• 제목/요약/키워드: patterning effect

검색결과 146건 처리시간 0.024초

Fabrication of ITO-less Sustain Electrodes for High Resolution Plasma Display Panel by X-Ray Lithographic Process

  • Ryu, Seung-Min;Yang, Dong-Yol;So, Jae-Yong;Park, Lee-Soon;Cheong, Hee-Woon;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.370-373
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    • 2009
  • X-ray lithography was employed to fabricate ITO-less high resolution sustain electrodes for plasma display panel (PDP). A polyimide film based X-ray mask and Xray sensitive Ag electrode paste were fabricated to check their effect on the patterning of Ag electrodes with less than 30 ${\mu}m$ in width. The X-ray lithographic method was found to be useful for the high resolution sustain electrode patterns due to the high penetration power and low scattering property of X-ray source.

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탄소나노튜브 전극으로부터 전계방출을 이용한 가스센서의 응용 (Application to Gas Sensors by Electron Emission from Carbon Nanotube Emitters)

  • 김성진
    • 한국전기전자재료학회논문지
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    • 제19권5호
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    • pp.405-410
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    • 2006
  • We fabricated gas sensors using carbon nanotubes (CNTs) as electron emitters for the purpose of detecting inert gases. By using the silicon-glass anodic bonding and glass patterning technologies with the typical Si process, we improved the compactness of the sensors and the reliability in process. The proposed sensor, based on, an electrical discharge theory known as Paschen's law in principle, works by figuring the variation of the discharge current depending on gas concentration. In the experiment, the initial breakdown characteristics were measured for air and Ar as a function of gas pressure. As the result, even though it should be realized that there are many other factors which have an effect on the breakdown of a gap, the sensors led to similar result as predicted by Paschen's law, and they showed a possibility as gas sensors which enable to detect the gas density ranged to the vacuum pressure from 1 to $10^{-3}$ Torr.

초고속 광변조기 제작을 위한 LiNbO3도파로의 건식식각 (Dry Etching of patternedLiNbO3Waveguides for the High-speed Optical Modulator fabrication)

  • 양우석;김우경;이승태;박우정;장현수;윤대호;이한영
    • 한국전기전자재료학회논문지
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    • 제16권8호
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    • pp.731-735
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    • 2003
  • Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.

Fabrication of Large-Scale Single-Crystal Organic Nanowire Arrays for High-Integrated Flexible Electronics

  • 박경선;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.266.1-266.1
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    • 2013
  • Large-scale single-crystal organic nanowire arrays were generated using a direct printing method (liquidbridge- mediated nanotransfer molding) that enables the simultaneous synthesis, alignment and patterning of nanowires from molecular ink solutions. Using this method, single-crystal organic nanowires can easily be synthesized by self-assembly and crystallization of organic molecules within the nanoscale channels of molds, and these nanowires can then be directly transferred to specific positions on substrates to generate nanowire arrays by a direct printing process. Repeated application of the direct printing process can be used to produce organic nanowire-integrated electronics with two- or three-dimensional complex structures on large-area flexible substrates. This efficient manufacturing method is used to fabricate all-organic nanowire field-effect transistors that are integrated into device arrays and inverters on flexible plastic substrates.

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Using Electron-beam Resists as Ion Milling Mask for Fabrication of Spin Transfer Devices

  • Nguyen Hoang Yen Thi;Yi, Hyun-Jung;Shin, Kyung-Ho
    • Journal of Magnetics
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    • 제12권1호
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    • pp.12-16
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    • 2007
  • Magnetic excitation and reversal by a spin polarized current via spin transfer have been a central research topic in spintronics due to its application potential. Special techniques are required to fabricate nano-scale magnetic layers in which the effect can be observed and studied. This work discusses the possibility of using electron-beam resists, the nano-scale patterning media, as ion milling mask in a subtractive fabrication method. The possibility is demonstrated by two resists, one positive tone, the ZEP 520A, and one negative tone, the ma-N2403. The advantage and the key points for success of this process will be also addressed.

TCAD 시뮬레이션을 이용한 Fin형 SONOS Flash Memory의 모서리 효과에 관한 연구 (A Study on the Corner Effect of Fin-type SONOS Flash Memory Using TCAD Simulation)

  • 양승동;오재섭;윤호진;정광석;김유미;이상율;이희덕;이가원
    • 한국전기전자재료학회논문지
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    • 제25권2호
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    • pp.100-104
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    • 2012
  • Fin-type SONOS (silicon-oxide-nitride-oxide-silicon) flash memory has emerged as novel devices having superior controls over short channel effects(SCE) than the conventional SONOS flash memory devices. However despite these advantages, these also exhibit undesirable characteristics such as corner effect. Usually, the corner effect deteriorates the performance by increasing the leakage current. In this paper, the corner effect of fin-type SONOS flash memory devices is investigate by 3D Process and device simulation and their electrical characteristics are compared to conventional SONOS devices. The corner effect has been observed in fin-type SONOS device. The reason why the memory characteristic in fin-type SONOS flash memory device is not improved, might be due to existing undesirable effect such as corner effect as well as the mutual interference of electric field in the fin-type structure as reported previously.

