• Title/Summary/Keyword: nanometer

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Nanoelectyomechanical Resonator Design and Performance Analysis

  • T. J. Kouh;Kim, D. H.;K. L. Ekinci
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2004.04a
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    • pp.538-541
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    • 2004
  • We describe a method for the detection of nanometer scale displacements of nanoelectromechanical resonators. We also present an analysis of the mechanical motion of these devices. We evaluate the effectiveness of the detection technique by detecting displacements from a series of nanomechanical doubly clamped beam resonators with decreasing dimensions.

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Nano-technology survey(1996) (1996년도 나노 테크놀로지 Survey)

  • Stout, K.J.
    • Journal of the Korean Society for Precision Engineering
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    • v.14 no.1
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    • pp.29-51
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    • 1997
  • The purpose of the survey is to identify possible new areas of research relating to nanotechnology and in particular areas in which the established facilities of the Centre for Metrology can be employed to good effect. This survey indicates that nanotechnology, a sub set of the more embracing Nano Science, is a rapidly developing discipline with good potential for Electronic and Mechanical Engineering. Nanotechnology includes three areas: Nanometrology, Nanometer positioning and Control, and Nanomanufacturing. In each of the areas, the current research situation and developing trends have been summarised. Possibilities for future work indicated.

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Modeling and optimal design of monolithic precision XYZ-stage using flexure mechanism (유연기구를 이용한 초정밀 단일체 3축 스테이지의 모델링 및 최적설계에 관한 연구)

  • Shim, Jong-Yeop;Gweon, Dae-Gab
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.22 no.4
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    • pp.868-878
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    • 1998
  • There are recently increasing needs for precision XYZ-stage in the fields of nanotechnology, specially in AFMs(Atomic Force Microscope) and STMs(Scanning Tunneling Microscope). Force measurements are made in the AFM by monitoring the deflection of a flexible element (usually a cantilever) in response to the interaction force between the probe tip and the sample and controlling the force neasyred constant topography can be obtained. The power of the STM is based on the strong distance dependence of the tunneling current in the vacuum chamber and the current is a feedback for the tip to trace the surface topography. Therefore, it is required for XYZ-stage to position samples with nanometer resolution, without any crosscouples and any parasitic motion and with fast response. Nanometer resolution is essential to investigate topography with reasonable shape. No crosscouples and parasitic motion is essential to investigate topography without any shape distortion. Fast response is essential to investigate topography without any undesirable interaction between the probe tip and sample surface ; sample scratch. To satisfy these requirements, this paper presents a novel XYZ-stage concept, it is actuated by PZT and has a monolithic flexible body that is made symmetric as possible to guide the motion of the moving body linearly. PZT actuators have a very fast response and infinite resolution. Due to the monolithic structure, this XYZ-stage has no crosscouples and by symmetry it has no parasitic motion. Analytical modeling of this XYZ-stage and its verification by FEM modeling are performed and optimal design that is to maximize 1st natural frequencies of the stage is also presented and with that design values stage is manufactured.

A Study on the Measurement for the Nano Scale Film Formation of Ultra Low Aspect Ratio

  • Jang Siyoul;Kong Hyunsang
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2004.11a
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    • pp.283-288
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    • 2004
  • The measurement of ultra low aspect ratio fluid film thickness is very crucial technique both for the verification of lubrication media characteristics and for the clearance design in many precision components such as MEMS, precision bearings and other slideways. Many technologies are applied to the measurement of ultra low aspect ratio fluid film thickness (i.e. elastohydrodynamic lubrication film thickness). In particular, in-situ optical interferometric method has many advantages in making the actual contact behaviors realized with the experimental apparatus. This measurement method also does the monitoring of the surface defects and fractures happening during the contact behavior, which are delicately influenced by the surface conditions such as load, velocity, lubricant media as well as surface roughness. Careful selection of incident lights greatly enhances the fringe resolutions up to $\~1.0$ nanometer scale with digital image processing technology. In this work, it is found that coaxial aligning trichromatic incident light filtering system developed by the author can provide much finer resolution of ultra low aspect ratio fluid film thickness than monochromatic or dichromatic incident lights, because it has much more spectrums of color components to be discriminated according the variations of film thickness. For the measured interferometric images of ultra low aspect ratio fluid film thickness it is shown how the film thickness is finely digitalized and measured in nanometer scale with digital image processing technology and space layer method. The developed measurement system can make it possible to visualize the contact deformations and possible fractures of contacting surface under the repeated loading condition.

