• 제목/요약/키워드: ferroelectric material

검색결과 469건 처리시간 0.044초

Effect of preparation of organic ferroelectric P(VDF-TrFE) nanostructure on the improvement of tennis performance

  • Qingyu Wang
    • Advances in nano research
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    • 제14권4호
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    • pp.329-334
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    • 2023
  • Organic ferroelectric material found vast application in a verity of engineering and health technology fields. In the present study, we investigated the application of the deformable organic ferroelectric in motion measurement and improving performance in tennis players. Flexible ferroelectric material P(VDF-TrFE) could be used in wearable motion sensors in tennis player transferring velocity and acceleration data to collecting devises for analyzing the best pose and movements in tennis players to achieve best performances in terms of hitting ball and movement across the tennis court. In doing so, ferroelectric-based wearable sensors are used in four different locations on the player body to analyze the movement and also a sensor on the tennis ball to record the velocity and acceleration. In addition, poses of tennis players were analyzed to find out the best pose to achieve best acceleration and movement. The results indicated that organic ferroelectric-based sensors could be used effectively in sensing motion of tennis player which could be utilized in the optimization of posing and ball hitting in the real games.

3D NAND Flash Memory에 Ferroelectric Material을 사용한 Current Path 개선 (Improvement of Current Path by Using Ferroelectric Material in 3D NAND Flash Memory)

  • 이지환;이재우;강명곤
    • 전기전자학회논문지
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    • 제27권4호
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    • pp.399-404
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    • 2023
  • 본 논문에서는 3D NAND Flash memory의 O/N/O(Oxide/Nitride/Oxide) 구조와 blocking oxide를 ferroelectric material로 대체한 O/N/F(Oxide/Nitride/Ferroelectric) 구조의 current path를 분석했다. O/N/O 구조는 Vread가 인가되면 neighboring cell의 E-field로 인해 current path가 channel 후면에 형성된다. 반면 O/N/F 구조는 ferroelectric material의 polarization으로 인해 electron이 channel 전면으로 이동하여 current path가 전면에 형성된다. 또한 channel thickness와 channel length에 따른 소자 특성을 분석했다. 분석 결과 O/N/F 구조의 전면 electron current density 증가는 O/N/O 구조보다 2.8배 더 높았고 O/N/F 구조의 전면 electron current density 비율이 17.7% 높았다. 따라서 O/N/O 구조보다 O/N/F 구조에서 전면 current path가 더 효과적으로 형성된다.

Investigations of Ferroelectric Polarization Switching in Potassium Nitrate Composite Films

  • Kumar, Neeraj;Nath, Rabinder
    • Transactions on Electrical and Electronic Materials
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    • 제15권2호
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    • pp.60-65
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    • 2014
  • This article explains the experimental results of ferroelectric polarization switching (FPS) of potassium nitrate ($KNO_3$) with different polymers such as polyvinylidene fluoride (PVDF) and polyvinyl fluoride (PVF) using simple melt-press techniques. To analyze the ferroelectric polarization switching in potassium nitrate ($KNO_3$) composite films at room temperature, we applied the Ishibashi and Takagi theory (based on Avrami model) to the switching current transient. To investigate the dimensionality of domain growth, the ferroelectric polarization switching current (FPS current) was observed from the square - wave bipolar signals across a resistance of $0.1k{\Omega}$ in series with the composite films. The existence of a switching current transient pulse confirmed the ferroelectricity and indicated the stability of the ferroelectric phase (phase III) of $KNO_3$ at room temperature. Polarization hysteresis (P-E) characteristics supported the prominent features of ferroelectric polarization switching in the composite films at room temperature.

Feasibility of ferroelectric materials as a blocking layer in charge trap flash (CTF) memory

  • Zhang, Yong-Jie;An, Ho-Myoung;Kim, Hee-Dong;Nam, Ki-Hyun;Seo, Yu-Jeong;Kim, Tae-Geun
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.119-119
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    • 2008
  • The electrical characteristics of Metal-Ferroelectric-Nitride-Oxide-Silicon (MFNOS) structure is studied and compared to the conventional Silicon-Oixde-Nitride-Oxide-Silicon (SONOS) capacitor. The ferroelectric blocking layer is SrBiNbO (SBN with Sr/Bi ratio 1-x/2+x) with the thickness of 200 nm and is fabricated by the RF sputter. The memory windows of MFNOS and SONOS capacitors with sweep voltage from +10 V to -10 V are 6.9 V and 5.9 V, respectively. The effect of ferroelectric blocking layer and charge trapping on the memory window was discussed. The retention of MFNOS capacitor also shows the 10-years and longer retention time than that of the SONOS capacitor. The better retention properties of the MFNOS capacitor may be attributed to the charge holding effect by the polarization of ferroelectric layer.

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Enhanced Photocatalytic Activity by the Combined Influence of Ferroelectric Domain and Au Nanoparticles for BaTiO3 Fibers

  • Zhang, Xiaoshan;Huan, Yu;Zhu, Yuanna;Tian, Hui;Li, Kai;Hao, Yanan;Wei, Tao
    • Nano
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    • 제13권12호
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    • pp.1850149.1-1850149.10
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    • 2018
  • Ferroelectric particles have been applied in the photocatalytic field because the spontaneous polarization results in the internal electric field, which can accelerate the separation and migration of photogenerated carriers. In this study, the $BaTiO_3$ (BT) fibers are synthesized by electrospinning. The BT fibers calcined above $800^{\circ}C$ exhibit a strong ferroelectric property, which is verified by a typical butterfly-shaped displacement-voltage loop. It is found that the BT fibers with the single-domain structure exhibit better photocatalytic performance than that with the multi-domain configuration. When the single-domain transforms into multi-domain, the integrated internal electric field correspondingly breaks up, inducing that the internal electric field might cancel each other out and diminish the separation of photogenerated carriers. Also, the Au nanoparticles can improve the photocatalytic activity further on account of the surface plasmon resonance. Therefore, it is suggested that Au nanoparticles decorated on ferroelectric BT nanomaterials are promising photocatalysts.

