• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2007년도 춘계학술대회 논문집
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• pp.657-658
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• 2007

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2007년도 춘계학술대회 논문집
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• pp.645-646
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• 2007

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 춘계학술발표대회
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• pp.15.2-15.2
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• 2009

Manufacturing of printed electronics using printing technology has begun to get into the hot issue in many ways due to the low cost effectiveness to existing semi-conductor process. This technology with both low cost and high productivity, can be applied in the production of organic thin film transistor (OTFT), solar cell, radio frequency identification (RFID) tag, printed battery, E-paper, touch screen panel, black matrix for liquid crystal display (LCD), flexible display, and so forth. The emerging technology to manufacture the products in mass production is roll-to-roll printing technology which is a manufacturing method by printings of multi-layered patterns composed of semi-conductive, dielectric and conductive layers. In contrary to the conventional printing machines in which printing precision is about $50~100{\mu}m$, the printing machines for printed electronics should have a precision under $30{\mu}m$. In general, in order to implement printed electronics, narrow width and gap printing, register of multi-layer printing by several printing units, and printing accuracy of under $30{\mu}m$ are all required. We developed the roll-to-roll printing equipment used for printed electronics, which is composed of un-winder, re-winder, tension measurement system, feeding units, dancer systems, guide unit, printing unit, vision system, dryer units, and various auxiliary devices. The equipment is designed based on cantilever type in which all rollers except printing ones have cantilever types, which could give more accurate machine precision as well as convenience for changing rollers and observing the process.

• 대한기계학회논문집B
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• 제38권8호
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• pp.709-714
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• 2014

리버스 옵셋 인쇄는 인쇄전자를 위한 미세 패터닝기술 중 하나로서 수 ${\mu}m$ 이하의 선폭을 구현할 수 있다. 옵셋 인쇄의 특성상 잉크는 PDMS 재질의 블랑켓에 전사된 후 음각으로 패턴된 클리쉐에 접촉하여 불필요한 패턴을 제거하게 되는데, 이 때 블랑켓은 압력에 의하여 음각 패턴 내부로 침투하는 변형이 발생한다. 이러한 변형은 인쇄 압력에 비례하며, 과도한 인쇄 압력은 넓은 면적의 패턴을 인쇄할 때 클리쉐 패턴의 바닥에 블랑켓이 닿는 불량을 일으키게 된다. 이 논문에서는 리버스 옵셋 인쇄에서 가압변위에 따른 PDMS 블랑켓의 변형을 유한요소기법을 이용하여 모델링하고 접촉압력 대비 변형량을 예측함으로써 실제 인쇄 장비의 실험 결과와 비교하여 인쇄결함이 발생하지 않도록 하는 클리쉐의 제작조건을 제시하고자 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.511-511
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• 2007

Low-emissivity (low-e) coatings with visible transparency have attracted increased interest m reducing heat radiation loss through window panes from ecological and sustainable aspects. $TiO_2$-silver transparent thin films for low-e have good properties for UV and IR blocking as well as photocatalyst compared to that with commercial UV blocking films such as fluorine doped oxide (FTO), antimony doped tin oxide (ATO), etc. In this study, transparent $TiO_2$-silver thin films were prepared by successive ink-jet printing of commercial nano silver and $TiO_2$ sol. The $TiO_2$ sol, as ink for ink-jet printing, were synthesized by hydrothermal process in the autoclave externally pressurized with $N_2$ gas of 200 bar at $120^{\circ}C$ for 10 hrs. The synthesized $TiO_2$ sols were all formed with brookite phase and their particle size was several to 30 nm. At first nano sized silver sol was coated on glass substrate, after that $TiO_2$ sol was coated by ink-jet printing. With increasing coating thickness of $TiO_2$-silver multilayer by repeated ink-jet coating, the absorbance of UV region (under 400nm) and IR region (over 700nm) also increase reasonably, compared to that with commercial UV blocking films.

• International Journal of Precision Engineering and Manufacturing
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• 제9권2호
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• pp.50-53
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• 2008

A design approach using a one-dimensional (1D) lumped model was studied and applied to an industrial inkjet printing head design for micro patterning on printed circuit boards. For an accurate analysis, a three-dimensional piezoelectric-driven actuator model was analyzed and its jetting characteristics were applied to 1Danalysis model. The performance of the 1D lumped model was verified by comparing measured and simulated results. The developed 1D model helped to optimize the design and configuration of the inkjet head and could be implemented in the design of multi-nozzle inkjet printing heads to improve the jetting frequency and minimize crosstalk.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.256-257
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• 2006

3D printing of NiTi alloys has been successfully achieved. A novel printing process has been developed and used, which consists in selective deposition of a solvent on a granule bed. The granules are composed of metal powders and thermoplastic binder, which are mixed and sieved by conventional methods. A sound green strength is obtained after solvent evaporation. Sintered parts exhibit good density, proper phase composition and shape memory behaviour.

• 한국전기전자재료학회논문지
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• 제35권1호
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• pp.18-23
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• 2022

이젯 프린팅은 직접적인 비접촉 마이크로 팹기술의 하나로서 노즐과 기판 사이에 강한 전기장을 가함으로써 넓은 범위의 마이크로/나노패턴 어레이를 구현할 수 있는 다목적 팹공정이다. 제조된 고분자/퀀텀닷 마이이크로 패턴의 모양과 두께는 자동화된 프린트 기계에 설치된 노즐 직경과 공정에 사용된 잉크 성분에 일반적으로 정밀한 의존성을 갖는다. 본 논문의 목적은 실험 결과에 영향을 미칠 수 있는 각각의 공정 변수 효과를 설명하기 위해서 이젯 프린팅된 고분자/퀀텀닷의 전형적인 실제 예를 설명하는데 있다. 여기서 우리는 마이크로/나노 해상도로 두께가 정밀하게 제어된 고분자/퀀텀닷 패턴을 제조할 수 있는 몇 가지 이젯 프린팅 공정을 구현하였다.

• 한국정밀공학회지
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• 제31권6호
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• pp.497-504
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• 2014

The digital signage display is actively researched as the next generation of large FPD. To commercialize those digital signage display, the manufacturing cost must be downed with printing method instead of conventional photolithography. Here, we demonstrate a reverse offset printed TFT electrodes for the digital signage display. For the fabricated source/drain and gate electrode, we used Ag ink, silicone blanket, Clich$\acute{e}$ and reverse offset printer. We printed uniform TFT electrode patterns with narrow line width(10 ${\mu}m$ range) and thin thickness(nm range). In the end the printing source/drain and gate electrode are successfully achieved by optimization of experimental conditions such as Clich$\acute{e}$ surface treatment, ink coating process, delay time, off/set process and curing temperature. Also, we checked that the printing align accuracy was within 5 ${\mu}m$.

• 한국전기전자재료학회논문지
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• 제24권5호
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• pp.374-380
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• 2011

In this paper a printing process for patterning electrodes on large area substrate was developed by combining screen printing with reverse off-set printing. Ag ink was uniformly coated by screen printing. And then etching resist (ER) was patterned in the Ag film by reverse off-set printing, and then the non-desired Ag film was etched off by etchant. Finally, the ER was stripped-off to obtain the final Ag patterns. We extracted the suitable conditions of reverse Using the process we successfully fabricated gate electrodes and scan bus lines of OTFT-backplane used for e-paper, in which the diagonal size was 6 inch, the resolution $320{\times}240$, the minimum line width 30 um, and sheet resistance 1 ${\Omega}/{\Box}$.