• Title/Summary/Keyword: p-doped

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Atomic Layer Deposition of Nitrogen Doped ZnO and Application for Highly Sensitive Coreshell Nanowire Photo Detector

  • Jeong, Han-Eol;Gang, Hye-Min;Cheon, Tae-Hun;Kim, Su-Hyeon;Kim, Do-Yeong;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.26.1-26.1
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    • 2011
  • We investigated the atomic layer deposition (ALD) process for nitrogen doped ZnO and the application for n-ZnO : N/p-Si (NW) coaxial hetero-junction photodetectors. ALD ZnO:N was deposited using diethylzinc (DEZ) and diluted $NH_4OH$ at $150^{\circ}C$ of substrate temperature. About 100~300 nm diameter and 5 um length of Si nanowires array were prepared using electroless etching technique in 0.108 g of $AgNO_3$ melted 20 ml HF liquid at $75^{\circ}C$. TEM images showed ZnO were deposited on densely packed SiNW structure achieving extraordinary conformality. When UV (360 nm) light was illuminated on n-ZnO:N/p-SiNW, I-V curve showed about three times larger photocurrent generation than film structure at 10 V reverse bias. Especially, at 660 nm wave length, the coaxial structure has 90.8% of external quantum efficiency (EQE) and 0.573 A/W of responsivity.

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Dielectric and piezoelectric properties of lead-free $(Na_{0.5}K_{0.5})NbO_3$-Ba(Ti, Sn)$O_3$ ceramics

  • Cha, Yoo-Jeong;Kim, Chang-Il;Jeong, Young-Hun;Lee, Young-Jin;Paik, Jong-Hoo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.30-30
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    • 2008
  • Lead-free piezoelectric ceramics 0.97$(Na_{0.5}K_{0.5})NbO_3$-0.03Ba$(Ti_{1-x}Sn_x)O_3$ [NKN-BTS-x] ceramics doped with 1 mol% $MnO_2$ have been fabricated by a sintering technique with muffling. The $MnO_2$-doped NKN-BTS-x ceramics with x$\leq$0.2 have pure orthorhombic perovskite structure at room temperature. The dense microstructure was developed with grain growth as an increase of amount of Sn. Moreover, the addition of Sn was found to have a significant influence on piezoelectric properties. In particular, the $MnO_2$-doped NKN-BTS-0.1 ceramics showed improved piezoelectric properties of piezoelectric constant ($d_{33}$=145pC/N), relatively large electromechanical coupling factor ($k_p$=43%), dielectic constant (${\varepsilon}^T_{33}/{\varepsilon}_0$=676) dielectric loss (tan$\delta$=1.3%).

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Electrical Properties of ZnTe:Cu Films Grown by Hot-Wall Evaporation (열벽 증착(hot-wall evaporaton) 방법으로 성장한 ZnTe:Cu 박막의 전기적 특성)

  • Park, S.G.;Nam, S.G.;O, B.S.;Lee, K.S.
    • Solar Energy
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    • v.17 no.3
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    • pp.51-57
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    • 1997
  • Cu-doped ZnTe thin films have been grown by hot-wall evaporation. The electrical conductivity of the intrinsic ZnTe film was of p-type and as low as $10^{-6}({\Omega}{\cdot}cm)^{-1}$. As the doped Cu concentration was increased, the electrical conductivity was increased. up to $10^2({\Omega}{\cdot}cm)^{-1}$, but the mobility was decreased a little. The heavily doped sample shows the metal-like electrical resistivity.

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Effect of Rapid Thermal Annealing on the Ti doped In2O3 Films Grown by Linear Facing Target Sputtering

  • Seo, Ki-Won;Kim, Han-Ki
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.342.1-342.1
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    • 2014
  • The electrical, optical and structural properties of Ti doped $In_2O_3$ (TIO) ohmic contacts to p-type GaN were investigated using linear facing target sputtering (LFTS) system. Sheet resistance and resistivity of TIO films are decreased with increasing rapid thermal annealing (RTA) temperature. Although the $400^{\circ}C$ and $500^{\circ}C$ annealed samples showed rectifying behavior, the $600^{\circ}C$ and $700^{\circ}C$ annealed samples showed linear I-V characteristics indicative of the formation of an ohmic contact between TIO and p-GaN. The annealing of the contact at $700^{\circ}C$ resulted in the lowest specific contact resistivity of $9.5{\times}10^{-4}{\Omega}cm^2$. Based on XPS depth profiling and synchrotron X-ray scattering analysis, we suggested a possible mechanism to explain the annealing dependence of the properties of TIO layer on rapid thermal annealing temperature.

