• 제목/요약/키워드: nitrogen plasma

검색결과 639건 처리시간 0.05초

전자계-촉매형 플라즈마 반응기의 질소 산화물 제거 특성 (Removal Characteristics of Nitrogen Oxide in Electromagnetic-Catalytic Plasma Reactor)

  • 이현수;박재윤;이동훈;한병성
    • 한국전기전자재료학회논문지
    • /
    • 제15권7호
    • /
    • pp.640-648
    • /
    • 2002
  • This study is to develop electromagnetic-catalyst application plasma reactors for indoor air purification. Nitrogen Oxide(NOx) removal characteristics are measured in the electromagnetic catalyst application plasma reactors with various parameters and the effect of catalyst or/and magnetic field are investigated on the NOx removal. And AC or DC high voltage is applied for corona discharge, flow rates are 150~1500 $\ell/min$ and NO initial concentration is about 10 ppm. $Mn0_2$ and $TiO_2$ catalysts to increase NOx removal rate are used. In the results, NOx removal rate by AC power is about 10 % higher than that by DC power under the experimental condition of 700 $\ell/min$, 5 magnets, $MnO_2$ and $Ti)_2$ catalysts. When magnet is applied to the reactor, NOx removal rate increased. Also, the reactor with $MnO_2$ and $Ti)_2$ catalyst and magnet have the best removal rate.

High-rate, Low-temperature Deposition of Multifunctional Nano-crystalline Silicon Nitride Films

  • Hwang, Jae-Dam;Lee, Kyoung-Min;Keum, Ki-Su;Lee, Youn-Jin;Hong, Wan-Shick
    • Journal of Information Display
    • /
    • 제11권3호
    • /
    • pp.109-112
    • /
    • 2010
  • The solid phase compositions and dielectric properties of silicon nitride ($SiN_x$) films prepared using the plasma enhanced chemical vapor deposition (PECVD) technique at a low temperature ($200^{\circ}C$) were studied. Controlling the source gas mixing ratio, R = $[N_2]/[SiH_4]$, and the plasma power successfully produced both silicon-rich and nitrogen-rich compositions in the final films. The composition parameter, X, varied from 0.83 to 1.62. Depending on the film composition, the dielectric properties of the $SiN_x$ films also varied substantially. Silicon-rich silicon nitride (SRSN) films were obtained at a low plasma power and a low R. The photoluminescence (PL) spectra of these films revealed the existence of nano-sized silicon particles even in the absence of a post-annealing process. Nitrogen-rich silicon nitride (NRSN) films were obtained at a high plasma power and a high R. These films showed a fairly high dielectric constant ($\kappa$ = 7.1) and a suppressed hysteresis window in their capacitance-voltage (C-V) characteristics.

아크 이온플레이팅법에 의한 저온 CrN 합성 (The Low Temperature Deposition of CrN Films by the AIP Method)

  • 조용기;김상권;이원범;김성완
    • 열처리공학회지
    • /
    • 제20권2호
    • /
    • pp.78-83
    • /
    • 2007
  • CrN coatings were deposited by cathodic arc ion plating method on the SKD11 steel substrates. Atmosphere temperature of $350^{\circ}C$, arc current of 90 A, nitrogen partial pressure of 1.0-5.3 Pa, and negative bias voltage of 30-135 V were selected. The characteristics of microstructure were investigated with XRD. Hardness, adhesion and friction coefficient measured by microhardness tester, scratch tester, and ball on disk tribometer. Microstructures depended on nitrogen partial pressure and bias voltage. The preferred orientation of the films was changed from (200) to (111) with decreasing pressure and increasing bias voltage. Adhesion properties related with microstructure, but microstructure changes slightly influenced on hardness and friction properties. The critical load.($Lc_1$) and hardness of CrN films deposited at 5.3 Pa, -30 V condition were 55 N(HF1), $2157{\pm}47\;Hk_{0.025}$. The friction coefficient were about 0.5 under dry condition.

플라즈마 침질탄화처리된 순철의 화합물층 특성 (The Characteristics of Compound Layers Formed during Plasma Nitrocarburising in Pure Iron)

  • 조효석;이상윤
    • 열처리공학회지
    • /
    • 제13권3호
    • /
    • pp.143-150
    • /
    • 2000
  • Ferritic plasma nitrocarburising was performed on pure iron using a modified DC plasma unit. This investigation was carried out with various gas compositions which consisted of nitrogen, hydrogen and carbon monoxide gases, and various gas pressures for 3 hours at $570^{\circ}C$. After treatment, the different cooling rates(slow cooling and fast cooling) were used to investigate its effect on the structure of the compound layer. The ${\varepsilon}$ phase occupied the outer part of the compound layer and ${\gamma}^{\prime}$ phase existed between the ${\varepsilon}$ phase and the diffusion zone. The gas composition of the atmosphere influenced the constitution of the compound layer produced, i.e. high nitrogen contents were essential for the production of ${\varepsilon}$ phase compound layer. It was found that with increasing carbon content in the gas mixture the compound layer thickness increased up to 10%. In the gas pressure around 3 mbar, the compound layer characteristics were slightly effected by gas pressure. However, in the low gas pressure and high gas pressure, the compound layer characteristics were significantly changed. The constitution of the compound layer was altered by varying the cooling rate. A large amount of ${\gamma}^{\prime}$ phase was transformed from the ${\varepsilon}$ phase during slow cooling.

