• Title/Summary/Keyword: hermetic packaging

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A Study on the Hermetic Method for Packaging of Implantable Medical Device (생체 이식형 의료기기의 패키징을 위한 완전 밀폐 방법에 관한 연구)

  • Park, Jae-Soon;Kim, Sung-Il;Kim, Eung-Bo;Kang, Young-Hwan;Cho, Sung-Hwan;Joung, Yeun-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.7
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    • pp.407-412
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    • 2017
  • This paper introduces a biocompatible packaging system for implantable medical device having a hermetic sealing, such that a perfect physical and chemical isolation between electronic medical system and human body (including tissue, body fluids, etc.) is obtained. The hermetic packaging includes an electronic MEMS pressure sensor, power charging system, and bluetooth communication system to wirelessly measure variation of capacitance. The packaging was acquired by Quartz direct bonding and $CO_2$ laser welding, with a size of width $ 6cm{\times}length\;10cm{\times}lheight\;3cm$. Hermetic sealing of the packaged system was tested by changing the pressure in a hermetic chamber using a precision pressure controller, from atmospheric to 900 mmHg. We found that the packaged system retained the same count or capacitance values with sensor 1 - 25,500, sensor 2 - 26,000, and sensor 3 - 20,800, at atmospheric as well as 900 mmHg pressure for 5 hours. This result shows that the packaging method has perfect hermetic sealing in any environment of the human body pressure.

Application of Au-Sn Eutectic Bonding in Hermetic Rf MEMS Wafer Level Packaging (Au-Sn 공정 접합을 이용한 RF MEMS 소자의 Hermetic 웨이퍼 레벨 패키징)

  • Wang Qian;Kim Woonbae;Choa Sung-Hoon;Jung Kyudong;Hwang Junsik;Lee Moonchul;Moon Changyoul;Song Insang
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.3 s.36
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    • pp.197-205
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    • 2005
  • Development of the packaging is one of the critical issues for commercialization of the RF-MEMS devices. RF MEMS package should be designed to have small size, hermetic protection, good RF performance and high reliability. In addition, packaging should be conducted at sufficiently low temperature. In this paper, a low temperature hermetic wafer level packaging scheme for the RF-MEMS devices is presented. For hermetic sealing, Au-Sn eutectic bonding technology at the temperature below $300{\times}C$ is used. Au-Sn multilayer metallization with a square loop of $70{\mu}m$ in width is performed. The electrical feed-through is achieved by the vertical through-hole via filled with electroplated Cu. The size of the MEMS Package is $1mm\times1mm\times700{\mu}m$. By applying $O_2$ plasma ashing and fabrication process optimization, we can achieve the void-free structure within the bonding interface as well as via hole. The shear strength and hermeticity of the package satisfy the requirements of MIL-STD-883F. Any organic gases or contamination are not observed inside the package. The total insertion loss for the packaging is 0.075 dB at 2 GHz. Furthermore, the robustness of the package is demonstrated by observing no performance degradation and physical damage of the package after several reliability tests.

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On-Chip Process and Characterization of the Hermetic MEMS Packaging Using a Closed AuSn Solder-Loop (사각고리형상의 AuSn 합금박막을 이용한 MEMS 밀봉 패키징 및 특성 시험)

  • Seo, Young-Ho;Kim, Seong-A;Cho, Young-Ho;Kim, Geun-Ho;Bu, Jong-Uk
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.4
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    • pp.435-442
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    • 2004
  • This paper presents a hermetic MEMS on-chip package bonded by a closed-loop AuSn solder-line. We design three different package specimens, including a substrate heated specimen without interconnection-line (SHX), a substrate heated specimen with interconnection-line (SHI) and a locally heated specimen with interconnection-line (LHI). Pressurized helium leak test has been carried out for hermetic seal evaluation in addition to the critical pressure test for bonding strength measurement. Substrate heating method (SHX, SHI) requires the bonding time of 40min. at 400min, while local heating method (LHI) requires 4 min. at the heating power of 6.76W. In the hermetic seal test. SHX, SHI and LHI show the leak rates of 5.4$\pm$6.7${\times}$$^{-10}$ mbar-l/s, 13.5$\pm$9.8${\times}$$^{-10}$ mbar-l/s and 18.5$\pm$9.9${\times}$$^{-10}$ mbar-l/s, respectively, for an identical package chamber volume of 6.89$\pm$0.2${\times}$$^{-10}$. In the critical pressure test, no fracture is found in the bonded specimens up to the applied pressure of 1$\pm$0.1MPa, resulting in the minimum bonding strength of 3.53$\pm$0.07MPa. We find that the present on-chip packaging using a closed AuSn solder-line shows strong potential for hermetic MEMS packaging with interconnection-line due to the hermetic seal performance and the shorter bonding time for mass production.

