• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2003년도 춘계학술대회 논문집
• /
• pp.612-615
• /
• 2003

Maskless laser patterning process is developed using 3rd harmonic Diode Pumped Solid State Laser with near visible wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and polymer optical property to gain the optimal conditions. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8${\mu}{\textrm}{m}$ width and 5.4${\mu}{\textrm}{m}$ height. This process could be applied to fabricate a single mode waveguide without expensive mask projection method.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2003년도 춘계학술대회 논문집
• /
• pp.628-631
• /
• 2003

This study describes a new mastless nano-fabrication technique of Pyrex 7740 glass using the combination of nanomachining by nano-indenter XP and HF wet etching. First, the surface of a Pyrex 7740 glass specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by HF solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact. some sample structures were fabricated.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 1996년도 하계학술대회 논문집 C
• /
• pp.1980-1981
• /
• 1996

Laser direct dry etching is a new technique in semiconductor processing which has a lot of advantage, including decrease of etching-induced damage, maskless, photoresistiess, and high selectivity. This study presents characteristics of a laser direct dry etching for $Al_{0.3}Ga_{0.7}As/GaAs$ multi-layer structures for the first time. In this study, we were able to obtain the unusual aching profiles. The cross sectional analysis of etched groove was peformed for reaction characteristics and their applications.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.209.2-209.2
• /
• 2014

In recent years, researches about hydrophobic and hydrophilic surfaces have been executed however their other effects have not been researched enough. In this paper, the fabrication method of hierarchical structures of micro line array combined with fluorinated wax for anisotropic superomniphobic wettability is presented. We have achieved anisotropic and superomniphobic surface via simple two step methods, which are maskless photolithography and wax deposition. In order to prove how to provide those characteristics, SEM, contact angle measurement tool and X-ray diffraction are used. Fluorinated wax is crystalized self-assembly and it is subordinated on micro line array so that it is able to display anisotropic wettability. Understanding on anisotropic superomniphobic surface and simple fabrication method has been attracted to apply for lots of applications which range from self-cleaning surface, microfluidic chip, to directionally fluid control device, even in oily fluid.

• 한국정밀공학회지
• /
• 제22권7호
• /
• pp.71-78
• /
• 2005

The purpose of this study is to suggest a hyperfine maskless writing technique by using the nanoindentation and HF wet etching technique. Indents were made on the surface of Pyrex7740 glass by the hyperfine indentation process with a Berkovich diamond indenter, and they were etched in $50\;wr\%$ HF solution. After etching process, convex structure was obtained due to the deformation-induced hillock phenomena. In this study, effects of indentation process parameters (etching time, normal load, loading .ate, hold-time at the maximum load) on the morphologies of the indented surfaces after isotopic etching were investigated from an angle of deformation energies. Finally, sample characters were written to show the possibility of the application.

• 한국정밀공학회지
• /
• 제20권12호
• /
• pp.42-47
• /
• 2003

The laser direct writing method has some advantages of being maskless, allowing rapid and inexpensive prototyping in comparison to conventional mask-based photolithography. In general, there are two kinds of laser direct writing methods such as the laser ablation method and the laser polymerization method. The laser polymerization method was studied fur manufacturing waveguide in this paper. It is important to reduce line width for image mode waveguides, so some investigations will be carried out in various conditions of process parameters such as laser power, writing speed, focusing height and optical properties of polymer. Experimentally, the optical waveguide was manufactured trapezoid shape. Through SEM the waveguide was 20 ${\mu}{\textrm}{m}$ width and 7.4 ${\mu}{\textrm}{m}$ height.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
• /
• pp.1272-1273
• /
• 2009

We demonstrate conformal phosphor coating and patterning methods on light emitting diodes (LEDs) using image processing based optofluidic maskless lithography (IP-OFML) system in microfluidic channels. IP-OFML allows a real-time detection and dynamic mask generation for packaging of randomly dispersed microchips. Our system detects each chip by considering rotation of the chip through image processing regardless of their arrangement error. Therefore, it precisely packages the chip making conformal polymer layer.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
• /
• pp.99-102
• /
• 1999

A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2000년도 하계학술대회 논문집 C
• /
• pp.2257-2259
• /
• 2000

This paper reports on the design, fabrication and driving experiment of micro mirror array(MMA) for lithography process to apply to biochip fabrication Photolithography technology is applied to activate specific area on the surface of modified glass surface, DNA monomers are bound on the activated area of the glass surface. After repeat of DNA monomer synthesizing process, DNA single strand probes could be solid-synthesized on the glass substrate. Without using photomask, photolithography process is tried using micro mirror array(MMA). Photomask or mask alignment is not required in maskless photolithography process using micro mirror array.

• 한국공작기계학회:학술대회논문집
• /
• 한국공작기계학회 2002년도 추계학술대회 논문집
• /
• pp.274-279
• /
• 2002

In this paper, the development process of an unique and creative micro/nano-structure fabrication technique based on micro/nano-tribology are reviewed and discussed. The so-called Mechano-Chemical Process(MCP), which has been developed since 1995 by Tribology Research Laboratory at Yonsei University with the motivation to overcome the demerits of the conventional photolithographic techniques, is based on the fundamental understanding of the interaction between the tool tip and the workpiece surface. This process is a maskless process which offers tremendous flexibility in surface patterns that can be created on a workpiece surface without using any capital intensive equipment. It Is capable of fabricating the prototypes of micro/nano-components, micro- structured surface with various geometries, micro-molds for making polymer or metal parts, and micro-fluidic channels for lab-on-a- chip