• Title/Summary/Keyword: optical energy gap

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Electrical Properties of Tungsten Oxide Interfacial Layer for Silicon Solar Cells

  • Oh, Gyujin;Kim, Eun Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.196.2-196.2
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    • 2015
  • There are various issues fabricating the successful and efficient solar cell structures. One of the most important issues is band alignment technique. The solar cells make the carrier in their active region over the p-n junction. Then, electrons and holes diffuse by minority carrier diffusion length. After they reach the edge of solar cells, there exist large energy barrier unless the good electrode are chosen. Many various conductor with different work functions can be selected to solve this energy barrier problem to efficiently extract carriers. Tungsten oxide has large band gap known as approximately 3.4 eV, and usually this material shows n-type property with reported work function of 6.65 eV. They are extremely high work function and trap level by oxygen vacancy cause them to become the hole extraction layer for optical devices like solar cells. In this study, we deposited tungsten oxide thin films by sputtering technique with various sputtering conditions. Their electrical contact properties were characterized with transmission line model pattern. The structure of tungsten oxide thin films were measured by x-ray diffraction. With x-ray photoelectron spectroscopy, the content of oxygen was investigated, and their defect states were examined by spectroscopic ellipsometry, UV-Vis spectrophotometer, and photoluminescence measurements.

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Development of a Microplasma Source under Atmospheric Pressure using an External Ballast Capacitor (방전에너지 제어용 외부 커패시터를 이용한 대기압 마이크로 플라즈마 소스 개발)

  • Ha, Chang-Seung;Lee, Je-Hyun;Son, Eui-Jeong;Park, Cha-Soo;Lee, Ho-Jun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.6
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    • pp.31-38
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    • 2013
  • A pulse driven atmospheric plasma jet controlled by external ballast capacitor is developed. Unlike the most commonly use DBD sources, the proposed device utilizes bare metal electrode. The discharge energy per pulse can precisely be determined by changing voltage and capacitance of the ballast capacitor. It is shown that the device can provide wide range of plasma, from stable glow mode to near arc state. Current-voltage waveforms, optical emission spectra and discharge images are investigated as a function of an injection energy. The OES shows that He and oxygen lines are increased as a function of the external ballast capacitor. Ozone and rotational temperature have similar tendency with a power consumption. The feeding gas is He and the applied DC voltage is from 400V to 800V when the gap distance is $500{\mu}m$.

Effect of the Calcination Temperature and Li(I) Doping on Ethanol Sensing Properties in p-Type CuO Thin Films

  • Choi, Yun-Hyuk
    • Korean Journal of Materials Research
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    • v.29 no.12
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    • pp.764-773
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    • 2019
  • The gas response characteristic toward C2H5OH has been demonstrated in terms of copper-vacancy concentration, hole density, and microstructural factors for undoped/Li(I)-doped CuO thin films prepared by sol-gel method. For the films, both concentrations of intrinsic copper vacancies and electronic holes decrease with increasing calcination temperature from 400 to 500 to 600 ℃. Li(I) doping into CuO leads to the reduction of copper-vacancy concentration and the enhancement of hole density. The increase of calcination temperature or Li(I) doping concentration in the film increases both optical band gap energy and Cu2p binding energy, which are characterized by UV-vis-NIR and X-ray photoelectron spectroscopy, respectively. The overall hole density of the film is determined by the offset effect of intrinsic and extrinsic hole densities, which depend on the calcination temperature and the Li(I) doping amount, respectively. The apparent resistance of the film is determined by the concentration of the structural defects such as copper vacancies, Li(I) dopants, and grain boundaries, as well as by the hole density. As a result, it is found that the gas response value of the film sensor is directly proportional to the apparent sensor resistance.

Fabrication of CdTe thin films by sputtering and its application on CdTe/CdS solar cells (Sputtering에 의한 CdTe박막제조 및 CdTe/CdS태양전지에의 응용)

  • Jung, H.W.;Lee, C.;Kim, S.;Shin, S.H.;Park, K.J.
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1645-1647
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    • 1996
  • Polycrystalline CdTe thin films -have been studied for photovoltaic application because of their high absorption coefficient and optimal band gap energy (1.54 eV) for solar energy conversion. In this study, we prepared CdTe films using RF-magnetron sputtering method and investigated structural, optical and electrical properties with spectrophotometer, XRD, EDX, and resistivity meter. CdTe films at $200\;^{\circ}C$ showed a mixture of zinc blend (Cubic) and wurtzite (hexagonal) phase. On the other hand, the films at $400\;^{\circ}C$ showed highly oriented structure having hexagonal structure. The resistivity of CdTe films deposited on $SiO_2$ substrates was about $10_7\;{\Omega}cm$. The value of resistivity decreased with the increase of the substrate temperature. CdTe were sputtered on CdS thin films prepared by chemical bath deposition for the formation of the heterojunction. I-V characteristics of these cells were measured at a light density of $100mw/cm^2$, AM. 1.0. The present thin film solar cells showed a conversion efficiency of about 5%.

