• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.264-265
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• 2003

광 회절한계를 극복한 기록밀도 향상 기술로 대두된 근접장 응용 정보저장기술은 차세대 광 정보저장의 핵심기술로 간주되고 있다. 근접장을 응용한 기술에는, 근접장 헤드구조의 관점에서, 근접장 효과 렌즈(SIL), 탐침형, 미소구멍레이저, 안테나 구조 등 나노크기 Aperture를 가지는 구조 등이 있다. 그러나 각각의 근접장 헤드구조에 적합한 특히, 탐침형 근접장 방식에 적합한 근접장 매체에 대한 활발한 연구는 아직 진행되고 있지 않다. (중략)

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.290-291
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• 2003

근접장 측정에서 가장 많이 쓰이는 근접장 광섬유 탐침은 몇가지 단점을 가지고 있다. 단점 중 하나는 광 전달율이 매우 낮다는 점이다. 전형적으로 근접장 광섬유 탐침의 aperture가 100nm일때 빛이 통과할 때의 광 전달율은 $10^{-5}$만큼 떨어진다. 그리고 sample과 probe간의 수십 nm의 근접장거리를 유지하기 위해 복잡한 장치가 필요하다는 점이다. 이러한 단점을 보완하여 본 연구실에서는 근접장 측정에서 핵심이 되는 근접장 광섬유 탐침의 새로운 개념인 나노 탐침 제작을 연구하였다. (중략)

• Transactions of the Korean Society of Mechanical Engineers A
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• v.30 no.12 s.255
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• pp.1557-1563
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• 2006

A scanning electron microscope (SEM) is well known as a measurement and analysis equipment in nano technology, being widely used as a crucial one in measuring objects or analyzing chemical components. It is equipped with an electron optical system that consists of an electron beam source, electromagnetic lenses, and a detector. The present work concerns numerical analysis for the electron optical system so as to facilitate design of each component. Through the numerical analysis, we investigate trajectories of electron beams emitted from a nano-scale field emission tip, and compare the result with that of experimental observations. Effects of various components such as electromagnetic lenses and an aperture are also discussed.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.4
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• pp.134-139
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• 2008

A spirally arrayed nano-pattern is designed as a model pattern for the next generation optical storage media. The pattern consists off types of embossed rectangular dot, which are 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The height of the dot is designed to be 50nm. The pitch of the spiral track of the pattern is 100nm. A ER(Electron resist) master for this pattern is fabricated by e-beam lithography process. The ER is first spin-coated to be 50nm thick on a Si wafer and then the model pattern is written on the coated ER layer by e-beam. After developing this pattern written wafer in the solution, a ER pattern master is fabricated. The most conventional e-beam machine can write patterns in orthogonal way, so we made our own pattern generator which can write the pattern in circular or spiral way. This program generates the patterns to be compatible with the e-beam machine from Raith(Raith 150). To fabricate 50nm pattern master precisely, a series of experiments were done including the design compensation for the pattern size, optimization of the dose, acceleration voltage, aperture size and developing. Through these experiments, we conclude that the higher accelerating voltages and smaller aperture size are better for mastering the nano pattern which is in order of 50nm. With the optimized e-beam lithography process, a spiral arrayed 50nm pattern master adopting PMMA resist was fabricated to have dimensional accuracy over 95% compared to the designed. Using this pattern master, a metal pattern stamp will be fabricated by Ni electro plating for injection molding of the patterned plastic substrate.

• Current Optics and Photonics
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• v.1 no.2
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• pp.157-162
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• 2017

In large liquid crystal displays, the image quality in an oblique viewing direction is a crucial issue. From this perspective, 8-domain polymer-stabilized vertical alignment (PS-VA) mode has been developed to suppress the color shift in oblique viewing directions, compared to that in 4-domain PS-VA mode. To realize the 8-domain PS-VA, the four domains in a pixel are each divided into two regions, such that applying different electric potentials result in different tilt angles in these two regions, while keeping four azimuthal directions in each domain. However, applying different voltages in a pixel causes drawbacks, such as requiring additional processes to construct a capacitor and a transistor, which will further reduce the aperture ratio. Here we propose a different approach to form the 8-domain, by controlling surface polar anchoring energy and the width of patterned electrodes in two regions of a pixel. As a result, the gamma-distortion index (GDI), measured at an azimuthal angle of $0^{\circ}$, is reduced by about 23% and 8%, compared to that of a conventional 4-domain at polar angles of $30^{\circ}$ and $60^{\circ}$ respectively.