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Morphology-dependent Nanocatalysis: Rod-shaped Oxides

  • Shen, Wenjie
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.130-131
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    • 2013
  • Nanostructured oxides are widely used in heterogeneous catalysis where their catalytic properties are closely associated with the size and morphology at nanometer level. The effect of particle size has been well decumented in the past two decades, but the shape of the nanoparticles has rarely been concerned. Here we illustrate that the redox and acidic-basic properties of oxides are largely dependent on their shapes by taking $Co_3O_4$, $Fe_2O_3$, $CeO_2$ and $La_2O_3$ nanorods as typical examples. The catalytic activities of these rod-shaped oxides are mainly governed by the nature of the exposed crystal planes. For instance, the predominant presence of {110} planes which are rich in active $Co^{3+}$ on $Co_3O_4$ nanorods led to a much higher activity for CO oxidation than the nanoparticles that mainly exposed the {111} planes. The simultaneous exposure of iron and oxygen ions on the surface of $Fe_2O_3$ nanorods have significantly enhanced the adsorption and activation of NO and thereby promoted the efficiency of DeNOx process. Moreover, the exposed surface planes of these rod-shaped oxides mediated the reaction performance of the integrated metal-oxide catalysts. Au/$CeO_2$ catalysts exhibited outstanding stability under water-gas shift conditions owing to the strong bonding of gold particle on the $CeO_2$ nanorods where the formed gold-ceria interface was resistant towards sintering. Cu nanoparticles dispersed on $La_2O_3$ nanorods efficiently catalyzed transfer dehydrogenation of primary aliphatic alcohols based on the uniue role of the exposed {110} planes on the support. Morphology control at nanometer level allows preferential exposure of the catalytically active sites, providing a new stragegy for the design of highly efficient nanostructured catalysts.

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The Effect of Nano-scale Zn-$TiO_2$ and Pure $TiO_2$ Particles were Prepared using a Hydrothermal Method on Zebrafish Embryogenesis (수열합성법으로 제조된 Zn-$TiO_2$ 나노입자와 $TiO_2$ 나노입자가 zebrafish 배발생에 미치는 영향)

  • Yeo, Min-Kyeong;Kim, Hyo-Eun
    • Environmental Analysis Health and Toxicology
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    • v.24 no.4
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    • pp.333-339
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    • 2009
  • In this study, we investigated the biological toxicity of nano-scale Zn (0.1, 0.5, and 1 mol%)-doped $TiO_2$ and pure $TiO_2$ nanoparticles using zebrafish embryogenesis as our model organism. Zn-doped $TiO_2$ nanoparticles were prepared using a conventional hydrothermal method for the insertion of zinc into the $TiO_2$ framework. The characters of Zn-doped $TiO_2$ (0.1%, 0.5%, 1%Zn) and pure $TiO_2$ were about 7~8 nm. These sizes were smaller than 100~200 nm of $TiO_2$ was prepared using the sol-gel method. Particularly, in this study, we found no significant biological toxicity in the hatching rate and abnormal rate under expose pure $TiO_2$ and Zn-doped $TiO_2$ nanoparticles were prepared using a conventional hydrothermal method of zebrafish. It was different from the biological damage under $TiO_2$ nanoparticles were prepared using sol-gel method. We assessed that the damage was not linked to the particle's nanometer size, but rather due to the prepare method. Moreover, $TiO_2$ nanoparticles were prepared using a hydrothermal method were not shown to cause cytotoxic effects, like apoptosis and necrosis, that are the major markers of toxicity in organisms exposed to nanomaterials. Therefore, there is some relationship with biological toxicity of nanoparticles and the prepare method of nanometer size particles.

Characterization of Supported Lipid Layers Using Atomic Force Microscopy (원자힘현미경을 이용한 지지 지질층의 특성규명)

  • Park, Jin-Won
    • Korean Chemical Engineering Research
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    • v.47 no.4
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    • pp.395-402
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    • 2009
  • The atomic force microscopy(AFM) has been used, as a powerful tool, to investigate physical properties of supported-lipid layers. Prior to the advent of the AFM, no observation was performed for the physical phenomena at the nanometer-scale. This microscope provides nanometer-scale morphology by scanning surfaces with the cantilever and presents force curve by monitoring the behavior of the cantilever that approaches to surface and retracts from the surface. From the morphology, the structures of the supported lipid layer and the effect of other molecules on the structures have been investigated. From the force curve, the surface properties-electrostatic and mechanical properties-of the supported lipid layers have been studied. In this article, characterization of the structure and surface properties of the supported lipid layer is explained. Future perspectives and direction are also discussed.

