• Title/Summary/Keyword: high vacuum pump

Search Result 99, Processing Time 0.021 seconds

Consideration on the rotor design of a claw pump (클로펌프 회전자 설계에 대한 고찰)

  • IN, S.R.
    • Journal of the Korean Vacuum Society
    • /
    • v.8 no.3B
    • /
    • pp.257-261
    • /
    • 1999
  • The claw pump, one of oil-less dry pumps developed to solve problems found in vacuum systems pumped by oil-sealed rotary pumps, has been widely used separately or as a part of compound structure with a roots pump. The claw pump has some merits such as a high pumping speed, a high compression ratio, and relatively little heat generation. The high compression ratio of the claw pump is compression ratio, and relatively little heat generation. The high compression ratio of the claw pump is based on efficient sweeping action of the special type rotor and an intrinsic self-valving mechanism. The contour of the rotor with claw-type blade is designed basically to make two rotors revolve smoothly without touching with each other, and related dimensions are determined by required pumping speed, compression ratio, power demand and diameter of the rotor axis. In this paper the procedure of designing the rotor of the claw pump is described and factors influencing the pump performance are analyzed.

  • PDF

Development of Dry-Vacuum-Pump for Semiconductor/Display Process (반도체/디스플레이 공정급 건식진공펌프 개발 개요)

  • Lee, S.Y.;Noh, M.;Kim, B.O.;Lee, A.S.
    • Journal of the Korean Vacuum Society
    • /
    • v.19 no.4
    • /
    • pp.265-274
    • /
    • 2010
  • The excellent performance and stability of dry-vacuum-pump is essential to create and maintain high quality vacuum condition in semiconductor and display process. The development of dry-vacuum-pump needs systematic consideration for target application as well as delicate mechanical issues. Here, we introduce a development procedures of dry-vacuum-pump for semiconductor-process-class.

Simulation of Vacuum Characteristics in Semiconductor Processing Vacuum System by the Combination of Vacuum Pumps (진공펌프 조합에 의한 반도체공정 진공시스템 진공특성 전산모사)

  • Kim, Hyung-Taek;Kim, Dae-Yeon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.24 no.6
    • /
    • pp.449-457
    • /
    • 2011
  • Effect of pump combinations on the vacuum characteristics of vacuum system was simulated for optimum design of system. In this investigation, the feasibility of modelling mechanism for VacSimMulti simulator was proposed. Simulation results of various pumping combinations showed the possibilities and reliabilities of simulation for the performance of vacuum system in specific semiconductor processing. Simulation of roughing pump presented the expected pumping behaviors based on commercial specifications of employed pumps. Application of booster pump exhibited the high pumping efficiency for middle vacuum range. Combinations of optimum backing pump for diffusion and turbo vacuum system were obtained. And, the predictable characteristics of process application of both simulated systems were also acquired.

Analysis for Design of a High Vacuum Turbomolecular Pump (고진공 터보분자 펌프의 설계 및 해석기술)

  • 이우영;국정한;박종권;구본학
    • Journal of the Semiconductor & Display Technology
    • /
    • v.1 no.1
    • /
    • pp.41-45
    • /
    • 2002
  • In modem manufacturing, new applations and technologies demand smaller, and functional devices to replace large systems. As miniaturization becomes a necessity, many companies are interested in small pumps for use in creating ultra-high vacuum, but past efforts to develop such systems have failed due to problems with vibration, stress, heat and power consumption. This paper shows analysis-based design techniques for high vacuum turbomolecular pump by finite element analysis.

  • PDF

Development of Multistage Roots Dry Vacuum Pump Technology (다단 루츠 드라이 진공펌프 기술 개발)

  • Ryu, Jae-Kyeong
    • Vacuum Magazine
    • /
    • v.2 no.4
    • /
    • pp.39-46
    • /
    • 2015
  • After stepping into a new field of vacuum 30 years ago, our company has grown up steadily as a specialized vacuum industry, and now we can provide vacuum devices covering most of the pressure range. We are planning to put out high level dry pump like a multistage Roots pump on the market in the near future. Procedures of technology development for designing, fabricating, and testing the multistage Roots pump of 600 L/min class will be briefly reported. Core items of the technical development on the multistage Roots pump are as follows; elaborated profile design of 3-lobe rotors using an involute curve, optimization of rotor dimensions, especially for clearances and rotor width, considering the pumping speed, compression ratio and heat load, and establishment of a standardized test system. At present, the multistage Roots pump is about to come into commercialization.

