• Title/Summary/Keyword: p-Type semiconductor

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Two dimensional tin sulfide for photoelectric device

  • Patel, Malkeshkumar;Kim, Joondong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.389.1-389.1
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    • 2016
  • The flexible solid state device has been widely studied as portable and wearable device applications such as display, sensor and curved circuits. A zero-bias operation without any external power consumption is a highly-demanding feature of semiconductor devices, including optical communication, environment monitoring and digital imaging applications. Moreover, the flexibility of device would give the degree of freedom of transparent electronics. Functional and transparent abrupt p/n junction device has been realized by combining of p-type NiO and n-type ZnO metal oxide semiconductors. The use of a plastic polyethylene terephthalate (PET) film substrate spontaneously allows the flexible feature of the devices. The functional design of p-NiO/n-ZnO metal oxide device provides a high rectifying ratio of 189 to ensure the quality junction quality. This all transparent metal oxide device can be operated without external power supply. The flexible p-NiO/n-ZnO device exhibit substantial photodetection performances of quick response time of $68{\mu}s$. We may suggest an efficient design scheme of flexible and functional metal oxide-based transparent electronics.

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The Development of Fertical type LPE System for Single Crystal Growth (단결정 성장을 위한 수직형 LPE 장치의 제작)

  • 오종환
    • Proceedings of the Optical Society of Korea Conference
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    • 1989.02a
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    • pp.201-205
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    • 1989
  • In this study, the vertical type LPE system has been developed by fully hand-made. The temperature fluctuation and minimum cooling rate of this LPE system are within $\pm$0.05$^{\circ}C$ and 0.15$^{\circ}C$/min, respectively. It is considered that these properties are enough to grow III-V semiconductor compounds single crystals by liquid phase epitaxy method. Futhermore in this study. 1.3${\mu}{\textrm}{m}$ GaInAsP/InP single crystal growing has been carried out by this system. It has been obtained that the growing rate was about 0.72${\mu}{\textrm}{m}$/min for InP binary layer and 0.36${\mu}{\textrm}{m}$/min for GaInAsP quarternary layer under 0.6$^{\circ}C$/min cooling rate condition.

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$Cu_2O$ p-type oxide-semiconductor film ($Cu_2O$ p-형 산화물반도체 박막)

  • Song, Byeong-Jun;Lee, Ho-Nyeon
    • Proceedings of the KAIS Fall Conference
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    • 2010.11a
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    • pp.356-358
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    • 2010
  • Cuprous oxide ($Cu_2O$)를 기초로 하여 산화 박막 트랜지스터에 대하여 연구를 하였다. 일정한 두께의 cuprous oxide ($Cu_2O$) 박막을 조건별로 열처리 공정을 하고 그에 따른 변화를 측정을 하였다. 그 측정한 결과 중 가장 좋은 열처리 조건으로 열 증착 방식(Vacuum Thermal Evaporation)을 사용하여 cuprous oxide ($Cu_2O$) 비정질 산화 박막 트랜지스터를 제작 및 측정했다.

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Growth and Characterization of P-type Doping for InAs Nanowires during Vapor-liquid-solid and Vapor-solid Growth Mechanism by MOCVD

  • Hwang, Jeongwoo;Kim, Myung Sang;Lee, Sang Jun;Shin, Jae Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.328.2-328.2
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    • 2014
  • Semiconductor nanowires (NWs) have attracted research interests due to the distinct physical properties that can lead to variousoptical and electrical applications. In this paper, we have grown InAs NWs viagold (Au)-assisted vapor-liquid-solid (VLS) and catalyst-free vapor-solid (VS) mechanisms and investigated on the p-type doping profile of the NWs. Metal-organic chemical vapor deposition (MOCVD) is used for the growth of the NWs. Trimethylindium (TMIn) and arsine (AsH3) were used for the precursor and diethyl zinc (DEZn) was used for the p-type doping source of the NWs. The effectiveness of p-type doping was confirmed by electrical measurement, showing an increase of the electron density with the DEZn flow. The structural properties of the InAs NWs were examined using scanning electron microscopy (SEM) and transmission electron microscopy (TEM). In addition, we characterize atomic distribution of InAs NWs using energy-dispersive X-ray spectroscopy (EDX) analysis.

