• Title/Summary/Keyword: glass substrates

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Optimal Sputtering Parameters of Transparent Conducting ITO Films Deposited on PET SUbstates

  • Kim, Hyun-Hoo;Shin, Sung-ho
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.2
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    • pp.23-27
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    • 2000
  • Indium in oxide(ITO) films have been deposited on PET and glass substrates by DC reactive magnetron sputtering without post-deposition thermal treatment, The high quality for microstructure, electrical and optical properties of the as-deposited ITO films on unheated substrates is dominated by the sputtering parameters, The influence of the working gas pressure, DC power and oxygen partial pressure has been systematically investigated, The lowest DC power, and oxygen partial pressure has been systematically investigated, The lowest resistivity of ITO films deposited on PET substrates was 6$\times$10$^{-4}$ $\Omega$cm. It has been obtained at a working pressure of 3 mTorr and DC power of 30 W. The sheet resistance and optical transmittance of these film were 22 $\Omega$/square and 84% respectively. The best values of figures of merit for the electrical and optical characteristics such as T/ $R_{sh}$ and $T^{10}$ / $R_{sh}$ are approximately 38.1 and 7.95($\times$10$^{-3}$ $\Omega$$^{-1}$ ), respectively.

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Effects of Precursor Concentration on the Growth of ZnO Nanorods (ZnO 나노로드 성장에 미치는 전구체 농도의 영향)

  • Ma, Tae-Young
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.65 no.11
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    • pp.1835-1839
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    • 2016
  • In this study, ZnO nanorods were grown by a hydrothermal method. $SiO_2/Si$ wafers and glass were used as substrates. ~20 nm-thick ZnO thin films were rf magnetron sputtered for seed layers. The precursor was prepared by mixing zinc nitrate hexahydrate and hexamethylenetetramine (hexamine) in DI water. The concentration of zinc nitrate hexahydrate was fixed at 0.05 mol, and that of hexamine was varied between 0 mol to 0.1 mol. The reactor containing substrates and precursor was put in an oven maintained at $90^{\circ}C$ for 1 h. X-ray diffraction was carried out to analyze the crystallinity of ZnO nanorods, and a field emission scanning electron microscope was employed to observe the morphology of nanorods. Transmittance and absorbance were measured by a UV-Vis spectrophotometer. Photoluminescence measurements were conducted using 266 nm light.

Magnetic Properties and Microstructures of Co-Cr-(Pt)-Ta Magnetic Thin Films Sputtered on Self-textured Substrates

  • Shin, Kyung-Ho;Chang, Han-Sung;Lee, Taek-Dong;Park, Joong-Keun
    • Electrical & Electronic Materials
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    • v.11 no.10
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    • pp.72-77
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    • 1998
  • The effects of Al micro-bumps on the magnetic properties of CoCr(Pt)Ta/Cr films deposited on glass substrates were investigated. The coercivity increased and the coercivity squareness decreased by incorporating Cr/Al underlayers. The cause of the coercivity increase is attributed to the reduction of Co(0002) texture, the increase of magnetic isolation of CoCr(Pt)/Ta grains, and the refinement of CoCr(Pt)/Ta grains deposited on Cr/Al underlayers. The effects of an Al overlayer on the magnetic properties of CoCr(Pt)Ta/Cr films were also studied. The decrease of coercivity squareness is ascribed to the magnetic isolation of CoCr(Pt)Ta grains.

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Micro Pattern Forming on Polymeric Circular Tubes by Hydrostatic Pressing (폴리머 원형 튜브 대상 미세 패턴 정수압 성형)

  • Rhim, S.H.
    • Transactions of Materials Processing
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    • v.23 no.8
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    • pp.507-512
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    • 2014
  • The objective of the current investigation is to establish techniques in micro pattern forming operations of polymeric circular tubes by using hydrostatic pressing. This method was developed and successfully applied to the micro pattern forming on polymeric plates. The key idea of the new technique is to pressurize multiple vacuum-packed substrate-mold stacks above the glass transition temperature of the polymeric substrates. The new process is thought to be a promising micro-pattern fabrication technique for two reasons; first, (hydro-) isostatic pressing ensures a uniform micro-pattern replicating condition regardless of the substrate area and thickness. Second, multiple curved substrates can be patterned at the same time. With the prototype forming machine for the new process, micro prismatic array patterns, 25um in height and 90 degrees in apex angle, were successfully made on the PMMA circular tubes with diameters of 5~40mm. These results show that this process can be also used in the micro pattern forming process on curved plates such as circular tube.

