• Journal of the Korean Applied Science and Technology
• /
• v.29 no.4
• /
• pp.570-576
• /
• 2012

In this study, we investigated the characteristics of NO oxidation using un-divided electrolyzed seawater as oxidant. The concentration of available chlorine and the temperature of electrolyzed seawater are increased with electrolysis time in the closed-loop constant current electrolysis system. While NO gas flow through bubbling reactor which is filled with electrolyzed seawater, the oxidation rate of NO to $NO_2$ is increased with the concentration of available chlorine and the temperature. $NO_2$, generated by oxidation reaction, is dissolved in electrolyzed seawater and existed as $HNO_3{^-}$ ion.

• Journal of the Korean Chemical Society
• /
• v.58 no.1
• /
• pp.68-71
• /
• 2014

Petroleum refining unavoidably generates large volumes of oily wastewater. The environmentally acceptable disposal of oily wastewater is a current challenge to the petroleum industry. Nowadays, more attentions have been focused on the treatment techniques of oily wastewater. Oily wastewater contained highly concentrated and toxic organic compounds. Wet peroxide oxidation (WPO) and catalytic wet oxidation (CWO) were applied to eliminate pollutants to examine the feasibility of the WPO/CWO of oily wastewater. The results indicated that more than 80% chemical oxygen demand (COD) removal from oily wastewater was achieved with CWO. Homogenous catalyst, $NaHCO_3$ and $Na_2CO_3$ and NaOH showed effective removal for pollutants in oily wastewater. Greater than 90% COD removal was achieved with WPO. It was concluded that WPO was a far more effective process for oily wastewater.

• Environmental Engineering Research
• /
• v.25 no.3
• /
• pp.324-334
• /
• 2020

Tannery wastewater is known to contain high concentrations of organic compounds, pathogens, and other toxic inorganic elements such as heavy metals, nitrogen, sulfur, etc. Biological methods such as aerobic and anaerobic processes are unsuitable for tannery wastewater treatment due to its high salinity, and electrochemical oxidation offers a promising method to solve this problem. In this study, raw tannery wastewater treatment using DSA® Ti/RuO₂, Ti/IrO₂ and Ti/BDD electrodes with continuous flow systems was examined. Effects of current densities and electrolysis times were investigated, to evaluate the process performance and energy consumption. The results showed that a Ti/BDD electrode is able to reach higher treatment efficiency than Ti/IrO₂, and Ti/RuO₂ electrodes across all parameters, excluding Total Nitrogen. The main mechanism of tannery wastewater oxidation at a Ti/BDD electrode is based on direct oxidation on the electrode surface combined with the generation of oxidants such as °OH and Cl₂, while at DSA® Ti/RuO₂ and Ti/IrO₂ electrodes, the oxidation mechanisms are based on the generation of chlorine. After treatment, the effluents can be discharged to the environment after 6-12 h of electrolysis. Electrooxidation thus offers a promising method for removing the nutrients and non-biodegradable organic compounds in tannery wastewater.

• Journal of the Semiconductor & Display Technology
• /
• v.18 no.1
• /
• pp.32-37
• /
• 2019

Titanium dioxide ($TiO_2$) is a promising dielectric material in the semiconductor industry for its high dielectric constant. However, for utilization on Si substrate, $TiO_2$ film meets with a difficulty due to the large leakage currents caused by its small conduction band energy offset from Si substrate. In this study, we propose an in-situ plasma oxidation process in plasma-enhanced atomic layer deposition (PE-ALD) system to form an oxide barrier layer which can reduce the leakage currents from Si substrate to $TiO_2$ film. $TiO_2$ film depositions were followed by the plasma oxidation process using tetrakis(dimethylamino)titanium (TDMAT) as a Ti precursor. In our result, $SiO_2$ layer was successfully introduced by the plasma oxidation process and was used as a barrier layer between the Si substrate and $TiO_2$ film. Metal-oxide-semiconductor ($TiN/TiO_2/P-type$ Si substrate) capacitor with plasma oxidation barrier layer showed improved C-V and I-V characteristics compared to that without the plasma oxidation barrier layer.

• Journal of the Korea Society of Computer and Information
• /
• v.25 no.12
• /
• pp.299-303
• /
• 2020

Currently, electric furnace oxide slag is mostly used for soil or road use due to its nature. Although electric furnace oxidation slag is an industrial byproduct, not a circulating aggregate, the shortcomings of electric furnace oxidation slag are gradually being resolved due to the development of technology, and it is said that electric furnace oxidation slag is enough to be used as aggregates in light of research and technology conditions outside of Korea. However, there are difficulties in expanding construction and application, given that the current standard for electric furnace oxid slag only defines recycling purposes and does not have specific regulations. Therefore, institutional supplementation is needed to utilize oxidation slag as electricity. In this study, the laws and system related to oxidation slag by electricity are reviewed, laws related to recycled aggregate are examined, and measures for improvement are proposed.

• Journal of Environmental Science International
• /
• v.29 no.12
• /
• pp.1213-1222
• /
• 2020

In the current study, a Cu2O/TiO2 photoinduced nanocomposite materials prepared by ultrasonification method was evaluated the photocatalytic oxidation efficiency of volatile organic compounds (BTEX) under visible-light irradiation. The results of XRD confirmed the successful preparation of photoinduced nanocomposite materials. However, diffraction peaks belonging to TiO2 were not confirmed for the Cu2O/TiO2. The possible reason for the absence of Cu2O peak is their low content and small particle size. The result of uv-vis spectra exhibited that the fabricated Cu2O/TiO2 can be activated under visible light irradiation. The FE-SEM/EDS and TEM showed the formation of synthesized nanocomposites and componential analysis in the undoped TiO2 and Cu2O/TiO2. The photocatalytic oxidation efficiencies of benzene, toluene, ethylbenzene, and o-xylene with Cu2O/TiO2 were higher than undoped TiO2. According to light sources, the average oxidation efficiencies for BTEX by Cu2OT-0.5 were exhibited in the orer of 8 W day light > violet LEDs > white LEDs. However, the photocatalytic oxidation efficiencies normalized to supplied electric power were calculated to be in the following order of violet LEDs > white LEDs > 8 W day light, indicating that the LEDs could be a much more energy efficient light source for the photo-oxidation of gaseous BTEX using Cu2O/TiO2.