Preparation of $Ga_2O_3:Eu^{3+}$ phosphors by homogeneous precipitation (균일침전법에 의한 $Ga_2O_3:Eu^{3+}$ 형광체의 제조)

  • 천민호;박인용;이종원;김선태
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.3
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    • pp.149-156
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    • 2002
  • Europium-activated $Ga_2O_3$ phosphor powders were prepared by homogeneous precipitation method. The resulting powders were characterized by means of TG/DTA, XRD, FT-IR and SEM, Two kinds of powders formed were the crystalline GaOOH and the amorphous-like $\gamma$-$Ga_2O_3$ phases. When the urea concentration was below 0,5 M, rod-like micrometer-sized GaOOH powders were formed. They were transformed via $\alpha$-$Ga_2O_3$ to $\beta$-$Ga_2O_3$ phases under heat treatment. On the other hand, the nanometer-sized $\gamma$-$Ga_2O_3$ powders were formed with urea concentrations higher than 1.0 M, and they were directly changed into $\beta$-$Ga_2O_3$.Photoluminescence (PL) spectra were observed at room temperature, and PL intensities of nanometer-sized $Ga_2O_3$ : $Eu^{3+}$ powders around 610 nm were higher than those of micrometer-sized ones.

Application of Pulsed Plasmas for Nanoscale Etching of Semiconductor Devices : A Review (나노 반도체 소자를 위한 펄스 플라즈마 식각 기술)

  • Yang, Kyung Chae;Park, Sung Woo;Shin, Tae Ho;Yeom, Geun Young
    • Journal of the Korean institute of surface engineering
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    • v.48 no.6
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    • pp.360-370
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    • 2015
  • As the size of the semiconductor devices shrinks to nanometer scale, the importance of plasma etching process to the fabrication of nanometer scale semiconductor devices is increasing further and further. But for the nanoscale devices, conventional plasma etching technique is extremely difficult to meet the requirement of the device fabrication, therefore, other etching techniques such as use of multi frequency plasma, source/bias/gas pulsing, etc. are investigated to meet the etching target. Until today, various pulsing techniques including pulsed plasma source and/or pulse-biased plasma etching have been tested on various materials. In this review, the experimental/theoretical studies of pulsed plasmas during the nanoscale plasma etching on etch profile, etch selectivity, uniformity, etc. have been summarized. Especially, the researches of pulsed plasma on the etching of silicon, $SiO_2$, and magnetic materials in the semiconductor industry for further device scaling have been discussed. Those results demonstrated the importance of pulse plasma on the pattern control for achieving the best performance. Although some of the pulsing mechanism is not well established, it is believed that this review will give a certain understanding on the pulsed plasma techniques.

Electrical Characterization of Nanoscale $Au/TiO_2$ Schottky Diodes Probed with Conductive Atomic Force Microscopy

  • Lee, Hyunsoo;Van, Trong Nghia;Park, Jeong Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.290.1-290.1
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    • 2013
  • The electrical characterization of Au islands on TiO2 at nanometer scale (as a Schottky nanodiode) has been studied with conductive atomic force microscopy in ultra-high vacuum. The diverse sizes of the Au islands were formed by using self-assembled patterns on n-type TiO2 semiconductor film using the Langmuir-Blodgett process. Local conductance images showing the current flowing through the TiN coated AFM probe to the surface of the Au islands on TiO2 was simultaneously obtained with topography, while a positive sample bias is applied. The boundary of the Au islands revealed a higher current flow than that of the inner Au islands in current AFM images, with the forward bias presumably due to the surface plasmon resonance. The nanoscale Schottky barrier height of the Au/TiO2 Schottky nanodiode was obtained by fitting the I-V curve to the thermionic emission equation. The local resistance of the Au/TiO2 nanodiode appeared to be higher at the larger Au islands than at the smaller islands. The results suggest that conductive atomic force microscopy can be used to reveal the I-V characterization of metal size dependence and the electrical effects of surface plasmon on a metal-semiconductor Schottky diode at nanometer scale.

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