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The Fabrication and Characteristics of ITO Thin Films and ITO/p-InP Solar Cells (ITO박막과 ITO/p-InP 태양전지의 제작 및 특성)

  • 맹경호;문동찬;송복식;김선태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.05a
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    • pp.105-109
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    • 1992
  • ITO film, 1500${\AA}$ of thickness, onto glass and p-InP wafer was prepared by e-beam evaporator. The bet ITO film had the resistivity 5.3${\times}$10$\^$-3/ $\Omega$-cm, the concentration 6.5${\times}$10$\^$20/cm$\^$-3/, the transmittance above 80%, and the optical energy gap about 3.5eV. The higher pressure of injected oxygen, the less reverse bias saturation current and the more open circuit voltage. Under the optimum evaporation conditions, the efficiency was 7.19% and the series resistance, and the shunt resistance were respectively 8.5%, 3${\alpha}$, and 26K$\Omega$. The interdependence between activation energy and pre-exponential factor was found. We found he surface of the p-InP became n-type and consquently supposed that the buried homojunction formation, that is, n+-ITO/n-InP/p-InP was caused by Sn diffusion or loss of phosphorus in the interface layer.

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Differential Transmission Spectra of Terahertz Metamaterial Resonances for Sensing Microorganisms (미생물에 의한 테라헤르츠 메타물질의 공명주파수 변화)

  • Park, S.J.;Ahn, Y.H.
    • Korean Journal of Optics and Photonics
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    • v.27 no.6
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    • pp.229-232
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    • 2016
  • Metamaterials operating in the terahertz frequency range show promising potential for use in highly sensitive microbial sensors that are capable of effectively detecting microorganisms in the ambient environment. We were able to detect extremely small numbers of microorganisms by measuring the differential transmission spectra (DTS) of the metamaterial resonances. This was possible because their sizes are on the same scale as the microgaps of the terahertz metamaterials. DTS depend critically on the number of microorganisms placed in the gap area, and their dielectric constant. In addition, these metamaterial microbial sensors are reusable, because the microorganisms can be completely removed by fungicide solution. Finite-difference time-domain simulations successfully reproduce our experimental data.

Growth and Properties of CdS Thin films(A Study on the adhesion of II-VI compound semiconductor for applications in light emitting and absorbing devices) (CdS 박막제작 및 그 특성(발광 및 수광 소자 응용을 위한에 II-VI족 화합물 반도체들의 접착에 관한 기초연구))

  • Kang, Hyun-Shik;Cho, Ji-Eun;Kim, Kyung-Wha
    • Solar Energy
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    • v.17 no.2
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    • pp.55-66
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    • 1997
  • The structural and optoelectronic properties of polycrystalline CdS films up to several microns in thickness, fabricated by three different methods, are compared to one another for the purpose of preparing CdTe/CdS solar cells. All films were deposited on an indium tin oxide on glass substrate. The three methods are: 1) alternated spraying of cation and anion solution at room temperature; 2) spray pyrolysis with substrate temperature up to $500^{\circ}C$; 3) chemical bath deposition (CBD). Deposited films were thermally treated in various ways. All films showed a well-developed wurtzite structure. Films grown by the alternated-spray method and the chemical bath method consist of randomly-oriented crystallites with dimensions <0.5 microns. Annealing at $400^{\circ}C$ increases the crystallite size slightly. Films which were grown by pyrolysis at substrate temperatures from $400^{\circ}C\;to\;500^{\cir\c}C$ were oriented in the <002> direction. For growth by pyrolysis at $500^{\circ}C$, the surface is rough on a lateral scale of 0.1 to 0.3 microns. The optical band gap and defect states are investigated by optical absorption, photoluminescene, Raman, and photothermal deflection spectroscopies.