• Clean Technology
• /
• v.15 no.2
• /
• pp.116-121
• /
• 2009

In this paper, we investigated the effect of an indirect oxidation zone in an electrolysis reactor that used Ti/$IrO_2$ as the anode and SUS 316L as the cathode. Based on our preliminary results, the electrolysis reactor was operated with pole plate interval of 6 mm, current density 1.0 $A/dm^2L$ and electrolyte concentration 15%. The removal efficiency, COD (chemical oxygen demand), was additionally increased by 55% and 12.5${\sim}$15.0% in the direct and indirect oxidation zones, respectively. The removal efficiencies of T-N (total nitrogen) and T-P (total phosphorus) were found to be 88% and 75%, respectively. It was shown that the additional effect of the indirect oxidation zone on the removal was nearly negligible. Also, as the removal of COD,T-N and T-P took place during the initial2${\sim}$5 days of reaction, it was concluded that there was no need to extend the retention time of the electrolysis reactor.

• Journal of Electrochemical Science and Technology
• /
• v.15 no.1
• /
• pp.67-95
• /
• 2024

Direct alcohol fuel cells (DAFCs) have gained much attention as promising energy conversion devices due to their ability to utilize alcohol as a fuel source. In this regard, Molybdenum-based electrocatalysts (Mo-ECs) have emerged as a substitution for expensive Pt and Ru-based co-catalyst electrode materials in DAFCs, owing to their unique electrochemical properties useful for alcohol oxidation. The catalytic activity of Mo-ECs displays an increase in alcohol oxidation current density by several folds to 1000-2000 mA mg_Pt^-1, compared to commercial Pt and PtRu catalysts of 10-100 mA mg_Pt^-1. In addition, the methanol oxidation peak and onset potential have been significantly reduced by 100-200 mV and 0.5-0.6 V, respectively. The performance of Mo-ECs in both acidic and alkaline media has shown the potential to significantly reduce the Pt loading. This review aims to provide a comprehensive overview of the bifunctional mechanism involved in the oxidation of alcohols and factors affecting the electrocatalytic oxidation of alcohol, such as synthesis method, structural properties, and catalytic support materials. Furthermore, the challenges and prospects of Mo-ECs for DAFCs anode materials are discussed. This in-depth review serves as valuable insight toward enhancing the performance and efficiency of DAFC by employing Mo-ECs.

• Corrosion Science and Technology
• /
• v.9 no.6
• /
• pp.276-280
• /
• 2010

Copper(Cu) as an interconnecting metal layer can replace aluminum (Al) in IC fabrication since Cu has low electrical resistivity, showing high immunity to electromigration compared to Al. However, it is very difficult for copper to be patterned by the dry etching processes. The chemical mechanical polishing (CMP) process has been introduced and widely used as the mainstream patterning technique for Cu in the fabrication of deep submicron integrated circuits in light of its capability to reduce surface roughness. But this process leaves a large amount of residues on the wafer surface, which must be removed by the post-CMP cleaning processes. Copper corrosion is one of the critical issues for the copper metallization process. Thus, in order to understand the copper corrosion problems in post-CMP cleaning solutions and study the effects of DC biases and post-CMP cleaning solution concentrations on the Cu film, a constant voltage was supplied at various concentrations, and then the output currents were measured and recorded with time. Most of the cases, the current was steadily decreased (i.e. resistance was increased by the oxidation). In the lowest concentration case only, the current was steadily increased with the scarce fluctuations. The higher the constant supplied DC voltage values, the higher the initial output current and the saturated current values. However the time to be taken for it to be saturated was almost the same for all the DC supplied voltage values. It was indicated that the oxide formation was not dependent on the supplied voltage values and 1 V was more than enough to form the oxide. With applied voltages lower than 3 V combined with any concentration, the perforation through the oxide film rarely took place due to the insufficient driving force (voltage) and the copper oxidation ceased. However, with the voltage higher than 3 V, the copper ions were started to diffuse out through the oxide film and thus made pores to be formed on the oxide surface, causing the current to increase and a part of the exposed copper film inside the pores gets back to be oxidized and the rest of it was remained without any further oxidation, causing the current back to decrease a little bit. With increasing the applied DC bias value, the shorter time to be taken for copper ions to be diffused out through the copper oxide film. From the discussions above, it could be concluded that the oxide film was formed and grown by the copper ion diffusion first and then the reaction with any oxidant in the post-CMP cleaning solution.

• Journal of Integrative Natural Science
• /
• v.3 no.4
• /
• pp.210-214
• /
• 2010

Relationship between etch current and morphology and porosity of porous silicon (PS) has been investigated. The gravimetric method is applied to measured the porosity of PS. As the current density increase, the silicon dissolution rate increases, resulting in a higher porosity and etching rate. The result shows that linear dependence of PS porosity and etching rate as a function of current density. The morphology of porous silicon was investigated by using cold field emission scanning electron micrograph (FE-SEM). The size of pores formed during anodization is predominantly controlled by the current density, with an increase in the pore size corresponding to an increase in the current density.