• Journal of the Korean Society for Precision Engineering
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• v.21 no.2
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• pp.210-217
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• 2004

In this study, a new process, named as nano replication printing(nRP) process, is developed for printing any figure in the range of several micrometers by using voxel matrix scanning scheme. In this newly developed process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid resin according to a voxel matrix which is transformed from bitmap format file. After the polymerization, a droplet of ethanol is dropt to remove the unnecessary remaining liquid resin and then the polymerized figures with nano-scaled precision are only remaining on the glass plate. By the nRP process, any figure file of bitmap format could be reproduced as nano-scaled precision replication in the range of several micrometers. Also, nano/micro-scaled patterns for an extremely wide range of applications would become a technologically feasible reality. Some of figures with nano-scaled precision were printed in scaled replication as examples to prove the usefulness of this study.

• Journal of the Korean Society for Precision Engineering
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• v.29 no.10
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• pp.1144-1148
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• 2012

Process conditions for generating nano patterns handle different process according to the pattern characteristics, and different process data according to patterns in questions. To efficiently find optimal process conditions for generating nano patterns, process data by experiment is needed consideration of the pattern characteristics concerning the equipment. In particular, coating methods of a cylindrical mold differ from it of a flat plate because of viscosity of coating materials. Also the coating thickness affects nano process and pattern line width. So coating method of coating thickness for cylindrical mold is very important on nano pattern generating. In this study, a method is proposed for coating Photo Resist through the spray in order to coat cylindrical mold and measuring the thickness of coating using measuring tip considering the size of cylindrical mold because there is no method in the existing SEM. The proposed method is applied to a real printed electronics system to verify its accuracy and efficiency.

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.05a
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• pp.16.1-16.1
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• 2006

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.11a
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• pp.15.1-15.1
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• 2006

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.05a
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• pp.17.1-17.1
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• 2006

• Journal of Institute of Control, Robotics and Systems
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• v.14 no.4
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• pp.332-335
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• 2008

PMMA light guiding plate with nano pattern was fabricated by nano imprint lithography method. A silicon mold for electroplating of nickel was fabricated by conventional photolithography process. A nickel stamp for nano imprint lithography was fabricated by electroplating process using silicon mold. The nano imprint lithography was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM. It is shown that the patterns were well transferred for several steps and the nano imprint lithography method could be applied for fabricating patterns of light guiding plate.

• Proceedings of the KSME Conference
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• 2003.11a
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• pp.1888-1891
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• 2003

In this paper, we proposed a new method to control the length of carbon nano tube in the single CNT probe. A single CNT probe was composed of a tungsten tip made by the electrochemical etching and carbon nano tube which was grown by CVD and prepared through the sonication. The two components were attached with the carbon tape. Since the length of CNT can not be controlled during the manufacturing, the post process is needed to shorten the CNT. In this paper, we proposed the method of electrochemical process. The process was done under the optical microscope and the results were checked by SEM. The diameter of the carbon nano tube used in this paper was about 130nm because the above process had to be done with the optical microscope. Using the method proposed in this paper, we can control the length of the nano tube tip.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.126-127
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• 2006

In this study, nano grain W is fabricated by Severe Plastic Deformation-Powder Metallurgy (SPD-PM) process. W powder and W-Re powder mixtures are processed by SPD-PM process, a Mechanical Milling (MM) process. As results, a nano grain structure, whose grain size is approximately 20nm, is obtained in W powder after MM for 360ks. A nano grain W compact, whose grain size 630nm, has excellent deformability above 1273K. A nano grain W-10Re compact is composed of equiaxed grain, a grain growth is restrained and has low dislocation density after the large deformation; therefore it is considered that W-Re compact shows superplasticity.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.25 no.1
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• pp.95-103
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• 2015

Objectives: This study was conducted in order to better understand the conceptual model and Stoffenmanager nano module and apply it to the synthesis and packing processes of nanomaterials. Methods: Site visits were conducted to five nanomaterial production processes. Product and exposure variables were investigated in these workplaces. Hazard banding and exposure classification of the synthesis and packing processes of nanomaterials were conducted using documents and the website of Stoffenmanager Nano. Results: The five sites featured different products, packing tasks, ventilation and local exhaust, and others. The hazards for nano-nickel and copper were classified as E. The hazards for both fumed silica and indium tin oxide were classified as D. The hazard for spherical silica was classified as C. The exposure classes in the synthesis process of nanomaterials ranged from 2 through 4. The exposure classes in the packing process of nanomaterials ranged from 1 through 4. Conclusions: Application of Stoffenmanager nano to the synthesis and packing processes of nanomaterials helped to better understand the control level of the work environment and to suggest appropriate actions. The comparison of each process showed the effect of the production process and handling of solids and ventilation on exposure class.

• Transactions on Electrical and Electronic Materials
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• v.13 no.1
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• pp.31-34
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• 2012

The addition of nano/micro silica into unsaturated polyester resin (UPR) results in the improvement of the electrical properties of Silica-UPR composites. The surface, volume resistivity, dielectric strength, dissipation factor and dry arc resistivity of nano silica-UPR composites were found to improve significantly. The effects of the nano and micro fillers in UPR have been evaluated. They are presented in this paper. To evaluate the electrical properties of the nano & micro composites, all the measurements were done as per the prescribed methods in ASTM. It was observed that the addition of nano silica improves the electrical properties as compared to micro silica. The better dispersion of silica particles in unsaturated polyester resin enhances the electrical properties of silica-UPR composites.