• Title/Summary/Keyword: metal ion effect

검색결과 511건 처리시간 0.032초

Copper ion Toxicity Causes Discrepancy between Acetate Degradation and Methane Production in Granular Sludge

  • Bae, Jin-Woo;Rhee, Sung-Keun;Jang, Am;Kim, In-S.;Lee, Sung-Taik
    • Journal of Microbiology and Biotechnology
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    • 제12권5호
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    • pp.849-853
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    • 2002
  • Metal ions have an adverse effect on anaerobic digestion. In an acetate degradation test of upflow of anaerobic sludge blanket granules with $Cu^{2+}$, not all of the acetate that disappeared was stoichiometrically converted to methane. In the presence of 400 mg/g-VSS (volatile suspended solids) $Cu^{2+}$, only 26% of the acetate consumed was converted to methane. To study acetate conversion by other anaerobic microorganisms, sulfate and nitrate reductions were investigated in the presence of $Cu^{2+}$ Sulfate and nitrate reductions exhibited more resistance to $Cu^{2+}$than methanogenesis, and the granules reduced 2.2 mM and 5.4 mM of nitrate and sulfate, respectively, in the presence of 400 mg/g-VSS copper ion. However, the acetate degraded by sulfate and nitrate reductions was only 24% of the missing acetate that could have been stoichiometrically converted to $CO_2$. Accordingly, 76% of the acetate consumed appeared to have been converted to other unknown compounds.

Epitaxial growth of Pt Thin Film on Basal-Plane Sapphire Using RF Magnetron Sputtering

  • 이종철;김신철;송종환;이충만
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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    • pp.41-41
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    • 1998
  • Rare earth metal films have been used as a buffer layer for growing ferroelectric t thin film or a seed layer for magnetic multilayer. But when it was deposited on s semiconductor substrates for the application of magneto-optic (MO) storage media, it i is difficult to exactly measure magnetic cons떠nts due to shunting current, and so it n needs to grow metal films on insulator substrate to reduce such effect. Recently, it w was reported that ultra-thin Pt layer were epitaxially grown on A12O:J by ion beam s sputtering in 비떠 high vacuum and it can be used as a seed layer for the growth of C Co-contained magnetic multilayer. In this stu$\phi$, Pt thin film were epi떠xially grown on AI2D3 ($\alpha$)OJ) by RF magnetron s sputtering. The crystalline structure was analyzed by transmission electron microscope ( (TEM) and Rutherford Back Scattering (RBS)/Ion Channeling. In TEM study, Pt was b believed to be twinned on AI잉3($\alpha$)01) su$\pi$ace about Pt(ll1) plane.Moreover, RBS c channeling spectra showed that minimum scattering yield of Pt(111)/AI2O:J(1$\alpha$)OJ) was 4 4% and Pt(11J)/AI2D3($\alpha$)OJ) had 3-fold symmetry.

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Effect of wet/dry transition on the atmospheric corrosion of Zn (아연의 대기부식에 미치는 주기적 침적/건조 효과)

  • Kim, Ki-Tae
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 한국표면공학회 1998년도 춘계학술발표회 초록집
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    • pp.3-3
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    • 1998
  • The atmospheric corrosIOn properties of Zinc (Zn) under wet/dry transition of $H_20$ film were investigated in this study. The atmospheric corrosion of metal is usually occurred as a result of repetitious thickness transition (so called wet/dry transition) of liquid phase which is covering the metal surface. Corrosion potential and the polarization behaviour of Zn during liquid film thickness transition were measured by Kelvin probe method which IS using vibrating reference electrode without touching the liquid film. The oxidized states of Zn as a result of successive wet/dry transition were also investigated by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The results show that the corrosion potential and the corrosIOn rate of Zn both are increasing during drying. However, the corrOSIon rate is decreasing again when the Zn surface is completely dried while the corrosion potential still remains high. This behaviour can be explained by the polarization behaviour change of Zn according to the $H_20$ film thickness change. The completely dried surface is consisted mostly with Zn and ZnO phases. After a number of cycles of wet/dry transition, however, the oxidized Zn phase of ${\varepsilon}-Zn(OH)_2$, which has rather voluminous and defected structure, were found.

