• Title/Summary/Keyword: dielectric constant.

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A Study on the Surface Discharge Characteristics by Dielectric Constant and Diameter of Solid Dielectrics to Improve Surface Dielectric Strength in Eco-Friendly Insulation Gas (친환경 절연가스 중 연면절연성 향상을 위한 고체유전체의 유전율과 지름에 따른 연면방전특성 연구)

  • Lim, Dong-Young;Min, Gyeong-Jun;Park, He-Rie;Choi, Eun-Hyeok;Choi, Sang-Tae;Park, Won-Zoo;Lee, Kwang-Sik
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.1
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    • pp.85-91
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    • 2013
  • This paper studied surface discharge characteristics by a dielectric constant and diameter of solid dielectrics in $N_2/O_2$ mixture gas. Applied electric field strength at $N_2/O_2$ mixture gas was changed from the dielectric constant and diameter of the solid dielectrics, and insulation performance of the $N_2/O_2$ mixture gas determined surface discharge voltage. In each of the diameter at the solid dielectrics, the surface discharge voltage was increased by lengthening surface distance, whereas increasing rate of the surface discharge voltage was different from gas pressure. Thus, In this paper, main factors of surface discharge are as follows. 1) Insulation performance of $N_2/O_2$ mixture gas, 2) Dielectric constant of solid dielectrics, 3) Surface discharge path. It was clear that the surface discharge voltage depend on the main factors. These results will be applied to useful data for an eco-friendly composite insulation design.

Pyroelectric Peyformance Evaluation of Pure PZT and Alternately Deposited PZT/PT Thin Films (PZT 순수박막과 PZT/PT 교차박막의 적외선 감지 특성 비교)

  • Ko, Jong-Soo;Kwak, Byung-Man
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.6
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    • pp.1001-1007
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    • 2002
  • To improve the performance of the PZT thin flms, each PZT and PT layer was alternately deposited on a Pt/Ti/Si$_3$N$_4$/SiO$_2$/Si substrate by a modified sol-gel solid precursor technique. For comparison, PZT thin films were also prepared with an identical method under the same conditions. XRD measurement revealed that the diffraction pattern of the multilayer film was due to the superimposition of the PZT and PT patterns. At 1㎑, a dielectric constant of 389 and 558, a dielectric loss of 1.2% and 1.1% were obtained for the PZT/PT and PZT thin films, respectively. If we consider the PT dielectric constant to be 260, it is clear that the dielectric constant of alternately deposited PZT/PT thin films was well adjusted. The PZT/PT thin film showed a low dielectric constant and a similar dielectric loss compared with those of the PZT film. The figures of merit on detectivity for the PZT/PT and PZT thin films were 20.3$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and 18.7$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and the figures of merit on voltage response were 0.038㎡/C and 0.028 ㎡/C, respectively. The high figures of merit for the PZT/PT film were ascribed to its relatively low dielectric constant when compared to the PZT thin films.

Optical, Thermal and Dielectric Properties of $B_2O_3-Al_2O_3$-SrO Glasses for Plasma Display Panel (플라즈마 디스플레이 패널을 위한 $B_2O_3-Al_2O_3$-SrO계 유리의 물리적 특성)

  • Hwang, Seong-Jin;Lee, Jin-Ho;Lee, Sang-Wook;Kim, Hyung-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.33-33
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    • 2007
  • In PDP industry, the dielectrics and barrier ribs have been required with low dielectric constant, low melting point and Pb-free composition due to the low power consumption, low signal delay time and the environment restriction. We were studied with $B_2O_3-Al_2O_3$-SrO glass systems about optical, thermal and dielectric properties. The glass forming region of the $B_2O_3-Al_2O_3$-SrO glass systems was narrow due to the amount of the glass former $(B_2O_3)$. The glass transition temperature (Tg) of the glasses was at $550{\sim}590^{\circ}C$. The glasses have 6~8 for the dielectric constant. Furthermore, the transmittance of the glasses was over 80% on the range of the visible ray. From the results, the glasses of the $B_2O_3-Al_2O_3$-SrO glass systems should enable to be a good candidate of the PDP devices for information display with low dielectric constant. The aim of this study is to give a fundamental result of new glass system for low dielectric constant in the information display.