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Tailoring the properties of spray deposited V2O5 thin films using swift heavy ion beam irradiation

  • Rathika, R.;Kovendhan, M.;Joseph, D. Paul;Pachaiappan, Rekha;Kumar, A. Sendil;Vijayarangamuthu, K.;Venkateswaran, C.;Asokan, K.;Jeyakumar, S. Johnson
    • Nuclear Engineering and Technology
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    • v.52 no.11
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    • pp.2585-2593
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    • 2020
  • Swift heavy ion (SHI) beam irradiation can generate desirable defects in materials by transferring sufficient energy to the lattice that favours huge possibilities in tailoring of materials. The effect of Ag15+ ion irradiation with energy 200 MeV on spray deposited V2O5 thin films of thickness 253 nm is studied at various ion doses from 5 × 1011 to 1 × 1013 ions/㎠. The XRD results of pristine film confirmed orthorhombic structure of V2O5 and its average crystallite size was found to be 20 nm. The peak at 394 cm-1 in Raman spectra confirmed O-V-O bonding of V2O5, whereas 917 cm-1 arise because of distortion in stoichiometry by a loss of oxygen atoms. Raman peaks vanished completely above the ion fluence of 5 × 1012 ions/㎠. Optical studies by UV-Vis spectroscopy shows decrement in transmittance with an increase in ion fluence up to 5 × 1012 ions/㎠. The red shift is observed both in the direct and indirect band gaps until 5 × 1012 ions/㎠. The surface topography of the pristine film revealed sheath like structure with randomly distributed spherical nano-particles. The roughness of film decreased and the density of spherical nanoparticles increased upon irradiation. Irradiation improved the conductivity significantly for fluence 5 × 1011 ions/㎠ due to band gap reduction and grain growth.

Effect of Oxygen and Diborane Gas Ratio on P-type Amorphous Silicon Oxide films and Its Application to Amorphous Silicon Solar Cells

  • Park, Jin-Joo;Kim, Young-Kuk;Lee, Sun-Wha;Lee, Youn-Jung;Yi, Jun-Sin;Hussain, Shahzada Qamar;Balaji, Nagarajan
    • Transactions on Electrical and Electronic Materials
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    • v.13 no.4
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    • pp.192-195
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    • 2012
  • We reported diborane ($B_2H_6$) doped wide bandgap hydrogenated amorphous silicon oxide (p-type a-SiOx:H) films prepared by using silane ($SiH_4$) hydrogen ($H_2$) and nitrous oxide ($N_2O$) in a radio frequency (RF) plasma enhanced chemical vapor deposition (PECVD) system. We improved the $E_{opt}$ and conductivity of p-type a-SiOx:H films with various $N_2O$ and $B_2H_6$ ratios and applied those films in regards to the a-Si thin film solar cells. For the single layer p-type a-SiOx:H films, we achieved an optical band gap energy ($E_{opt}$) of 1.91 and 1.99 eV, electrical conductivity of approximately $10^{-7}$ S/cm and activation energy ($E_a$) of 0.57 to 0.52 eV with various $N_2O$ and $B_2H_6$ ratios. We applied those films for the a-Si thin film solar cell and the current-voltage characteristics are as given as: $V_{oc}$ = 853 and 842 mV, $J_{sc}$ = 13.87 and 15.13 $mA/cm^2$. FF = 0.645 and 0.656 and ${\eta}$ = 7.54 and 8.36% with $B_2H_6$ ratios of 0.5 and 1% respectively.

Characteristics of the Mg and In co-doped ZnO Thin Films with Various Substrate Temperatures (RF 마그네트론 스퍼터를 이용하여 제작한 MIZO 박막의 특성에 미치는 기판 온도의 영향)

  • Jeon, Kiseok;Jee, Hongsub;Lim, Sangwoo;Jeong, Chaehwan
    • Current Photovoltaic Research
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    • v.4 no.4
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    • pp.150-154
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    • 2016
  • Mg and In co-doped ZnO (MIZO) thin films with transparent conducting characteristics were successfully prepared on glass substrates by RF magnetron sputtering technique. The Influence of different substrate temperature (from RT to $400^{\circ}C$) on the structural, morphological, electrical, and optical properties of MIZO thin films were investigated. The MIZO thin film prepared at the substrate temperature of $350^{\circ}C$ showed the best electrical characteristics in terms of the carrier concentration ($4.24{\times}10^{20}cm^{-3}$), charge carrier mobility ($5.01cm^2V^{-1}S^{-1}$), and a minimum resistivity ($1.24{\times}10^{-4}{\Omega}{\cdot}cm$). The average transmission of MIZO thin films in the visible range was over 80% and the absorption edges of MIZO thin films were very sharp. The bandgap energy of MIZO thin films becomes wider from 3.44 eV to 3.6 eV as the substrate temperature increased from RT to $350^{\circ}C$. However, Band gap energy of MIZO thin film was narrow at substrate temperature of $400^{\circ}C$.