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Separation of Zinc Ion from Metal Plating Wastewaters by Reverse Osmosis Membrane (Membrane을 이용한 도금폐수 중 아연이온의 분리에 관한 연구)

  • 장자순;이효숙;정헌생;이원권
    • Membrane Journal
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    • 제4권2호
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    • pp.106-112
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    • 1994
  • The ultrafiltration(UF) and reverse osmosis(RO) tests for a model metal plating wastewater prepared with zinc sulfate, showed the zinc ion rejection coefficient of over 99% and the permeate flux of $1.49 {\times} 10^{-3}cm/sec$ at pH = 8.3. The effect of cyanide on the zinc removal was investigated. When the amount of cyanide addition was same the zinc content, the zinc was removed over 99% and the cyanide was excluded about 93%. The addition of the surfactants such a LAS-Na and EDTA-Na was found to reduce the permeate flux down to $0.76 {\times} 10^{-3}cm/sec$ at the RO membrane.

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Preparations of the Cross-linked Chitosan Based on a Marine Natural Product with Epichlorohydrine for the Exclusion of Heavy Metal Ions from the Various Wastewater and Its Effect of Crosslinking Ratio (각종 폐수로부터 중금속 이온을 제거하기 위한 Epichlorohydrine-가교키토산의 제조 및 가교도의 효과)

  • Park, Young-Mi;Jeon, Dong-Won
    • Fashion & Textile Research Journal
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    • 제8권5호
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    • pp.577-584
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    • 2006
  • The binding of heavy metal ions onto cross-linked chitosan in dilute aqueous solution has been investigated as a function of pH (4.0 and 7.0), agitation period (10-180min) and concentration of various metal cations (5, 10, 50 and 100ppm). In order to obtain adsorbents that are insoluble and stable, and prevent the dissolution loss of chitosan into an acidic aqueous solution, chitosan flakes were cross-linked with epichlorohydrine (ECH) and its adsorption behavior was compared with that of the non cross-linked chitosan. An advantage of ECH is that it does not eliminate the cationic amine functional group of chitosan. In terms of adsorption ratio, the chitosan cross-linked at an ECH was inferior to original chitosan and was found that chitosan has a selectivity much remarkable than the cross-linked chitosan in low concentrated metal solutions. However, no significant decreases in the adsorption ratios were observed between the cross-linked ECH-chitosan and the non cross-linked chitosan concerning the adsorption of $Ni^{2+}$, $Co^{2+}$, $Pb^{2+}$ and $Zn^{2+}$ acidic solution.

Removal of Heavy Metals by Cladophora sp. in Batch Culture: The Effect of Wet-mixed Solidified Soil (loess) on Bioremoval Capacities

  • Kim, Jin-Hee;Lee, Kyung-Lak;Kim, Sook-Chan;Kim, Han-Soon
    • Korean Journal of Ecology and Environment
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    • 제40권4호
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    • pp.537-545
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    • 2007
  • The heavy metal removal capacity of filamentous green alga Cladophora sp. cultured together with wet-mixed solidified soil (loess) was tested. A Cladophora sp. was cultured for 5d, with added Chu No. 10 medium, in stream water contaminated by high concentration of heavy metals from a closed mine effluent. Heavy metal ion concentrations of the medium and in algal tissue were measured every day during the experiment. Dissolved metals (Al, Cd, Cu, Fe, Mn, Zn) in medium were rapidly removed (over 90% elimination) within 1-2d when alga and loess were added. Dissolved heavy metals dropped by only 10% when algae were cultured without loess. The Cladophora sp. accumulated much more heavy metals when cultured with loess than when the alga was cultured alone. Cladophora sp. exhibited a maximum uptake capacity for Al ($17,000{\mu}g^{-1}$ algal dry weight). The metal bioremoval capacities of the algae were in the order Al, Fe, Cu, Mn, Zn and Cd. The heavy metal removal capacity of Cladophora sp. showed significant increases when wet-mixed solidified soil was added to culture media.

