• Korean Chemical Engineering Research
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• v.45 no.2
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• pp.160-165
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• 2007

The synthesis and the characterization of Low Silica X (LSX) zeolite for nitrogen adsorption have been studied. The performance of LSX zeolite for nitrogen adsorption was compared to that of the commercial zeolite. The $Na_2O/(Na_2O+K_2O)$ ratio in the gel and the crystallization time were fixed as the synthetic factor. The LSX zeolite was formed at the $Na_2O/(Na_2O+K_2O)$ ratio of 0.75. The formation of LSX zeolite was confirmed by XRD and SEM. The Si/Al ratio was investigated by using XRF and FT-IR. The synthesized LSX zeolite showed a lower Si/Al ratio than the NaY and NaX zeolites although they have a same faujasite structure. The Si/Al ratio of the LSX zeolite converged close to 1. 1A (Li, Na, K) and 2A (Mg, Ca, Ba) group elements were ion-exchanged to the LSX zeolite. As the charge density of cation rises, the amount of nitrogen adsorbed increased. $Li^+$ ion-exchanged LSX zeolite showed the highest nitrogen adsorption weight. When the Li/Al ratio was over 0.65, nitrogen adsorption increased remarkably. $Li^+$ ions located on the supercage (site III, III') in the LSX zeolite played a role as nitrogen adsorption sites. When the $Ca^{2+}$ ions were added to the LiLSX zeolite by ion-exchange method, the performance for nitrogen adsorption increased more. The performance for the nitrogen adsorption was the highest at the Ca/Al ratio of 0.26. Nitrogen adsorption capacity of LiCaLSX (Ca/Al=0.26) zeolite was superior to the commercial NaX zeolite.

• Journal of Surface Science and Engineering
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• v.29 no.5
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• pp.494-497
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• 1996

The effect of implanted nitrogen and carbon ion into SUS 304 on the absorption of hydrogen by cathodic chaging were studied. Implantations of $N^+$, $C^+$ were performed with doses of $3\times10^{17}$ ions $\textrm{cm}^2$ and $5\times10^{17}N^+cm^2$, and $5\times10^{17}C^+cm^2$, at an energy of 90 keV. Nitrides and carbide were investigatedby X-ray diffraction, Auger electron spectroscopy (AES) and scanning electron microscope (SEM). Formation of hydrides during cathodic charging were depressed by a modified surface layer. It is concluded that the both nitrides and carbides act as the barrier of hydrogen migration and the catalyst of desorption of cathodically charged hydrogen.

• Journal of Surface Science and Engineering
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• v.29 no.6
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• pp.816-823
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• 1996

Chlorine containing high density plasmas are widely used to etch various materials in the microelectronic device fabrication. In this study, the characteristics of inductively coupled $Cl_2(O_2/N_2$) plasmas and their effects on the formation of silicon etching have been investigated using a Langmuir probe, quadrupole mass spectrometry(QMS), X-ray photoelectron spectroscopy(XPS), and Scanning Electron Microscopy(SEM). The addition of oxygen for chlorine plasmas reduced ion current densities and chlorine radical densities compared to the nitrogen addition by the recombination of oxygen with chlorine. Also, when silicon is etched in $Cl_2/O_2$ plasmas, etch products recombined with oxygen such as $SiCl_xO_y$ emerged. However, when nitrogen is added to chlorine, etch products recombined with nitrogen or Si-N bondings on the etched silicon surface were not found. All the silicon etch characteristics were dependent on the plasma conditions such as ion density, radical density, etc. As a result sub micron vertical silicon trench etch profiles could be effectively formed using optimized etch conditions for $Cl_2/O_2\; and \;Cl_2/N_2$ gas combinations.

• Journal of the Korean Chemical Society
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• v.43 no.2
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• pp.167-171
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• 1999

An investigation of the interaction of Co(II), Ni(II), Cu(II), Zn(II), Cd(II), Pb(II) and Ag(I) with two N,N'-dibenzylated nitrogen-oxygen mixed donor macrocyclic ligands, has been carried out. Tle log K values for the respective complexes in 95% methanol have been determined potentiometrically. Both ligands have formed stable complex with only Cu(II) and Ag(I) ion. Transport measurements in a bulk liquid membrane system exhibited a very high selectivity of Ag(I) ion over the other metal ions used.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.302-303
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• 2006

The response surface modeling of the pretilt angle control using ion-beam (IB) alignment on nitrogen doped diamond-like carbon (NDLC) thin film layer is investigated. The response surface model is used to analyze the variation of the pretilt angle under various process conditions IB exposure angle and IB exposure time are considered as Input factors. The analysis of variance technique is used to analyze the statistical significance, and effect plots are also investigated to examine the relationships betweenthe process parameters and the response. The model can allow us to reliably predict the pretilt angle with respect to the varying process conditions.

