• Korean Journal of Chemical Engineering
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• v.35 no.11
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• pp.2241-2255
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• 2018

RSM methodology was applied to present mathematical models for the fabrication of polyvinylidene fluoride (PVDF) dual-layer hollow fibers in membrane distillation process. The design of experiments was used to investigate three main parameters in terms of polymer concentration in both outer and inner layers and the flow rate of dope solutions by the Box-Behnken method. According to obtained results, the optimization was done to present the proper membrane with desirable properties. The characteristics of the optimized membrane (named HF-O) suggested by the Box-Behnken (at the predicted point) showed that the proposed models are strongly valid. Then, a morphology study was done to modify the fiber by a combination of three types of a structure such as macro-void, sponge-like and sharp finger-like. It also improved the hydrophobicity of outer surface from 87 to $113^{\circ}$ and the mean pore size of the inner surface from 108.12 to 560.14 nm. The DCMD flux of modified fiber (named HF-M) enhanced 62% more than HF-O when it was fabricated by considering both of RSM and morphology study results. Finally, HF-M was conducted for long-term desalination process up to 100 hr and showed stable flux and wetting resistance during the test. These stepwise approaches are proposed to easily predict the main properties of PVDF dual-layer hollow fibers by valid models and to effectively modify its structure.

• The Journal of Engineering Geology
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• v.29 no.4
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• pp.509-529
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• 2019

This study performs to evaluate the role of filter material at alluvial well for intake of riverbank filtration and the applicability and improvement effect of dual filter well. To achieve this objective, dual filter intake well and single filter intake well were installed with different filter conditions at riverbank free surface aquifer in soil layer then we evaluated filter material condition, permeability, optimum yield and well efficiency according to yield in drawdown test. As a results, we assumed forming dual filter layer minimizes sudden speed changes at boundary between aquifer and filter layer by cushioning of groundwater flow. This suppresses warm current then intake groundwater efficiently, therefore it seems decreasing peripheral groundwater level changes in spite of higher intake water amount than single filter intake well. Furthermore, we confirmed by test, installing dual filter improves permeability, optimum yield and well efficiency. The result will be used by combining with former study to set up standard of design/construction of dual filter intake well at alluvial aquifer layer. Furthermore, we expect this result will be used to prove application effect of dual filter intake well compared to single filter one and radial collector well which are mainly applied on riverbank filtration.

• Progress in Medical Physics
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• v.27 no.1
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• pp.31-36
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• 2016

The paper discusses radiation dose of dual energy CT on which copper modulation layer, is mounted in order to improve diagnostic performance of the dual energy CT. The radiation dose is estimated using MCNPX and its results are compared with that of the conventional dual energy CT system. CT X-ray spectra of 80 and 120 kVp, which are usually used for thorax, abdominal, head, and neck CT scans, were generated by the SPEC78 code and were used for the source specification 'SDEF' card for MCNPX dose modeling. The copper modulation layer was located 20 cm away from a source covering half of the X-ray window. The radiation dose was measured as changing its thickness from 0.5 to 2.0 mm at intervals of 0.5 mm. Since the MCNPX tally provides only normalized values to a single particle, the dose conversion coefficients of F6 tally for the modulation layer-based dual energy CBCT should be calculated for matching the modeling results into the actual dose. The dose conversion coefficient is $7.2*10^4cGy/output$ that is obtained from dose calibration curve between F6 tally and experimental results in which GAFCHORMIC EBT3 films were exposed by an already known source. Consequently, the dose of the modulation layer-based dual energy cone beam CT is 33~40% less than that of the single energy CT system. On the basis of the results, it is considered that scattered dose produced by the copper modulation layer is very small. It shows that the modulation layer-based dual energy CBCT system can effectively reduce radiation dose, which is the major disadvantage of established dual energy CT.

• Journal of the Institute of Electronics and Information Engineers
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• v.51 no.9
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• pp.139-147
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• 2014

In this paper, we present a novel method for simultaneous detection and tracking of multiple objects using dual-layer particle filtering. The proposed dual-layer particle sampling (DLPS) algorithm consists of parent-particles (PP) in the first layer for detecting multiple objects and child-particles (CP) in the second layer for tracking objects. In the first layer, PPs detect persons using a classifier trained by the intersection kernel support vector machine (IKSVM) at each particle under a randomly selected scale. If a certain PP detects a person, it generates CPs, and makes an object model in the detected object region for tracking the detected object. While PPs that have detected objects generate CPs for tracking, the rest of PPs still move for detecting objects. Experimental results show that the proposed method can automatically detect and track multiple objects, and efficiently reduce the processing time using the sampled particles based on motion distribution in video sequences.