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A Study on the Dielectric Polarization of $ITO/Alq_3/Al$ Structure Organic Light-emitting Diodes ($ITO/Alq_3/Al$ 구조 유기 발광 소자의 유전분극 현상의 연구)

  • Oh, Yong-Cheul;Shin, Cheol-Gi;Kim, Chung-Hyeak
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.57 no.1
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    • pp.73-77
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    • 2008
  • We have investigated dielectric polarization in organic light-emitting diodes using 8-hydroxyquinoline aluminum($Alq_3$) as an electron transport and emissive material. We analyzed the dielectric polarization of organic light-emitting diodes using characteristics of impedance and equivalent circuit of $ITO/Alq_3/Al$. Impedance characteristics was measured complex impedance Z and phase ${\theta}$ in the frequency range of $1{\times}40Hz\;to\;1{\times}10^8Hz$. We obtained complex electrical conductivity, dielectric constant, and loss tangent(tan${\delta}$) of the device at room temperature. And, we obtained the equivalent circuit of $ITO/Alq_3/Al$ through analyzing dielectric constant and dielectric loss tangent. From these analyses, we could interpret a conduction mechanism and dielectric polarization.

Characterization of Thin Film Transistor using $Ta_2O_5$ Gate Dielectric

  • Um, Myung-Yoon;Lee, Seok-Kiu;Kim, Hyeong-Joon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.157-158
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    • 2000
  • In this study, to get the larger drain current of the device under the same operation condition as the conventional gate dielectric SiNx thin film transistor devices, we introduced new gate dielectric $Ta_2O_5$ thin film which has high dielectric constant $({\sim}25)$ and good electrical reliabilities. For the application for the TFT device, we fabricated the $Ta_2O_5$ gate dielectric TFT on the low-temperature-transformed polycrystalline silicon thin film using the self-aligned implantation processing technology for source/drain and gate doping. The $Ta_2O_5$ gate dielectric TFT showed better electrical performance than SiNx gate dielectric TFT because of the higher dielectric constant.

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Preparation and Dielectric Behavior of D-Glass with Different Boron Contents (보론함량에 따른 D-glass의 유전율 특성)

  • Jeong, Bora;Lee, Ji-Sun;Lee, MiJai;Lim, Tae-Young;Lee, Youngjin;Jeon, Dae-Woo;Shin, Dongwook;Kim, Jin-Ho
    • Korean Journal of Materials Research
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    • v.27 no.1
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    • pp.39-42
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    • 2017
  • E-glass (electrical glass) fiber is the widely used as a reinforced composite material of PCBs (printed circuit boards). However, E-glass fiber is not stable because it has a dielectric constant of 6~7. On the other hand, D-glass (dielectric glass) fiber has a low dielectric constant of 3~4.5. Thus, it is adaptable for use as a reinforcing material of PCBs. In this study, we fabricated D-glass compositions with low dielectric constant, and measured the electrical and optical properties. In the glass composition, the boron content was changed from 9 to 31 wt%. To confirm the dependence of the dielectric constant on melting properties, D-glass with 22 wt% boron was melted at $1550^{\circ}C$ and $1650^{\circ}C$ for 2hrs. The glass melted at $1650^{\circ}C$ had a lower dielectric constant than the glass melted at $1550^{\circ}C$. Therefore, the D-glass with boron of 9~31 wt% was fabricated by melting at $1650^{\circ}C$ for 2hrs, and transparent clear glass was obtained. We identified the non-crystalline nature of the glass using an XRD (x-ray diffractometer) graph. The visible light transmittance values depending on the boron contents were measured and found to be 88.6 % ~ 82.5 %. Finally, the dielectric constant of the D-glass with 31 wt% boron was found to have decreased from 4.18 to 3.93.

