• Restorative Dentistry and Endodontics
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• 제14권2호
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• pp.65-76
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• 1989

The purpose of this study was to observe the effect on the removal of dentinal smear layer and morphological changes of reduced dentin surfaces by various dentin surface conditioners. Thirty-two healthy human premolars extracted due to periodontal or orthodontic reasons were used. The teeth were cross-sectioned to expose dentin at the middle portion of the crown with diamond rotary saw. The specimens were then divided into 8 groups. The sectioned dentin surfaces in group 1 to 4 were grinded with No. 400 grit silicone abrasive paper and those in group 5 to 8 were cut with #700 carbide bur under air-water spray. The grinded or cut dentin surfaces were conditioned with 3% $H_2O$, Dentin Conditioner(GC Inter. Corp., Japan), and Scotchprep(3M Dent Prod., U.S.A) according to manufacturer's directions. All the specimens were dried in room temperature for 48 hours, and gold-coated with Eiko ion coater(Eik-engineering Co.), and observed in Hitachi S-450 Scanning electron microscope at 15-25 KV. The following results were obtained; 1. The dentin surfaces grinded with the silicon abrasive paper were rougher in texture and heavier in amount of smear layer than those cut with the carbide bur. 2. Scrubbing of 3% $H_2O_2$ was not effective in removing dentinal smear layer. 3. 20-second conditioning of Dentin Conditioner (GC Inter. Corp) resulted in the removal of a significant amount of the smear layer without removing the tubular plugs and dissolving the peritubular dentin. 4. Scotchprep removed the smear layer very effectively. But at the same time it dissolved the peritubular dentin. 5. Irrespective of the uses of the silicon carbide abrasive paper or the carbide bur the morphological changes of dentin surfaces treated with the same conditioning agents were similar.

• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 2003년도 ICCAS
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• pp.156-161
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• 2003

It is an interest problem to predict substance distributions in three-dimensional space. Recently, a research field as Geostatistics is advanced. It is a kind of inter- or extrapolation mathematically. Some useful means for the inter- and extrapolation are known, in which slide window method with neural networks is hopeful one. We propose multi-dimensional extrapolation using multi-layer neural networks and the slide-window method. The multi-dimensional extrapolation is not similar to one-dimension. It has plural algorithms. We researched line predictors and local-plain predictors I two-dimensional space. The both predictors are equivalent; however, in multi-dimensional extrapolation, it is very important to find the direction of predictions. Especially, since the slide window method requires information to predict the future in sampling data, if they are not ordered appropriately in the direction, the predictor cannot operate. We tested the extrapolation for typical two-dimensional functions, and found an excellent character of slide-window method based on local-plain. By using the method, we can extrapolate the function until twice-outer regions of the definitions.

• 대한임베디드공학회논문지
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• 제9권2호
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• pp.81-86
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• 2014

In the scalable video coding standard, inter-layer prediction based on the coding information of the base layer was adopted to increase the coding performance. This prediction tool results in new syntax elements called motion_prediction_flag (mPF) and residul_prediction_flag(rPF), which are carried to notify the motion vector predictor (MVP) and reference block required in the motion compensation of the decoder. In this paper, an efficient coding method for mPF is proposed to enhance coding efficiency of the salable video coding standard. Through an analysis on the transmission of mPF based on the relationship between the MVPs, we discover the conditions where mPF is unnecessary at the decoder and suggest a modified rate-distortion (RD) cost function to make RD optimization more effective. Simulation results show that the proposed method offers BD rate savings of approximately 1.4%, compared with the conventional SVC standard.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1200-1203
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• 2009

A solution processed polymer tandem cell has been fabricated by using the organic layer coated crystalline $TiO_2$ nanoparticle inter layer. The highly dispersive OL-$TiO_2$ has several advantages in terms of excellent film forming property, crystallinity, optical transparency, and well defined chemical composition. The surface morphology of the $TiO_2$ thin film was found to play a crucial role in the performance of the polymer tandem cell. The stability of the tandem cell, utilizing dense $TiO_2$ nanoparticles inter layer, was superior to the stability of the single junction cell.

• 한국전기전자재료학회논문지
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• 제14권9호
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• pp.707-713
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was requirdfo the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gest thinner, micro-scratches are becoming as major defects. However, as the IMD layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}{\textrm}{m}$ point of use (POU) filter, which is depth-type filter and has 80% filtering efficiency for the 1.0${\mu}{\textrm}{m}$ size particle. In this paper, we studied the relationship between defect generation and polished wafer counts to understand the exact efficiency fo the slurry filteration, and to find out the appropriate pad usage. Our experimental results showed that it sis impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the slurry flow rate, and to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of depth type filter.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집
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• pp.185-188
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• 2001

Chemical mechanical polishing(CMP) process is widely used for global planarization of inter-metal dielectric (IMD) layer and inter-layer dielectric (ILD) for deep sub-micron technology. However, as the IMD and ILD layer gets thinner, defects such as micro-scratch lead to severe circuit failure, which affect yield. In this paper, for the improvement of CMP Process, deionized water (DIW) pressure, purified $N_2$ (P$N_2$) gas, slurry filter and high spray bar were installed. Our experimental results show that DIW pressure and P$N_2$ gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. Also, the filter installation in CMP polisher could reduce defects after CMP process, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. However, the slurry filter is impossible to prevent defect-causing particles perfectly. Thus, we suggest that it is necessary to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of slurry filter. Finally, we could expect the improvements of throughput, yield and stability in the ULSI fabrication process.