• Proceedings of the KIEE Conference
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• 2001.11a
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• pp.47-49
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• 2001

We present experimental results on the multiplexed and stack-wise recording of near-field holograms. Experiments on angular multiplexing show that the angular selectivity of near-field hologram is better than that of the conventional hologram Experiments on stack-wise recording prove that near fields originated from sub-diffraction-limit-size objects could be stored in a photorefractive crystal at 2 mm apart from the crystal surface. In addition, to improve the data access and transfer time silicon nano-aperture array was introduced and applied to the near-field holographic storage.

• Current Optics and Photonics
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• v.4 no.1
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• pp.16-22
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• 2020

In high resolution imaging devices, smaller aperture in the color filter causes cross talk which provides incorrect information. Plasmonic color filters (PCFs) have been reported as an alternative of the conventional color resist based-color filter (CRCF) and many studies on PCFs demonstrated the filtering function by PCFs with a sub-micron size. In this work, we investigated the cross talk performance of PCFs compared to CRCFs. The effect of cross talk over distance from the filter were measured for each filter. Despite poorer spectral filtering characteristics, PCFs were more robust against cross talk than CRCFs. Also, the further away from the filter, the more cross talk appeared. As a result, PCFs showed less cross talk than CRCFs at about 82% of the results measured at a distance of 2~10 ㎛. This study will help to make practical use of PCFs in high-resolution imaging applications.

• Journal of the Optical Society of Korea
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• v.5 no.4
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• pp.136-139
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• 2001

We investigated a high-output ower, periodically poled lithium niobate(PPLN) optical parametric oscillator(OPO) pumped by a Q-switched Nd:YAG laser. Given the low optical damage threshold and the limited aperture (0.5mm thick) of PPLN, we tried to maximize the signal output power in a linear cavity consisting of two flat mirrors with a loosely focused pump beam. It is found that this simple cavity structure allowed a robust OPO operation, which was not sensitive to alignment compared with the conventional ones using concave mirrors. A maximum energy of 100$\mu$J/pulse was achieved for the signal at 1.36${\mu}{\textrm}{m}$, while the oscillation threshold was 0.3 mJ/pulse for the pump at 1064 nm.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.19 no.5
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• pp.1040-1046
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• 2015

With the rapid progress of electronics and radio communication technology, human enjoys greater freedom in information communication. However, EMW (Electro-Magnetic Wave) environments have become more complicate and difficult to control. Thus, international organizations, such as the American National Standard Institution (ANSI), Federal Communications Commission (FCC), the Comite Internationale Special des Perturbations Radio Electrique (CISPR), etc, have provided standard for controlling the EM wave environments and for the countermeasure of the electromagnetic compatibility (EMC). In this paper, the status of EMW absorbers and the goal of smart EMW absorber in the future were described. Furthermore, design method of the smart EM wave absorber with heat radiating function was suggested. The designed smart EM wave absorber has the absorption ability of more than 20 dB from 2 GHz to 2.45 GHz band, the optimum aperture (hole) size, the adjacent hole space, and the thickness of which were 6 mm, 9 mm, and 6.5 mm, respectively. Thus, it is respected that these results can be applied as various EMC devices in electronic, communication, and controlling systems.

• Polymer(Korea)
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• v.29 no.4
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• pp.418-421
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• 2005

Three-dimensional (3D) microfabrication process using two-photon polymerization (TPP) is developed to fabricate the curved microstructures in a layer, which can be applied potentially to optical MEMS, nano/micro-devices, etc. A 3D curved structure can be expressed using the same height-contours that are defined by symbolic colors which consist of 14 colors. Then, the designed bitmap figure is transformed into a multi-exposure voxel matrix (MVM). In this work a multi-exposure voxel matrix scanning method is used to generate various heights of voxels according to each laser exposure time that is assigned to the symbolic colors. An objective lens with a numerical aperture of 1.25 is employed to enlarge the variation of a voxel height in the range of 1.2 to 6.4 um which can be controlled easily using the various exposure time. Though this work some 3D curved micro-shapes are fabricated directly to demonstrate the usefulness of the process without a laminating process that is generally required in a micro-stereolithography process.