• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.173.2-173.2
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• 2014

Thin nitride thin films were synthesized by reactive radio-frequency magnetron sputtering in the ultra high vacuum (UHV) chamber. To control the characteristics of thin films, tin nitride thin films were obtained various argon and nitrogen gas mixtures, especially low nitrogen gas ratios. Tin nitride thin films were analyzed with alpha step, scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and 4 point probe measurement. The result of alpha step and SEM showed that the thickness of thin nitride thin films were decreased with increasing nitrogen gas ratios. The metallic tin structure was decreased and the amorphous tin nitride structure were observed by XRD with higher nitrogen gas ratios. The oxidation state of tin and nitride were studied with high resolution Sn 3d and N 1s XP spectra.

• Tribology and Lubricants
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• v.10 no.3
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• pp.29-38
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• 1994

The friction and wear of mild steel at dry sliding surfaces under different vacuum conditions have been investigated to understand the wear mechanisms. For the test, a ball-ondisk typed wear-rig has been built and implemented, allowing control of sliding speed, load and vacuum. Results show that, at a high sliding velocity, friction of low carbon steel (SS41) under a high vacuum is much higher than that of ambient condition and wear is much severer. It is due to lack of effective oxidation film formation on which steel surfaces could protect themselves against the severe wear. It has been shown, however, that there is a critical regime with contact conditions (at a low sliding velocity, a low load, and under a medium vacuum) at which effective, protective films of low carbon steel have been built on the surfaces in a friction process with a self-regulating way, resulting in both very low coefficients of friction (about 0.3) and mild wear. In order to investigate the protective films on steel surfaces, the worn surfaces and the wear debris have been experimentally analyzed with SEM, AES/SAM and XRD. A theoretical analysis of frictional heating at sliding surfaces, and an experimental analysis of the influence of oxidation wear under various vacuum conditions are described. The important variables on which self-formations of protective films at dry sliding surfaces depend, and the wear mechanisms are also investigated.

• Journal of the Korean Wood Science and Technology
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• v.36 no.3
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• pp.17-23
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• 2008

The purpose of this study is to estimate the shrinkage of wood by LV-SEM (Low-Vacuum Scanning Electron Microscope) which can observe wetted wood sample. The shrinkage of small sample specimen by the dehumidification in the specimen chamber was investigated and compared with that of normal wood specimen. The observation of cross sectional surface of wood from wetted condition to dried condition can be achieved in about twenty minutes by means of the dehumidification in the specimen chamber of LV-SEM. The volumetric shrinkage of earlywood was almost the same as that of latewood. The shrinkage of SEM observation specimen was similar to that of normal wood specimen. From the correlation of the shrinkages between SEM observation specimen and normal wood specimen, it is surmised that the shrinkage of wood is more strictly dominated by shrinkage of latewood than that of earlywood.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 1994.11a
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• pp.39-45
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• 1994

Combustion characteristics of the solid composite propellants were studied from burning rate, ignition and steady combustion processes, and structure of the extinguished surfaces. Optical Vacuum Strand Burner (OVSB) system was desisted and configured to study those. Burning rates of the propellants were measured by OVSB at low pressure range by developed ten method. video camera(30 frames/s) was used to take potographs of the phenomena of ignition and combustion of propellant within the test cell of the OVSB. Burning surfaces of the propellants that were extinguished by rapid depressurization method were analyzed with Scanning Electron Microscope. (SEM).

• Journal of the Korean Vacuum Society
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• v.7 no.s1
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• pp.37-43
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• 1998

The mechanism of interaction between low energy ions and biological organisms has been paid much attention recently. In order to clarify the microstructural response to low energy ion irradiation embryonic cells of Paeonia rockii L. implanted by $Fe^{1+}$ ions with the energy of 80KeV were investigated by Optical Microscopy (OM), Scanning electron Microscopy(SEM) and Transmission Electron Microscopy(TEM). At the dose of 1$\times$1015 ions/$\textrm{cm}^2$, apparent cellular damage was observed in the outer several layers of the radicle. The shape of the cells was obviously deformed from regular polygon to irregular. The cell walls became obscure. SEM micrographs showed that the surface of the radicle was etched severely. It was observed by TEM that nucleus of the implanted cell was elongated and tended to fracture. Nuclear envelope lost its integrity. The implanted $Fe^{1+}$ ions were detected by Energy Dispersive Spectroscopy (EDS). These observations showed that low energy ions could damage to the plant organisms with the thickness of about 30~50$\mu\textrm{m}$. The possible reasons for radiation damage in the biological organisms were discussed.

