• 제목/요약/키워드: doped GaAs

검색결과 285건 처리시간 0.021초

Optimization of InAlAs/InGaAs HEMT Performance for Microwave Frequency Applications and Reliability

  • Gupta, Ritesh;Aggarwal, Sandeep Kumar;Gupta, Mridula;Gupta, R.S.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제4권3호
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    • pp.240-249
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    • 2004
  • In the present paper efforts have been made to optimize InAlAs/InGaAs HEMT by enhancing the effective gate voltage ($(V_c-V_off)$) using pulsed doped structure from uniformly doped to delta doped for microwave frequency applications and reliability. The detailed design criteria to select the proper design parameters have also been discussed in detail to exclude parallel conduction without affecting the del ice performance. Then the optimized value of $V_c-V_off$and breakdown voltages corresponding to maximum value of transconductance has been obtained. These values are then used to predict the transconductance and cut-off frequency of the del ice for different channel depths and gate lengths.

Mg Delta-Doping Effect on a Deep Hole Center Related to Electrical Activation of a p-Type GaN Thin Film

  • Park, Hyo-Yeol;Jeon, Kyoung-Nam;Kim, Keun-Joo
    • Transactions on Electrical and Electronic Materials
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    • 제11권1호
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    • pp.37-41
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    • 2010
  • The authors investigated the photoluminescence (PL) and the electron paramagnetic resonance (EPR) from an magnesium (Mg)-doped GaN thin film with a delta-doped layer. The regularly doped sample shows a PL peak at 2.776 eV for the as-grown sample, and the peak shifts to 2.904 eV and increases in intensity for the annealed sample. The delta-doped sample also shows the same PL peak as does the regularly doped sample. However, only the annealed delta-doped layer shows a sharp EPR with a small isotropic Lande g-factor, $g_{II}$, of 2.029. This resonance is attributed to the delta-doped layer, which forms a hole-bound Mg-N atomic structure instead of the $Mg_{Ga}-V_N$ defect complex, indicating that the delta-doped sample was not optically activated to form PL centers but was instead electrically activated to form a hole-bound state.

도핑된 GaAs의 형광 및 시간분해 형광 특성 (Properties of photoluminescence and time-resolved photoluminescence in doped GaAs)

  • 추장희;서정철;유성규;신은주;이주인;김동호
    • 한국광학회지
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    • 제8권3호
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    • pp.213-217
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    • 1997
  • n형과 p형 GaAs의 도핑에 따른 형광과 시간 분해 형광특성을 조사하였다. 도핑의 농도가 증가할수록 형광의 피크 위치는 p형은 낮은 에너지 쪽으로, n형은 높은 에너지 쪽으로 이동함을 관찰하였다. 이것은 p형은 띠간격 좁아짐 효과가 우세하게 작용하며, n형은 Burstein-Moss효과가 지배적으로 작용하기 때문인 것으로 해석된다. 또한, 도핑의 농도가 증가하면 형광의 소멸시간과 상승시간이 감소하며, p형의 형광소멸시간과 상승시간이 n형보다 더 빠르게 나타났다. 따라서 도핑된 GaAs에서 형광소멸시간과 상승시간은 다수 운반자의 종류와 농도에 의존함을 알 수 있으며, 운반자-운반자 상호작용이 에너지 이완 과정에 중요한 역할을 함을 알 수 있었다.

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RF 마그네트론 스퍼터링법으로 합성된 Ga-doped ZnO 박막의 특성평가 (Characterization of Ga-doped ZnO thin films prepared by RF magnetron sputtering method)

