• Title/Summary/Keyword: p-doping

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Magnetic Properties and Cation Distribution of Phosphorous-Doped $Co-{\gamma}-{Fe_2} {O_3}$ Particles

  • Na, J.G.;Han, D.H.
    • Journal of Magnetics
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    • 제1권1호
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    • pp.51-54
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    • 1996
  • The effects of additional P-doping on the magnetic properties, thermal stability and cation distribution of Co-doped ${\gamma}-{Fe_2} {O_3}$have been investigated by means of magnetic annealing and measurements with vibration sample magnetometer and torque magnetometer. It is found that the P-doping promotes the coercivity and its magnetic-thermal stability, which may be attributed to increase of the cubic magneto-crystalline anisotropy constant, $K_1$ and the activation energy, E, for cation rearrangement, respectively. The cation distribution of P and Co-substituted iron oxide was calculated from the variation of the saturation magnetization with P-doping on the basis of the Neel model. It was found that the most of P ions in the iron oxides occupied the B-site of spinel lattice.

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고효율 HIT Solar Cell 제작을 위한 AFORS HET 시뮬레이션 실험 (AFORS HET Simulation for Optimization of High Efficiency HIT Solar Cell)

  • 조수현;허종규;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.450-451
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    • 2008
  • 비정질 실리콘 태양전지는 n-i-p형 구조가 일반적이며, 각 층의 두께와 도핑농도가 태양전지의 효율을 결정하는 중요한 요인이다. 최대의 효율을 얻을 수 있는 태양전지 설계를 위해 AFORS HET 시뮬레이션을 통하여 n층의 두께와 도핑농도, 그리고 p층의 도핑농도롤 변화시켰다. 최적화 결과, a-Si:H(n) 층의 두께 1nm, a-Si:H(n)층의 도핑농도 $2\times10^{20}cm^{-3}$, a-Si:H(p+)층의 도핑농도 $1\times10^{19}cm^{-3}$에서 $V_{oc}$=679.5mV, $J_{sc}$=39.02mA/$cm^2$, FF=83.71%, Efficiency=22.21%의 고효율을 얻을 수 있다. 본 연구를 통하여 실제의 높은 효율을 갖는 태양전지 설계와 제조 시에 이용할 수 있을 것이다.

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용액공정으로 제작한 리튬 도핑된 N-ZTO/P-SiC 이종접합 구조의 전기적 특성 (The Effects of Lithium-Incorporated on N-ZTO/P-SiC Heterojunction Diodes by Using a Solution Process)

  • 이현수;박성준;안재인;조슬기;구상모
    • 한국전기전자재료학회논문지
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    • 제31권4호
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    • pp.203-207
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    • 2018
  • In this work, we investigate the effects of lithium doping on the electric performance of solution-processed n-type zinc tin oxide (ZTO)/p-type silicon carbide (SiC) heterojunction diode structures. The proper amount of lithium doping not only affects the carrier concentration and interface quality but also influences the temperature sensitivity of the series resistance and activation energy. We confirmed that the device characteristics vary with lithium doping at concentrations of 0, 10, and 20 wt%. In particular, the highest rectification ratio of $1.89{\times}107$ and the lowest trap density of $4.829{\times}1,022cm^{-2}$ were observed at 20 wt% of lithium doping. Devices at this doping level showed the best characteristics. As the temperature was increased, the series resistance value decreased. Additionally, the activation energy was observed to change with respect to the component acting on the trap. We have demonstrated that lithium doping is an effective way to obtain a higher performance ZTO-based diode.

Diffusion Behaviors of B and P at the Interfaces of Si/$SiO_2$ Multilayer System After the Annealing Process

  • Jang, Jong-Shik;Kang, Hee-Jae;Hwang, Hyun-Hye;Kim, Kyung-Joong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.232-232
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    • 2012
  • The doping of semiconducting elements is essential for the development of silicon quantum dot (QD) solar cells. Especially the doping elements should be activated by substitution at the crystalline sites in the crystalline silicon QDs. However, no analysis technique has been developed for the analysis of the activated dopants in silicon QDs in $SiO_2$ matrix. Secondary ion mass spectrometry (SIMS) is a powerful technique for the in-depth analysis of solid materials and the impurities analysis of boron and phosphorus in semiconductor materials. For the study of diffusion behaviour of B and P by SIMS, Si/$SiO_2$ multilayer films doped by B or P were fabricated and annealed at high temperatures for the activated doping of B and P. The distributions of doping elements were analyzed by SIMS. Boron found to be preferentially distributed in Si layer rather than the $SiO_2$ layer. Especially the B in the Si layers was separated to two components of an interfacial component and a central one. The central component was understood as the activated elements. On the other hand, phosphorus did not show any preferred diffusion.