Preparation of Highly Oriented ZnO Thin Films Prepared by Sol-Gel Method

  • Cheol Jeong;Hwang, Kyu-Seog;Moon, Jong-Ha;Kim, Byung-Hoon
    • The Korean Journal of Ceramics
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    • v.3 no.4
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    • pp.249-252
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    • 1997
  • Highly oriented ZnO thin films were fabricated by dip-coating technique using zinc acetate 2-methoxyethanol 2-aminoethanol solution as starting materials, and effects of substrates on the film's orientation were investigated. Product films were obtained by prefiring at 300, 400, 500 and 550℃ for 10 min, followed by final heat-treatment at the same temperatures as prefiring for 1h. c-axis oriented films on glass substrates were prepared by heat treatment of prefiring films at 300-550℃, while films on alumina showed polycrystalline structure. Films with c-axis orientation exhibited lower specific resistivities than those of polycrystalline films with partial crack and pore.

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Characteristic of ZnO Thin Film Grown on Plastic Substrates for the Application of Transparent Electronic Devices (투명 전자 소자로의 응용을 위해 플라스틱 기판에 성장시킨 ZnO 특성)

  • Lee, Jun-Pyo;Yoon, Yung-Sup;Kang, Seong-Jun
    • Proceedings of the IEEK Conference
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    • 2008.06a
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    • pp.503-504
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    • 2008
  • ZnO thin films were deposited on glass and plastic substrates at different $Ar/O_2$ gas flow ratio in RF magnetron sputtering system. To investigate structural and optical properties of ZnO thin films, X-ray Diffactometer and UV-Vis Spectrometer were performed, respectively. The obtained films showed a preferred orientation the c-axis perpendicular to the substrate and transmittance above 80 % in visible range.

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Three Dimensional Direct Monte Carlo Simulation on OLED Evaporation Process (유기EL 증착 공정에 대한 3차원 Monte Carlo 해석)

  • Lee, Eung-Ki
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.37-42
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    • 2009
  • The performance of an OLED(organic luminescent emitting device) fabrication system strongly depends on the design of the evaporation cell-source. Trends in display sizes have hauled the enlargement of mother glass substrates. The enlargement of substrates requires the improvement and the enlargement of the effusion cell-source for OLED evaporation process. The deposited layers should be as uniform as possible, and therefore it is important to know the effusion profile of the molecules emitted from the cell-source. Conventional 2D DSMC algorithm cannot be used for simulating the new concept cell-source design, such as a linear source. This work concerns the development of 3D DSMC (direct simulation Monte Carlo) analysis for simulating the behavior of the evaporation cell-sources. In this paper, the 3D DSMC algorithm was developed and the film thickness profiles were obtained by the numerical analysis.

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Influence of Sputter Pressure on the Structural and Optical Properties of CdTe for Solar Cell Applications (스퍼터 압력에 따른 태양전지용 CdTe 박막의 구조적, 광학적 특성)

  • Lee, J.H.;Choi, S.H.;Lee, D.J.;Lee, J.I.;Lim, D.G.;Yang, K.J.;Yi, J.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.101-102
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    • 2005
  • Cadmium telluride (CdTe) films have been prepared on Coming 7059 glass, molybdemium (Mo), and polyimide (PI) substrates by r.f. magnetron sputtering technique. The influence of the sputter pressure on the structural and optical properties of these films was evaluated. In addition, a comparison of the properties of the films deposited on different substrates was performed.

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Laser Direct Patterning of Carbon Nanotube Film

  • Yun, Ji-Uk;Jo, Seong-Hak;Jang, Won-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.203-203
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    • 2012
  • The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

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Poly-Silicon TFT's on Metal Foil Substrates for Flexible Displays

  • Hatalis, Miltiadis;Troccoli, M.;Chuang, T.;Jamshidi, A.;Reed, G.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.692-696
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    • 2005
  • In an attempt to fabricate all inclusive display systems we are presenting a study on several elements that would be used as building blocks for all-on-board integrated applications on stainless steel foils. These systems would include in the same substrate all or many of the components needed to drive a flat panel OLED display. We are reporting results on both digital and analog circuits on stainless steel foils. Shift registers running at speeds greater than 1.0MHz are shown as well as oscillators operating at over 40MHz. Pixel circuits for driving organic light emitting diodes are presented. The device technology of choice is that based on poly-silicon TFT technology as it has the potential of producing circuits with good performance and considerable cost savings over the established processes on quartz or glass substrates (amorphous Silicon a-Si:H or silicon on Insulator SOI).

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