• Journal of the Korean Vacuum Society
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• v.11 no.1
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• pp.16-21
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• 2002

Selective epitaxial growth(SEG) of silicon were performed at low temperature under an ultraclean environment below $1000^{\circ}C$ using ultraclean $Si_2H_6$ and $H_2$ gases ambient in low pressure chemical vapor deposition(LPCVD). As a result of ultraclean processing, epitaxial Si layers with good quality were obtained for uniform and SEG wafer at temperatures range 600~$710^{\circ}C$ and an incubation period of Si deposition only on $SiO_2$ was found. Low-temperature Si selectivity deposition condition and epitaxy on Si were achieved without addition of HCl. The epitaxial layer was found to be thicker than the poly layer deposited over the oxide. Incubation period prolonged for 20~30 sec can be obtained by $O_2$addition. The surface morphologies & cross sections of the deposited films were observed with SEM, The structure of the Si films was evaluated XRD.

• Korean Journal of Materials Research
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• v.21 no.10
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• pp.542-545
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• 2011

Half-Heusler alloys are a potential thermoelectric material for use in high-temperature applications. In an attempt to produce half-Heusler thermoelectric materials with fine microstructures, TiCoSb was synthesized by the mechanical alloying of stoichiometric elemental powder compositions and then consolidated by vacuum hot pressing. The phase transformations during the mechanical alloying and hot consolidation process were investigated using XRD and SEM. A single-phase, half- Heusler allow was successfully produced by the mechanical alloying process, but a minor portion of the second phase of the CoSb formation was observed after the vacuum hot pressing. The thermoelectric properties as a function of the temperature were evaluated for the hot-pressed specimens. The Seebeck coefficients in the test range showed negative values, representing n-type conductivity, and the absolute value was found to be relatively low due to the existence of the second phase. It is shown that the electrical conductivity is relatively high and that the thermal conductivities are compatibly low in MA TiCoSb. The maximum ZT value was found to be relatively low in the test temperature range, possibly due to the lower Seebeck coefficient. The Hall mobility value appeared to be quite low, leading to the lower value of Seebeck coefficient. Thus, it is likely that the single phase produced by mechanical alloying process will show much higher ZT values after an excess Ti addition. It is also believed that further property enhancement can be obtained if appropriate dopants are selectively introduced into this MA TiCoSb System.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.369.2-369.2
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• 2014

Diamond-like Carbon(DLC) films doping Si were deposited by linear ion source(LIS)-physical vapor deposition method on Si wafer. We have studied the effects of Si content on friction and wear properties of DLC films and the characteristics of the films were investigated using Nano-indentation, Micro raman spectroscopy, Field Emission-Scanning Electron Microscope (FM-SEM) and X-ray Photoelectron Spectroscopy (XPS). The films has been various low-friction and low-stress by varying the flow rates of silane gas. Under the about 2% of Si doping is very suitable for improving the adhesion of films and reducing internal stress while maintaining the surfaces hardness of DLC films. Linear ion source (LIS)를 사용하여 Si wafer위에 Si 이온이 첨가된 DLC 박막을 증착하였다. 참가된Si 이온의 양에 따라 DLC 박막에 미치는 영향을 분석하기 위하여 마찰 계수 및 경도를 비교하였고, Micro raman spectroscopy, Field Emission-Scanning Electron Microscope (FM-SEM) and X-ray Photoelectron Spectroscopy (XPS)를 통하여 표면 상태를 분석하였다. 천체 주입된 가스량의 약 2%까지 Si 이온 주입이 늘어날수록 DLC 박막의 마찰계수는 낮아졌고, 경도는 Si 이온이 주입되지 않았을 경우와 비슷한 값(약 20~23 GPa)을 가졌다. 2% 이상의 주입량에서는 마찰계수는 주입량이 늘어날수록 높아졌으며 경도는 떨어지는 경향을 보였다. 이는 Si이온이 2%이하로 첨가되었을 경우, DLC 박막의 생성시 탄소 이온들의 결합 Stress를 줄여 마찰계수가 줄어든다고 볼 수 있으며, 그 양이 2%이상이 되면 오히려 불순물로 작용하여 DLC 박막의 Stress는 급격히 증가하고 마찰계수도 높아짐을 알 수 있다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.05a
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• pp.123-128
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• 1996

As electrode materials like as Cu-Pb, Cu-Bi, WC-Ag, W-Ag for vacuum circuit breaker have high chopping current or bad insulation-recovery characteristics, it can affect induction machinery like as transformer and motor. To produce low surge electrode material, it have been suggested Co-Ag-Te electrode which were infiltrated with Ag-Te intermetallic compound into sintered Co matrix in vacuum. In this paper, we would like to represent that production method and microstructure of Co-Ag-Te electrode material in each condition. The microstructure and characteristics of Ag-Te intermetallic compound and Co-(Ag-Te) electrode were investigated by using optical microscope, SEM, XRD, EPMA.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.71-71
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• 2010

Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different substrate temperature. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was about 170 nm. AFM images show that the surface roughness of copper oxide films was increased with increasing substrate temperature. As the substrate temperature increased, monoclinic CuO (111) peak appeared and the crystal size decreased while the monoclinic CuO (-111) peak was independent on the substrate temperature. The oxidation states of Cu 2p and O 1s resulted from XPS were not affected on the substrate temperature. The contact angle measurement was also studied and indicated that the surface of copper oxide thin films deposited high temperature has more hydrophobic surface than that of deposited at low temperature.