• Corrosion Science and Technology
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• v.11 no.1
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• pp.9-14
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• 2012

The formation of the Fe-Al inhibition layer in hot-dip galvanizing is a confusing issue for a long time. This study presents a characterization result on the inhibition layer formed on C-Mn-Cr and C-Mn-Si dual-phase steels after a short time galvanizing. The samples were annealed at $800^{\circ}C$ for 60 s in $N_{2}$-10% $H_{2}$ atmosphere with a dew point of $-30^{\circ}C$, and were then galvanized in a bath containing 0.2 %Al. X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) was employed for characterization. The TEM electron diffraction shows that only $Fe_{2}Al_{5}$ intermetallic phase was formed. No orientation relationship between the $Fe_{2}Al_{5}$ phase and the steel substrate could be identified. Two peaks of Al 2p photoelectrons, one from metallic aluminum and the other from $Al^{3+}$ ions, were detected in the inhibition layer, indicating that the layer is in fact a mixture of $Fe_{2}Al_{5}$ and $Al_{2}O_{3}$. TEM/EDS analysis verifies the existence of $Al_{2}O_{3}$ in the boundaries of $Fe_{2}Al_{5}$ grains. The nucleation of $Fe_{2}Al_{5}$ and the reduction of the surface oxide probably proceeded concurrently on galvanizing, and the residual oxides prohibited the heteroepitaxial growth of $Fe_{2}Al_{5}$.

• Advances in materials Research
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• v.1 no.2
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• pp.109-113
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• 2012

Electromigration-induced void evolutions in typical upper and lower layer dual-inlaid Copper (Cu) interconnect structures were simulated by applying a phenomenological model resorting to Monte Carlo based simulations, which considers redistribution of heterogeneously nucleated voids and/or pre-existing vacancy clusters at the Copper/dielectric cap interface during electromigration. The results indicate that this model can qualitatively explain the electromigration-induced void evolutions observations in many studies reported by several researchers heretofore. These findings warrant need to re-investigate technologically important electromigration mechanisms by developing rigorous models based on similar concepts.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.4
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• pp.296-299
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• 2008

The effects of radio frequency (RF) source power for decoupled plasma nitridation (DPN) process on the electrical properties and Fowler-Nordheim (FN) stress immunity of the oxynitride gate dielectrics for deep nano-technology devices has been investigated. With increase of RF source power, the threshold voltage (Vth) of a NMOS transistor(TR) decreased and that of a PMOS transistor increased, indicating that the increase of nitrogen incorporation in the oxynitride layer due to higher RF source power induced more positive fixed charges. The improved off-current characteristics and wafer uniformity of PMOS Vth were observed with higher RF source power. FN stress immunity, however, has been degenerated with increasing RF source power, which was attributed to the increased trap sites in the oxynitride layer. With the experimental results, we could optimize the DPN process minimizing the power consumption of a device and satisfying the gate oxide reliability.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.527-530
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• 2009

We report on the fabrication of ZnO-based dual gate (DG) thin-film transistors (TFTs) with 20 nm-thick $Al_2O_3$ for both top and bottom dielectrics, which were deposited by atomic layer deposition on glass substrates at $200^{\circ}C$. Whether top or bottom gate is biased for sweep, our TFT almost symmetrically operates under a low voltage of 5 V showing a field mobility of ~0.4 $cm^2/V{\cdot}s$ along with the on/off ratio of $5{\times}10^4$. The threshold voltage of our DG TFT was systematically controlled from 0.5 to 2.0 V by varying counter gate input from +5 to -2 V.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.284-284
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• 2011

Recently, the increasing degree of device integration in the fabrication of Si semiconductor devices, etching processes of nano-scale materials and high aspect-ratio (HAR) structures become more important. Due to this reason, etch selectivity control during etching of HAR contact holes and trenches is very important. In this study, The etch selectivity and etch rate of TEOS oxide layer using ACL (amorphous carbon layer) mask are investigated various process parameters in CH2F2/C4F8/O2/Ar plasma during etching TEOS oxide layer using ArF/BARC/SiOx/ACL multilevel resist (MLR) structures. The deformation and etch characteristics of TEOS oxide layer using ACL hard mask was investigated in a dual-frequency superimposed capacitively coupled plasma (DFS-CCP) etcher by different fHF/ fLF combinations by varying the CH2F2/ C4F8 gas flow ratio plasmas. The etch characteristics were measured by on scanning electron microscopy (SEM) And X-ray photoelectron spectroscopy (XPS) analyses and Fourier transform infrared spectroscopy (FT-IR). A process window for very high selective etching of TEOS oxide using ACL mask could be determined by controlling the process parameters and in turn degree of polymerization. Mechanisms for high etch selectivity will discussed in detail.

• Structural Engineering and Mechanics
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• v.51 no.4
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• pp.627-641
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• 2014

Functionally graded steels (FGSs) are a family of functionally graded materials (FGMs) consisting of ferrite (${\alpha}$), austenite (${\gamma}$), bainite (${\beta}$) and martensite (M) phases placed on each other in different configurations and produced via electroslag remelting (ESR). In this research, the flow stress of dual layer austenitic-martensitic functionally graded steels under hot deformation loading has been modeled considering the constitutive equations which describe the continuous effect of temperature and strain rate on the flow stress. The mechanism-based strain gradient plasticity theory is used here to determine the position of each layer considering the relationship between the hardness of the layer and the composite dislocation density profile. Then, the released energy of each layer under a specified loading condition (temperature and strain rate) is related to the dislocation density utilizing the mechanism-based strain gradient plasticity theory. The flow stress of the considered FGS is obtained by using the appropriate coefficients in the constitutive equations of each layer. Finally, the theoretical model is compared with the experimental results measured in the temperature range $1000-1200^{\circ}C$ and strain rate 0.01-1 s-1 and a sound agreement is found.