• Title/Summary/Keyword: high voltage discharge plasma

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Flexible Plasma Sheets

  • Cho, Guangsup;Kim, Yunjung
    • Applied Science and Convergence Technology
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    • v.27 no.2
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    • pp.23-25
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    • 2018
  • With respect to the electrode structure and the discharge characteristics, the atmospheric pressure plasma sheet of a thin polyimide film is introduced in this study; here, the flexible plasma device of a dielectric-barrier discharge with the ground electrode and the high-voltage electrode formulated on each surface of a polyimide film whose thickness is approximately $100{\mu}m$, that is operated with a sinusoidal voltage at a frequency of 25 kHz and a low voltage from 1 kV to 2 kV is used. The streamer discharge is appeared along the cross-sectional boundary line between two electrodes at the ignition stage, and the plasma is diffused on the dielectric-layer surface over the high-voltage electrode. In the development of a plasma sheet with thin dielectric films, the avoidance of the insulation breakdown and the reduction of the leakage current have a direct influence on the low-voltage operation.

A Study on Energy Recovery Circuit in Sputtering Plasma Power supply for arc Discharge Prevention (스퍼터용 플라즈마 전원장치의 아크방지를 위한 에너지 회생회로에 대한 연구)

  • Ban, Jung-Hyun;Han, Hee-Min;Kim, Joohn-Sheok
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.61 no.3
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    • pp.116-121
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    • 2012
  • Recently, in the field of renewable energy such as solar cells including the semiconductor and display industries, thin film deposition process is being diversified. Furthermore, to deal with trend of making high-quality and fast, the high-capacity and output plasma power supply which can control high density plasma is required. The biggest problem is arc discharge caused by using high voltage power supply. Thus, the key function of plasma power supply is to prevent arc discharge and there is a need to maintain the possible minimum arc energy. In DC sputtering power supply, on a periodic basis (-)voltage powering up is able to significantly reduce arcing, as well as arc discharge prevention, and maintaining uniform charge density. This conventional method for powering up (-)voltage requires heavy mutual inductance of the transformer to avoid distortion problem of the output voltage. This study is about energy recovery circuit for arc discharge prevention in sputtering plasma power supply. By using energy recovery circuit, it is possible to reduce the mutual inductance and size of the transformer dramatically, prevent distortion of the output voltage and has a stable output waveform. This work was proved through simulation and experimental study.

Inactivation of Microorganisms in Sewage Using a Pilot Plasma Reactor (Pilot 플라즈마 반응기를 이용한 하수 중 미생물의 불활성화)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Health Sciences
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    • v.39 no.3
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    • pp.289-299
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    • 2013
  • Objectives: For the field application of the dielectric barrier discharge plasma reactor, scale-up of the plasma reactor is needed. This study investigated the possibility of inactivation of microorganisms in sewage using pilot multi-plasma reactor. We also considered the possibility of degradation of total organic carbon (TOC) and nonbiodegradable matter ($UV_{254}$) in sewage. Methods: The pilot plasma reactor consists of plasma reactor with three plasma modules (discharge electrode and quartz dielectric tube), liquid-gas mixer, high voltage transformers, gas supply equipment and a liquid circulation system. In order to determine the operating conditions of the pilot plasma reactor, we performed experiments on the operation parameters such as gas and liquid flow rate and electric discharge voltage. Results: The experimental results showed that optimum operation conditions for the pilot plasma reactor in batch experiments were 1 L/min air flow rate), 4 L/min liquid circulation rate, and 13 kV electric discharge voltage, respectively. The main operation factor of the pilot plasma process was the high voltage. In continuous operation of the air plasma process, residual microorganisms, $UV_{254}$ absorbance and TOC removal rate at optimal condition of 13 kV were $10^{2.24}$ CFU/mL, 56.5% and 8.6%, respectively, while in oxygen plasma process at 10 kV, residual microorganisms, $UV_{254}$ absorbance and TOC removal rate at optimal conditions were $10^{1.0}$ CFU/mL, 73.3% and 24.4%, respectively. Electric power was increased exponentially with the increase in high voltage ($R^2$ = 0.9964). Electric power = $0.0492{\times}\exp^{(0.6027{\times}lectric\;discharge\;voltage)}$ Conclusions: Inactivation of microorganisms in sewage effluent using the pilot plasma process was done. The performance of oxygen plasma process was superior to air plasma process. The power consumption of oxygen plasma process was less than that of air plasma process. However, it was considered that the final evaluation of air and oxygen plasma must be evaluated by considering low power consumption, high process performance, operating costs and facility expenses of an oxygen generator.

Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma (펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성)

  • 김종일
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.7
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    • pp.641-646
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    • 2003
  • The dielectric carbon nitride thin films were deposited onto Si(100) substrate using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in the presence of a N$_2$ reactive gas. We calculated dielectric constant, $\varepsilon$$\_$s/, with a capacitance Schering bridge method. We investigated the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were increased drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and C=N bonds. The carbon nitride thin films were observed crystalline phase confirmed by x-ray diffraction data.

The Experimental Research On The Electrical Characteristics For The Ignition Of Plasma Jet Using The Advance Discharge Of High Frequency Voltage With Attenuation (감쇠파 고주파전압의 선행방전을 이용한 Plasma jet의 전기적 기동특성에 대한 실험적 연구)

  • Choon Saing Jhoun
    • 전기의세계
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    • v.21 no.4
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    • pp.27-38
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    • 1972
  • This paper discusses the characteristics about the ignition of D.C. main discharge is a plasma jet generator, manufactured for trial as non-transferred type, when the electrical energy appropriate to the ignition is supplied to the gap between the electrodes by using advance discharge of attenuating high frequency voltage generated by a high frequency oscillator with mercury spark gap. These characteristics are under the influences of (a) the length of mercury gap in high frequency oscillator and the quantity of hydrogen flow supplied to it, (b) the condenser capacity of the high frequency oscillator circuit, (c) the length of plasma jet torch in D.C. main discharge circuit and the quantity of argon flow supplied to it, (d) the circuit constants of D.C. main discharge circuit. The results for these characteristics, obtained by this research, are considered to be helpful to the designs for the ignition of a plasma jet as well as the welding arc stabilizer by high frequency discharge and the high frequency arc welder.

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Characteristics of Nonthermal Plasma Source in Various Liquids

  • Lim, Seung-Ju;Min, Boo-Ki;Taylor, Nathan;Kim, Tae-Gyu;Kim, Hyeong-Seok;Yang, Seon-Pil;Jung, Jin-Yong;Han, Jin-Hyun;Lee, Jong-Yong;Kang, Seung-Oun;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.259.1-259.1
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    • 2014
  • Recently non-thermal plasma has been frequently applied to various research fields. The liquid plasma have received much attention lately because of interests in surgical and nanomaterial synthesis applications. Especially, intensive researches have been carried out for non-thermal plasma in liquid by using various electrode configurations and power supplies. We have developed a bioplasma source which could be used in a liquid, in which outer insulator has been covered onto the outer electrode. Also we have also put an insulator between the inner and outer electrode. Based on the surface discharge mode, the nonthermal bioplasma has been generated inside a liquid by using an alternating current voltage generator with peak voltage of 12 kV under driving frequency of 22 KHz. Here the discharge voltage and current have been measured for electrical characteristics. Especially, We have measured discharge and optical characteristics under various liquids of deionized (DI) water, tap water, and saline by using monochromator. We have also observed nitric oxide (NO), hydrogen peroxide (H2O2), and hydroxyl (OH) radical species by optical emission spectroscopy during the operation of bioplasma discharge inside various kinds of DI water, tap water, and saline. Here the temperature has been kept to be $40^{\circ}C$ or less when discharge in liquid has been operated in this experiment. Also we have measured plasma temperature by high speed camera image and density by using either H-alpha or H-beta Stark broadening method.

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Effect of a Laser Ablation on High Voltage Discharge Plasma Area for Carbon Nitride Film Deposition (고전압 방전 플라즈마에 의한 질화탄소 박막 증착 시 플라즈마 영역에 가한 레이저 애블레이션의 효과)

  • 김종일
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.6
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    • pp.551-557
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    • 2002
  • Carbon nitride films have been deposited on Si(100) substrate by a high voltage discharge plasma combined with laser ablation in a nitrogen atmosphere. The films were grown both with the without the presence of an assisting focused Nd:YAG laser ablation. The laser ablation of the graphite target leads to vapor plume plasma expending into th ambient nitrogen arc discharge area. X-ray photoelectron spectroscopy and Auger electron spectroscopy were used to identify the binding structure and the content of the nitrogen species in the deposited films. The nitrogen content of the films was found to increase drastically with an increase of nitrogen pressure. The surface morphology of the films was studied using a scanning electron microscopy. Data of infrared spectroscopy and x-ray photoelectron spectroscopy indicate the existence of carbon-nitrogen bonds in the films. The x-ray diffraction measurements have also been taken to characterize the crystal properties of the obtained films.

