• 제목/요약/키워드: nanostructures

검색결과 721건 처리시간 0.032초

Impact of Wet Etching on the Tribological Performance of 304 Stainless Steel in Hydrogen Compressor Applications

  • Chan-Woo Kim;Sung-Jun Lee;Chang-Lae Kim
    • Tribology and Lubricants
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    • 제40권3호
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    • pp.71-77
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    • 2024
  • Hydrogen has emerged as an eco-friendly and sustainable alternative to fossil fuels. However, the utilization of hydrogen requires high-pressure compression, storage, and transportation, which poses challenges to the durability of compressor components, particularly the diaphragm. This study aims to improve the durability of 304 stainless steel diaphragms in hydrogen compressors by optimizing their surface roughness and corrosion resistance through wet etching. The specimens were prepared by immersing 304 stainless steel in a mixture of sulfuric acid and hydrogen peroxide, followed by etching in hydrochloric acid for various durations. The surface morphology, roughness, and wettability of the etched specimens were characterized using optical microscopy, surface profilometry, and water contact angle measurements. The friction and wear characteristics were evaluated using reciprocating sliding tests. The results showed that increasing the etching time led to the development of micro/nanostructures on the surface, thereby increasing surface roughness and hydrophilicity. The friction coefficient initially decreased with increasing surface roughness owing to the reduced contact area but increased during long-term wear owing to the destruction and delamination of surface protrusions. HCl-30M exhibited the lowest average friction coefficient and a balance between the surface roughness and oxide film formation, resulting in improved wear resistance. These findings highlight the importance of controlling the surface roughness and oxide film formation through etching optimization to obtain a uniform and wear-resistant surface for the enhanced durability of 304 stainless steel diaphragms in hydrogen compressors.

Water Repellency on a Nanostructured Superhydrophobic Carbon Fibers Network

  • Ko, Tae-Jun;Her, Eun-Kyu;Shin, Bong-Su;Kim, Ho-Young;Lee, Kwang-Ryeol;Hong, Bo-Ki;Kim, Sae-Hoon;Oh, Kyu-Hwan;Moon, Myoung-Woon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.224-224
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    • 2012
  • For decades, carbon fiber has expanded their application fields from reinforced composites to energy storage and transfer technologies such as electrodes for super-capacitors and lithium ion batteries and gas diffusion layers for proton exchange membrane fuel cell. Especially in fuel cell, water repellency of gas diffusion layer has become very important property for preventing flooding which is induced by condensed water could damage the fuel cell performance. In this work, we fabricated superhydrophobic network of carbon fiber with high aspect ratio hair-like nanostructure by preferential oxygen plasma etching. Superhydrophobic carbon fiber surfaces were achieved by hydrophobic material coating with a siloxane-based hydrocarbon film, which increased the water contact angle from $147^{\circ}$ to $163^{\circ}$ and decreased the contact angle hysteresis from $71^{\circ}$ to below $5^{\circ}$, sufficient to cause droplet roll-off from the surface in millimeter scale water droplet deposition test. Also, we have explored that the condensation behavior (nucleation and growth) of water droplet on the superhydrophobic carbon fiber were significantly retarded due to the high-aspect-ratio nanostructures under super-saturated vapor conditions. It is implied that superhydrophobic carbon fiber can provide a passage for vapor or gas flow in wet environments such as a gas diffusion layer requiring the effective water removal in the operation of proton exchange membrane fuel cell. Moreover, such nanostructuring of carbon-based materials can be extended to carbon fiber, carbon black or carbon films for applications as a cathode in lithium batteries or carbon fiber composites.

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CoO Thin Nanosheets Exhibit Higher Antimicrobial Activity Against Tested Gram-positive Bacteria Than Gram-negative Bacteria

