Etching Characteristics of $Al_2O_3$ film Using $BCl_3$ /He Plasma
($BCl_3$ /He 플라즈마를 이용한 $Al_2O_3$ 박막 식각특성 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2007.11a
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- pp.188-189
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- 2007