• Title/Summary/Keyword: electrode array

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Fabrication of Field-Emitter Arrays using the Mold Method for FED Applications

  • Cho, Kyung-Jea;Ryu, Jeong-Tak;Kim, Yeon-Bo;Lee, Sang-Yun
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.4-8
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    • 2002
  • The typical mold method for FED (field emission display) fabrication is used to form a gate electrode, a gate oxide layer, and emitter tip after fabrication of a mold shape using wet-etching of Si substrate. However, in this study, new mold method using a side wall space structure was developed to make sharp emitter tips with the gate electrode. In new method, gate oxide layer and gate electrode layer were deposited on a Si wafer by LPCVD (low pressure chemical vapor deposition), and then BPSG (Boro phosphor silicate glass) thin film was deposited. After then, the BPSG thin film was flowed into the mold at high temperature in order to form a sharp mold structure. TiN was deposited as an emitter tip on it. The unfinished device was bonded to a glass substrate by anodic bonding techniques. The Si wafer was etched from backside by KOH-deionized water solution. Finally, the sharp field emitter array with gate electrode on the glass substrate was formed.

Fabrication of Electrochemical Sensor with Tunable Electrode Distance

  • Yi, Yu-Heon;Park, Je-Kyun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.5 no.1
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    • pp.30-37
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    • 2005
  • We present an air bridge type electrode system with tunable electrode distance for detecting electroactive biomolecules. It is known that the narrower gap between electrode fingers, the higher sensitivity in IDA (interdigitated array) electrode. In previous researches on IDA electrode, narrower patterning required much precise and expensive equipment as the gap goes down to nanometer scale. In this paper, an improved method is suggested to replace nano gap pattering with downsizing electrode distance and showed that the patterning can be replaced by thickness control using metal deposition methods, such as electroplating or metal sputtering. The air bridge type electrode was completed by the following procedures: gold patterning for lower electrode, copper electroplating, gold deposition for upper electrode, photoresist patterning for gold film support, and copper etching for space formation. The thickness of copper electroplating is the distance between upper and lower electrodes. Because the growth rate of electroplating is $0.5{\mu}m\;min^{-1}$, the distance is tunable up to hundreds of nanometers. Completed electrodes on the same wafer had $5{\mu}m$ electrode distance. The gaps between fingers are 10, 20, 30, and $40{\mu}m$ and the widths of fingers are 10, 20, 30, 40, and $50{\mu}m$. The air bridge type electrode system showed better sensitivity than planar electrode.

Indicator-free DNA Chip Array Using an Electrochemical System

  • Park, Yong-Sung;Kwon, Young-Soo;Park, Dae-Hee
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.4
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    • pp.133-136
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    • 2004
  • This research aims to develop a DNA chip array without an indicator. We fabricated a microelectrode array through photolithography technology. Several DNA probes were immobilized on an electrode. Then, target DNA was hybridized and measured electrochemically. Cyclic-voltammograms (CVs) showed a difference between the DNA probe and mismatched DNA in an anodic peak. This indicator-free DNA chip resulted in a sequence-specific detection of the target DNA.

A Study on the Fabrication of Periodic Holes on Metal Electrode for Electrodeionization System Application (전기탈이온시스템 응용을 위한 주기적 홀을 갖는 금속 전극 제작에 관한 연구)

  • Yeo, Jong-Bin;Sun, Sang-Wook;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.3
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    • pp.227-231
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    • 2013
  • Electrodeionization is a hybrid separation process of electrodialysis and ion exchange to produce high purity water under electric field. This article provides a fabrication result of hole patterned metal electrode for elecrodeionization system. The hole patterns have been fabricated by nanosphere lithography (NSL). The technique utilizes the self-assembled nanospheres as lens-mask patterns and collimated laser beam source. The hole patterns have a periodic array structure. The images of hole pattern on metal electrode prepared were observed by SEM. We believe that the periodic hole patterned metal electrode structure is a useful device applicable for metal mat electrode in electrodeionization system.

Nanowell Array based Sensor and Its Packaging

  • Lee, JuKyung;Akira, Tsuda;Jeong, Myung Yung;Lee, Hea Yeon
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.3
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    • pp.19-24
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    • 2014
  • This article reviews the recent progress in nanowell array biosensors that use the label-free detection protocol, and are detected in their natural forms. These nanowell array biosensors are fabricated by nanofabrication technologies that should be useful for developing highly sensitive and selective also reproducible biosensors. Moreover, electrochemical method was selected as analysis method that has high sensitivity compared with other analysis. Finally, highly sensitive nanobiosensor was achieved by combining nanofabrication technologies and classical electrochemical method. Many examples are mentioned about the sensing performance of nanowell array biosensors will be evaluated in terms of sensitivity and detection limit compared with other micro-sized electrode without nanowell array.

