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Effect of PDMS Blanket Deformation on Printability in Reverse-Offset Printing

리버스 옵셋 인쇄에서 PDMS 블랑켓 변형이 인쇄에 미치는 영향에 관한 연구

  • Choi, Young-Man (Dept. of Printed Electronics, Korea Institute of Machinery and Materials) ;
  • Kim, Kwang-Young (Dept. of Printed Electronics, Korea Institute of Machinery and Materials) ;
  • Jo, Jeongdai (Dept. of Printed Electronics, Korea Institute of Machinery and Materials) ;
  • Lee, Taik-Min (Dept. of Printed Electronics, Korea Institute of Machinery and Materials)
  • 최영만 (한국기계연구원 인쇄전자연구실) ;
  • 김광영 (한국기계연구원 인쇄전자연구실) ;
  • 조정대 (한국기계연구원 인쇄전자연구실) ;
  • 이택민 (한국기계연구원 인쇄전자연구실)
  • Received : 2014.05.19
  • Accepted : 2014.06.24
  • Published : 2014.08.01

Abstract

Reverse-offset printing is one of the technologies that can be used for patterning fine features of the order of a few micrometers for printed electronics. In reverse-offset printing, a coated ink film is transferred to a blanket made of elastomer-like poly-dimethylsiloxane. Then, the blanket is impressed onto a clich$\acute{e}$ that has intaglio patterns. The blanket is deformed by penetrating the intaglio of the clich$\acute{e}$ according to the printing pressure. Excessive deformation of the blanket can cause printing defects upon touching the bottom of the intaglio pattern, especially in large patterns. In this paper, we modelled the deformation of the blanket using the finite element method. Considering the actual printing parameters, a condition for fabricating a clich$\acute{e}$ is proposed to prevent defects by the deformation of the blanket.

리버스 옵셋 인쇄는 인쇄전자를 위한 미세 패터닝기술 중 하나로서 수 ${\mu}m$ 이하의 선폭을 구현할 수 있다. 옵셋 인쇄의 특성상 잉크는 PDMS 재질의 블랑켓에 전사된 후 음각으로 패턴된 클리쉐에 접촉하여 불필요한 패턴을 제거하게 되는데, 이 때 블랑켓은 압력에 의하여 음각 패턴 내부로 침투하는 변형이 발생한다. 이러한 변형은 인쇄 압력에 비례하며, 과도한 인쇄 압력은 넓은 면적의 패턴을 인쇄할 때 클리쉐 패턴의 바닥에 블랑켓이 닿는 불량을 일으키게 된다. 이 논문에서는 리버스 옵셋 인쇄에서 가압변위에 따른 PDMS 블랑켓의 변형을 유한요소기법을 이용하여 모델링하고 접촉압력 대비 변형량을 예측함으로써 실제 인쇄 장비의 실험 결과와 비교하여 인쇄결함이 발생하지 않도록 하는 클리쉐의 제작조건을 제시하고자 한다.

Keywords

References

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