  • Khan, Shams Tabrez;Wahab, Rizwan;Ahmad, Javed;Al-Khedhairy, Abdulaziz A.;Siddiqui, Maqsood A.;Saquib, Quaiser;Ali, Bahy A.;Musarrat, Javed
    • Korean Chemical Engineering Research
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    • 제53권5호
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    • pp.565-569
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    • 2015
  • Envisaging the role of Co in theranautics and biomedicine it is immensely important to evaluate its antimicrobial activity. Hence in this study CoO thin nanosheets (CoO-TNs) were synthesized using wet chemical solution method at a very low refluxing temperature ($90^{\circ}C$) and short time (60 min). Scanning electron microscopy of the grown structure revealed microflowers ($2{\sim}3{\mu}m$) composed of thin sheets petals (60~80 nm). The thickness of each individual grown sheet varies from 10~20 nm. Antimicrobial activities of CoO-TNs against two Gram positive bacteria (Micrococcus luteus, and Staphylococcus aureus), and two Gram negative bacteria (Escherichia coli and Pseudomonas aeruginosa) were determined. A 98% and 65% growth inhibition of M. luteus and S. aureus respectively, was observed with $500{\mu}g/ml$ of CoO-TNs compared to 39 and 34% growth inhibition of E. coli and P. aeruginosa, respectively with the same concentration of CoO-TNs. Hence, synthesized CoO-TNs exhibited antimicrobial activity against Gram negative bacteria and an invariably higher activity against tested Gram positive bacteria. Therefore, synthesized CoO-TNs are less prone to microbial infections.

전기화학적 도금을 이용한 wrap-around 게이트 나노구조의 제작 (Fabrication of wrap-around gate nanostructures from electrochemical deposition)

  • 안재현;홍수헌;강명길;황성우
    • 전기전자학회논문지
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    • 제13권2호
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    • pp.126-131
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    • 2009
  • Wrap-around 전계효과 트랜지스터는 채널과 전극간의 커플링을 매우 커서 채널길이가 짧아지면서 생기는 단채널효과(short channel effect)를 개선시킬 수 있는 이유로 많은 관심을 불러왔다. 본 논문에서는 실리콘 나노와이어를 이용하여 상향식의 wrap-around 전계효과 트랜지스터(FET)의 제작 공정을 소개한다. 소자의 제작 공정은 크게 전자빔 리소그래피, 유전영동(dielectrophoresis)을 이용한 나노와이어의 효과적 정렬 그리고 게이트 전극의 전기 화학적 도금(electrochemical deposition)을 이용한 생성 등의 방법들로 이루어진다. 전기 화학적 도금을 위한 용액은 독성을 띄지 않는 유기물 용액을 사용하였다. 액체 질소를 이용하여 polymethyl methacrylate(PMMA)가 전기화학적 도금시 형태를 잃지 않게 함으로써, 패터닝된 PMMA가 wrap-around 게이트 나노구조를 제작하기 위한 나노 템플릿으로 사용될 수 있도록 하였다.

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CNT-PDMS Composite Thin-Film Transmitters for Highly Efficient Photoacoustic Energy Conversion

  • Song, Ju Ho;Heo, Jeongmin;Baac, Hyoung Won
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.297.2-297.2
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    • 2016
  • Photoacoustic generation of ultrasound is an effective approach for development of high-frequency and high-amplitude ultrasound transmitters. This requires an efficient energy converter from optical input to acoustic output. For such photoacoustic conversion, various light-absorbing materials have been used such as metallic coating, dye-doped polymer composite, and nanostructure composite. These transmitters absorb laser pulses with 5-10 ns widths for generation of tens-of-MHz frequency ultrasound. The short optical pulse leads to rapid heating of the irradiated region and therefore fast thermal expansion before significant heat diffusion occurs to the surrounding. In this purpose, nanocomposite thin films containing gold nanoparticles, carbon nanotubes (CNTs), or carbon nanofibers have been recently proposed for high optical absorption, efficient thermoacosutic transfer, and mechanical robustness. These properties are necessary to produce a high-amplitude ultrasonic output under a low-energy optical input. Here, we investigate carbon nanotube (CNT)-polydimethylsiloxane (PDMS) composite transmitters and their nanostructure-originated characteristics enabling extraordinary energy conversion. We explain a thermoelastic energy conversion mechanism within the nanocomposite and examine nanostructures by using a scanning electron microscopy. Then, we measure laser-induced damage threshold of the transmitters against pulsed laser ablation. Particularly, laser-induced damage threshold has been largely overlooked so far in the development of photoacoustic transmitters. Higher damage threshold means that transmitters can withstand optical irradiation with higher laser energy and produce higher pressure output proportional to such optical input. We discuss an optimal design of CNT-PDMS composite transmitter for high-amplitude pressure generation (e.g. focused ultrasound transmitter) useful for therapeutic applications. It is fabricated using a focal structure (spherically concave substrate) that is coated with a CNT-PDMS composite layer. We also introduce some application examples of the high-amplitude focused transmitter based on the CNT-PDMS composite film.