  • 윤영훈
    • 한국결정성장학회지
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    • 제31권2호
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    • pp.73-77
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    • 2021
  • RF 마그네트론 스퍼터링 공정에 의해 Ga-doped ZnO 박막이 O2 및 Ar 분위기 하에서 증착 조건에 따라 합성되었으며, N2 분위기에서, 600℃에서 급속열처리(RTA)를 실시하였다. 증착된 ZnO : Ga 박막에 대해 두께를 측정하였고, XRD 패턴 분석에 의해 결정상을 조사하였으며, FE-SEM, AFM 이미지에 의해 박막의 미세구조를 관찰하였다. O2 및 Ar 분위기 기체 종류별로 형성된 박막들의 증착 조건에 따라 X-선 회절 패턴의 (002)면의 세기는 상당한 차이를 나타냈다. O2 조건에서는 Ga doping이 이루어진 단일 박막의 경우에서는 강한 세기의 회절피크가 관찰되었다. O2 및 Ar 조건에서는 Ga doping이 이루어진 다층박막의 경우에서는 다소 약한 세기의 (002) 면의 피크만을 나타내었다. FE-SEM image에서는 박막의 표면입자의 크기는 두께가 증가함에 따라 입자크기가 다소 증가하는 것으로 관찰되었다. O2 및 Ar 분위기 조건 하에서, Ga doping이 이루어진 다층박막의 경우에서는, 비저항은 6.4 × 10-4Ω·cm을 나타냈고, O2 분위기 조건하에서, Ga doping이 이루어진 단일 박막의 경우에서는 저항값이 감소하였고, Ga-doped ZnO 박막의 두께가 2 ㎛로 증가하면서 저항이 감소하였으며, 1.0 × 10-3 Ω·cm의 비교적 낮은 비저항 값을 나타내었다.

단채널 덱타도핑 HEMT의 전압-전류 특성에 대한 2차원적 해석 (A Study on the I-V characteristics of a delta doped short-channel HEMT)

  • 이정호;채규수;김민년
    • 한국산학기술학회논문지
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    • 제5권4호
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    • pp.354-358
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    • 2004
  • 본 논문은 HEMT소자의 전류-전압특성을 해석적으로 모델링한 것으로 n-AlGaAs층의 전자농도를 고려하여 Gauss법칙과 비선형 전하제어모델을 이용하여 2DEG의 전자농도를 구하였고, 채널을 부분적으로 2차원적으로 해석하여 포화전압을 도출하였고, 계산된 결과는 n-AlGaAs의 전자농도를 고려하지 않은 결과와 비교하였을 때 비교적 정확한 전류전압특성을 보이고 있다

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Synthesis of Nickel-doped Transparent Glass-ceramics for Ultra-broadband Optical Fiber Amplifiers

  • Suzuki, Takenobu;Arai, Yusuke;Ohishi, Yasutake
    • 세라미스트
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    • 제10권3호
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    • pp.28-33
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    • 2007
  • The structural and optical properties of Ni-doped transparent glass-ceramics are reviewed. The quantum efficiencies of ceramics were examined to explore suitable crystalline phase for Ni-doping in glass-ceramics. Inverse spinel $LiGa_5O_8$ have the quantum efficiency of almost 100 % at room temperature. Transparent glass ceramics containing $LiGa_5O_8$ was successfully synthesized by heat treatment of $Li_2O-Ga_2-O_3-SiO_2-NiO$ glass. Most of $Ni^{2+}$ ions in glass-ceramic were incorporated into $LiGa_5O_8$ nanocrystals. The near-infrared emission covering from the O-band to L-band (1260-1625 nm) was observed from the Ni-doped $Li_2O-Ga_2O_3-SiO_2$ glass-ceramic though it was not observed from the as-cast glass. The lifetime of the emission was about $580\;{\mu}sec$ even at 300K. The emission quantum efficiency was evaluated as about 10 % that is enough high for practical usage as gain media of optical fiber amplifiers. The figure of merit (the product of the stimulated emission cross section and lifetime) was as high as that of rare-earth-doped glasses. The broad bandwidth, high quantum efficiency and high figure of merit show that transparent glass-ceramics containing $Ni^{2+}:LiGa_5O_8$ nanocrystals are promising candidates as novel ultra-broadband gain media.

