• Transactions on Electrical and Electronic Materials
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• 제3권1호
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• pp.4-8
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• 2002

The typical mold method for FED (field emission display) fabrication is used to form a gate electrode, a gate oxide layer, and emitter tip after fabrication of a mold shape using wet-etching of Si substrate. However, in this study, new mold method using a side wall space structure was developed to make sharp emitter tips with the gate electrode. In new method, gate oxide layer and gate electrode layer were deposited on a Si wafer by LPCVD (low pressure chemical vapor deposition), and then BPSG (Boro phosphor silicate glass) thin film was deposited. After then, the BPSG thin film was flowed into the mold at high temperature in order to form a sharp mold structure. TiN was deposited as an emitter tip on it. The unfinished device was bonded to a glass substrate by anodic bonding techniques. The Si wafer was etched from backside by KOH-deionized water solution. Finally, the sharp field emitter array with gate electrode on the glass substrate was formed.

• JSTS:Journal of Semiconductor Technology and Science
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• 제5권1호
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• pp.30-37
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• 2005

We present an air bridge type electrode system with tunable electrode distance for detecting electroactive biomolecules. It is known that the narrower gap between electrode fingers, the higher sensitivity in IDA (interdigitated array) electrode. In previous researches on IDA electrode, narrower patterning required much precise and expensive equipment as the gap goes down to nanometer scale. In this paper, an improved method is suggested to replace nano gap pattering with downsizing electrode distance and showed that the patterning can be replaced by thickness control using metal deposition methods, such as electroplating or metal sputtering. The air bridge type electrode was completed by the following procedures: gold patterning for lower electrode, copper electroplating, gold deposition for upper electrode, photoresist patterning for gold film support, and copper etching for space formation. The thickness of copper electroplating is the distance between upper and lower electrodes. Because the growth rate of electroplating is $0.5{\mu}m\;min^{-1}$, the distance is tunable up to hundreds of nanometers. Completed electrodes on the same wafer had $5{\mu}m$ electrode distance. The gaps between fingers are 10, 20, 30, and $40{\mu}m$ and the widths of fingers are 10, 20, 30, 40, and $50{\mu}m$. The air bridge type electrode system showed better sensitivity than planar electrode.

• KIEE International Transactions on Electrophysics and Applications
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• 제4C권4호
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• pp.133-136
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• 2004

This research aims to develop a DNA chip array without an indicator. We fabricated a microelectrode array through photolithography technology. Several DNA probes were immobilized on an electrode. Then, target DNA was hybridized and measured electrochemically. Cyclic-voltammograms (CVs) showed a difference between the DNA probe and mismatched DNA in an anodic peak. This indicator-free DNA chip resulted in a sequence-specific detection of the target DNA.

• 한국전기전자재료학회논문지
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• 제26권3호
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• pp.227-231
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• 2013

Electrodeionization is a hybrid separation process of electrodialysis and ion exchange to produce high purity water under electric field. This article provides a fabrication result of hole patterned metal electrode for elecrodeionization system. The hole patterns have been fabricated by nanosphere lithography (NSL). The technique utilizes the self-assembled nanospheres as lens-mask patterns and collimated laser beam source. The hole patterns have a periodic array structure. The images of hole pattern on metal electrode prepared were observed by SEM. We believe that the periodic hole patterned metal electrode structure is a useful device applicable for metal mat electrode in electrodeionization system.

• 마이크로전자및패키징학회지
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• 제21권3호
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• pp.19-24
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• 2014

This article reviews the recent progress in nanowell array biosensors that use the label-free detection protocol, and are detected in their natural forms. These nanowell array biosensors are fabricated by nanofabrication technologies that should be useful for developing highly sensitive and selective also reproducible biosensors. Moreover, electrochemical method was selected as analysis method that has high sensitivity compared with other analysis. Finally, highly sensitive nanobiosensor was achieved by combining nanofabrication technologies and classical electrochemical method. Many examples are mentioned about the sensing performance of nanowell array biosensors will be evaluated in terms of sensitivity and detection limit compared with other micro-sized electrode without nanowell array.

