• Title/Summary/Keyword: diffraction grating

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Polarization selective diffraction grating using birefringence of the liquid crystal polymer (액정폴리머의 복굴절 특성을 이용한 편광선택형 회절격자)

  • An, Jun-Won;Kim, Nam
    • Proceedings of the Optical Society of Korea Conference
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    • 2007.02a
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    • pp.163-164
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    • 2007
  • We have described a polarization selective diffraction grating using liquid crystal polymer and experimentally demonstrated. From the experimental results, intensity ratios of 1.171 for p-polarization and of 0.0072 for s-polarization are achieved by 650nm wavelength, respectively.

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A Study on thin relief phase holographic grating using photoresist. (Photoresist을 이용한 Thin relief 위상형 홀로그램 격자에 관한 연구.)

  • Shin, K.Y.;Choi, D.H.;Kim, N.;Park, H.K.
    • Proceedings of the KIEE Conference
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    • 1987.07a
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    • pp.47-50
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    • 1987
  • There are various holographic recording materials, such as Dichromated Gelatin, Silver Halide, Thermoplastic, Photoresist. In this paper especially, we used Photoresist to make the phase holographic grating. Deep-groove diffractive grating formed in relatively thin holographic recording material is to express high diffraction efficiency. Phase holographic grating recorded In photoresist can be used very practical because it has the high diffraction efficiency, and it is possible to make a replication easily. So, it has the merit in recording the optical holographic grating than any other materials.

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Diffraction grating interferometer of large equivalent wavelength for flatness testing of rough surfaces (거친 표면 형상측정을 위한 큰 등가파장 회절격자 간섭계)

  • 황태준;김승우
    • Korean Journal of Optics and Photonics
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    • v.15 no.1
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    • pp.56-62
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    • 2004
  • We present a diffraction grating interferometer of large equivalent wavelength specially designed for flatness testing of rough surfaces. Two transmission diffraction gratings are illuminated on the object under test by use of two measurement beams with different angles of incidence, which yields a large equivalent wavelength. This interferometer design minimizes unnecessary diffraction rays and the systematic error caused by the diffraction gratings, and provides a large working distance and easy alignment. To improve the measurement accuracy, phase shifting technique is applied and the equivalent wavelength error caused by defocus is calibrated. Test results obtained from mirror surfaces and machined rough surfaces are discussed.

A new interpretation of two-beam energy coupling in terms of bragg diffraction in a photorefractive crystal

  • Lee, Yeon-Ho;Kim, You-Hyun;Kim, Jae-Cheo;Kim, Hyun-Sung
    • Journal of the Optical Society of Korea
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    • v.1 no.1
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    • pp.36-40
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    • 1997
  • Bragg diffraction of a strong reference beam from a steady-state photorefractive grating is measured experimentally and an analytic prediction is derived from the coupled wave equations of two-beam energy coupling. The relation between Bragg diffraction and two-beam coupling is used to check the mechanism of photorefractive grating formation.

A Study on the Development of Measurement Setup for Crater Wear by Diffraction Grating in Turning (선삭에서 회절격자를 이용한 크레이터마모 측정장치 개발에 관한 연구)

  • Kim, Yeong-Il;Kim, Se-Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.9 no.1
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    • pp.82-95
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    • 1992
  • There is the high interest for sensing of tool wear with the aim of controlling machine tools productivity from the point of view of qualitity. Difficulties in this measurement are also known. This study is on the development of measurement setup for crater wear by CCD image inturning. In this study, the crater wear measurement system consists of the He-Ne gas laser, diffraction grating. CCD camera, noise filter, slit, microcomputer, diverging lens, converging lens and so on. He-Ne laser beam passes through a diverging lens and a diffraction grating is positioned properly. A converging lens focuses so that the interference fringes can be obtained on the crater wear. Performance test revealed that the developed image technique provides precise, absolute tool-wear quantification and reduces human measurement errors. The results obtained are as follows 1. The digitizing of one image requires less than 2ses. 2. It can give detailed information on crater wear with limited times and errors 3. All parameters required by specification are easily obtained for several points of the cutting edge.

