• 한국전기전자재료학회논문지
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• 제30권6호
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• pp.393-400
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• 2017

For comparison to the Li-ion battery, evaluating a thermal battery must consider additional variables. The first one is the temperature difference between the battery and its unit cell. Thermal batteries and their unit cells have a temperature difference that is caused by the thermal battery activation mechanism and its shape. The second variable is the electrochemical reaction steps. Most Li-ion batteries have a constant electrochemical reaction at the electrode, and battery voltage is affected when the concentration of Li ions is changed. However, a thermal battery has several steps in its electrochemical reaction, and each step has a different potential. In this study, we used unit cell discharge tests based on interpolating a 4D lookup table to estimate the performance of a thermal battery. From the test results, we derived an estimation algorithm by interpolating the table, which is queried from specified profile groups. As a result, we found less than a 5 percent difference between estimation and experiment at the 1.3 V cut-off time.

• 전기화학회지
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• 제3권2호
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• pp.72-75
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• 2000

For the purpose of developing the non-stoichiometric Zr-based Laves phase alloy with higher capacity and better performance for electrochemical application, extensive work has been carried out in KAIST. After careful alloy design of $ZrMn_2-based$ hydrogen storage alloys through varing their stoichiometry while susbstituting or adding some alloying elements, the $Zr-Ti-(Lh-V-Ni)_{2.2},\;Zr-Ti-(Mn-V-Cr-Ni)_{1.8\pm0.1}$ with high capacity and better performance was developed. Consequently the $Zr-Ti-(Mn-V-Ni)_{2.2}$ alloy has a high discharge capacity of 394mAh/g and shows a high rate capability equaling to that of commercialized $AB_5$ type alloys. On the other hand, in order to develop the hydrogen storage alloy with higher discharge capacity, the hypo-stoichiometric $Zr(Mn-V-Ni)_{2-\alpha}$ alloys substituted by Ti are under developing. As the result of competitive roles of Ti and $stocihiometry({\alpha})$, the discharge capacity of $Zr-Ti-(Mn-V-Cr-Ni)_{l.8\pm0.1}$ alloys is about 400mAh/g(410 mAh/g, which shows the highest level of performance in the Zr-based alloy developed. Our sequential endeavor is improving the shortcoming of Zr-based Laves phase alloy for commercialization, i.e., poor activation property and low rate capability, etc. It is therefore believed that the commercialization of Zr-based Laves phase hydrogen storage alloy for Ni-MH rechargeable battery is in near future.

• Korean Chemical Engineering Research
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• 제47권4호
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• pp.441-445
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• 2009

고분자전해질 막의 전기화학적 열화에 미치는 온도의 영향에 대해 연구하였다. 가속 열화 조건(OCV, anode 무가습, cathode 65% RH)에서 셀 온도를 변화시켜 144시간 운전한 후 셀 성능은 12에서 35%까지 감소하였다. 이러한 성능 감소는 FER(Fluoride Emission Rate) 측정에서 알 수 있듯이 과산화수소 혹은 산소라디칼(${\cdot}OH$, $HO_2{\cdot}$)의 공격에 의한 막의 열화에 따른 것으로 라디칼 형성을 위한 가스 crossover의 증가를 가져왔다. 전극에서의 라디칼 생성은 ESR로 확인하였다. 고분자막 열화의 온도 의존성을 나타내는 Arrhenius plot에 얻어진 활성화 에너지 값은 66.2 kJ/mol이었다. 셀 작동온도 증가는 라디칼 형성속도와 라디칼이 막을 공격하는 반응 속도뿐 아니라 가스 crossover 속도도 증가시켜 막 열화를 가속화시켰다.