Parametric Study on the Capacity of Vacuum Pump for Tube Structure (튜브열차 구조물의 진공 펌프 용량에 관한 파라메타 연구)

  • Nam, Seong-Won
    • Journal of the Korean Society for Railway
    • /
    • v.13 no.5
    • /
    • pp.516-520
    • /
    • 2010
  • Parametric study has been conducted to calculate the capacity of vacuum pump system that will be used to maintain the pressure of the tube structure under atmosphere level. Recently many railroad researchers pay attention to the tube train system as one of the super high speed transportation system. To achieve the super high speed, the inside of tube system should be maintained at low pressure level. In the low pressure environment, it is well known that air resistance of train is drastically decreased. Vacuum pump system will be used to make low pressure state for tube structure, exhaust the leakage air and supplement additional vacuum pumping. As results of these studies, we get the lump capacity of vacuum pump for various parameters. These results can be applied to analyze the effects of the reduction of air resistance.

Analysis of High Vacuum System Based on the Applications of Vacuum Materials

  • Kim, Hyung-Taek
    • Transactions on Electrical and Electronic Materials
    • /
    • v.14 no.6
    • /
    • pp.334-338
    • /
    • 2013
  • In this study, the outgassing effects of selected vacuum materials on the vacuum characteristics were simulated by the $VacSim^{Multi}$ simulation tool. This investigation examined the feasibility of reliably simulating the outgassing characteristics of common vacuum chamber materials (aluminum, copper, stainless steel, nickel plated steel, Viton A). The optimum design factors for these vacuum systems were suggested based on the simulation results. The baking-out effects of the modeled systems and materials on the performance of the vacuum system were also analyzed. The simulation predicted that the overall outgassing effect was more significant in the turbomolecular pump system than in the diffusion pump system and that the utilization of a booster pump has a greater effect on the evacuation time than on the ultimate pressure.

Simulation of High Vacuum Characteristics by VacTran Simulator

  • Kim, Hyung-Taek;Jeong, Hyeongwon
    • International journal of advanced smart convergence
    • /
    • v.11 no.4
    • /
    • pp.88-95
    • /
    • 2022
  • Vacuum simulation is associated with the prediction and calculation of how materials, pumps and systems will perform using mathematical equations. In this investigation, three different high vacuum systems were simulated and estimated with each vacuum characteristics by VacTran simulator. In each of modelled vacuum systems, selection of gas loads into vessel, combination of rough and high vacuum pumps and dimension of conductance elements were proposed as system variables. In pump station model, the pumping speed to pressures by the combination of root pump was analyzed under the variations of vessel volume. In this study, the effects of outgassing dependent on vessel materials was also simulated and aluminum vessel was estimated to optimum materials. It was obtained from the modelling with diffusion pump that the diameter, length of 50×250[mm]roughing line was characterized as optimum variables to reach the ultimate pressure of 10E-7[torr]. Optimum design factors for vacuum characteristics of modelled vacuum system were achieved by VacTran simulator. Feasibility of VacTran as vacuum simulator was verified and applications of VacTran in high tech process expected to be increased.

Simulation of Vacuum Characteristics of High Vacuum System Modelled by VacCAD

  • Kim, Hyungtaek;Park, Junhyung;Yun, Gyeongah
    • International journal of advanced smart convergence
    • /
    • v.7 no.4
    • /
    • pp.84-91
    • /
    • 2018
  • In this paper, we simulated three different HV systems and analyzed of each vacuum characteristics by VacCAD modelling. In each of modelled vacuum systems, selection of chamber materials, combination of rough pump with high vacuum pump and conductance of roughing line (diameter and length) were proposed as system variables. In the modelling of chamber materials, the pumping times to ultimate pressures of different chamber materials (stainless steel, aluminum) were compared by the variations of chamber volume. In this model, the effects of outgassing dependent on the chamber materials was also simulated and aluminum was estimated to optimum chamber materials. It was also obtained that modelling of vane and roots pump with diffusion pump and diameter, length of $50{\times}250$ [mm]roughing line were characterized as optimum variables to reach the ultimate pressure of 10E-7 [mbar] most effectively. Optimum design factors for vacuum characteristics of modelled vacuum system were achieved by VacCAD simulations. Feasibility of VacCAD as vacuum simulator was verified and applications of VacCAD expected to be increased to fields in vacuum needed.

Characteristic Evaluation of Vacuum Chamber for EBM System (전자빔 가공시스템용 진공환경의 성능평가)

  • Kang J.H.;Lee C.H.;Choi J.H.;Lim Y.B.
    • Proceedings of the Korean Society of Precision Engineering Conference
    • /
    • 2005.10a
    • /
    • pp.934-937
    • /
    • 2005
  • It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, proper chamber with high vacuum condition is necessarily required more than anything else to modify scanning electron microscope. In this study, special chamber unit using rotary pump and diffusion pump to obtain high vacuum degree was designed and manufactured and various evaluation tests fur recognize the vacuum characteristic were accomplished.

  • PDF