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부분 채널도핑된 GaAs계 이중이종접합 전력FET의 선형성 증가 (Linearity Enhancement of Partially Doped Channel GaAs-based Double Heterostructure Power FETs)

  • 김우석;김상섭;정윤하
    • 대한전자공학회논문지SD
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    • 제39권1호
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    • pp.83-88
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    • 2002
  • HFET 소자의 선형성과 게이트-트레인 항복특성을 향상시키기 위해 부분채널 도핑된 Al/sub 0.25/Ga/sub 0.75/As/In/sub 0.25/Ga/sub 0.75/As/Al/sub 0.25/Ga/sub 0.75/As 이종접합 구조를 갖는 FET를 제안하였다. 제안된 HFET는 게이트 전극 아래로 도핑되지 않은 AlGaAs 진성공급층을 두어 -2OV 의 높은 항복전압을 얻었다. 또한 소자의 InGaAs 채널에 부분 도핑을 실시하여, 균일 채널 도핑을 실시한 경우보다 향상된 선형성을 유도하였고, 2차원 전산모사 견과와 제작 및 측정결과를 통해 선형성의 향상을 확인하였다. 본 실험에서 제안된 HFET소자는 DC측정 결과와 고주파측정 결과 모두에서 기존의 FET소자들에 비해 향상된 선형성을 나타내었다.

Mg도핑된 GaN 반도체 박막의 전자스핀공명 (Electron Spin Resonance from Mg-doped GaN Semiconductor Thin Films)

  • 박효열
    • 반도체디스플레이기술학회지
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    • 제4권2호
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    • pp.1-5
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    • 2005
  • Electon spin resonance measurements have been performed on the Mg-doped wurtzite GaN thin films grown on sapphire substrates by low-pressure metal-organic chemical vapor deposition. The sample set included films as-grown with the regular Mg doped and Mg delta doped samples and the corresponding annealed ones. The resonance signal has been observed from the annealed Mg delta-doped sample with the Lande g value of 2.029. This indicates that the singlet resonance signal originates from the neutral Mg acceptor located at 0.24 eV above the valence band edge and 0.13 eV above the Fermi level because of the nuclear hyperfine spin 1=0 of Mg and the larger value than the free electron g=2.0023.

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GaAs MESFET의 파괴특성 향상을 위한 recess게이트 구조 (The recess gate structure for the improvement of breakdown characteristics of GaAs MESFET)

  • 장윤영;송정근
    • E2M - 전기 전자와 첨단 소재
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    • 제7권5호
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    • pp.376-382
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    • 1994
  • In this study we developed a program(DEVSIM) to simulate the two dimensional distribution of the electrostatic potential and the electric field of the arbitrary structure consisting of GaAs/AlGaAs semiconductor and metal as well as dielectric. By the comparision of the electric field distribution of GaAs MESFETs with the various recess gates we proposed a suitable device structure to improve the breakdown characteristics of MESFET. According to the results of simulation the breakdown characteristics were improved as the thickness of the active epitaxial layer was decreased. And the planar structure, which had the highly doped layer under the drain for the ohmic contact, was the worst because the highly doped layer prevented the space charge layer below the gate from extending to the drain, which produced the narrow spaced distribution of the electrostatic potential contours resulting in the high electric field near the drain end. Instead of the planar structure with the highly doped drain the recess gate structure having the highly doped epitaxial drain layer show the better breakdown characteristics by allowing the extention of the space charge layer to the drain. Especially, the structure in which the part of the drain epitaxial layer near the gate show the more improvement of the breakdown characteristics.

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수직 배향된 Ga-doped ZnO nanorods의 합성과 전기적 특성 (Ga-doped ZnO nanorod arrays grown by thermal evaporation and their electrical behavior)

  • 안철현;한원석;공보현;김영이;조형균;김준제;김홍승
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.414-414
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    • 2008
  • Vertically well-aligned Ga-doped ZnO nanorods with different Ga contents were grown by thermal evaporation on a ZnO template. The Ga-doped ZnO nanorods synthesized with 50 wt % Ga with respect to the Zn content showed maximum compressive stress relative to the ZnO template, which led to a rapid growth rate along the c-axis due to the rapid release of stored strain energy. A further increase in the Ga content improved the conductivity of the nanorods due to the substitutional incorporation of Ga atoms in the Zn sites based on a decrease in lattice spacing. The p-n diode structure with Ga-doped ZnO nanorods, as a n-type, displayed a distinct white light luminescence from the side-view of the device, showing weak ultraviolet and various deep-level emissions.

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