• Journal of Surface Science and Engineering
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• v.24 no.1
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• pp.24-24
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• 1991

Cr-N films were deposited on low-carbon steel sheets by the reactive arc-induced ion plating (AIIP). The influence of the deposition conditions (nitrogen pressure and substrate bias voltage) on the crystal orientation, morphology and microhardness of the Cr-N films has been investigated using x-ray diffractometer and scanning electron microscope. The impurities and contaminations on the surface and at the interface, and the layer-by-layer compositions of the film have been analyzed using scanning Auger multiprobe (SAM) and glow discharge spectroscope (GDS). The mixed state of Cr and Cr2N turned out to have a fine fibrous structure. The Cr2N films were deposited at a wide range of nitrogen flow rates. The orientations of Cr2N films were mainly (110) and (111), and the intensity of the (111) peak increased as the substrate bias voltage increased. The micorstructure of the Cr2N film was dense and no columnar structure was observed. The films in the mixed state of Cr2N and CrN were also dense without columnar structure. The maximum microhardness of the Cr-N films was 2400 kg/$\textrm{mm}^2$ at 10gf load.

• Journal of Surface Science and Engineering
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• v.25 no.1
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• pp.24-33
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• 1992

Cr-N films were deposited on low-carbon steel sheets by the reactive arc-induced ion plating (AIIP). The influence of the deposition conditions (nitrogen pressure and substrate bias voltage) on the crystal orientation, morphology and microhardness of the Cr-N films has been investigated using x-ray diffractometer and scanning electron microscope. The impurities and contaminations on the surface and at the interface, and the layer-by-layer compositions of the film have been analyzed using scanning Auger multiprobe (SAM) and glow discharge spectroscope (GDS). The mixed state of Cr and Cr₂N turned out to have a fine fibrous structure. The Cr₂N films were deposited at a wide range of nitrogen flow rates. The orientations of Cr₂N films were mainly (110) and (111), and the intensity of the (111) peak increased as the substrate bias voltage increased. The microstructure of the Cr₂N film was dense and no columnar structure was observed. The films in the mixed state of Cr₂N and CrN were also dense without columnar structure. The maximum microhardness of the Cr-N films was 2400 kg/㎟ at 10 gf load.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.413-416
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• 2004

In this study, zinc oxide(ZnO) having large misfit(18.2%) with sapphire was tried to be grown on very thin nitride buffer layers. For the creation of various kinds of nitride buffer layer, sapphire surface was modified by an irradiation of nitrogen ion beam with low energy generated from stationary plasma thruster(SPT) at room temperature. After the irradiation of ion beam, Al-N and Al-O-N bonding was identified to be formed as nitride buffet layers. Surface morphology was measured by AFM and then ZnO growth was followed by pulsed laser deposition(PLD). Their properties are analyzed by XRD, AFM, TEM, and PL. We observed that surface morphology was improved and deep level emission related to defects was almost vanished in PL spectra from the ZnO grown on nitride buffer layer.

• Journal of the Korean Applied Science and Technology
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• v.34 no.3
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• pp.436-442
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• 2017

This study was conducted to develop a wastewater treatment system to remove organic matter, nitrate nitrogen, and phosphate ion in synthetic wastewater. COD was removed almost 100% by the oxidation reaction of HClO and nitrate nitrogen was reduced to ammonia by electrolysis treatment, but ammonia was reoxidized into nitrate nitrogen by HClO treatment. Ammonia was removed almost 100% by heating evaporation and no ammonia was reoxidized into nitrate by HClO treatment. Phosphate ion could be removed by precipitation treatment by forming metal complex according to pH. Through electrolysis treatment and HClO treatment, removal efficiencies of COD 99.5%, nitrogen 97.3% and phosphorus 91.5% were obtained.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 1999.10a
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• pp.33-33
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• 1999