• Title/Summary/Keyword: direct fabrication

Search Result 485, Processing Time 0.028 seconds

Fabrication of Organic Nanowire Electronics by Direct Printing Method

  • Park, Gyeong-Seon;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.02a
    • /
    • pp.563-563
    • /
    • 2012
  • We report a one-step fabrication of single-crystal organic nanowire arrays on substrates using a new direct printing method (liquid-bridge-mediated nanotransfer moulding, LB-nTM), which can simultaneously enable the synthesis, alignment and patterning of the nanowires using molecular ink solutions. Two- or three-dimensional complex structures of various single-crystal organic nanowires were directly fabricated over a large area with a successive process. The position of the nanowires can be aligned easily on complex structures because the mold is movable on substrates before drying the polar liquid layer, which acts as an adhesive lubricant. This efficient manufacturing method can produce a wide range of optoelectronic devices and integrated circuits with single-crystal organic nanowires.

  • PDF

Fabrication of Beta-phase Poly(9,9-dioctylfluorene) Nanowire Arrays for Polymer Light-Emitting Diode Using Direct Printing Method

  • Baek, Jang-Mi;Lee, Gi-Seok;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.02a
    • /
    • pp.560-560
    • /
    • 2012
  • We report a one-step fabrication method of Poly(9,9-dioctylfluorene) (PFO) nanowire array with pronounced ${\beta}$-Phase. We use liquid-bridge-mediated nanotransfer molding (LB-nTM) which is a new direct nano-patterning method based on the direct transfer of various materials from a mold to a substrate via liquid layer. The formation of the ${\beta}$-phase morphology in the resulting PFO nanowire array was evidenced by the presence of an absorption peak at 435nm. With the collection polarizer oriented parallel to the wire long axis, the PL emission was most intense and an emission dichroic ratio, DRE, of 3.7 was determined. The nanowire array have been investigated by scanning electron microscopy (SEM). Also, we simply fabricated structure of device of ITO/PFO nanowire arrays/Al and the electroluminescence spectra were recorded at various applied voltage.

  • PDF

Fabrication of Colloid Thrusters using MEMS Technology

  • Park, Kun Joong;Song, Seung Jin;Sanchez, Manuel Martinez
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • 2004.03a
    • /
    • pp.588-592
    • /
    • 2004
  • This paper presents the preliminary fabrication results of colloid thrusters which can provide thrust of the order of micro to milli-Newtons. MEMS technology has been used for fabrication, and four essential fabrication techniques - deep etching with nested masks, isotropic plasma etching, anisotropic reactive ion etching, and direct fusion wafer bonding - have been newly developed. Among diverse models which have been designed and fabricated, the fabrication results of 4-inch wafer-based colloid thrusters are presented.

  • PDF

Laser-aided Direct Metal Tooling Technology (DMT 기술과 적용사례)

  • 서정훈
    • Proceedings of the Korean Society of Precision Engineering Conference
    • /
    • 2003.06a
    • /
    • pp.58-61
    • /
    • 2003
  • 제품이 요구하는 기능성 소재(금속, 합금, 세라믹 등)를 사용하여 컴퓨터에 저장되어 있는 3차원 형상의 기하학적 자료(digital data of 3D subjects)로부터 직접 3차원 형상의 제품 또는 제품생산에 필요한 툴(tools)을 매우 빠른 시간 내에 제작할 수 있는 신개념의 쾌속 직접금속성형기술(laser-aided direct metal fabrication tech.)임.(중략)

  • PDF

Development of Hybrid Fused Deposition Modeling System for Three-Dimensional Circuit Device Fabrication (3 차원 회로 장치 제작을 위한 FDM 기반의 통합 시스템 개발)

  • O, Sung Taek;Lee, In Hwan;Kim, Ho-Chan;Cho, Hae Yong
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.38 no.8
    • /
    • pp.869-874
    • /
    • 2014
  • It is possible to fabricate a three-dimensional (3D) shape using the solid freeform fabrication (SFF) technology. However, there are several problems in applying conventional SFF technologies to the direct manufacturing of a product. Hence, multimaterial SFF is gaining attention. Moreover, a 3D circuit device that is different from a conventional two-dimensional PCB can also be fabricated using multimaterial SFF. In this study, a hybrid system using fused deposition modeling and direct writing was designed for 3D circuit device fabrication.

Direct Printable Nanowire p-n Junction device

  • Lee, Tae-Il;Choi, Won-Jin;Kar, Jyoti Prakash;Moon, Kyung-Ju;Lee, Min-Jung;Jun, Joo-Hee;Baik, Hong-Koo;Myoung, Jae-Min
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2010.05a
    • /
    • pp.30.2-30.2
    • /
    • 2010
  • Nano-scale p-n junction can generate various nano-scale functional devices such as nanowire light emitting diode, nanowire solar cell, and nanowire sensor. The core shell type nanowire p-n junction has been considered for the high efficient devices in many previous reports. On the other hand, although device efficiency is relatively lower, the cross bar type p-n junction has simple topological structure, suggested by C.M. Lieber group, to integrate easily many p-n junction devices in one board. In this study, for the integration of the cross bar nanowire p-n junction device, a simple fabrication route, employed dielectrophoretic array and direct printing techniques, was demonstrated by the successful fabrication and programmable integration of the nanowire cross bar p-n junction solar cell. This direct printing process will give the single nanowire solar cell the opportunity of the integration on the circuit board with other nanowire functional devices.

  • PDF

Process Study of Direct Laser Lithographic System for Fabricating Diffractive Optical Elements with Various Patterns (다중 패턴의 회절광학소자 제작을 위한 레이저 직접 노광시스템의 공정 연구)

  • Kim, Young-Gwang;Rhee, Hyug-Gyo;Ghim, Young-Sik;Lee, Yun-Woo
    • Journal of the Semiconductor & Display Technology
    • /
    • v.18 no.2
    • /
    • pp.58-62
    • /
    • 2019
  • Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.