  • PDF

Nano-scale PMOSFET에서 Plasma Nitrided Oixde에 대한 소자 특성의 의존성 (Dependency of the Device Characteristics on Plasma Nitrided Oxide for Nano-scale PMOSFET)

  • 한인식;지희환;구태규;유욱상;최원호;박성형;이희승;강영석;김대병;이희덕
    • 한국전기전자재료학회논문지
    • /
    • 제20권7호
    • /
    • pp.569-574
    • /
    • 2007
  • In this paper, the reliability (NBTI degradation: ${\Delta}V_{th}$) and device characteristic of nano-scale PMOSFET with plasma nitrided oxide (PNO) is characterized in depth by comparing those with thermally nitrided oxide (TNO). PNO case shows the reduction of gate leakage current and interface state density compared to TNO with no change of the $I_{D.sat}\;vs.\;I_{OFF}$ characteristics. Gate oxide capacitance (Cox) of PNO is larger than TNO and it increases as the N concentration increases in PNO. PNO also shows the improvement of NBTI characteristics because the nitrogen peak layer is located near the $Poly/SiO_2$ interface. However, if the nitrogen concentration in PNO oxide increases, threshold voltage degradation $({\Delta}V_{th})$ becomes more degraded by NBT stress due to the enhanced generation of the fixed oxide charges.

Vitamin B6 결핍이 Streptozotocin 유발 당뇨 흰쥐의 에너지 대사물 농도에 미치는 영향 (The Effect of Vitamin B6 Deficiency on Energy Metabolite in Streptozotocin-induced Diabetic Rats)

  • 주윤옥
    • Journal of Nutrition and Health
    • /
    • 제27권3호
    • /
    • pp.228-235
    • /
    • 1994
  • The purpose of this study was to investigate the effect of vitamin B6 deficiency on the concentration of energy metabolite in streptozotocin-induced diabetic rats. Thirty rats were fed a vitamin B6 deficient diet(-B6) or a control diet(+B6) for 5 weeks and then subdivided into 3 groups respectively ; base group, one day diabetic group and three day diabetic group. Diabetes of rats were induced by streptozotocin injection into the tail vein. Glucose, glycogen, protein, alanine, triglyceride and free fatty acids were compared in plasma, liver skeletal muscle of rats. Also, the total urinary nitrogen and glucose excretion were compared. Compared with +B6 rats, the increase of plasma glucose in -B6 rats due to the diabetes was smaller. After diabetes was induced, the level of plasma alamine was not changed in -B6 rats while increased significantly(p<0.05) in +B6 rats. The increase of urinary nitrogen excretion was smaller and the increase of muscle protein was larger in -B6 rats at the first day diabetes was induced. The levels of plasma free fatty acid and liver triglyceride were significantly (p<0.05) higher in -B6 rats after diabetes was induced. These results suggest that vitamin B6 deficiency may impair the adaptation of animals to the energy metabolism related due to a decrease of the body protein catabolism of fatty acid oxidation in diabetes and aggravate fatty liver which is one of the chronic complications of diabetes.

  • PDF

소화성 궤양 흰쥐에서 체내 질소이용율 증진을 위한 체내 질소원에 관한 연구 - 단백질과 단백질 가수분해물의 비율을 중심으로 - (A Study on the Nitrogen Sources for the Enhancement of the Nitrogen Bioavailability in Rats with Peptic Ulcer -The Ratio of Casein and Casein Hydrolysate-)

