plastic substrates.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.314.1-314.1
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• 2013

Transparent conducting nanoscale-domes were periodically patterned on a Si substrate by nanoimprint method. Transparent conductor of indium-tin-oxide (ITO) was shaped as a nanodome, which effectively drives the incident light effectively into a light-absorber and therefore induces a substantially enhanced photo-response. An ITO nanodome is electrically isolated from the neighboring nanodomes. This structure benefits to provide a low contact between a Si substrate and a front metal electrode giving an efficient electrical path. The ITO nanodome device showed a significantly enhanced photo-response of 6010 from the value of 72.9 of a planar ITO film. The electrical and optical advantage of an ITO nanodome is suitable for various photoelectric applications.

• Laser Solutions
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• v.10 no.2
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• pp.17-24
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• 2007

We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.

• Journal of the Semiconductor & Display Technology
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• v.18 no.4
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• pp.124-128
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• 2019

In this paper, a high temperature plastic film type water level sensor was developed. The high temperature film type water level sensor was manufactured by attaching a copper film to a polyimide film which can be used for a long time at 250℃, by laminating process and patterning the electrode by etching process. For the performance evaluation of the developed film type water level sensor, the temperature dependence of the capacitance was measured, and the deformation was examined after standing for 8 hours in 150℃ air. The developed film type water level sensor can be used at up to 150℃, and can be applied to electric ports and steam devices.

• Journal of Magnetics
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• v.12 no.1
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• pp.12-16
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• 2007

Magnetic excitation and reversal by a spin polarized current via spin transfer have been a central research topic in spintronics due to its application potential. Special techniques are required to fabricate nano-scale magnetic layers in which the effect can be observed and studied. This work discusses the possibility of using electron-beam resists, the nano-scale patterning media, as ion milling mask in a subtractive fabrication method. The possibility is demonstrated by two resists, one positive tone, the ZEP 520A, and one negative tone, the ma-N2403. The advantage and the key points for success of this process will be also addressed.

• Journal of the Semiconductor & Display Technology
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• v.17 no.4
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• pp.16-20
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• 2018

Graphene is attracting attention due to its outstanding properties as line material for next-generation semiconductor. Graphene pattern technology is essential to apply graphene line. Selective graphene oxide reduction as one of graphene pattern method does not require a substrate thereby a high flexibility device can be applied. Particularly, the method using photon energy has advantages of short process time and environment friendly. In this review, we introduce the photocatalytic method and the photo-thermal energy conversion method using photon energy in the selective reduction process of graphene oxides.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.21 no.4
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• pp.77-83
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• 2022

Amorphous alloys exhibit excellent mechanical properties; therefore, application technology development is being attempted in various fields. However, industrial use of application technology is limited owing to the limitations in fabrication. In this study, micropattern fabrication of an amorphous alloy was conducted using laser beam machining. Although microhole fabrication is possible without the deformation of the amorphous phase through nanosecond pulsed laser beam machining, there are limitations in the generation of recast layers and spatters. In cover plate laser beam machining (c-LBM), a cover plate is used to reduce the thermal deformation and processing area. Therefore, it is possible to fabricate holes at the level of several micrometers. In this study, it was confirmed that recast layers are hardly generated in c-LBM. Furthermore, square-shaped micropatterns were successfully fabricated using c-LBM.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.2 no.4
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• pp.17-24
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• 2003

Chemical mechanical polishing(CMP) has been applied for planarization of topography after patterning process in semiconductor fabrication process. Tungsten CMP is necessary to build up interconnects of semiconductor device. But the tungsten dishing and the oxide erosion defects appear at end-point during tungsten CMP. It has been known that the generation of dishing and erosion is based on the over-polishing time, which is determined by pattern selectivity. Fixed abrasive pad takes advantage of decreasing the defects resulting flam reducing pattern selectivity because of the lower abrasive concentration. The manufacturing technique of fixed abrasive pad using hydrophilic polymers is introduced in this paper. For application to tungsten CMP, chemicals composed of oxidizer, catalyst, and acid were developed. In comparison of the general pad and slurry for tungsten CMP, the fixed abrasive pad and the chemicals resulted in appropriate performance in point of removal rate, uniformity, material selectivity and roughness.