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A nonlocal quasi-3D theory for bending and free flexural vibration behaviors of functionally graded nanobeams

  • Bouafia, Khadra;Kaci, Abdelhakim;Houari, Mohammed Sid Ahmed;Benzair, Abdelnour;Tounsi, Abdelouahed
    • Smart Structures and Systems
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    • 제19권2호
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    • pp.115-126
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    • 2017
  • In this paper, size dependent bending and free flexural vibration behaviors of functionally graded (FG) nanobeams are investigated using a nonlocal quasi-3D theory in which both shear deformation and thickness stretching effects are introduced. The nonlocal elastic behavior is described by the differential constitutive model of Eringen, which enables the present model to become effective in the analysis and design of nanostructures. The present theory incorporates the length scale parameter (nonlocal parameter) which can capture the small scale effect, and furthermore accounts for both shear deformation and thickness stretching effects by virtue of a hyperbolic variation of all displacements through the thickness without using shear correction factor. The material properties of FG nanobeams are assumed to vary through the thickness according to a power law. The neutral surface position for such FG nanobeams is determined and the present theory based on exact neutral surface position is employed here. The governing equations are derived using the principal of minimum total potential energy. The effects of nonlocal parameter, aspect ratio and various material compositions on the static and dynamic responses of the FG nanobeam are discussed in detail. A detailed numerical study is carried out to examine the effect of material gradient index, the nonlocal parameter, the beam aspect ratio on the global response of the FG nanobeam. These findings are important in mechanical design considerations of devices that use carbon nanotubes.

Nano-delamination monitoring of BFRP nano-pipes of electrical potential change with ANNs

  • Altabey, Wael A.;Noori, Mohammad;Alarjani, Ali;Zhao, Ying
    • Advances in nano research
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    • 제9권1호
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    • pp.1-13
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    • 2020
  • In this work, the electrical potential (EP) technique with an artificial neural networks (ANNs) for monitoring of nanostructures are used for the first time. This study employs an expert system to identify size and localize hidden nano-delamination (N.Del) inside layers of nano-pipe (N.P) manufactured from Basalt Fiber Reinforced Polymer (BFRP) laminate composite by using low-cost monitoring method of electrical potential (EP) technique with an artificial neural networks (ANNs), which are combined to decrease detection effort to discern N.Del location/size inside the N.P layers, with high accuracy, simple and low-cost. The dielectric properties of the N.P material are measured before and after N.Del introduced using arrays of electrical contacts and the variation in capacitance values, capacitance change and node potential distribution are analyzed. Using these changes in electrical potential due to N.Del, a finite element (FE) simulation model for N.Del location/size detection is generated by ANSYS and MATLAB, which are combined to simulate sensor characteristic, therefore, FE analyses are employed to make sets of data for the learning of the ANNs. The method is applied for the N.Del monitoring, to minimize the number of FE analysis in order to keep the cost and save the time of the assessment to a minimum. The FE results are in excellent agreement with an ANN and the experimental results available in the literature, thus validating the accuracy and reliability of the proposed technique.

3D feature profile simulation for nanoscale semiconductor plasma processing

  • Im, Yeon Ho
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.61.1-61.1
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    • 2015
  • Nanoscale semiconductor plasma processing has become one of the most challenging issues due to the limits of physicochemical fabrication routes with its inherent complexity. The mission of future and emerging plasma processing for development of next generation semiconductor processing is to achieve the ideal nanostructures without abnormal profiles and damages, such as 3D NAND cell array with ultra-high aspect ratio, cylinder capacitors, shallow trench isolation, and 3D logic devices. In spite of significant contributions of research frontiers, these processes are still unveiled due to their inherent complexity of physicochemical behaviors, and gaps in academic research prevent their predictable simulation. To overcome these issues, a Korean plasma consortium began in 2009 with the principal aim to develop a realistic and ultrafast 3D topography simulator of semiconductor plasma processing coupled with zero-D bulk plasma models. In this work, aspects of this computational tool are introduced. The simulator was composed of a multiple 3D level-set based moving algorithm, zero-D bulk plasma module including pulsed plasma processing, a 3D ballistic transport module, and a surface reaction module. The main rate coefficients in bulk and surface reaction models were extracted by molecular simulations or fitting experimental data from several diagnostic tools in an inductively coupled fluorocarbon plasma system. Furthermore, it is well known that realistic ballistic transport is a simulation bottleneck due to the brute-force computation required. In this work, effective parallel computing using graphics processing units was applied to improve the computational performance drastically, so that computer-aided design of these processes is possible due to drastically reduced computational time. Finally, it is demonstrated that 3D feature profile simulations coupled with bulk plasma models can lead to better understanding of abnormal behaviors, such as necking, bowing, etch stops and twisting during high aspect ratio contact hole etch.

