• Applied Chemistry for Engineering
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• v.7 no.5
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• pp.861-868
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• 1996

Skeletal isomerization reaction known as exothermic reaction shows possible maximum yield of i-butene from n-butene at $110^{\circ}C$ over $Pt/MoO_3/SiO_2$. Compared with conventional catalyst such as silica, zeolite, alumina etc., $Pt/MoO_3/SiO_2$ demonstrates higher yield while by-products except 2-butene do not form. Faster H spillover rate over $Pt/MoO_3/SiO_2$ is demonstrated via isothermal reduction experiment at $110^{\circ}C$ compared to the rate over $Pt/MoO_3/Al_2O_3$. Overall isomerization rates are proportional to higher spillover rates from Pt onto $MoO_3$ surface. The skeletal isomerization reaction is composed of two elementary steps. First, carbonium ion formation over Pt crystallites by H spillover. Second, carbenium ion formation over $MoO_3$ followed by formation of i-butene. Moreover, it is suggested that H spillover step from Pt surface onto $MoO_3$ is assumed to be the rate determining step and control the overall isomerization rate.

• Applied Chemistry for Engineering
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• v.8 no.2
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• pp.191-196
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• 1997

The isothermal reduction on $Pt/MoO_3/SiO_2$ at $50^{\circ}C$ demonstrates that the rate of hydrogen spillover is increased as calciantion temperature increases. That is due to the overlayer formation over the surface of Pt crystallites, investigated by TEM and CO chemisorption. It is known that reaction mechanism of skeletal isomerization of 1-butene into iso-butene is composed of 2 step such as formation of carbonium ion and isomerization of methyl group. It is expected that the increase of i-butene yield after calcination at $250^{\circ}C$ is due to increased rate of hydrogen spillover coming from first, overlayer formation over Pt surface and second, chlorine lessoning from $PtCl_x$ precursor.

• Journal of the Korean Vacuum Society
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• v.3 no.4
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• pp.414-419
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• 1994

Surface of Pt/$Al_2O_3$ model catalyst was produced on an aluminum foil with surface area of 1 $cm^2$ The aluminum surface was oxidized under $10 ^5Torr$Torr oxygen and platinum was deposited on top of the oxide layer using a plasma evaporation source. Conversion of I-butene was performed on the model catalyst surface. Isomerization was the major reaction in I-butene conversion on the aluminum oxide layer. Addition of Pt on the aluminum oxide layer induces hydrogenation of I-butene. Selectivity for the hydrogenation increases as the amount of Pt on alumina increases.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.1
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• pp.34-37
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• 2004

Effect of $H_2$ spillover rate as functon of calcination temperature on reaction kinetics was evaluated. Reaction kinetics including yield, conversion and selectivity of 1-butene isomerization over $Pt/HxMoO_3/SiO_2$ were measured as reaction temperature was increased. While conversion of 1-butane was decreased, yield of iso-butene was increased. Two kinds of reaction mechanism were proposed from the change of selectivity as function of temperature.

• Applied Chemistry for Engineering
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• v.7 no.4
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• pp.623-632
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• 1996

The reactivity ratios, melting temperature and polymer morphology in propylene/butene-1 and propylene/hexene-1 copolymerization reactions were studied by examining comonomer compositions of resulting polymers. The catalysts used here are different in their supports which are silica(catalyst I) and magnesium(catalyst II). As the content of comonomer(butene-1 and hexene-1) increased in the copolymer, the melting temperature of the copolymer decreased. The morphology of polymer was amorphous in the range of comonomer(butene-1) composition over 40% in the propylene/butene-1 copolymerization and comonomer(hexene-1) composition over 80% in the propylene/hexene-1 copolymerization. The reactivity ratios were obtained by the Fineman-Ross and Kelen-$T{\ddot{u}}d{\tilde{o}}s$ methods.

• Korean Journal of Materials Research
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• v.9 no.11
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• pp.1148-1152
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• 1999

An organometallic precursor, hfac(hexafluoroacetylacetonate) Cu(I) DMB (3,3-dimethyl- 1-butene) was synthesized, evaluated and compared with other precursors for metal organic chemical vapor deposition of copper thin films. It was found that at $40^{\circ}C$, the vapor pressure was an order of magnitude higher (about 3 torr) than (hfac) Cu vinyltrimethylsilane (VTMS) and films could be deposited at the substrate temperature of 100-$280^{\circ}C$ with deposition rate substantially higher. The copper films contained no detectable impurities as measured by Auger electron spectroscopy and had a resistivity of about 2.0$\mu\Omega$-cm in the deposition temperature range of 150 to $250^{\circ}C$. From the thermal analysis, (hfac)Cu(I)(DMB) is believed to be quite stable and no appreciable amount of precipitation was observed at $65^{\circ}C$ heating for more than a month.