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A Study on the Grating Foemation and Optical Properties of Amorphous (Se,S)-based Chalcogenide Thin Films (비정질 (Se,S)를 기본으로 한 칼코게나이드 박막의 Grating 형성과 광특성에 관한 연구)

  • Park, Tae-Sung;Chung, Hong-Bay;Kim, Jong-Bin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1988.05a
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    • pp.20-23
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    • 1988
  • Effect of light irradiation on evaporated chalcogenide glass films of an As-Se-S-Ge system has been studied. Utiling this characteristics diffraction grating of the amorphous film was obtained. Parameters such as film thickness, composition, and exporsure time influencing the diffraction efficiency were also studied. The maximum value of the diffraction efficiency achieved was 4.6% in an $As_{75}Se_{15}S_{35}-Ge_{10}$ film.

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Light diffraction in anisotronic surface relief phase grating (비등방 표면 부조 격자에서의 빛의 회절)

  • 장혜정;강보영;최현희;박병주;우정원
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.07a
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    • pp.166-167
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    • 2003
  • 아조벤젠 그룹의 trans-cis-trans photo isomerization 특성에 의한 광배향 (photoinduced orientation) 성질을 이용하여 아조벤젠이 함유된 폴리머박막에 표면 부조 격자 (surface relief grating)를 만드는 것은 널리 알려져 있다. 특히 최근 들어, 비선형 물질의 주기적인 배열 구조를 만들기 위해서 surface relief grating을 corona poling 하는 방법들이 연구되어 지고 있다. poling된 surface relief grating은 poling 방향으로의 azo분자의 극질서가 유도되기 때문에, $C_{{\infty}v}$점대칭을 가지는 비등방 회절 격자(anisotropic grating)가 되며 2차 비선형 특성 중의 하나인 선형 전기 광학 효과를 나타낼 수 있다. (중략)

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The Elimination Characteristics by Impressed Voltage of Holography Grating in Chacogenide Thin Film

  • Lee Ki-Nam;Yeo Cheol-Ho;Yang Sung-Jun;Chung Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.6
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    • pp.219-222
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    • 2004
  • This paper discovers that there are some peculiar properties that can remove holography grating, which was made in chacogenide thin film by impressed voltage. The thin films were used are $As_{40}Ge_{10}Se_{15}S_{35}$, and we use He-Ne laser in order to form thin films. I-V curved line in a thin film before a lattice was made has the critical point, about 3.7 V. Moreover, the I-V curved line increased current intensity at over 4 V after it made thin film. In addition, while holography grating is being made, and when it has the highest diffraction efficiency, a lattice can be deleted if put more voltage into it.

Annealing Effect of the Chalcogenide Thin Film for Holographic Grating Formation (홀로그래픽 격자 형성에 대한 칼코게나이드 박막의 열처리 효과)

  • Park, Jung-Il;Shin, Kyung;Lee, Jung-Tae;Lee, Young-Jong;Chung, Hong-Bay
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.8
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    • pp.736-739
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    • 2003
  • We prepared the chalcogenide As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/, Se$\_$75/Ge$\_$25/ thin film. Holographic grating was formed by the He-Ne laser( λ =633 nm). Annealing at 100$^{\circ}C$ and 200$^{\circ}C$ has been used to change the optical property of chalcogenide thin films for holographic grating formation. As the results, large variation of the optical property was generated at the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ chalcogenide film. Diffraction efficiency of the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ film has been enhanced about three times

Holographic Properties in Amorphous As-Ge-Se-S with Ag Thickness (Ag의 두께에 따른 비정질 As-Ge-Se-S의 홀로그래픽 특성연구)

  • Kim, Chung-Hyeok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.3
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    • pp.213-217
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    • 2012
  • In this study, we have investigated the holographic grating formation on Ag-doped amorphous As-Ge-Se-S thin films. The dependence of diffraction efficiency as afunction of Ag layer thickness has been investigated in this amorphous chalcogenide films. Holographic gratings was formed using [P:P] polarized Diode Pumped Solid State laser (DPSS, 532.0 nm). The diffraction efficiency was obtained by +1st order intensity. The results were shown that the diffraction efficiency of Ag/AsGeSeS double layer thin films for the Ag thickness, the maximum grating diffraction efficiency using 60 nm Ag layer is 0.96%.