• Journal of Information Display
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• 제10권1호
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• pp.33-36
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• 2009

A new hybrid silicon thin-film transistor (TFT) fabrication process using the DPSS laser crystallization technique was developed in this study to realize low-temperature poly-Si (LTPS) and a-Si:H TFTs on the same substrate as a backplane of the active-matrix liquid crystal flat-panel display (AMLCD). LTPS TFTs were integrated into the peripheral area of the activematrix LCD panel for the gate driver circuit, and a-Si:H TFTs were used as a switching device of the pixel electrode in the active area. The technology was developed based on the current a-Si:H TFT fabrication process in the bottom-gate, back-channel etch-type configuration. The ion-doping and activation processes, which are required in the conventional LTPS technology, were thus not introduced, and the field effect mobility values of $4\sim5cm^2/V{\cdot}s$ and $0.5cm^2/V{\cdot}s$ for the LTPS and a-Si:H TFTs, respectively, were obtained. The application of this technology was demonstrated on the 14.1" WXGA+(1440$\times$900) AMLCD panel, and a smaller area, lower power consumption, higher reliability, and lower photosensitivity were realized in the gate driver circuit that was fabricated in this process compared with the a-Si:H TFT gate driver integration circuit

• 공업화학
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• 제29권5호
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• pp.489-496
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• 2018

화학에너지를 전기에너지로 전환하는 친환경 에너지 자원으로 각광받는 연료전지에서 고분자 전해질 연료전지(proton exchange membrane fuel cell, PEMFC)의 비싼 백금촉매 사용, 고온가습조건에서의 전도도 감소 등의 문제로 음이온교환연료전지(anion exchange membrane fuel cell, AEMFC)가 주목을 받고 있다. 음이온교환연료전지는 비백금계 촉매를 사용하고 산소환원반응의 활성화 에너지가 낮아 효율이 더 우수한 장점이 있다. 하지만, 이산화탄소에 노출되어 전극손상, 이온전도도 감소 등의 문제점을 포함하여 여러 가지 해결해야 할 문제점이 있다. 따라서, 본 미니총설은 음이온 교환연료전지의 다양한 문제점을 여러 연구논문을 통해서 해결방안을 제시하고자 한다.

• 공업화학
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• 제10권6호
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• pp.814-821
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• 1999

고비표면적의 활성탄소섬유(ACF: activated carbon fiber)를 분극성 전극으로 이용한 전기이중층 캐패시터(electric double layer capacitor)의 단위 cell test를 통하여, ACF의 비표면적, 세공의 크기 및 전기전도도가 캐패시터의 비축전용량에 커다란 영향을 미치고 있음을 확인할 수 있었고, 전해질은 $H^+$ 이온을 함유한 $H_2SO_4$이 가장 좋은 축전용량을 나타내었으나, 집전체 부식 등의 문제로 인하여, 실용화에 있어서는 우수한 충방전 거동을 나타낸 KOH계 전해질이 적당한 것으로 확인되었다. 분극성 전극으로 사용되는 ACF를 탄화 또는 후활성화 등이 후처리를 통하여 비축전용량을 급격히 증가시킬수 있었고, 3만회까지의 연속 충방전 실험에서 전기이중층 캐패시터는 2차전지에서는 찾아 볼 수 없는 매우 높은 충방전 효율과 긴 사용수명을 가지는 것을 확인할 수 있었다.

• 공업화학
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• 제16권4호
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• pp.570-575
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• 2005

하수방류수 살균 소독에 이용되는 UV 램프를 기존의 전극용보다 효율을 높이고 수명이 긴 무 전극 UV 램프를 제작하고 그 성능을 알아보았다. 우선 활성물질을 변화시키면서 제조한 램프의 UV 강도 및 온도의 변화를 실험 하였다. 그 결과 활성물질이 Hg/In의 무게비 95/5로 만든 램프를 250 min간 운전한 결과 UV 강도 $300{\mu}W/cm^2$ 및 온도 $200{\sim}250^{\circ}C$로 가장 안정적인 결과를 나타내었다. 그러나 무전극 램프를 장시간 발광시켰을 경우 램프의 온도가 상승하기 때문에 이를 방지하기 위해 실제 하수처리공정에 적용할 수 있는 냉각이 가능한 이중관 형태로 제작하여 UV 강도와 온도 변화특성을 알아보았다. 또한 제작된 무전극 UV lamp를 하수 방류수의 살균 소독을 위하여 대장균(E-coli.)으로 실험한 결과에서도 99.9% 이상의 살균효율을 보였다.

