• Title/Summary/Keyword: glow discharge

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Fundamental Studies of Gas-jet Assisted Radio Frequency Glow Discharge Atomic Absorption Spectrometry (원자흡수법에 의한 Gas-Jet Assisted RF 글로우방전 시스템의 특성 연구)

  • Choi, Seong-Kyu;Kim, Hyo-Jin
    • Analytical Science and Technology
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    • v.8 no.1
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    • pp.69-77
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    • 1995
  • The instrumentation and operating characteristics of a gas-jet assisted radio frequency glow discharge atomic absorption spectrometry(RF-GDAAS) are studied. The roles of discharge power, pressure as well as gas flow rate on the sample loss rate and absorbance are described in this paper. Results show that the optimum discharge conditions depend on pressure and discharge power as well as on the gas flow rate. The gas flow rate plays as an important parameter in RF-GDAAS. Absorbance increases as the gas flow rate increase up to 600ml/min., and the optimum absorbance is obtained at the pressure of 3 mbar. The absorbance increases when the discharge power increases as expected, however, the instability of the system due to the heat might be the trade off factor. The linear calibration curves of Ni and Cr in stainless steel(BAS 461-468) and brass (KSS 1121-1126) are obtained with RF-GDAAS.

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High luminous efficiency Mercury-free flat light source for LCD BLU

  • Lee, Ju-Kwang;Oh, Byung-Joo;Jung, Jae-Chul;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1161-1164
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    • 2005
  • A Mercury-free, flat light source which shows high luminance and luminous efficiency simultaneously has been developed. An electrodeless, dielectric barrier discharge is used to generate the plasma using Ne-Xe mixture gas of relatively low gas pressure of a few tens torr in a 4.1 inch diagonal size of flat panel. The basic properties of the long gap glow discharge and its accompanying instabilities, which prevents us from having high luminous efficiency discharge have been analyzed. A new structure and optimized driving methods have been used to generate a glow discharge which shows a wide voltage margin of a few hundred volts. The luminous efficiency and luminance could be 110 lm/W at $1300\;cd/m^2$ and 50 lm/W at $5500\;cd/m^2$.

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RF Glow Discharge and TiN Thin Film Characteristics in a Plane Electrode System (평판형 전극계의 RF 글로우 방전특성 및 TiN 박막특성)

  • Kwak, D.J.;Kim, D.H.;Kim, H.J.;Park, C.H.
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1838-1840
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    • 1996
  • In order to study the relationship between the physical properties of glow discharge plasma and the physical behavior of TiN thin film, electrical characteristics of RF discharge plasma driven at 13.56MHz in a parallel-plate electrode system were measured. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors deciding the physical properties of TiN thin film under given conditions of applied biasd voltage and pressure. The TiN thin film were fabricated over a wide range of discharge conditions, and some of the general relationships between the measured plasma parameters and the properties of TiN thin film were discussed.

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The Fabrication and Properties of Ito Transparent Conducting Film for PDP by the Discharge Plasma Analysis (방전플라즈마 해석을 통한 PDP용 ITO 투명전도막의 제작 및 특성)

  • 곽동주;조문수;박강일;임동건
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.10
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    • pp.902-907
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    • 2003
  • In this paper, the ITO thin film, which is considered as one of the most currently used material for the high performance transparent conducting films for the PDP cell, was made in a parallel-plate, capacitively coupled DC magnetron sputtering system. Some electrical and optical properties of ITO films were investigated and discussed on the basis of glow discharge characteristics. The optimized thin film fabricating conditions of Ar gas pressure and substrate temperature were derived from the Paschen curve and glow discharge characteristics. The maximum transmittance of 89.61 % in the visible region and optical band gap of 3.89 eV and resistivity of 1.67${\times}$10$\^$-3/ $\Omega$-cm were obtained under the conditions of 300 C of substrate temperature and 10∼15 mtorr of pressure, which corresponds nearly to that of Paschen minimum.