Microstructure and Dielectric Properties of ($Sr_{1-x}Ca_x)TiO_3$ Ceramic Thin Film by RF Sputtering Method (RF 스퍼터링법에 의한 ($Sr_{1-x}Ca_x)TiO_3$ 세라믹 박막의 미세구조 및 유전특성)

  • 김진사;오재한;이준웅
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.11
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    • pp.984-989
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    • 1998
  • The ($Sr_{1-x}Ca_x)TiO_3$(SCT) thin films are deposited on Pt-coated electrode($Pt/TiN/SiO_2/Si$) using RF sputtering method with substitutional contents of Ca. The maximum grain of thin films is obtained by substitution of Ca at 15[mol%]. All SCT thin films had (111) preferred orientation. The dielectric constant was increased with increasing the substitutional contents of Ca, while it was decreased if the substitutional contents of Ca exceeded over 15[mol%]. The dielectric constant changes almost linearly in temperature ranges of -80~+90[$^{\circ}C$]. The temperature properties of the dielectric loss have a stable value within 0.02 independent of the substitutional contents of Ca. All SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequency, and the relaxation frequency is observed above 200[kHz].

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Microwave Dielectric Properties and Infrared ReflectivitySpectra of (Zr$_{0.8}$Sn$_{0.2}$)TiO$_4$ Ceramics ((Zr$_{0.8}$Sn$_{0.2}$)TiO$_4$ 세라믹스의 마이크로파 유전특성 및 Infrared Reflectivity Spectra of (Zr0.8Sn0.2)TiO4)

  • 윤기현;안일석;김우섭;김응수
    • Journal of the Korean Ceramic Society
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    • v.36 no.9
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    • pp.915-922
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    • 1999
  • Microwave dielectric properties and far infrared reflectivity spectra of the (Zr0.8Sn0.2)TiO4 ceramics were inves-tigated with the various cooling rate. Dielectric constant was nearly same value while the unloaded Q value was largely affected by cooling rate. The Q.f of 42,140 at 7 GHz was obtained for the specimens with cooling rate of 1$^{\circ}C$/min. The effect of the cooling rate on the change of the ionic the electronic polarization and the intrinsic microwave loss of the specimens were investigated by the infrared reflectivity spectra from 50 to 4000cm-1 which were calculated by Kramers-Kroning analysis and the classical oscillator model. The relative tendency of microwave dielectric properties of the specimens calculated from the relfectivity data were in good agreement with the results by the post resonant method.

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Effects of Fluoride Additions on Sintering and Microwave Dielectric Properties of CaWO$_4$ (Fluoride 첨가에 따른 CaWO$_4$의 소결 및 고주파 유전특성)

  • 이경호;김용철;방재철
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.127-130
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    • 2002
  • In this study, development of a new LTCC material using a non-glassy system was attempted with respect to reducing the fabrication process steps and cost down. Lowering the sintering temperature can be achieved by liquid phase sintering. For LTCC application, the starting material must have quality factor as high as possible in microwave frequency range. And also, the material should have a low dielectric constant for enhancing the signal propagation speed. Regarding these factors, dielectric constants of various materials were estimated by the Clausius-Mosotti equation. Among them, CaWO$_4$ was tamed out the suitable LTCC material. CaWO$_4$ can be sintered up to 98% of full density at 1200$^{\circ}C$ for 3 hours. It's measured dielectric constant, quality factor, and temperature coefficient of resonant frequency were 10.15, 62880GHz, and -27.8ppm/$^{\circ}C$, respectively. In order to modify the dielectric properties and densification temperature, 0.5∼1.5 wt% LiF were added to CaWO$_4$. LiF addition reduced the sintering temperature/time down to 800$^{\circ}C$/10∼30min due to the reactive liquid phase sintering. Dielectric constant lowered from 10.15 to 9.38 and Q x fo increased up to 92000GHz with increasing LiF content.

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Analysis of a Parallel-Two-Wire Transmission Line Coated with Multi-layer Dielectric Material (유전체가 다층으로 코팅된 평행 2선식 전송선로 해석)

  • Chun Dong-Wan;Kim Won-Ki;Shin Chull-Chai
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.41 no.12
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    • pp.131-137
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    • 2004
  • In this paper, we proposed the method of the characteristic impedance and effective dielectric constant calculations of a parallel-two-wire transmission line coated with multi-layer dielectric material using conformal mapping method. First of all, we calculated the capacitance of the transmission line when coated by N layer dielectric material which has different thickness and dielectric constant and calculated the characteristic impedance and effective dielectric constant using calculated capacitances. When compared with the Maxwell 2D (made by Ansoft Corporation) simulation result calculated result was very similar to the simulation result within the four percent error range.