• Corrosion Science and Technology
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• 제11권6호
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• pp.275-279
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• 2012

Ni-W alloy deposits have lately attracted the interest as an alternative surface treatment method for hard chromium electrodeposits because of higher wear resistance, hardness at high temperature, and corrosion resistance. This study deals with influences of process variables, such as electodeposition current density, plating temperature and pH, on the internal stress of Ni-W nanocrystalline deposits. The internal stress was increased with increasing the applied current density. With increasing applied current density, the grain size of the deposit decreases and concentration of hydrogen in the deposit increases. The subsequent release of the hydrogen results in shrinkage of the deposit and the introduction of tensile stress in the deposit. Consequently, for layers deposited at high current density, cracking occurs readily owing to high tensile stress value. By increasing the temperature of the electrodeposition from $60^{\circ}C$ to $80^{\circ}C$, the internal stress was decreased. It seems that an increase in the number of active ions overcoming the activation energy at elevated temperature caused a decline in the concentration polarization and surface diffusion. It decreased the level of hydrogen absorption due to the lessened hydrogen evolution reaction. Therefore, the lower level of hydrogen absorption degenerated the hydride on the surface of the electrode, resulting in the reduction of the internal stress of the deposits. By increasing the pH of the electrodeposition from 5.6 to 6.8, the internal stress in the deposits were slightly decreased. It is considered that the decrease in internal stess of deposits was due to supply of W complex compound in cathode surface, and hydrogen ion resulted from decrease of activity.

• 한국표면공학회지
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• 제49권6호
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• pp.530-538
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• 2016

There is a close relationship between the performance and the heat generation of the electronic device. Heat generation causes a significant degradation of the durability and/or efficiency of the device. It is necessary to have an effective method to release the generated heat. Based on demands of the printed circuit board (PCB) manufacturing, it is necessary to develop a robust and reliable plating technique for substrates with high thermal conductivity, such as alumina ($Al_2O_3$), aluminium nitride (AlN), and silicon nitride ($Si_3N_4$). In this study, the plating of metal layers on an insulating silicon nitride ($Si_3N_4$) ceramic substrate was developed. We formed a Pd-$TiO_2$ adhesion layer and used APTES(3-Aminopropyltriethoxysilane) to form OH groups on the surface and adhere the metal layer on the insulating $Si_3N_4$ substrate. We used an electroless Ni plating without sensitization/activation process, as Pd particles were nucleated on the $TiO_2$ layer. The electrical resistivity of Ni and Cu layers is $7.27{\times}10^{-5}$ and $1.32{\times}10^{-6}ohm-cm$ by 4 point prober, respectively. The adhesion strength is 2.506 N by scratch test.

• 대한치과교정학회지
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• 제20권3호
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• pp.499-517
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• 1990

Electrical stimulation among several factors that influence bone remodeling has been studied by many investigators with great enthusiasm in orthodontic field. The action mechanisms of Pulsed Electromagnetic Field (PEMF) are different from those of the conventional electrode application method in that PEMF induces endogenous current in the living tissues. PEMF is known to have the healing effect in nonunion of bone and osteoporosis. It is widely used in orthopaedic scopes and the possibility of using the method in clinical orthodontics Is also conceivable. But the exact mechanisms by which the PEMF exerts its effects are not clearly understood. Therefore, the author wanted to see the effect of PEMF on five groups of rat calvarial cells obtained by sequential enzyme digestion method, and observed the changes in enzyme activation, collagen synthesis and $^3H-thymidine$ incorporation. The results were as follows: 1. Under the effect of PEMF, there were no changes in the alkaline phosphatase activity in five groups of cell populations. 2. Both the PEMF group and the PTH with PEMF group shelved no changes in acid phosphatase activities and there were no differences between two experimental groups. 3. Under the effect of PEMF, there was significant increase of collagen synthesis in the group V cell population. 4. Under the effect of PEMF, there were significant increases of $^3H-thymidine$ incorporation in the group IV and V cell populations.