A Study on Electrode Array for Measurement of Induced Polarization of Rock Samples (암석 시료의 유도분극 측정을 위한 전극배열 비교)

  • Man-ho Han;Jung-hwan Lee;Keun-Soo Lee;Myeong-Jong Yi
    • Tunnel and Underground Space
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    • v.33 no.6
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    • pp.483-494
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    • 2023
  • Measurement of the physical properties of rocks or minerals is an important factor in determining the distribution of the underground medium as well as mineral resource investigations. Resistivity and induced polarization, which are widely used in Korea, are methods for measuring electrical properties, which are representative properties of obtaining subsurface information. In order to precisely analyze the exploration data obtained from various sites, it is important to accurately measure the material properties. Electrical properties of rock is measured using two-electrode or four-electrode method. Compared to the four-electrode method, the two-electrode method is generally used because it is very easy to contact the sample and the electrode, but there is a problem in that the impedance of the electrode and the sample is measured together. In this study, the time-domain the induced polarization effects were measured using the 2-electrode method and the 4-electrode method for artificial samples mixed with graphite and cement having induced polarization characteristics, and the results were compared. Although the 4-electrode method has difficulties in installing potential electrodes, it was confirmed that it is effective in measuring electrical properties because it can reduce the problem caused by the impedance of potential electrodes compared to the 2-electrode method.

Electrochemical Machining Using a Disk Electrode for Micro Internal Features (미세 내부 형상 가공을 위한 디스크 전극 이용 전해 가공)

  • Jo, Chan-Hee;Kim, Bo-Hyun;Chu, Chong-Nam
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.7
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    • pp.139-144
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    • 2008
  • Micro electrochemical machining was investigated to machine micro internal features. This method uses a micro disk tool electrode and can easily machine micro features inside of a micro hole, which are very difficult to make by the conventional processes. In order to limit the machining area and localize the electrochemical dissolution, ultra short pulses were used as power source and a micro disk electrode with insulating layer on its surface was used as a tool electrode. By electrochemical process, internal features, such as groove array, were fabricated on the stainless steel plate.

The analysis of EDM characteristics for Cu-electrode using LIGA process (LIGA 공정을 이용한 Cu전극의 방전가공 특성 분석)

  • Lee, S.H.;Jung, T.S.;Chang, S.S.;Kim, J.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.05a
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    • pp.383-386
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    • 2007
  • In this study, the analysis was carried out for Electrical Discharge Machining (EDM) characteristics of the Cu electrodes by LIGA process. The shape of electrodes has 324 pins for the cavity of BGA(Ball Grid Array) type test socket mold. BGA test sockets are used in the inspection process of the semi-conductor I.C chip manufacturing. In the work, the machining performance for EDM of the electrodes was analyzed on dimensional accuracy and wear rate. The dimensional accuracy was measured for dimension of the pins, pitch size between the pins and the roundness of corner edge using optical measuring machine.

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Stable Atmospheric Plasma Generation at a Low Voltage using a Microstructure Array (대기압 플라즈마 발생용 마이크로 전극 제작 및 저전압 동작 특성)

  • Han, Sung-Ho;Kim, Young-Min;Kim, Jae-Hyeok
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.4
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    • pp.773-776
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    • 2007
  • A microstructure array has been proposed for micro plasma generation using electroplating and double exposed process. A stable atmospheric plasma has been generated at a low voltage by utilizing the micro electrode gap. Self-aligned microstructure can provide uniform electrode overlap with precisely controlled gap between the electrodes. The proposed structure allows for triode operation, which can expand the generated plasma over a large area by applying a lateral electric field. Electrical characteristics of the micro triode confirm the large numbers of the plasma ions are drifted to the secondary cathode by the lateral electrical field.

Titanium Oxide Nanotube Arrays for Quartz Ctystal Microbalance (수정진동자 미세저울을 위한 티타늄산화물 나노튜브 어레이)

  • Mun, Kyu-Shik;Yang, Dae-Jin;Park, Hun;Choi, Won-Youl
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.372-372
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    • 2007
  • Titanium oxide nanotube arrays were fabricated by the anodization of pure titanium thin film deposited at $500^{\circ}C$ on silicon substrates. The titania nanotubes were grown by anodization in nonaqueous-base electrolytes at different potentials between 5 V and 30 V. $TiO_2$ nanotube array with a small pore diameter of 40 nm and long titanium oxide layer of $4\;{\mu}m$ was obtained. The $TiO_2$ nanotube array was used as a porous electrode for quartz crystal microbalance (QCM). Nanoporous morphology of electrode will increase the sensitivity of microbalance.

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