• 한국정밀공학회지
• /
• 제24권5호
• /
• pp.7-13
• /
• 2007

• 한국정밀공학회지
• /
• 제24권5호
• /
• pp.14-21
• /
• 2007

• 한국전기전자재료학회논문지
• /
• 제21권7호
• /
• pp.660-664
• /
• 2008

Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness, chemical stability, low friction and good adhesion properties. In this study, we investigated the effect of DC power on the characteristics of TiN thin films deposited on Si and glass substrates by DC magnetron sputtering using TiN target. We made TiN films of 300 nm thickness with various DC powers. The structural properties of films are investigated by x-ray diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester. The rms roughness was measured by atomic forced microscopy (AFM). In the result, TiN films had the smooth surface and exhibited (111) directions with the increase of DC Power. Also, especially in case of 175 W DC power, TiN film exhibited the maximum hardness about 8 GPa, and the critical load near 25.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2007년도 추계학술대회 논문집
• /
• pp.354-354
• /
• 2007

Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness. In this paper, we wanted see how the films properties are changed according to DC power. TiN thin films were deposited by direct current (DC) magnetron sputtering method using TiN compound target on silicon substrates. The films structural properties are examined by X-ray Diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester, nano-stress tester. Especially in DC power of 150 W, the maximum hardness and the minimum residual stress of TiN film exhibited about 25 GPa and 1 GPa, respectively. And also, the critical load of TiN film prepared by magnetron sputtering method were measured over 30 N.

• 접착 및 계면
• /
• 제7권1호
• /
• pp.10-15
• /
• 2006

자동차의 유리를 폴리카보네이트로 대체하기 위하여 폴리카보네이트 판 위에 하드 코팅을 시도하였다. 본 연구에서는 [3-(methacryloyloxy)propyl]trimethoxysilane으로부터 졸-겔 과정을 이용하여 코팅을 실시하였다. Butanol을 용매로 사용하였고, 촉매로는 HCI을 이용하였으며, 개시제로는 AIBN을 이용하였다. 폴리카보네이트 판은 PMMA를 이용하여 전처리를 하였으며, 코팅의 열처리는 $130^{\circ}C$에서 6 h 동안 하였다. 형성된 코팅의 연필 경도는 2 H이었고, 내마모성과 접착력이 매우 우수한 코팅이 형성되었다.

• 접착 및 계면
• /
• 제6권3호
• /
• pp.10-18
• /
• 2005

자동차의 유리를 폴리카보네이트로 대체하기 위하여 폴리카보네이트 판 위에 하드 코팅을 시도하였다. 본 연구에서는 tetraethyl orthosilicate (TEOS), methyltriethoxysilane (MTES)으로부터 졸-겔 과정을 이용하여 코팅 막을 형성하였는데 이 때 가장 우수한 물성을 갖는 배합 조건을 찾아보았다. 폴리카보네이트 판의 전처리, TEOS와 MTES의 비율, 용매의 선택, aging 시간, 산 촉매의 양, 코팅의 횟수 등을 변화시켜가면서 형성된 코팅 막의 물성을 측정하였다. 측정 결과 폴리메칠메타크릴레이트를 이용한 전처리가 접착력 향상에 매우 효과적이었으며 이러한 졸-겔 과장으로부터 연필경도 2 H 정도의 아주 매끄러운 코팅 막이 형성되었다.

• 열처리공학회지
• /
• 제24권4호
• /
• pp.209-216
• /
• 2011

Surface coatings were prepared on SKD11 core mold steel by plasma electrolytic oxidation (PEO). The coatings were investigated about the formation condition of core mold steel. SKD11 were coated by PEO in a mix solution of Sodium Aluminate $NaAlO_2$ (10 g/l), Sodium Silicate powder $Na_2SiO_3$ (0.5 g/l), Sodium tungstate dihydrate $Na_2WO_42H_2O$ (0.5 g/l) at less than $30^{\circ}C$. The electrical condition were voltage : 500~600 V; Pulse : 600~1800 Hz; current density 15~20 $A/dm^2$ various time : 3 min~40 min. The coatings surface morphology, cross-section, friction coefficient, hardness were investigated. The PEO coatings on SKD11 core mold steel showed the extended service life.

• 대한기계학회논문집A
• /
• 제38권6호
• /
• pp.629-636
• /
• 2014

비정질합금이 가지고 있는 우수한 기계적 성질과 화학적 특성을 부품소재에 표면개질을 목적으로 고속화염 용사법으로 대면적 코팅층을 형성하였고 내열성이 높은 자융성합금과 초경합금 성분들을 적절히 혼합하여 비정질기지 복합재료를 제조하여 코팅들의 미세조직 관찰과 나노인덴테이션을 이용한 미세표면의 기계적 거동을 분석하였다. 각 코팅층의 미세조직을 관찰한 결과, 단일상 비정질 코팅에는 미용융 입자와 lamellae 영역이 존재하고 자융성합금이 고용된 복합재에는 in-situ $Cr_2Ni_3$ 석출물, 자융성합금과 초경합금성분이 함께 혼합된 코팅층은 석출물과 ex-situ WC 강화입자가 공존하였다. 이들 미세표면의 기계적 거동은 제 2 상이 고용된 비정질 기지 복합재의 코팅층의 기계적 특성이 전체적으로 향상되었다.

• 한국분말재료학회지
• /
• 제14권6호
• /
• pp.372-379
• /
• 2007

The microstructure, mechanical and electrochemical properties of plasma electrolytic coatings (PEO) coatings on Mg-4.3 wt%Zn-1.0 wt%Y and Mg-1.0 wt%Zn-2.0 wt%Y alloys prepared by gas atomization, followed by compaction at 320 for 10 min under the pressure of 700 MPa and sintering at 380 and 420 respectively for 24 h, were investigated, which was compared with the cast Mg-1.0 wt%Zn alloy. All coatings consisting of MgO and $Mg_2SiO_4$ oxides showed porous and coarse surface features with some volcano top-like pores distributed disorderly and cracks between pores. In particular, the surface of coatings on Mg-1.0 wt%Zn-2.0 wt%Y alloy showed smaller area of pores and cracks compared to the Mg-4.3 wt%Zn-1.0 wt%Y and Mg-1.0 wt%Zn alloys. The cross section micro-hardness of coatings on the gas atomized Mg-Zn-Y alloys was higher than that on the cast Mg-1.0 wt%Zn alloy. Additionally, the coated Mg-1.0 wt%Zn-2.0 wt%Y alloy exhibited the best corrosion resistance in 3.5%NaCl solution. It could be concluded that the addition of Y has a beneficial effect on the formation of protective and hard coatings on Mg alloys by plasma electrolytic oxidation treatment.

• 한국표면공학회지
• /
• 제50권5호
• /
• pp.339-344
• /
• 2017

Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin $Al_2O_3$ thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin $Al_2O_3$ passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD $Al_2O_3$ thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick $Al_2O_3$ thin films, which implies that ALD-$Al_2O_3$ passivation layer can be used as an effect barrier layer of corrosion.