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Growth and Characterization of P-type Doping for InAs Nanowires during Vapor-liquid-solid and Vapor-solid Growth Mechanism by MOCVD

  • Hwang, Jeongwoo;Kim, Myung Sang;Lee, Sang Jun;Shin, Jae Cheol
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.328.2-328.2
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    • 2014
  • Semiconductor nanowires (NWs) have attracted research interests due to the distinct physical properties that can lead to variousoptical and electrical applications. In this paper, we have grown InAs NWs viagold (Au)-assisted vapor-liquid-solid (VLS) and catalyst-free vapor-solid (VS) mechanisms and investigated on the p-type doping profile of the NWs. Metal-organic chemical vapor deposition (MOCVD) is used for the growth of the NWs. Trimethylindium (TMIn) and arsine (AsH3) were used for the precursor and diethyl zinc (DEZn) was used for the p-type doping source of the NWs. The effectiveness of p-type doping was confirmed by electrical measurement, showing an increase of the electron density with the DEZn flow. The structural properties of the InAs NWs were examined using scanning electron microscopy (SEM) and transmission electron microscopy (TEM). In addition, we characterize atomic distribution of InAs NWs using energy-dispersive X-ray spectroscopy (EDX) analysis.

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All Carrier Ohmic-Contacts을 이용한 유기 발광 다이오드의 성능 향상 연구

  • 박진우;임종태;염근영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.168-168
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    • 2012
  • 본 연구에서는 Molybdenum oxide (MoOx)-doped 4,4',4"-tris[2-naphthyl(amino)] triphenylamine(2-TNATA)의 P-doping에 의한 hole ohmic contact과 fullerene (C60)/lithium (LiF)의 electron ohmic contact에 의한 All Ohmic contact를 이용한 유기 발광 다이오드 (OLEDs)의 광저항 특성의 향상을 설명한다. 이 소자의 성능은 MoOx-doped 2-TNATA의 두께와 도핑농도에 큰 영향을 받는다. glass/ITO/MoOx-doped 2-TNATA (100 nm)/Al 구조의 소자에서 MoOx-doped 2-TNATA 도핑 농도가 25%에서 75%로 증가할수록 hole only device의 hole ohmic 특성이 향상됐다. 그 이유는 p-type doping effect 때문이다. 또한 photoemission spectra 분석결과, p-type doping effect는 hole-injecting barrier 높이는 낮추고, hole conductivity는 향상되었다. 이것은 2-TNATA에 도핑된 MoOx의 전하전송 콤플렉스의 형성으로 hole carrier의 수가 증가하여 발생되었다. MoOx-doped 2-TNATA의 hole ohmic contact과 fullerene (C60)/lithium fluoride (LiF)의 electron ohmic contact 으로 구성된 glass/ITO/MoOx-doped 2-TNATA (75%, 60 nm)/NPB (10 nm)/Alq3 (35 nm)/C60 (5 nm)/LiF (1 nm)/Al (150 nm)의 소자구조는 6,4V에서 127,600 cd/m2 최대 휘도와 약 1,000 cd/m2에서 4.7 lm/W의 높은 전력 효율을 보여준다.

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원자층 증착법으로 성장된 ZnO 박막의 질소 도핑에 대한 연구 (Nitrogen Doping Characterization of ZnO Prepared by Atomic Layer Deposition)

  • 김도영
    • 한국전기전자재료학회논문지
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    • 제27권10호
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    • pp.642-647
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    • 2014
  • For feasible study of opto-electrical application regarding to oxide semiconductor, we implemented the N doped ZnO growth using a atomic layer deposition technique. The p-type ZnO deposition, necessary for ZnO-based optoelectronics, has considered to be very difficulty due to sufficiently deep acceptor location and self-compensating process on doping. Various sources of N such as $N_2$, $NH_3$, NO, and $NO_2$ and deposition techniques have been used to fabricate p-type ZnO. Hall measurement showed that p-type ZnO was prepared in condition with low deposition temperature and dopant concentration. From the evaluation of photoluminescence spectroscopy, we could observe defect formation formed by N dopant. In this paper, we exhibited the electrical and optical properties of N-doped ZnO thin films grown by atomic layer deposition with $NH_3OH$ doping source.