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UV-Vis Spectra of N, N'-Bis(4′-Aminophenyl)-1,4-quinonenediimine Doped With $H_{4}SiW_{12}O_{40}$

  • Jian Gong;Cui, Xiu-Jun;Chen, Ya-Guang;Xie, Zhong-Wei;Qu, Lun-Yu
    • Macromolecular Research
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    • v.12 no.1
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    • pp.22-25
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    • 2004
  • We have synthesized aniline oligomer composites by using heteropoly acid (H$_4$SiW$_{12}$O$_{40}$ ) as a dopant. The doping and dedoping processes of the aniline oligomer composites were investigated with the aid of UV- Vis spectra. The bands of the aniline oligomer at 572 nm weakened or disappeared, and the bands at 268, 412, and 771 nm appeared, after the aniline oligomer was doped. When the solution of the aniline oligomer doped with H$_4$SiW$_{12}$O$_{40}$ was kept at lower values of pH, the aniline oligomer could not be dedoped by dilution. The turning point of doping and dedoping occurred at pH 5.5. The band at 771 nm shifted towards longer wavelengths when the aniline oligomer composites were synthesized using acetone as the solvent. This observation indicates that the molecular chain became stretched. In addition, we also investigated the change of the electronic absorption spectra of the composites with respect to the time laid up.id up.

Properties of photoluminescence and time-resolved photoluminescence in doped GaAs (도핑된 GaAs의 형광 및 시간분해 형광 특성)

  • 추장희;서정철;유성규;신은주;이주인;김동호
    • Korean Journal of Optics and Photonics
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    • v.8 no.3
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    • pp.213-217
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    • 1997
  • We have measured photoluminescence (PL) and time-resolved PL in doped-GaAs. As increasing doping concentration, the PL spectra of n-type GaAs shift to higher energies while the PL spectra of p-type GaAs shift to lower energies than the bandgap of the undoped GaAs. The contribution of the Burstein-Moss effect overrules the band-gap narrowing in n-type GaAs, contrary to p-type GaAs. The PL rise time and decay time become shorter as increasing doping concentration. The PL rise and decay time in doped-GaAs depend on the type of majority carriers and their concentrations, which imply that the carrier-carrier interaction plays an important role in the energy relaxation processes.

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Photovoltaic Effect of Polymer Solar Cells Doped with Sensitizing Dye (감광성 염료를 도핑한 고분자 태양 전지 소자 연구)

  • Yun, Soo Hong;Park, Jae Woo;Huh, Yoon Ho;Park, Byoungchoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.3
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    • pp.252-256
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    • 2013
  • We introduced sensitizing dyes into the bulk-heterojunction (BHJ) photovoltaic (PV) layer of polymer solar cells (PSCs). The sensitizing dyes doped were Bis(tetra butyl ammonium) cis-dithio cyanato bis(2,2'-bipyridine-4-carboxylicacid-4'-carboxylate) ruthenium (II) (N719 dye) and the BHJ PV layer used was made of poly (3-hexylthiophene) (P3HT) and phenyl $C_{61}$-butyric acid methyl ester (PCBM). It was found that the N719 dyes increase the photovoltaic performance, i.e., increasing open-circuit voltage and short-circuit current density with improved fill factor. For the P3HT:PCBM PV cells doped with the N719 dyes (0.24 wt%), an increase in power conversion efficiency of 4.0% was achieved, compared to that of the control cells (3.6%) without the N719 dyes.