• 한국전기전자재료학회논문지
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• 제20권6호
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• pp.502-507
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• 2007

The oxidation treatment of several carbon materials with a sodium chlorate and 70 wt.% of nitric acid, combined with heat treatment, were attempted to achieve an electrochemical active material with a larger capacitance. Among pitch, needle coke, calcinated needle coke and natural graphite, the structure of needle coke and calacinated needle coke were changed to the graphite oxide structure with the expansion of the inter-layer. On the other hand, the calcinated needle coke after oxidation and heating at $200^{\circ}C$ has exhibited largest capacitance per weight and volume of 29.5 F/g and 24.5 F/ml at the two-electrode system in the potential range of 0 to 2.5 V. The electrochemical performance of the calcinated needle coke was discussed with the phenomenon of the electric field activation and the formation of new pores between the expanded inter-layer at first charge.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.97-97
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• 2015

전 세계적으로 화석연료의 고갈 및 환경오염 문제를 해결하기 위해 신재생에너지에 대한 관심이 급증하고 있다. 이러한 신재생에너지에는 수소 에너지, 자연 에너지(태양열, 지열 등), 바이오 매스 에너지 등이 포함된다. 이 중 수소 에너지는 지구상에 풍부하게 존재하고 있는 물과 탄화수소로부터 얻어지며, 연소 시에도 다시 물을 형성하여 오염 물질을 배출하지 않는 차세대 무공해 에너지원으로써 주목을 받고 있다. 수소 제조를 위한 공정에는 수증기 개질 공정(steam reforming), 부분 산화(partial oxidation) 및 자열개질(autothermal reforming) 등이 있으며 실제로 생산되는 대부분의 수소는 탄소/수소비(1:4)가 높은 메탄($CH_4$) 가스를 이용한 메탄 수증기 개질 공정(steam methane reforming)을 통하여 제조된다. 이 때 수소 제조의 고효율화 및 저비용화를 위해서는 반응물에 대한 높은 선택도, 고활성도 및 높은 안정성을 갖는 촉매가 반드시 필요하며, 대표적으로 Ni, Pt, Ru 등이 보고되고 있다. 이러한 촉매들은 대부분 세라믹 pellet 형태로 제작되어 왔으나 열전도도가 낮고 물리적 충격에 취약하다는 단점이 존재한다. 따라서 우리는 이러한 단점을 극복하고, 촉매의 활성을 높이기 위하여 다공성 금속 합금 폼을 촉매 지지체로 도입하였다. 또한, 다공성 금속 합금 폼 표면에 촉매의 분산 및 안정성을 향상시키기 위해 지지체와 촉매 사이에 원자층 증착법을 이용하여 inter-layer를 도입하였다. 이들의 구조, 형태, 및 표면의 화학적 상태는 주사전자현미경, EDS (energy dispersive spectroscopy)가 탑재된 주사전자현미경, X-선 회절, 및 X-선 광전자 분광법을 이용하여 규명하였다. 더하여 정전압-전류 측정법 및 유도 결합 플라즈마 분광 분석기을 이용하여 전기 화학 반응을 유도하고, 반응 후 전해질의 성분분석을 통해 촉매와 지지체 간의 안정성을 평가하였다. 따라서 본 결과들은 한국진공학회 하계정기학술대회를 통해 좀 더 자세히 논의될 것이다.

• Bulletin of the Korean Chemical Society
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• 제31권9호
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• pp.2503-2508
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• 2010

ZnO thin films were grown on Si or $SiO_2$/Si substrates, at growth temperatures ranging from 150 to $400^{\circ}C$, by atomic layer deposition (ALD) using diethylzinc and water. Despite the large band gap of 3.3 eV, the ALD ZnO films show high n-type conductivity, i.e. low resistivity in the order of $10^{-3}\;{\Omega}cm$. In order to understand the high conductivity of ALD ZnO films, the films were characterized with X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy, elastic recoil detection, Rutherford backscattering, Photoluminescence, and Raman spectroscopy. In addition, the various analytical data of the ZnO films were compared with those of ZnO single crystal. According to our analytical data, metallic zinc plays an important role for the high conductivity in ALD ZnO films. Therefore when the metallic zinc was additionally oxidized with ozone by a modified ALD sequence, the resistivity of ZnO films could be adjusted in a range of $3.8{\times}10^{-3}\;{\sim}\;19.0\;{\Omega}cm$ depending on the exposure time of ozone.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권5호
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• pp.191-195
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• 2002

Chemical mechanical Polishing (CMP) process is widely used for the global planarization of inter-metal dielectric (IMD) layer and inter-layer dielectric (ILD) for deep sub-micron technology. However, as the IMD and ILD layer gets thinner, defects such as micro-scratch lead to severe circuit failure, which affect yield. In this paper, for the improvement of CMP process, deionized water (DIW) pressure, purified $N_2$ ($PN_2$) gas, point of use (POU) slurry filler and high spray bar (HSB) were installed. Our experimental results show that DW pressure and P$N_2$ gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. Also, the filter installation in CMP polisher could reduce defects after CMP process, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. However, the slurry filter is impossible to prevent defect-causing particles perfectly. Thus, we suggest that it is necessary to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of slurry filter Finally, we could expect the improvements of throughput, yield and stability in the ULSI fabrication process.