Decomposition of Odorous Gases in a Pilot-scale Nonthermal Plasma Reactor

  • Hwang, Yoon-Ho;Jo, Young-Min
    • Journal of Korean Society for Atmospheric Environment
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    • v.21 no.E2
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    • pp.57-65
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    • 2005
  • An experimental study was performed on the decomposition of gaseous ammonia and two selected volatile organic compounds (VOCs: toluene and acetone) in a combined nonthermal plasma reactor with corona and glow discharges. A lab pilot scale reactor (206 liter) equipped with a high electric power pack was used to determine the decomposition efficiency in relation with the inlet concentration and applied voltage. Three different types of discharging electrode such as wired rack, wire strings for corona discharge, and thin plate for glow discharge were put in order in the reactor. While decomposition of ammonia decreased with an increase in the initial concentration, acetone showed an opposite result. In the case of toluene however no explicit tendency was found in toluene and aceton. Negative discharge resulted in high decomposition efficiency than the positive one for all gases. A better removal of gas phase element could be achieved when fume dust were present simultaneously.

Effect of Bias Voltage on the Micro Discharge Characteristics of MgO Film prepared by Unbalanced Magnetron Sputtering

  • Kim, Young-Kee;Park, Jung-Tea;Park, Cha-Soo;Cho, Jung-Soo;Park, Chung-Hoo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.101-102
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    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the de bias voltage of -10V showed lower discharge voltage, lower erosion rate by ion bombardment, higher optic transparency and higher crack resistance in annealing process than those samples prepared by conventional magnetron sputtering or E-beam evaporation.

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The Properties of Ar RF Plasma Using 1- and 2-dimensional Model (1,2차 모델링을 이용한 Ar RF 플라즈마의 응답 특성)

  • 박용섭;정해덕
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.8
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    • pp.622-628
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    • 2001
  • We developed 1- and 2-dimensional fluid model for the analysis of a capacitively coupled Ar RF(Radio Frequency) glow discharge. This discharge is in pure Ar gas at the pressure 100[mTorr], frequency 13.56[MHz] and voltage amplitude 120[V}. This model is based on the equations of continuity and electron energy conservation coupled with Poison equation. 2-dimensional model is simulated on the condition of GEC(Gaseous Electronic Conference cell). The geometry of the discharge chamber and the electrodes used in the model is cylindrically simmetric; tow cylinders for the electrodes are surrounded by the grounded chamber. It is shown that 1-dimensional model is very useful on the understanding of RF glow discharge property and of the movement of charged particles. 2-dimensional model predicts off-axis maximum structure as in the experiments and has the results in qualitatively and quantitatively good agreement with the experiments. Effects of dc self-bias voltage, guard ring and reactor geometry is discussed.

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Preparation of MgO Protective layer for AC PDP by High Energy Particle Bombardment (고속 입자 충격을 도입한 AC PDP의 MgO 보호층 형성에 관한 연구)

  • Kim, Young-Kee;Park, Jung-Tae;Ko, Kwang-Sik;Kim, Gyu-Seob;Cho, Jung-Soo;Park, Chong-Hoo
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.9
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    • pp.527-532
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    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with dc bias voltage of -10V showed lower discharge voltage and lower erosion rate byion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardement during deposition process.

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Design and Optimization of Glow Discharge Atomic Absorption Spectrometry System (글로우방전 원자흡수시스템의 구성 및 최적화에 관한 연구)

  • Kim, Hyo Jin;Jang, Hye Jin;Lee, Gae Ho;Jo, Jeong Hwan
    • Journal of the Korean Chemical Society
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    • v.38 no.3
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    • pp.214-220
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    • 1994
  • A glow discharge atomic absorption system for the direct analysis of conducting solid samples has been designed and constructed. An arrestor made of machinable ceramic which is a main component for confining the discharge between cathode and anode is modified to have a better stability in discharge. Discharge voltage or current, shape of arrestor, pressure, and gas flow rate can be controlled by an ADC/DAC board with a personal computer. The effect of discharge parameters such as discharge voltage, pressure, and gas flow rate on the sample loss rate, absorbance, and the surface morphology of sample by SEM has been studied to find optimum discharge conditions.

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