• Title/Summary/Keyword: glass properties

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Experimental Study on the Thermal Characteristics According to the Content Change of Biodiesel Mixture (바이오디젤 혼합물의 함량변화에 따른 열적 특성에 대한 실험적인 연구)

  • Ju Suk Kim;Jae Sun Ko
    • Journal of the Society of Disaster Information
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    • v.19 no.3
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    • pp.532-544
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    • 2023
  • Purpose: To identify and evaluate the risk of chemical fire causative substances by using thermal analysis methods (DSC, TGA) for the hazards and physical property changes that occur when newly used biofuels are mixed with existing fuels It is to use it for identification and evaluation of the cause of fire by securing data related to the method and the hazards of the material according to it. Method: The research method used in this experiment is the differential scanning calorimeter (DSC: Difference in heat flux) through quantitative information on the caloric change from the location, shape, number, and area of peaks. flux) was measured, and the weight change caused by decomposition heat at a specific temperature was continuously measured by performing thermogravimetric analyzer (TGA: Thermo- gravimetric Analyzer). Result: First, in the heat flux graph, the boiling point of the material and the intrinsic characteristic value of the material or the energy required for decomposition can be checked. Second, as the content of biodiesel increased, many peaks were identified. Third, it was confirmed through analysis that substances with low expected boiling points were contained. Conclusion: It was shown that the physical risk of the material can be evaluated by using the risk of biodiesel, which is currently used as a new energy source, through various physical and chemical analysis techniques (DSC + TGA).In addition, it is expected that the comparison of differences between test methods and the accumulation and utilization of know-how on experiments in this study will be helpful in future studies on physical properties of hazardous materials and risk assessment of materials.

Effect of Deposition and Heat Treatment Conditions on the Electrical and Optical Properties of AZO/Cu/AZO Thin Film (증착 및 열처리 조건에 따른 AZO/Cu/AZO 박막의 전기적·광학적 특성 평가)

  • Chan-Young Kim;Ha-Eun Lim;Gaeun Yang;Sukjeang Kwon;Chan-Hee Kang;Sang-Chul Lim;Taek Yeong Lee
    • Korean Journal of Materials Research
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    • v.33 no.4
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    • pp.142-150
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    • 2023
  • AZO/Cu/AZO thin films were deposited on glass by RF magnetron sputtering. The specimens showed the preferred orientation of (0002) AZO and (111) Cu. The Cu crystal sizes increased from about 3.7 nm to about 8.5 nm with increasing Cu thickness, and from about 6.3 nm to about 9.5 nm with increasing heat treatment temperatures. The sizes of AZO crystals were almost independent of the Cu thickness, and increased slightly with heat treatment temperature. The residual stress of AZO after heat treatment also increased compressively from -4.6 GPa to -5.6 GPa with increasing heat treatment temperature. The increase in crystal size resulted from grain growth, and the increase in stress resulted from the decrease in defects that accompanied grain growth, and the thermal stress during cooling from heat treatment temperature to room temperature. From the PL spectra, the decrease in defects during heat treatment resulted in the increased intensity. The electrical resistivities of the 4 nm Cu film were 5.9×10-4 Ω·cm and about 1.0×10-4 Ω·cm for thicker Cu films. The resistivity decreased as the temperature of heat treatment increased. As the Cu thickness increased, an increase in carrier concentration resulted, as the fraction of AZO/Cu/AZO metal film increased. And the increase in carrier concentration with increasing heat treatment temperature might result from the diffusion of Cu ions into AZO. Transmittance decreased with increasing Cu thicknesses, and reached a maximum near the 500 nm wavelength after being heat treated at 200 ℃.