The Effect of Carbon on the Hot Corrosion of lron by Sulfur Containing Environment. (철의 고온 황화부식에 미치는 탄소의 영향)

  • 최성필;강성군;백영남
    • Journal of the Korean institute of surface engineering
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    • 제21권2호
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    • pp.53-67
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    • 1988
  • The high temperature corrosion of Fe-C alloys were studied at I atm SO gas in the temperature range 500~80$0^{\circ}C$ by means of a thermogravimetric analysis. The Na2SO4 induced high tempwrature corrosion rate was also measured at atm O2 gas under above the temperature renge. The reaction products were identified with the aid of X-ray diffraction technique, and micostruction of the alloy/scale interface was observed with a optical microscope and SEM. The experimental results were disussed by the themodeynamic calcutions. Under above the experimental condition. the reaction rates decrbon with increasing carbon content. The transfer of Fe ion was limited by a residue of carbon precipitated at alloy scale interface due to the oxidation of Fe-C alloys at alloy surface. The effect of cold working on reaction rate was different between the Fe containing low carbon and Fe-C Alloy containing carbon above 0,73 wt%. In a cold worked iron containing low carbon content, the crystallization of metal surface leads to the poor adherence between the alloy and the cavity formed between the alloy and scale. The outward diffusion of ion through the scale is estimated to be hindered by the cavity formed between the scale, consequently decreasing reaction rate. In the case Fe-C containing carbon above 0.73 Wt% alloy, the reaction rate was little affected by cold working, because the effect of content on reaction rats is greater than the effect of cold working.

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Ion Beam-based Surface Modification of Polyimide Films for Adhesion Improvement with Deposited Metal Layer

  • Cho, Hwang-Woo;Jung, Chan-Hee;Hwang, In-Tae;Choi, Jae-Hak;Nho, Young-Chang
    • Journal of Radiation Industry
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    • 제4권4호
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    • pp.335-339
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    • 2010
  • In this study, the surface of polyimide (PI) films was modified using ion implantation to enhance its adhesion to a deposited copper (Cu) layer. The surfaces of the PI films were implanted with 150 keV $Xe^+$ ions at fluences varying from $1{\times}10^{14}$ to $1{\time}10^{16}ions\;cm^{-2}$. The Cu layers were then deposited on the implanted PI. The surface properties of the implanted PI film were investigated based on the contact angle measurements, Fourier transform infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Furthermore, the adhesive strength between the deposited Cu layer and PI film was estimated through a scratch test using a nanoindenter. As a result, the surface environment of the PI film was changed by the ion implantation, which could have a significant effect on the adhesion between the deposited Cu layer and the PI.

Removal of Co++ Ion in the Hollow Fiber Ultrafiltration System using Anion Surfactant Micellar Enhancement (음이온 계면활성제 미셀형성을 이용한 중공사 한외여과막 시스템에서의 코발트(Co)이온 제거)

  • Yang, Hyun-Soo;Han, Kwang-Hee;Choi, Kwang-Soon
    • Applied Chemistry for Engineering
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    • 제7권1호
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    • pp.109-117
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    • 1996
  • Removal of metal ions on the ultrafiltration membrane with micellar-enhanced with anion surfactants is a recently developed technique which can remove heavy metals and small molecular weight ions from wastewater with simple separation process and without a phase change. Above a certain concentration, so called the critical micelle con binding cationic cobalt ions and anionic surfactants, were removed by ultrafiltration membrane. The transmembrane pressure difference had a relatively small effect on the rejection coefficient of metal ions on the ultrafiltration membrane whereas the level of anionic surfactant-to-metal ratio (S/M) had a substantial effect.

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Effect of the fixed oxide charge on the metal-oxide-silicon-on-insulator structures (metal-oxide-silicon-on-insulator 구조에서 고정 산화막 전하가 미치는 영향)

  • Jo, Yeong-Deuk;Kim, Ji-Hong;Cho, Dae-Hyung;Moon, Byung-Moo;Koh, Jung-Hyuk;Ha, Jae-Geun;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.83-83
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    • 2008
  • Metal-oxide-silicon-on-insulator (MOSOI) structures were fabricated to study the effect caused by reactive ion etching (RIE) and sacrificial oxidation process on silicon-on-insulator (SOI) layer. The MOSOI capacitors with an etch-damaged SOI layer were characterized by capacitance-voltage (C-V) measurements and compared to the sacrificial oxidation treated samples and the reference samples without etching treatment. The measured C-V curves were compared to the numerical results from 2-dimensional (2-D) simulations. The measurements revealed that the profile of C-V curves significantly changes depending on the SOI surface condition of the MOSOI capacitors. The shift in the measured C-V curves, due to the difference of the fixed oxide charge ($Q_f$), together with the numerical simulation analysis and atomic force microscopy (AFM) analysis, allowed extracting the fixed oxide charges ($Q_f$) in the structures as well as 2-D carrier distribution profiles.

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