• 한국광학회지
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• 제20권5호
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• pp.288-293
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• 2009

두개 이상의 광학이방성 막이 중첩된 복합막의 편광특성을 분석하였다. 투과형 타원법에서 사용되는 타원상수의 표현을 이용하여 복합 위상지연막의 유효 광축과 등가 리타데이션을 결정하는 방법을 제시하였다. 막 평면 방향으로 광축은 나란하지만 위상지연의 정도가 균일하지 않은 불균일 위상지연판의 등가 리타데이션 및 유효 광축 방향을 나타내는 수학적 표현을 유도하였다. 또한 두개의 광학 이방성막이 광축이 나란하지 않게 중첩되어 있는 복합막의 등가 리타데이션 및 유효 광축 표현을 제시하고 입사광이 직선편광일 때 방위각 의존성 검토를 통해 이들을 실제로 적용할 때 마주치는 한계를 논의하였다.

• 한국광학회지
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• 제24권5호
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• pp.271-278
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• 2013

다층박막이 있는 기층에 단축이방성 배향막이 코팅되어 있을 때 비스듬히 입사한 빛의 유효반사계수 표현들을 유도하였다. 유효반사계수들과 타원상수들을 다층박막의 미지상수들은 물론 단축이방성 배향막의 광학이방성의 크기와 광축의 방향 그리고 배향막의 두께로 표현하였다. 이를 바탕으로 배향막의 정상굴절률과 이상굴절률, 배향된 두께 그리고 광축의 방위각과 기울임각을 다층박막의 두께나 조성비 등과 함께 타원법이 가지고 있는 높은 수준의 측정 정밀도를 유지하며 기존의 모델링 분석방법으로 결정할 수 있도록 하였다.

• Applied Science and Convergence Technology
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• 제23권1호
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• pp.44-47
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• 2014

In this study, we investigated the basic properties of N-doped ethylcyclohexene plasma polymer thin films that deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition (PECVD) method with controlled ammonia flow rate. Ethylcyclohexene was used as organic precursor with hydrogen gas as the precursor bubbler gas. Additionally, ammonia ($NH_3$) gas was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, UV-Visible spectroscopy, and water contact angle measurement. We found that with increasing plasma power, film thickness is gradually increased while optical transmittance is drastically decreased. However, under the same plasma condition, water contact angle is decreased with increasing $NH_3$ flow rate. The FT-IR spectra showed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.

• 한국광학회지
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• 제20권4호
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• pp.241-248
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• 2009

액정 디스플레이에서 시야각 향상을 위해 사용하는 보상판과 편광판을 접합한 복합판의 광축 틀어짐 오차와 보상판의 $R_{in}$(in-plane retardation), $R_{th}$(out-of-plane retardation)를 동시에 결정하는 새로운 방법을 제시하였다. 보상판은 광축이 임의의 기울임각과 방위각을 갖는 o-판으로 하였으며, 확장된 존스 행렬법에 기반한 광학모델을 도입하여 복합판의 편광특성을 분석하였다. 입사각 0도와 50도에서 시료의 방위각을 360도 회전시키며 투과된 빛의 편광상태를 각각 계산한 후, 타원법의 모델링 분석기법을 적용하여 광축 틀어짐과 복합판의 기울임각과 방위각들을 역방계산하였다. 이 방법은 편광판과 보상판을 접합한 후에도 복합판의 성능평가를 할 수 있어 제조공정단계를 줄여 제조 원가를 절감하는데 기여할 수 있을 것으로 기대된다.

• 한국표면공학회지
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• 제29권6호
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• pp.781-787
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• 1996

Silicom oxide films with good water repellency were prepared by rf plasma-enhanced CVD (rf-PECVD) using four kinds of organosilicon compound, which had different number of methyl ($CH_3$) groups, and oxygen as gas sources. The differences in the deposition rates, film composition and film properties were studied in detail. Water repellency depended on the number of $CH_3$ groups in the organosilicon compounds and the partial pressure of oxygen in the plasma. The highest contact angle for water drops, about 95 degrees, was obtained when trimethy lmethoxy silane (TMMOS) was used. The contact angle decreased with the amount of oxygen gas introduced into the plasma. The dissociation of $CH_3$ groups by adding oxygen was comfirmed by Fourier transform infrared spectroscopy(FTIR) and X-ray photoelectron spectroscopy (XPS). The optical properties were estimated by double-beam spectroscopy and ellipsometry. The transmittance of the glass plate coated by the film prepared with tetramethoxy silane (TMOS) was about 90% and the refractive index of film was 1.44. This value was smaller than the refractive index of a glass plate(soda lime glass, refractive index is 1.515) and this film played a role of anti-refractive coating.