Lead-free inorganic metal perovskites beyond photovoltaics: Photon, charged particles and neutron shielding applications

  • Srilakshmi Prabhu;Dhanya Y. Bharadwaj;S.G. Bubbly;S.B. Gudennavar
    • Nuclear Engineering and Technology
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    • v.55 no.3
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    • pp.1061-1070
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    • 2023
  • Over the last few years, lead-free inorganic metal perovskites have gained impressive ground in empowering satellites in space exploration owing to their material stability and performance evolution under extreme space environments. The present work has examined the versatility of eight such perovskites as space radiation shielding materials by computing their photon, charged particles and neutron interaction parameters. Photon interaction parameters were calculated for a wide energy range using PAGEX software. The ranges of heavy charged particles (H, He, C, N, O, Ne, Mg, Si and Fe ions) in these perovskites were estimated using SRIM software in the energy range 1 keV-10 GeV, and that of electrons was computed using ESTAR NIST software in the energy range 0.01 MeV-1 GeV. Further, the macroscopic fast neutron removal cross-sections were also calculated to estimate the neutron shielding efficiencies. The examined shielding parameters of the perovskites varied depending on the radiation type and energy. Among the selected perovskites, Cs2TiI6 and Ba2AgIO6 displayed superior photon attenuation properties. A 3.5 cm thick Ba2AgIO6-based shield could reduce the incident radiation intensity to half its initial value, a thickness even lesser than that of Pb-glass. Besides, CsSnBr3 and La0.8Ca0.2Ni0.5Ti0.5O3 displayed the highest and lowest range values, respectively, for all heavy charged particles. Ba2AgIO6 showed electron stopping power (on par with Kovar) better than that of other examined materials. Interestingly, La0.8Ca0.2Ni0.5Ti0.5O3 demonstrated neutron removal cross-section values greater than that of standard neutron shielding materials - aluminium and polyethylene. On the whole, the present study not only demonstrates the employment prospects of eco-friendly perovskites for shielding space radiations but also suggests future prospects for research in this direction.

Warpage and Solder Joint Strength of Stacked PCB using an Interposer (인터포저를 이용한 Stacked PCB의 휨 및 솔더 조인트 강도 연구)

  • Kipoong Kim;Yuhwan Hwangbo;Sung-Hoon Choa
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.3
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    • pp.40-50
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    • 2023
  • Recently, the number of components of smartphones increases rapidly, while the PCB size continuously decreases. Therefore, 3D technology with a stacked PCB has been developed to improve component density in smartphone. For the s tacked PCB, it i s very important to obtain solder bonding quality between PCBs. We investigated the effects of the properties, thickness, and number of layers of interposer PCB and sub PCB on warpage of PCB through experimental and numerical analysis to improve the reliability of the stacked PCB. The warpage of the interposer PCB decreased as the thermal expansion coefficient (CTE) of the prepreg decreased, and decreased as the glass transition temperature (Tg) increased. However, if temperature is 240℃ or higher, the reduction of warpage is not large. As FR-5 was applied, the warpage decreased more compared to FR-4, and the higher the number and thickness of the prepreg, the lower the warpage. For sub PCB, the CTE was more important for warpage than Tg of the prepreg, and increase in prepreg thickness was more effective in reducing the warpage. The shear tests indicated that the dummy pad design increased bonding strength. The tumble tests indicated that crack occurrence rate was greatly reduced with the dummy pad.

Effects of Substrate Temperature on Figure of Merit of Transparent Conducting GZO Thin Films (기판온도가 GZO 투명전도막의 재료평가지수에 미치는 영향 )

  • Hyun-Ho Shin;Yang-Hee Joung;Seong-Jun Kang
    • The Journal of the Korea institute of electronic communication sciences
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    • v.18 no.5
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    • pp.797-802
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    • 2023
  • We prepared GZO (Ga2O3 : 5 wt %, ZnO : 95 wt %) thin film on glass substrate according to the substrate temperature using the pulsed laser deposition method and investigated electrical and optical properties of the thin film. Through the XRD measurements, their were confirmed that all GZO thin films grew preferentially in c-axis and the GZO thin film deposited at 300℃ showed the best crystallinity with a FWHM of 0.38°. As the substrate temperature increased from 150 to 300℃, the resistivity of GZO thin film tend to decrease, while the average transmittance in the visible light region was not significantly affected. The figure of merit of the GZO thin film deposited at 300℃ was 2.05×104-1·cm-1, which was the best value, the resistivity and the average transmittance in the visible light region were 3.72 × 10-4 Ω·cm and 87.71 %, respectively. In this study, it was found that GZO thin film is very promising material for transparent conducting thin film.