  • 김창임;이연숙
    • 한국식품영양과학회지
    • /
    • 제27권1호
    • /
    • pp.132-140
    • /
    • 1998
  • This study aimed to verify the nutritional and curative effects of protein hydroysate and optimal ratio between protein and protein hydroysate as nitrogen source in rats with cysteamine-induced duodenal ulcer. Duodenal ulcer rat model was established by intraperitoneal injections of cysteamine. Sprague-Dawley, female rats weighing approximately 200g were intrapertionealy injected twice cysteamine(13mg/100g BW) at intervals of 3hours per day. This procedure was repeated 3 times at intervals of 3 days. Animals fed on 10% casein diet for injection periods. After last injection, 5 kinds of kiets (the ratio of casein and casein hydrolysate was 100 : 0(C100), 75 : 25(CH 25), 50 : 50(CH 50), 25 : 75(CH 75), 0 : 100(CH 100)) were given. The rate were sacrificed after feeding diet, 1, 3, 5 days. Ulcer index, hexosamine content of stomach and duodeum, gastric motility, trypsin activity, blood glutathione, plasma total protein, albumin, amino-N, urinalry urea nitrogen, creatinine, hydroxyproline and retention rate of nitrogen were analyzed for nutritional effects of diet treatments. There were no differences among diet groups in the view of the growth and diet treatments. There difference of ulcer curation by diet was appeared after 3 days. The ulcer indexes of C100 and CH 25 of 3, 5 days were significantly higher than those of CH 50, CH 75 and CH 100. This result was the same as hexosamine content of stomach, plasma protein, albumin concentration and nitrogen retention rate. The more casein hydrolysate diet had, the lower trypsin activity was. The more casein gydroysate diet had, the higher excretion of hydroxyproline was. These results show that protein hydrolysate can be applied in diet therapy for the patients with gastronitestinal ulcer. It suggests that it has curative effect of diet when nitogen sources include at least over than 50% of protein hydrolysate.

  • PDF

AISI 316L stainless steel에 저온 플라즈마 침탄 및 질화처리 시가스조성이 표면특성에 미치는 영향 (Effects of Gas Composition on the Characteristics of Surface Layers Produced on AISI316L Stainless Steel during Low Temperature Plasma Nitriding after Low Temperature Plasma Carburizing)

  • 이인섭;안용식
    • 한국표면공학회지
    • /
    • 제42권3호
    • /
    • pp.116-121
    • /
    • 2009
  • The 2-step low temperature plasma processes (the combined carburizing and post-nitriding) offer the increase of both surface hardness and thickness of hardened layer and corrosion resistance than the individually processed low temperature nitriding and low temperature carburizing techniques. The 2-step low temperature plasma processes were carried out for improving both the surface hardness and corrosion resistance of AISI 316L stainless steel. The influence of gas compositions on the surface properties during nitriding step were investigated. The expanded austenite (${\gamma}_N$) was formed on all of the treated surface. The thickness of ${\gamma}_N$ and concentration of N on the surface increased with increasing both nitrogen gas and Ar gas levels in the atmosphere. The thickness of ${\gamma}_N$ increased up to about $20{\mu}m$ and the thickness of entire hardened layer was determined to be about $40{\mu}m$. The surface hardness was independent of nitrogen and Ar gas contents and reached up to about 1200 $HV_{0.1}$ which is about 5 times higher than that of untreated sample (250 $HV_{0.1}$). The corrosion resistance in 2-step low temperature plasma processed austenitic stainless steels was also much enhanced than that in the untreated austenitic stainless steels due to a high concentration of N on the surface.

Synthesis of N-doped Ethylcyclohexane Plasma Polymer Thin Films with Controlled Ammonia Flow Rate by PECVD Method

  • Seo, Hyunjin;Cho, Sang-Jin;Boo, Jin-Hyo
    • Applied Science and Convergence Technology
    • /
    • 제23권1호
    • /
    • pp.44-47
    • /
    • 2014
  • In this study, we investigated the basic properties of N-doped ethylcyclohexene plasma polymer thin films that deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition (PECVD) method with controlled ammonia flow rate. Ethylcyclohexene was used as organic precursor with hydrogen gas as the precursor bubbler gas. Additionally, ammonia ($NH_3$) gas was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, UV-Visible spectroscopy, and water contact angle measurement. We found that with increasing plasma power, film thickness is gradually increased while optical transmittance is drastically decreased. However, under the same plasma condition, water contact angle is decreased with increasing $NH_3$ flow rate. The FT-IR spectra showed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.

알루미늄의 플라즈마 표면처리가 알루미늄/CFRP 복합재의 파괴인성에 미치는 영향 (Effect of Plasma Treatment of Aluminum on the Fracture Toughness of Aluminum/CFRP Composites)

  • 신명근;이경엽
    • 한국정밀공학회지
    • /
    • 제20권8호
    • /
    • pp.153-157
    • /
    • 2003
  • In the present work, the effect of plasma treatment of aluminum on the fracture toughness of CFRP/aluminum composites was investigated. The surface of the aluminum was treated by a DC plasma. The plasma treatment was carried out at volume ratio of acetylene gas to nitrogen gas of 5:5 and the treatment time used was 30 sec. Cracked lap shear specimens of aluminum/CFRP composites were made using secondary bonding procedure. Fracture toughness of aluminum/CFRP composites was determined using the work factor approach. Then, the fracture toughness of plasma-treated aluminum/CFRP composites was compared with that of untreated aluminum/CFRP composites. The results showed that the fracture toughness of plasma-treated aluminum/CFRP composites was about 50 % higher than that of untreated aluminum/CFRP composites.