강유전체를 이용한 음의 정전용량 무접합 이중 게이트 MOSFET의 문턱전압 모델 (Analytical Model of Threshold Voltage for Negative Capacitance Junctionless Double Gate MOSFET Using Ferroelectric)

  • 정학기
    • 한국전기전자재료학회논문지
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    • 제36권2호
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    • pp.129-135
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    • 2023
  • An analytical threshold voltage model is presented to observe the change in threshold voltage shift ΔVth of a junctionless double gate MOSFET using ferroelectric-metal-SiO2 as a gate oxide film. The negative capacitance transistors using ferroelectric have the characteristics of increasing on-current and lowering off-current. The change in the threshold voltage of the transistor affects the power dissipation. Therefore, the change in the threshold voltage as a function of theferroelectric thickness is analyzed. The presented threshold voltage model is in a good agreement with the results of TCAD. As a results of our analysis using this analytical threshold voltage model, the change in the threshold voltage with respect to the change in the ferroelectric thickness showed that the threshold voltage increased with the increase of the absolute value of charges in the employed ferroelectric. This suggests that it is possible to obtain an optimum ferroelectric thickness at which the threshold voltage shift becomes 0 V by the voltage across the ferroelectric even when the channel length is reduced. It was also found that the ferroelectric thickness increased as the silicon thickness increased when the channel length was less than 30 nm, but the ferroelectric thickness decreased as the silicon thickness increased when the channel length was 30 nm or more in order to satisfy ΔVth=0.

Ferroelectric Cholesteric Suspension

  • Buchnev, Olesander;Reznikov, Yuri;Tereshchenko, Olexander;Grabar, A.;Kwon, Soon-Bum
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1236-1239
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    • 2004
  • We developed a new cholesteric material for bistable LCDs. The material consists of dispersion of sub-micron ferroelectric particles in cholesteric host. We found that the doping of the cholesteric with ferroelectric particles in small concentration (< 1% by weight) strongly improved basic characteristics of the transition between poly-domain planar texture and focal conic texture. Decrease of the driving voltage, increase of the reflection contrast and the steepness of the transition is associated with giant steady dipole and dielectric constant of the ferroelectric particles.

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A Study of Ferroelectric Properties of the Oscillator Model of PZT-22

  • Ukaegbu, Ikechi Augustine;Borodulin, Vladimir Nikolaevich
    • ETRI Journal
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    • 제33권1호
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    • pp.132-135
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    • 2011
  • In this letter, we study the contemporary technologies for making ferroelectric films and the possibility of using the oscillator model of PZT-22 to analyze its ferroelectric properties. The material showed permittivity dispersion at 65 KHz and 88.5 KHz. We obtained relative attenuation ${\gamma}$, relaxation time ${\tau}$, and ${\varepsilon}_{max}$ of the material as 0.0008319, 0.5 s, and 603.438, respectively.

Piezoresponse Force Microscopy를 이용한 Pb(Zr,Ti)O3 세라믹의 단계적 Poling에 의한 강유전체 도메인 진화 과정 관찰 (Observation of Ferroelectric Domain Evolution Processes of Pb(Zr,Ti)O3 Ceramic Using Piezoresponse Force Microscopy)

  • 김관래
    • 한국전기전자재료학회논문지
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    • 제32권1호
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    • pp.20-24
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    • 2019
  • Ferroelectric material properties are strongly governed by domain structures and their evolution processes, but the evolution processes of complex domain patterns during a macroscopic electrical poling process are still elusive. In the present work, domain-evolution processes in a PZT ceramic near the morphotropic phase-boundary composition were studied during a step-wise electrical poling using piezoresponse force microscopy (PFM). Electron backscatter diffraction was used with the PFM data to identify the grain boundaries in the region of interest. In response to an externally the applied electric field, growth and retreat of non-$180^{\circ}$ domain boundaries wasere observed. The results indicate that ferroelectric polarization-switching nucleates and evolves in concordance with the pattern of the pre-existing domains.

Ferroelectric Gate Field Effect Transistor용 $Sr_2(Nb,Ta)_2O_7$박막 ($Sr_2(Nb,Ta)_2O_7$ Thin Films for Ferroelectric Gate Field Effect Transistor.)

  • 김창영;우동찬;이희영;이원재
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 추계학술대회 논문집
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    • pp.335-338
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    • 1998
  • Ferroelectric Sr$_2$(Nb,Ta)$_2$O$_{7}$ (SNTO) thin films were prepared by chemical solution deposition processes. SNTO thin films were spin-coated on Pt/Ti/SiO$_2$/(100)Si substrates. After multiple coating, dried thin films were heat-treated for decomposition of residual organics and crystallization. B site-rich impurity phase, i.e. [Sr(Nb,Ta)$_2$O$_{6}$], was found after annealing, where its appearance was dependent on process temperature indicating the possible reaction with substrate. Dielectric and other relevant electrical properties were measured and the results showed a little possibility in ferroelectric gate random access memory devices.s.s.

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