Fabrication and Optical Characterization of Highly Dy3+-ion-incorporated Alumino-borosilicate Glasses for Magneto-optical Applications at 1550 nm (1550 nm 자기광학 응용을 위한 고농도 Dy3+ 이온이 함유된 알루미노보로실리케이트 유리의 제조 및 자기광학 특성 분석)

  • Kadathala Linganna;Yong-Tak Ryu;Young-Ouk Park;Bong-Ahn Yu;Bok Hyeon Kim
    • Korean Journal of Optics and Photonics
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    • v.35 no.3
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    • pp.115-120
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    • 2024
  • Magneto-optical (MO) materials have attracted much attention, since they can be utilized for various optical applications, such as magnetic field sensors, optical current sensors, optical isolators, and optical circulators. In this study, alumino-borosilicate (ABS) glasses with high concentrations of Dy3+ ions were fabricated by a conventional melt-quenching technique, and the dependence of their thermal, optical, and magneto-optical properties on Dy3+ ion concentration was investigated. The MO property of the glasses was investigated by measurement of Faraday rotation at 1550 nm. The Faraday rotation angle increased linearly with the increase of Dy3+ ion concentration in the glasses. A very high Verdet constant of -6.86 rad/(T·m) was obtained for glass with a Dy3+ ion concentration of 30 mol%. In addition, the ABS-Dy glasses showed good thermal stability of greater than 128 ℃ against crystallization, and high optical transmission of 70% in the visible to near-infrared windows of 480-720, 1390-1560, and 1800-2400 nm. Due to the high Verdet constant and good thermal stability, the ABS-Dy glasses in this study could be candidate optical materials for MO device applications at 1550 nm.

Study of Polysulfone Membrane for Membrane-covered Oxygen Probe System (산소 전극 시스템에 사용되는 polysulfone막에 대한 연구)

  • Hong, Suk In;Kim, Hyun Joon;Park, Hee Young;Kim, Tae Jin;Jeong, Yong Seob
    • Applied Chemistry for Engineering
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    • v.7 no.5
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    • pp.877-887
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    • 1996
  • The ideal membranes for membrane-covered oxygen probes system should be selectively permeable for oxygen and chemically inert, and have good mechanical strength. Polysulfone(PSf) was selected to develop the membrane for membrane-covered oxygen electrodes system. PSf membranes have properties such as good reproducibility, good mechanical strength, chemical inertness, and high heat resistance. PSf membranes were cast from polymer solution on the glass plate at constant temperature, and casting solvents used were tetrahydrofuran(THF), methylene chloride, and N-methyl-2-pyrrolidone(NMP). Tricresyl phosphate(TCP) as plasicizer was added to PSf to increase the softness of membrane. The permeation characteristics were observed for pure oxygen and nitrogen through pure PSf membranes by variable volume method and membrane-covered electrode system. The permeability coefficients of oxygen and nitrogen measured by variable volume method were slightly decreased with increasing of upstream pressure. The permeation properties of PSf membrane using methylene choride as casting solvent were not affected by the PSf amount of polymer solution. The permeability coefficients of oxygen and nitrogen for PSf membrane containing TCP were very slightly lower than those for pure PSf membrane, but ideal separation factors were slightly higher. The flexibility of PSf membrane containing 2wt% TCP was better than that of pure PSf membrane. It was expected that this increase in flexibility would solve the difficulty of fixing the membrane to the cathode. The membrane-covered oxygen probes system was composed of anode, cathode and electrolyte. The type of the anode was Ag/AgCl half-cell, that of cathode was Ag, and the electrolyte was 4N KCl solution. The result of sampled current voltametry for PSf membrane showed the plateu region at -0.3V~-1.0V. The correlation coefficient of oxygen partial pressure versus current for PSf membrane was relatively high, 0.99949. It was concluded that PSf membrane was the good candidate for the membrane-covered oxygen probes system.