Binary Doping of N-B and N-P into Graphene and Graphene Nanoribbons: Structural, Electronic, and Transport properties

  • Kim, Hyo Seok;Kim, Han Seul;Kim, Seong Sik;Kim, Yong Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.647-647
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    • 2013
  • We apply a density functional theory (DFT) and DFT-based non-equilibrium Green's function approach to study the structures, energetics and charge transport characteristics of nitrogen-doped graphene and graphene nanoribbons (GNRs) with additional doping of phosphorus or boron atoms. Considering graphitic, pyridinic, and porphrin-like N doping sites and increasing N-doping concentration, we analyze the structures of N-P and N-B doped graphene and particularly focus on how they affect the charge transport along the lateral direction. For the GNRs, we also consider the differences between defects formed at the edge and bulk regions. Implications of our findings in the context of electronic and energy device applications will be also discussed.

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중성자 조사에 의해 생성된 실리콘 결정내의 점결함 연구 (A study on point defects in silicon crystal induced with neutron irradiation)

  • 이운섭;류근걸;김봉구
    • 한국산학기술학회:학술대회논문집
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    • 한국산학기술학회 2001년도 춘계학술대회 발표논문집
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    • pp.155-161
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    • 2001
  • 반도체 소자의 기판 재료로 사용되고 있는 실리콘 웨이퍼는 그 정밀도가 매우 중요하다. 본 연구에서는 균일한 Dopant 농도 분포를 얻을 수 있는 중성자 변환 Doping을 이용하여 실리콘에 인(P)을 Doping하는 연구를 수행하였다. 중성자 변환 Doping, 즉 NTD(Neutron Transmutation Doping)란 원자번호 30인 실리론 동위원소에 중성자가 조사되면 원자번호 31인 실리콘으로 변환되고, 2.6시간의 반감기를 갖고 decay 되면서 인(P)으로 변하게 되어 실리콘 웨이퍼에 n-type 전도를 갖게 하는 것을 말한다. 본 연구에서는 하나로 원자로를 이용하여 고저항(1000-2000Ω㎝) FZ 실리콘 웨이퍼에 중성자 조사하여 저항의 변화를 관찰하였고, 중성자 조사시 발생하는 점결함을 분석하여 점결함이 저항 변화에 미치는 영향을 알아보았다. 중성자 조사 전 이론적 계산에 의해 16.8Ω㎝와 4.76Ω㎝의 저항을 얻을 수 있을 것으로 예상되었고, 중성자 조사 후 SRP로 측정한 결과 실리콘 웨이퍼가 3Ω㎝과 2.5Ω㎝의 저항을 가지고 있을 확인할 수 있었으며, FT-IR 분석결과 점결함의 변화 양상을 확인할 수 있었다.

Phosphorus-Doped ZnO 나노로드의 열처리 효과 (Annealing Effect of Phosphorus-Doped ZnO Nanorods Synthesized by Hydrothermal Method)

  • 황성환;문경주;이태일;명재민
    • 한국재료학회지
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    • 제23권5호
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    • pp.255-259
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    • 2013
  • An effect of thermal annealing on activating phosphorus (P) atoms in ZnO nanorods (NR) grown using a hydrothermal process was investigated. $NH_4H_2PO_4$ used as a dopant source reacted with $Zn^{2+}$ ions and $Zn_3(PO_4)_2$ sediment was produced in the solution. The fact that most of the input P elements are concentrated in the $Zn_3(PO_4)_2$ sediment was confirmed using an energy dispersive spectrometer (EDS). After the hydrothermal process, ZnO NRs were synthesized and their PL peaks were exhibited at 405 and 500 nm because P atoms diffused to the ZnO crystal from the $Zn_3(PO_4)_2$ particles. The solubility of the $Zn_3(PO_4)_2$ initially formed sediment varied with the concentration of $NH_4OH$. Before annealing, both the structural and the optical properties of the P-doped ZnO NR were changed by the variation of P doping concentration, which affected the ZnO lattice parameters. At low doping concentration of phosphorus in ZnO crystal, it was determined that a phosphorus atom substituted for a Zn site and interacted with two $V_{Zn}$, resulting in a $P_{Zn}-2V_{Zn}$ complex, which is responsible for p-type conduction. After annealing, a shift of the PL peak was found to have occurred due to the unstable P doping state at high concentration of P, whereas at low concentration there was little shift of PL peak due to the stable P doping state.