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Gold Recovery from Cyanide Solution through Biosorption, Desorption and Incineration with Waste Biomass of Corynebacterium glutamicum as Biosorbent (생체흡착, 탈착 및 회화를 이용한 시안 용액으로부터 금의 회수)

  • Bae, Min-A;Kwak, In-Seob;Won, Sung-Wook;Yun, Yeoung-Sang
    • Clean Technology
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    • v.16 no.2
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    • pp.117-123
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    • 2010
  • In this study, we propose two methods able to recover different type of gold from gold-cyanide solutions: biosorption and desorption process for mono-valent gold recovery and biosorption and incineration process for zero-valent gold recovery. The waste bacterial biomass of Corynebacterium glutamicum generated from amino acid fermentation industry was used as a biosorbent. The pH edge experiments indicated that the optimal pH range was pH 2 - 3. From isothermal experiment and its fitting with Langmuir equation, the maximum uptake capacity of Au(I) at pH 2.5 were determined to be 35.15 mg/g. Kinetic tests evidenced that the process is very fast so that biosorption equilibrium was completed within the 60 min. To recover Au(I), the gold ions were able to be successfully eluted from the Au-loaded biosorbent by changing the pH to pH 7 and the desorption efficiency was 91%. This indicates that the combined process of biosorption and desorption would be effective for the recovery of Au(I). In order to recover zero-valent gold, the Au-loaded biosorbents were incinerated. The content of zero-valent gold in the incineration ash was as high as 85%. Therefore, we claim on the basis of the results that two suggested combined processes could be useful to recover gold from cyanide solutions and chosen according to the type of gold to be recovered.

Improvement in LED structure for enhanced light-emission

  • Park, Seong-Ju
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.21-21
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    • 2003
  • To increase the light-emission efficiency of LED, we increased the internal and external quantum efficiency by suppressing the defect formation in the quantum well and by increasing the light extraction efficiency in LED, respectively. First, the internal quantum efficiency was improved by investigating the effect of a low temperature (LT) grown p-GaN layer on the In$\sub$0.25/GaN/GaN MQW in green LED. The properties of p-GaN was optimized at a low growth temperature of 900oC. A green LED using the optimized LT p-type GaN clearly showed the elimination of blue-shift which is originated by the MQW damage due to the high temperature growth process. This result was attributed to the suppression of indium inter-diffusion in MQW layer as evidenced by XRD and HR-TEM analysis. Secondly, we improved the light-extraction efficiency of LED. In spite of high internal quantum efficiency of GaN-based LED, the external quantum efficiency is still low due to the total internal reflection of the light at the semiconductor-air interface. To improve the probability of escaping the photons outside from the LED structure, we fabricated nano-sized cavities on a p-GaN surface utilizing Pt self-assembled metal clusters as an etch mask. Electroluminescence measurement showed that the relative optical output power was increased up to 80% compared to that of LED without nano-sized cavities. I-V measurement also showed that the electrical performance was improved. The enhanced LED performance was attributed to the enhancement of light escaping probability and the decrease of resistance due to the increase in contact area.

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Fabrication and Properties of GaAs-MIS Capacitor using $SF_6$ Plasma Discharge ($SF_6$ 플라즈마 방전을 이용한 G3AS-MIS 커패시터의 제작 밑 특성)

  • 이남열;정순원;김광호;유병곤;이원재;유인규;양일석
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.29-32
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    • 1999
  • $GaF_3$ films were directly grown on p' and p-type GaAs(100) substrates using a $SF_6$ plasma discharge system. GaAs MIS(Meta1-Insulator-Semiconductor) capacitor was successfully fabricated for about 1 hour at temperature $290^{\circ}C$ using the as-grown $GaF_3$ films. The as-grown films on p'-GaAs exhibited a current density of less than 6.68 $\times$ $1O^{-9}$ A/$cm^2$ at a breakdown field of 500kV/cm and a refractive index of 2.0 ~ 2.3 at a wavelength of 632.8 nm. The dielectric constant was about 5 derived from 1 MHz capacitance-voltage (C-V) measurements. Dielectric dispersion of the fluoridated films on p'-GaAs measured ranged from 100 Hz to 10 MHz was not observed.