• 터널과지하공간
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• 제33권6호
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• pp.483-494
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• 2023

국내에서 널리 사용되는 전기비저항과 유도분극탐사는 지하 매질 정보를 얻는 대표적인 물성인 전기적 성질을 측정하는 방법이다. 다양한 현장에서 획득하는 탐사 자료에 대한 정밀한 해석을 위해서는 매질의 물성 정보를 정확하게 측정하는 것이 중요하다. 암석의 전기적 물성 측정은 전류 전극과 전위 전극을 동일한 전극으로 사용하는 2전극법과 전류 전극과 전위 전극을 분리하여 측정하는 4전극법으로 구분된다. 2전극법은 4전극법에 비해 시료와 전극의 접촉이 매우 용이하므로 일반적으로 많이 사용되고 있지만, 시료뿐만 아니라 전극의 임피던스가 함께 측정된다는 문제가 있다. 이 연구에서는 유도분극 특성을 갖지 않는 물시료와 유도분극 특성을 갖는 흑연과 시멘트를 혼합한 인공 시료에 대하여 2전극법과 4전극법을 사용하여 시간영역 유도분극 효과를 측정하고 그 결과를 비교하였다. 또한, 현장탐사를 모사한 수조모형 실험으로 두 전극법의 결과와 비교하여, 모형실험과 4전극법의 결과가 잘 일치하는 것을 확인하였다. 따라서, 4전극법이 전위전극의 설치에 어려움이 있지만 2전극법에 비해 전위전극의 임피던스에 의한 문제를 줄일 수 있어 전기적 물성 측정에 효과적임을 확인하였다.

• 한국정밀공학회지
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• 제25권7호
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• pp.139-144
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• 2008

Micro electrochemical machining was investigated to machine micro internal features. This method uses a micro disk tool electrode and can easily machine micro features inside of a micro hole, which are very difficult to make by the conventional processes. In order to limit the machining area and localize the electrochemical dissolution, ultra short pulses were used as power source and a micro disk electrode with insulating layer on its surface was used as a tool electrode. By electrochemical process, internal features, such as groove array, were fabricated on the stainless steel plate.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2007년도 춘계학술대회 논문집
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• pp.383-386
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• 2007

In this study, the analysis was carried out for Electrical Discharge Machining (EDM) characteristics of the Cu electrodes by LIGA process. The shape of electrodes has 324 pins for the cavity of BGA(Ball Grid Array) type test socket mold. BGA test sockets are used in the inspection process of the semi-conductor I.C chip manufacturing. In the work, the machining performance for EDM of the electrodes was analyzed on dimensional accuracy and wear rate. The dimensional accuracy was measured for dimension of the pins, pitch size between the pins and the roundness of corner edge using optical measuring machine.

• 전기학회논문지
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• 제56권4호
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• pp.773-776
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• 2007

A microstructure array has been proposed for micro plasma generation using electroplating and double exposed process. A stable atmospheric plasma has been generated at a low voltage by utilizing the micro electrode gap. Self-aligned microstructure can provide uniform electrode overlap with precisely controlled gap between the electrodes. The proposed structure allows for triode operation, which can expand the generated plasma over a large area by applying a lateral electric field. Electrical characteristics of the micro triode confirm the large numbers of the plasma ions are drifted to the secondary cathode by the lateral electrical field.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.372-372
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• 2007

Titanium oxide nanotube arrays were fabricated by the anodization of pure titanium thin film deposited at $500^{\circ}C$ on silicon substrates. The titania nanotubes were grown by anodization in nonaqueous-base electrolytes at different potentials between 5 V and 30 V. $TiO_2$ nanotube array with a small pore diameter of 40 nm and long titanium oxide layer of $4\;{\mu}m$ was obtained. The $TiO_2$ nanotube array was used as a porous electrode for quartz crystal microbalance (QCM). Nanoporous morphology of electrode will increase the sensitivity of microbalance.