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UV-NIL(Ultraviolet-Nano-Imprinting-Lithography) 방법을 이용한 나노 패터닝기술 (Nano-patterning technology using an UV-NIL method)

  • 심영석;정준호;손현기;신영재;이응숙;최성욱;김재호
    • 한국진공학회지
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    • 제13권1호
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    • pp.39-45
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    • 2004
  • UV-나노임프린팅 (Ultraviolet-Nanoimprinting Lithography:UV-NIL) 공정 기술은 수십 나노에서 수 나노미터 크기의 구조물을 적은 비용으로 대량생산 할 수 있다는 장점을 가지고 있는 기술로 최근 전세계적으로 연구가 활발히 진행되고 있다. 본 연구에서는 반도체 공정 중 마스크 제작 공정을 이용하여 나노패턴을 가진 5${\times}$5${\times}$0.09 인치 크기의 수정스탬프(quartz stamp)를 제작하였고, 임프린팅 (imprinting)시에 레지스트(resist)와 스탬프(stamp) 사이에서 발생하는 점착현상(adhesion)을 방지하고자 그 표면에 Fluoroalkanesilane(FAS) 표면처리를 하였다. 웨이퍼의 평탄도를 개선하고 친수(hydrophilic) 상태의 표면을 만들기 위해 그 표면에 평탄화층을 스핀코팅하였고, 1 nl의 분해능을 가진 디스펜서(dispenser)를 이용하여 레지스트 액적을 도포하였다. 스템프 상의 패턴과 레지스트에 임프린트된 패턴은 SEM, AFM 등을 이용하여 측정하였으며, EVG620-NIL 장비를 이용한 임프린팅 실험에서 370 nm - 1 um 크기의 다양한 패턴을 가진 스탬프의 패턴들이 정확하게 레지스트에 전사됨을 확인하였다.

기계적 가공과 무전해 선택적 증착기술을 이용한 나노/마이크로 금속패턴 제작에 관한 연구 (A Study on Nano/micro Pattern Fabrication of Metals by Using Mechanical Machining and Selective Deposition Technique)

  • 조상현;윤성원;강충길
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1507-1510
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    • 2005
  • This study was carried out as a part of the research on the development of a maskless and electroless process for fabricating metal micro/nanostructures by using a nanoindenter and an electroless deposition technique. $2-\mu{m}-deep$ indentation tests on Ni and Cu samples were performed. The elastic recovery of the Ni and Cu was 9.30% and 9.53% of the maximum penetration depth, respectively. The hardness and the elastic modulus were 1.56 GPa and 120 GPa for Ni and 1.49 GPa and 100 GPa for Cu. The effect of single-point diamond machining conditions such as the Berkovich tip orientation (0, 45, and $90^{\circ}$) and the normal load (0.1, 0.3, 0.5, 1, 3, and 5 mN), on both the deformation behavior and the morphology of cutting traces (such as width and depth) was investigated by constant-load scratch tests. The tip orientation had a significant influence on the coefficient of friction, which varied from 0.52-0.66 for Ni and from 0.46-0.61 for Cu. The crisscross-pattern sample showed that the tip orientation strongly affects the surface quality of the machined area during scratching. A selective deposition of Cu at the pit-like defect on a p-type Si(111) surface was also investigated. Preferential deposition of the Cu occurred at the surface defect sites of silicon wafers, indicating that those defect sites act as active sites for the deposition reaction. The shape of the Cu-deposited area was almost the same as that of the residual stress field.

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