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Analysis of electrical characteristics for p-type silicon germanium metal-oxide semiconductor field-effect transistors (SiGe pMOSFET의 전기적 특성 분석)

  • Ko Suk-woong;Jung Hak-kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.2
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    • pp.303-307
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    • 2006
  • In this paper, we have designed the p-type metal-oxide semiconductor field-effect transistor(pMOSFET) for SiGe devices with gate lengths of $0.9{\mu}m$ and $0.1{\mu}m$using the TCAD simulators. The electrical characteristics of devices have been investigated over the temperatures of 300 and 77K. We have used the two carrier transfer models(hydrodynamic model and drift-diffusion model). We how that the drain current is higher in the hydrodynamic model than the drift-diffusion model. When the gate length is $0.9{\mu}m$, the threshold voltage shows -0.97V and -1.15V for 300K and 77K, respectively. The threshold voltage is, however, nearly same at $0.1{\mu}m$ for 300K and 77K.

Preparation of ZrO2 and SBT Thin Films for MFIS Structure and Electrical Properties (ZrO2 완충층과 SBT박막을 이용한 MFIS 구조의 제조 및 전기적 특성)

  • Kim, Min-Cheol;Jung, Woo-Suk;Son, Young-Guk
    • Journal of the Korean Ceramic Society
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    • v.39 no.4
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    • pp.377-385
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    • 2002
  • The possibility of $ZrO_2$ thin film as insulator for Metal-Ferroelectric-Insulator-Semiconductor(MFIS) structure was investgated. $SrBi_2Ta_2O_9$ and $SrBi_2Ta_2O_9$(SBT) thin films were deposited on P-type Si(111) wafer by R. F. magnetron sputtering method. The electrical properties of MFIS gate were relatively improved by inserting the $ZrO_2$ buffer layer. The window memory increased from 0.5 to 2.2V in the applied gate voltage range of 3-9V when the thickness of SBT film increased from 160 to 220nm with 20nm thick $ZrO_2$. The maximum value of window memory is 2.2V in Pt/SBT(160nm)/$ZrO_2$(20nm)/Si structure with the optimum thickness of $ZrO_2$. These memory windows are sufficient for practical application of NDRO-FRAM operating at low voltage.

Hybrid polymer-quantum dot based single active layer structured multi-functional device (Organic Bistable Device, LED and Photovoltaic Cell)

  • Son, Dong-Ick;Kwon, Byoung-Wook;Park, Dong-Hee;Kim, Tae-Whan;Choi, Won-Kook
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.97-97
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    • 2010
  • We demonstrate the hybrid polymer-quantum dot based multi-functional device (Organic bistable devices, Light-emitting diode, and Photovoltaic cell) with a single active-layer structure consisting of CdSe/ZnS semiconductor quantum-dots (QDs) dispersed in a poly N-vinylcarbazole (PVK) and 1,3,5-tirs- (N-phenylbenzimidazol-2-yl) benzene (TPBi) fabricated on indium-tin-oxide (ITO)/glass substrate by using a simple spin coating technique. The multi-functionality of the device as Organic bistable device (OBD), Light Emitting Diode (LED), and Photovoltaic cell can be successfully achieved by adding an electron transport layer (ETL) TPBi to OBD for attaining the functions of LED and Photovoltaic cell in which the lowest unoccupied molecular orbital (LUMO) level of TPBi is positioned at the energy level between the conduction band of CdSe/ZnS and LiF/Al electrode (band-gap engineering). Through transmission electron microscopy (TEM) study, the active layer of the device has a p-i-n structure of a consolidated core-shell structure in which semiconductor QDs are uniformly and isotropically adsorbed on the surface of a p-type polymer core and the n-type small molecular organic materials surround the semiconductor QDs.

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