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http://dx.doi.org/10.4313/JKEM.2008.21.7.660

Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings  

Kim, Young-Ryeol (성균관대학교 정보통신공학부)
Park, Yong-Seob (성균관대학교 정보통신공학부)
Choi, Won-Seok (한밭대학교 전기공학부)
Hong, Byung-You (성균관대학교 정보통신공학부)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.21, no.7, 2008 , pp. 660-664 More about this Journal
Abstract
Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness, chemical stability, low friction and good adhesion properties. In this study, we investigated the effect of DC power on the characteristics of TiN thin films deposited on Si and glass substrates by DC magnetron sputtering using TiN target. We made TiN films of 300 nm thickness with various DC powers. The structural properties of films are investigated by x-ray diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester. The rms roughness was measured by atomic forced microscopy (AFM). In the result, TiN films had the smooth surface and exhibited (111) directions with the increase of DC Power. Also, especially in case of 175 W DC power, TiN film exhibited the maximum hardness about 8 GPa, and the critical load near 25.
Keywords
Sputtering; TiN; Hardness; Adhesion;
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Times Cited By KSCI : 1  (Citation Analysis)
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