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A Study on Quality Changes of Domestic Frying Oils by Thermal Oxidation (시판식용유의 가열시간에 따른 품질 변화에 관한 연구)

  • Chang, You-Kyung;Lee, Joung-Won;Kim, Teak-Je
    • Korean Journal of Food Science and Technology
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    • v.10 no.2
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    • pp.112-118
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    • 1978
  • Four domestic frying oils (soybean, corn, rapeseed and rice bran oil) were studied on their changing properties according to thermal oxidation by means of chemical analysis of their compositions and measurements of various physical and chemical properties. The content of linoleic acid which is an essential unsaturated fatty acid and the total amount of unsaturated fatty acids were highest in soybean oil (53.2% and 80.3% respectively) among the unheated frying oils and the degree of its thermal degradation was lowest during the continuous heating period for 48 hours at $180^{\circ}C$. However in general, the contents of unsaturated fatty acids were sharply decreased by thermal oxidation whereas the saturated fatty acid contents ranging 10-17% were not changed considerably, which largely agreed with the results of iodine value measurements. The free acid and peroxide values were also lowest in soybean oil (0.09 and 5.6 respectively) among the unheated oils whereas an anomalously high free acid value was observed in rapeseed oil (54.8) which was packed in unleveled glass bottles. Such a high value is probably ascribed to the photo-catalyzed oxidation during storage. The viscosity measurements have shown similar values before heating, but after thermal oxidation for 32 hours the rapeseed and rice bran oils became too thick to measure viscosity by capillary flow method with heavy darkening in color.

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Structural and optical properties of TiO2 thin films prepared by Sol-Gel dip coating method (졸-겔 침지코팅법으로 제조된 TiO2 박막의 구조적.광학적 특설)

  • 김동진;이학준;한성홍;김의정
    • Korean Journal of Optics and Photonics
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    • v.13 no.3
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    • pp.197-203
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    • 2002
  • The TiO$_2$ coating solutions were synthesized with different concentrations (T1-0.7N, T2-2.0N) of hydrochloric acid used as catalyst. and TiO$_2$ thin films were prepared by sol-gel dip coating. Their structural and optical properties were examined as a function of calcination temperature. XRD results showed that T1 thin films calcined at 400~80$0^{\circ}C$ had the anatase phase, while those calcined at 100$0^{\circ}C$ had the rutile phase. T2 thin films calcined at 40$0^{\circ}C$ and $600^{\circ}C$ had the anatase phase, with the rutile phase for calcination at 80$0^{\circ}C$. Crystallinity of T2 thin films was superior to that of T1 thin films. The crystallite size of TiO$_2$ thin films increased with increasing calcination temperature, and the crystallite size of anatase phase in T2 thin films was larger than that in T1 thin films, but the crystallite size of rutile phase in T2 thin films was smaller. The surface morphology of the films showed that the films were formed more densely in the rutile phase than in the anatase phase, this phenomenon appeared conspicuously in T2 thin films. The transmittance of the samples with thin films on quartz glass calcined at 100$0^{\circ}C$ was significantly reduced at wavelength range about 300-700 nm due to the increased absorption originating from the change of crystallite phase and composition of the films and the scattering effect originating from increasing crystallite size. The refractive index of TiO$_2$ thin films increased, and hence the film thickness as well as the porosity of TiO$_2$ thin films decreased with increasing calcination temperature. Furthermore, the refractive index of T2 thin films was higher than T1 thin films, and porosity of T2 films was lower.

New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film

  • Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.100-101
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    • 2012
  • The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

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