Study on Characteristics of DBD Plasma Actuator as Design Parameters for Plasma Flow Control (플라즈마 유동제어를 위한 DBD 플라즈마 액츄에이터의 설계변수에 따른 특성 연구)

  • Yun, Su-Hwan;Kwon, Hyeok-Bin;Kim, Tae-Gyu
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.40 no.6
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    • pp.492-498
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    • 2012
  • Characteristics of DBD(Dielectric Barrier Discharge) plasma actuator as design parameters were investigated for plasma flow control. Flow velocity and power consumption of the DBD plasma actuator were measured according to the design parameters such as discharge voltage and frequency, gap, width and length of electrode, and the thickness of dielectric barrier. The flow velocity and power consumption increased as the discharge voltage and frequency increased. As the electrode gap increased, the flow velocity increased with decreasing the power consumption, whereas high voltage was required for the plasma discharge. The flow velocity increased as the upper-electrode width decreased, and as the lower-electrode width increased at the constant power consumption. The performance of the DBD plasma actuator can be estimated at the given discharge and geometry conditions.

High-Speed Characteristics of Plasma Display Panel using Priming Overlapping with Display Drive Method (표시기간 중첩 프라이밍 구동기술에 의한 플라즈마 디스플레이 패널의 고속구동특성)

  • Ryeom, Jeong-Duk
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.11
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    • pp.2004-2009
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    • 2007
  • A new high-speed drive method for the plasma display panel is proposed. In this method, the address period is inserted for the rest period of the sustain pulses and the priming pulse is applied on the entire panel at the same time overlapping with the sustain period. The ramp shaped priming pulse can be made with a simple drive circuit in this technology and the stable sustain discharge can be induced even by a narrow scan pulse in help of the space charge generated from the address discharge. From the experiments, it is ascertained that the priming pulse hardly influences the sustain discharge. Moreover, the voltage margin of the sustain discharge is almost constant though that of the address discharge broadens with narrowing the scan pulse width. And, if the time interval between the scan pulse and the sustain pulse is within $6{\mu}s$, the voltage margin of the address and the sustain discharges are unaffected though the applied position of the scan pulse is changed. High-speed driving with the address pulse of $0.7{\mu}s$ width was achieved and the address voltage margin of 20V and the sustain voltage margin of 10V were obtained.

Removal of Rhodamine B Dye Using a Water Plasma Process (수중 플라즈마 공정을 이용한 Rhodamine B 염료의 제거)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Health Sciences
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    • v.37 no.3
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    • pp.218-225
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    • 2011
  • Objectives: In this paper, a dielectric barrier discharge (DBD) plasma reactor was investigated for degrading the dye Rhodamine B (RhB) in aqueous solutions. Methods: The DBD plasma reactor system in this study consisted of a plasma component [titanium discharge (inner), ground (outer) electrode and quartz dielectric tube], power source, and gas supply. The effects of various parameters such as first voltage (input power), gas flow rate, second voltage (output power), conductivity and pH were investigated. Results: Experimental results showed that a 99% aqueous solution of 20 mg/l Rhodamine B is decolorized following an eleven minute plasma treatment. When comparing the performance of electrolysis and plasma treatment, the RhB degradation of the plasma process was higher that of the electrolysis. The optimum first voltage and air flow rate were 160 V (voltage of trans is 15 kV) and 3 l/min, respectively. With increased second voltage (4 kV to 15 kV), RhB degradation was increased. The higher the pH and the lower conductivity, the more Rhodamine B degradation was observed. Conclusions: OH radical generation of dielectric plasma process was identified by degradation of N, N-dimethyl-4-nitrosoaniline (RNO, indicator of OH radical generation). It was observed that the effect of UV light, which was generated as streamer discharge, on Rhodamine B degradation was not high. Rhodamine B removal was influenced by real second voltage regardless of initial first and second voltage. The effects of pH and conductivity were not high on the Rhodamine B degradation.