Low Temperature Hermetic Packaging by Localized Heating using Micro Heater (미세 가열기를 이용한 부분 가열 저온 Hermetic 패키징)

  • 심영대
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2002.11a
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    • pp.15-19
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    • 2002
  • 기존 형상의 미세 가열기를 이용한 마이크로 시스템 패키징의 문제점을 해결하기 위해 새로운 형상의 미세 가열기를 제작하여 패키징 실험을 실시하였다. 기존 형상의 미세 가열기와 새로운 미세 가열기의 형상을 각각 제작하여 접합시에 미세 가열기에 발생하는 열분포를 IR 카메라를 이용하여 실험하였다. 기존 형상의 미세 가열기가 불균일하게 가열되는 반면, 새로운 형상의 미세 가열기는 매우 균일하게 가열되는 형상을 나타내었다. IR 카메라 실험을 바탕으로 접합 실험을 실시하였다. 접합 실험시 사용한 미세 가열기는 폭 50$\mu\textrm{m}$, 두께 2$\mu\textrm{m}$로 제작하였으며, 0.2 Mpa의 압력을 Pyrex glass cap에 가한 상태에서 150 mA의 전류를 공급함으로서 접합을 완료하였다. 접합이 완료된 시편들에 대해서 IPA를 통한 leakage 실험을 실시하였으며, 기존 형상의 미세 가열기를 이용한 시편들은 66%가 테스트를 통과한 반면 새로운 형상의 미세 가열기를 이용한 시편들은 85% 이상이 테스트를 통과하였다. Leakage 실험을 통과한 각각의 시편들에 대해서 접합력 측정을 실시한 결과, 기존 형상의 미세 가열기를 이용한 시편들은 15~21 Mpa의 접합력을 나타내었고, 새로운 형상의 미세 가열기를 이용한 시편들은 25~30 Mpa의 우수한 접합력을 나타내었다.

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Low Temperature Hermetic Packaging using Localized Beating (부분 가열을 이용한 저온 Hermetic 패키징)

  • 심영대;김영일;신규호;좌성훈;문창렬;김용준
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.10a
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    • pp.1033-1036
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    • 2002
  • Wafer bonding methods such as fusion and anodic bonding suffer from high temperature treatment, long processing time, and possible damage to the micro-scale sensor or actuators. In the localized bonding process, beating was conducted locally while the whole wafer is maintained at a relatively low temperature. But previous research of localized heating has some problems, such as non-uniform soldering due to non-uniform heating and micro crack formation on the glass capsule by thermal stress effect. To address this non-uniformity problem, a new heater configuration is being proposed. By keeping several points on the heater strip at calculated and constant potential, more uniform heating, hence more reliable wafer bonding could be achieved. The proposed scheme has been successfully demonstrated, and the result shows that it will be very useful in hermetic packaging. Less than 0.2 ㎫ contact Pressure were used for bonding with 150 ㎃ current input for 50${\mu}{\textrm}{m}$ width, 2${\mu}{\textrm}{m}$ height and 8mm $\times$ 8mm, 5mm$\times$5mm, 3mm $\times$ 3mm sized phosphorus-doped poly-silicon micro heater. The temperature can be raised at the bonding region to 80$0^{\circ}C$, and it was enough to achieve a strong and reliable bonding in 3minutes. The IR camera test results show improved uniformity in heat distribution compared with conventional micro heaters. For gross leak check, IPA (Isopropanol Alcohol) was used. Since IPA has better wetability than water, it can easily penetrate small openings, and is more suitable for gross leak check. The pass ratio of bonded dies was 70%, for conventional localized heating, and 85% for newly developed FP scheme. The bonding strength was more than 30㎫ for FP scheme packaging, which shows that FP scheme can be a good candidate for micro scale hermetic packaging.

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Hermetic Packaging For MEMS

  • Kang Seok Jin
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2003.04a
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    • pp.115-134
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    • 2003
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Vacuum Packaging of MEMS (Microelectromechanical System) Devices using LTCC (Low Temperature Co-fired Ceramic) Technology (LTCC 기술을 이용한 MEMS 소자 진공 패키징)

  • 전종인;최혜정;김광성;이영범;김무영;임채임;황건탁;문제도;최원재
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.1
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    • pp.31-38
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    • 2003
  • In the current electronic technology atmosphere, MEMS (Microelectromechanical System) technology is regarded as one of promising device manufacturing technologies to realize market-demanding device properties. In the packaging of MEMS devices, the packaged structure must maintain hermeticity to protect the devices from a hostile atmosphere during their operations. For such MEMS device vacuum packaging, we introduce the LTCC (Low temperature Cofired Ceramic) packaging technology, in which embedded passive components such as resistors, capacitors and inductors can be realized inside the package. The technology has also the advantages of the shortened length of inner and surface traces, reduced signal delay time due to the multilayer structure and cost reduction by more simplified packaging processes owing to the realization of embedded passives which in turn enhances the electrical performance and increases the reliability of the packages. In this paper, the leakage rate of the LTCC package having several interfaces was measured and the possibility of LTCC technology application to MEMS devices vacuum packaging was investigated and it was verified that improved hermetic sealing can be achieved for various model structures having different types of interfaces (leak rate: stacked via; $4.1{\pm}1.11{\times}10^{-12}$/ Torrl/sec, LTCC/AgPd/solder/Cu-tube; $3.4{\pm}0.33{\times}10^{-12}$/ Torrl/sec). In real application of the LTCC technology, the technology can be successfully applied to the vacuum packaging of the Infrared Sensor Array and the images of light-up lamp through the sensor way in LTCC package structure was presented.

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