Low-Frequency Noise Characteristics of SiGe pMOSFET Depending upon Channel Structures and Bias Conditions (SiGe pMOSFET의 채널구조와 바이어스 조건에 따른 잡음 특성)

  • Choi, Sang-Sik;Yang, Hun-Duk;Kim, Sang-Hoon;Song, Young-Joo;Cho, Kyoung-Ik;Kim, Jeonng-Huoon;Song, Jong-In;Shim, Kyu-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.5-6
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    • 2005
  • High performance SiGe heterostructure metal-oxide-semiconductor field effect transistors(MOSFETs) were fabricated using well-controlled delta-doping of boron and SiGe/Si heterostructure epitaxal layers grown by reduced pressure chemical vapor deposition. In this paper, we report 1/f noise characteristics of the SiGe MOSFETs measured under various bias conditions of the gate and drain voltages changing in linear operation regions. From the noise spectral density, we found that the gate and drain voltage dependence of the noise represented same features, as usually scaled with $f^1$. However, 1/f noise was found to be much lower in the device with boron delta-doped layer, by a factor of $10^{-1}\sim10^{-2}$ in comparion with the device fabricated without delta-doped layer. 1/f noise property of delta-doped device looks important because the device may replace bipolar transistors most commonly embedded in high-frequency oscillator circuits.

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First-Principle Calculation Study of Cu Adsorption on X-doped (X=Ru, P, Si) 𝛾-Al2O3 (X-doped (X=Ru, P, Si) 𝛾-Al2O3 상의 Cu 흡착 제일원리 계산 연구)

  • LEE, EUNHYE;JI, HYUNJIN;CHOI, EUNYEONG;LEE, JUNGHUN;CHO, JANGHYEON
    • Transactions of the Korean hydrogen and new energy society
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    • v.33 no.1
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    • pp.105-112
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    • 2022
  • Copper (Cu)-based catalysts have been widely used in a methanol steam reforming (MSR) reaction for hydrogen production for air-independent propulsion (AIP) applications and their good catalytic activities have attracted much attention. However, the agglomeration of the catalytic active site Cu causes deteriorating the catalytic performance and suppression of Cu agglomeration is a crucial issue in the AIP applications that the MSR system is typically operated at 250-300℃ for a long time. R. Sakai et al. recently showed a computational study on the anchoring effect that reduces an agglomeration of active sites by doping in a supporter. In order to present the anchoring effect on 𝛾-Al2O3 supported Cu-based catalysts, in this study, the adsorption energies of Cu on X-doped (X=ruthenium, phosphorus, silicon) 𝛾-Al2O3 were calculated and Cu adsorption energy decreased due to a change of the electronic structure originated from doping, thereby proving the anchoring effect.

Growth of GaAs/AlGaAs structure for photoelectric cathode (광전음극 소자용 GaAs/AlGaAs 구조의 LPE 성장)

  • Bae, Sung Geun;Jeon, Injun;Kim, Kyoung Hwa
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.27 no.6
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    • pp.282-288
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    • 2017
  • In this paper, GaAs/AlGaAs multi-layer structure was grown by liquid phase epitaxy with graphite sliding boat, which can be used as a device structure of a photocathode image sensor. The multi-layer structure was grown on an n-type GaAs substrate in the sequence as follows: GaAs buffer layer, Zn-doped p-type AlGaAs layer as etching stop layer, Zn-doped p-type GaAs layer, and Zn-doped p-type AlGaAs layer. The Characteristics of GaAs/AlGaAs structures were analyzed by using scanning electron microscope (SEM), secondary ion mass spectrometer (SIMS) and hall measurement. The SEM images shows that the p-AlGaAs/p-GaAs/p-AlGaAs multi-layer structure was grown with a mirror-like surface on a whole ($1.25mm{\times}25mm$) substrate. The Al composition in the AlGaAs layer was approximately 80 %. Also, it was confirmed that the free carrier concentration in the p-GaAs layer can be adjusted to the range of $8{\times}10^{18}/cm^2$ by hall measurement. In the result, it is expected that the p-AlGaAs/p-GaAs/p-AlGaAs multi-layer structure grown by the LPE can be used as a device structure of a photoelectric cathode image sensor.