X-선 노광용 마스크 제작공정에 관한 연구 (A Study on the Mask Fabrication Process for X-ray Lithography)

  • 박창모;우상균;이승윤;안진호
    • 마이크로전자및패키징학회지
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    • 제7권2호
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    • pp.1-6
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    • 2000
  • X-선 노광용 마스크의 재료로서 SiC와 Ta박막을 각각 ECR플라즈마 CVD, 스퍼터링 장비를 이용하여 증착한 뒤 잔류응력, 미세구조, 표면상태, 그리고 화학적 결합상태 등을 조사하였고, ECR etching system을 이용하여 Ta박막 미세 식각 특성을 연구하였다. SiC박막은 $N_2$분위기에서 RTA를 통하여 X-선 투과막 물질로서 필요한 적절한 인장응력을 변화 시킬 수 있었고, 공정 압력을 조절하여 증착한 Ta박막은 높은 밀도와 우수한 표면 평활도를 가지고 시간과 온도에 따른 응력의 안정성이 좋은 X-선 흡수체를 증착할 수 있었다. 또한 Cl 플라즈마는 흡수체 물질 Ta에 대해 좋은 식각특성을 보였고, two-step 식각을 통해 microloading effect를 억제함으로써 0.2 $\mu\textrm{m}$이하의 미세패턴을 식각해 낼 수 있었다.

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The Effect of Cr Dosage on FePt Nanoparticle Formation

  • Won, C.;Keavney, D.J.;Divan, R.;Bader, S.D.
    • Journal of Magnetics
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    • 제11권4호
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    • pp.182-188
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    • 2006
  • The search for high-density recording materials has been one of most active and vigorous field in the field of magnetism. $FePt-L1_{0}$ nanoparticle has emerged as a potential candidate because of its high anisotropy. In this paper, we provide an overview of recent work at Argonne National Laboratory that contributes to the ongoing dialogue concerning the relation between structure and properties of the FePt nanoparticle system. In particular we discuss the ability to control structure and properties via dosing with Cr. Cr-dosed FePt films were grown via molecular beam epitaxy and annealed at $550^{\circ}C$ in an ultrahigh vacuum chamber, and were studied with the surface magneto-optic Kerr effect (SMOKE), scanning electron microscopy (SEM) and x-ray magnetic circular dichroism (XMCD). We found that small dosage of Cr helps to generate $L1_{0}$ phase FePt magnetic nanoparticles with small size, defined shape and regular spatial distribution on MgO (001) substrate. The nanostructures are ferromagnetic with high magnetic coercivity (${\sim}0.9T$) and magnetic easy axis in the desired out-of-plane orientation. We also show that controlling the lateral region where nanostructures exist is possible via artificial patterning with Cr.

The Effect of Fused Silica Crystallization on Flexural Strength and Shrinkage of Ceramic Cores for Investment Casting

  • Kim, Young-Hwan;Yeo, Jeong-Gu;Choi, Sung-Churl
    • 한국세라믹학회지
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    • 제53권2호
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    • pp.246-252
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    • 2016
  • Complex designed silica-based ceramic cores were fabricated by ceramic injection molding. Slow heating rate (0.2K/min) for debinding restrained bloating on the surface of ceramic cores. To investigate effect of sintering conditions on mechanical properties of ceramic cores, green bodies were sintered at temperatures in a range from $1150^{\circ}C$ to $1400^{\circ}C$ for various dwelling times (6 h to 48 h). Sintering above $1300^{\circ}C$ for 12 h and dwelling time over 24 h at $1200^{\circ}C$ reduce the flexural strength and increase the linear shrinkage of ceramic cores. Cristobalite, formed by high sintering temperature or long dwelling time, induces reduction of mechanical properties due to its phase transformation, which is accompanied by volume contraction and microcracking. Ceramic core sintered at $1200^{\circ}C$ for 12 h endured wax patterning and shell molding, and was manufactured successfully.

미세액적의 형상이 증발에 미치는 효과 (The Effect of Microdroplet Shape on the Evaporation)

  • 송현수;이용구;진송완;유정열
    • 대한기계학회논문집B
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    • 제31권6호
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    • pp.558-565
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    • 2007
  • Many studies of microdroplet evaporation from solid surfaces were made with priority given to inkjet printing and dye painting techniques. The objective of these studies is how to evaporate a droplet quickly and uniformly. Also it is necessary to prevent evaporation of a droplet to observe cells in a droplet generated through cell-patterning. In general, an identical volume of a water droplet on hydrophobic surfaces evaporates slower than that on hydrophilic surfaces. In this study, we observe the evaporation process of a droplet on various hydrophobic surfaces and calculated the evaporation rate considering the droplet geometry such as contact angle and height. This study also proposes a new model based on the fact that evaporation mode at the edge of a droplet is different from that at the outer surface of a droplet as the contact angle changes during evaporation. Finally, we reveal the cause fur the increase of evaporation flux and show that the ratio of edge evaporation to total evaporation increases with time.