• Bulletin of the Korean Chemical Society
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• v.13 no.5
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• pp.556-559
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• 1992

Hydrocarbon solution of $(PPh_3)_2(CO)MOSO_2CF_3$ (M= Rh, Ir) reacts rapidly with 1,4-dicyanobenzene or 1,4-dicyano-2-butene to yield dinuclear metal complexes $[(PPh_3)_2(CO)M({\mu}-dicyanobenzene)M(CO)(PPh_3)_2](SO_3CF_3)_2$ (I: M = Rh; II: M = Ir) or $[(PPh_3)_2(CO)M({\mu}-dicyano-2-benzene)M(CO)(PPh_3)_2](SO_3CF_3)_2$ (III: M = Rh; IV: M = Ir), respectively. Compounds I, II, III, and IV were characterized by $^1H$-NMR, $^{31}P$-NMR, and infrared spectrum. Dichloromethane solution of II and IV reacts with $H_2\;and\;I_2$ to yield oxidative addition complexes $[(PPh_3)_2(CO)IrX_2({\mu}-E)X_2Ir(CO)(PPh_3)_2](SO_3CF_3)_2$ (V; E = 1,4-dicyanobenzene, $X_2$ = $H_2$; VI : E = 1,4-dicyano-2-butene, $X_2$ = $H_2$; VII; E = 1,4-dicyanobenzene, $X_2$ = $I_2$). All metal complexes are bridged by the cyanide groups. Compounds Ⅴ, Ⅵ, and Ⅶ are characterized by conventional methods.

• Transactions of the Korean hydrogen and new energy society
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• v.32 no.6
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• pp.618-635
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• 2021

Environmental issues caused by our dependence on fossil fuels have caused our society to move toward new renewable sources of energy and chemicals. In this study, we develop an integrated process that co-produces butene oligomer (i.e., biofuels) and 1,3-butadiene (i.e., monomer for the production of synthetic rubber). To minimize utility consumption, we conduct heat integration. Then, we conduct a range of techno-economic analysis and life-cycle assessment to investigate economic and environmental feasibility of the proposed process.

• The Journal of Natural Sciences
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• v.5 no.2
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• pp.63-73
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• 1992

There are many methods of obtaining butadiene described in the literature. In the america it is produced largely from petroleum gases, i.e., by catalytic dehydrogenation of butene of butene-butane mixtures. Butadiene can be recovered from the $C_4$ residue of an olefin plant by distilling off a fraction containing most of the butadiene, catalytically hydrogenating the higher acetylenes to olefins and separating the product from other olefins and isobutane by extraction. Also it can be obtained by cracking naphtha and light oil. Among the individual dienes of commercial importance, 1, 3-butadiene is of first importance. It is used primarily for the production of polymers.In the present paper, it was investigated for a effect of the formation and the growth inhibition of popped corn polymer in butadiene extraction unit. As a result of study, inhibitors, $NaNO_2$ and TBC were good effective for inhibition of the formation and growth in popcorn polymer. The rational formula of popcorn polymer obtained was $(C_4H_6)_x$.

• Korean Journal of Materials Research
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• v.11 no.3
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• pp.184-184
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• 2001

The effect of neutral ligand(L) on the precursor characteristics of (hfac)Cu(I)-L and on Cu MOCVD Process was studied. The neutral ligands of (hac)Cu(I)-L$_{x}$, such as ATMS(allytrimethylsilane), VTMS(vinyltrimethylsilane), VCH(vinylcyclohexane), MP(4-methyl-1-pentene), ACP(allylcyclopentane), and DMB(3,3-dimethyl-1-butene) were investigated. When the dissociation temperature of Cu(I)-L bond is low, low temperature deposition below $100^{\circ}C$ is possible and the resistivity of the film is low. But thermal stability of the precursor is low in this case. The resistivity is almost the same regardless of L at the deposition temperature range of $125~175^{\circ}C$. The resistivity is increased as the molecular weight of L becomes higher above $225^{\circ}C$ The vapor pressure of the precursor was closely related to the boiling point of L, the lower the boiling point of L, the higher the vapor pressurere.