• Bulletin of the Korean Chemical Society
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• 제32권4호
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• pp.1331-1335
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• 2011

We report the results of the characterization of Cu oxide thin films deposited by radio frequency (r.f.) magnetron sputtering at different annealing temperatures. The deposited Cu oxide thin films were investigated by scanning electron microscopy, spectroscopic ellipsometry, X-ray diffraction, atomic force microscopy, Xray photoelectron spectroscopy, and contact angle measurements. The thickness of the films was about 180 nm and the monoclinic CuO phase was detected. The $CuO_2$ and $Cu(OH)_2$ phases were grown as amorphous phase and the ratio of the three phases were independent on the annealing temperature. The surface of Cu oxide films changed from hydrophilic to hydrophobic as the annealing temperature increased. This phenomenon is due to the increase of the surface roughness. The direct optical band gap was also obtained and laid in the range between 2.36 and 3.06 eV.

• Macromolecular Research
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• 제14권2호
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• pp.205-208
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• 2006

A polymeric film of a biodegradable poly(1,5-dioxepan-2-one) (PDXO) was formed on a gold surface by a combination of the formation of self-assembled monolayers (SAMs) presenting hydroxyl groups and the surface-initiated, ring-opening polymerization (SI-ROP) of 1,5-dioxepan-2-one (DXO). The SI-ROP of DXO was achieved by heating a mixture of $Sn(Oct)_2$, DXO, and the SAM-coated substrate in anhydrous toluene at $55^{\circ}C$. The resulting PDXO film was quite uniform. The PDXO film was characterized by polarized infrared external reflectance spectroscopy, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, atomic force microscopy, ellipsometry, and contact angle goniometry.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.71-71
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• 2010

Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different substrate temperature. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was about 170 nm. AFM images show that the surface roughness of copper oxide films was increased with increasing substrate temperature. As the substrate temperature increased, monoclinic CuO (111) peak appeared and the crystal size decreased while the monoclinic CuO (-111) peak was independent on the substrate temperature. The oxidation states of Cu 2p and O 1s resulted from XPS were not affected on the substrate temperature. The contact angle measurement was also studied and indicated that the surface of copper oxide thin films deposited high temperature has more hydrophobic surface than that of deposited at low temperature.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.159-159
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• 2013

In this studying, we investigated the basic properties of N-doped plasma polymer. The N-doped plasma polymer thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Various carbon-source were used as organic precursor with hydrogen gas as the precursor bubbler gas. Additionally, ammonia gas [NH3] was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using cyclic voltammetry, ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, FE-SEM, and water contact angle measurement. Electronic property of N-doped plasma thin film is changed as flow rate of the NH3 gas.

• Journal of Industrial and Engineering Chemistry
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• 제68권
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• pp.42-47
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• 2018

This work reports a facile and effective antibacterial coating for oxide substrates. As a coating material, a random copolymer, abbreviated as poly(TMSMA-r-PEGMA), was synthesized by radical polymerization of 3-(trimethoxysilyl)propyl methacrylate (TMSMA) and poly(ethylene glycol) methyl ether methacrylate (PEGMA). Polymeric self-assembled monolayers of poly(TMSMA-r-PEGMA) were formed on various inorganic oxide substrates, including silicon oxide, titanium dioxide, aluminum oxide, and glass, via the simple dip-coating process. The polymer-coated substrates were characterized by ellipsometry, contact angle measurements, and X-ray photoelectron spectroscopy. The bacterial adhesion on the polymer-coated substrates was completely suppressed compared to that on the uncoated substrates.